CN112334744B - 用于多图像激光束质量测量的聚焦校正的方法和设备 - Google Patents

用于多图像激光束质量测量的聚焦校正的方法和设备 Download PDF

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Publication number
CN112334744B
CN112334744B CN201980043526.9A CN201980043526A CN112334744B CN 112334744 B CN112334744 B CN 112334744B CN 201980043526 A CN201980043526 A CN 201980043526A CN 112334744 B CN112334744 B CN 112334744B
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China
Prior art keywords
image
focus
laser beam
imaging device
focal plane
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Chinese (zh)
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CN112334744A (zh
Inventor
方·雷·布朗
杰夫·布朗
杰德·希梦思
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Aofeier Optoelectronic Application Co ltd
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Alpha Spiricon
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4228—Photometry, e.g. photographic exposure meter using electric radiation detectors arrangements with two or more detectors, e.g. for sensitivity compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0214—Constructional arrangements for removing stray light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0422—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using light concentrators, collectors or condensers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/0014—Monitoring arrangements not otherwise provided for

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Lasers (AREA)
  • Length Measuring Devices By Optical Means (AREA)
CN201980043526.9A 2018-07-20 2019-07-08 用于多图像激光束质量测量的聚焦校正的方法和设备 Active CN112334744B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201862701244P 2018-07-20 2018-07-20
US62/701,244 2018-07-20
PCT/US2019/040891 WO2020018308A1 (en) 2018-07-20 2019-07-08 Method and apparatus for focus correction of multi-image laser beam quality measurements

Publications (2)

Publication Number Publication Date
CN112334744A CN112334744A (zh) 2021-02-05
CN112334744B true CN112334744B (zh) 2024-09-13

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Country Status (6)

Country Link
US (1) US11965775B2 (cg-RX-API-DMAC7.html)
EP (1) EP3824259B1 (cg-RX-API-DMAC7.html)
JP (1) JP7564086B2 (cg-RX-API-DMAC7.html)
KR (1) KR102767094B1 (cg-RX-API-DMAC7.html)
CN (1) CN112334744B (cg-RX-API-DMAC7.html)
WO (1) WO2020018308A1 (cg-RX-API-DMAC7.html)

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CN113091898A (zh) * 2021-03-04 2021-07-09 南京理工大学 基于散射光成像法的激光光束质量测量方法
CN112924024A (zh) * 2021-03-12 2021-06-08 中国工程物理研究院激光聚变研究中心 一种新型高能激光光束质量测量装置
DE202021103431U1 (de) * 2021-06-28 2021-08-19 Trioptics Gmbh Vorrichtung zur Abbildung durch ein zu prüfendes optisches System und System zum Prüfen eines optischen Systems
WO2023283204A1 (en) * 2021-07-06 2023-01-12 Divergent Technologies, Inc. Exchangeable beam entry window for am system
DE102022101274A1 (de) 2022-01-20 2023-07-20 TRUMPF Werkzeugmaschinen SE + Co. KG Verfahren und Messanordnung zur Bestimmung der Eigenschaften einer Laserschmelzschneidvorrichtung
DE102023102206A1 (de) * 2023-01-31 2024-08-01 TRUMPF Laser SE Kontrastmessung zur Laserpulseinstellung
CN121364060A (zh) * 2025-12-23 2026-01-20 中国计量科学研究院 一种扫描散射式光束分析仪

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CN114008418A (zh) * 2019-06-22 2022-02-01 奥菲尔-斯皮里康公司 用于激光束轮廓描绘和激光束特征化系统的纳米纹理衰减器及其使用方法

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WO1990012999A1 (en) * 1989-04-27 1990-11-01 Coherent, Inc. Apparatus for measuring the mode quality of a laser beam
US5760901A (en) * 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation
JP4397549B2 (ja) * 2001-07-04 2010-01-13 株式会社リコー ビームプロファイル検証方法
IL148664A0 (en) 2002-03-13 2002-09-12 Yeda Res & Dev Auto-focusing method and device
WO2004081549A1 (en) * 2003-03-11 2004-09-23 Koninklijke Philips Electronics N.V. Spectroscopic analysis apparatus and method with excitation system and focus monitoring system
IL156856A (en) * 2003-07-09 2011-11-30 Joseph Shamir Method for particle size and concentration measurement
EP1804100B1 (en) * 2005-12-30 2018-02-21 Datalogic IP TECH S.r.l. Device and method for focusing a laser light beam
EP2567202B1 (en) 2010-03-23 2022-12-07 Ophir Optronics Solutions Ltd. Beam scattering laser monitoring apparatus
US8520219B2 (en) * 2011-12-19 2013-08-27 Perceptron, Inc. Non-contact sensor having improved laser spot
US8711343B1 (en) * 2012-10-22 2014-04-29 Haas Laser Technologies, Inc. Apparatus for focus beam analysis of high power lasers
DE102014201779B4 (de) * 2014-01-31 2016-12-15 Carl Zeiss Smt Gmbh Strahlpropagationskamera und Verfahren zur Lichtstrahlanalyse
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Also Published As

Publication number Publication date
EP3824259A1 (en) 2021-05-26
EP3824259B1 (en) 2024-12-18
WO2020018308A1 (en) 2020-01-23
CN112334744A (zh) 2021-02-05
EP3824259A4 (en) 2022-03-30
KR102767094B1 (ko) 2025-02-13
KR20210024181A (ko) 2021-03-04
US11965775B2 (en) 2024-04-23
US20210199495A1 (en) 2021-07-01
JP2021530710A (ja) 2021-11-11
JP7564086B2 (ja) 2024-10-08

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