KR102746100B1 - 감활성광선성 또는 감방사선성 수지 조성물, 패턴 형성 방법, 레지스트막, 전자 디바이스의 제조 방법, 화합물, 화합물의 제조 방법 - Google Patents

감활성광선성 또는 감방사선성 수지 조성물, 패턴 형성 방법, 레지스트막, 전자 디바이스의 제조 방법, 화합물, 화합물의 제조 방법 Download PDF

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KR102746100B1
KR102746100B1 KR1020227041620A KR20227041620A KR102746100B1 KR 102746100 B1 KR102746100 B1 KR 102746100B1 KR 1020227041620 A KR1020227041620 A KR 1020227041620A KR 20227041620 A KR20227041620 A KR 20227041620A KR 102746100 B1 KR102746100 B1 KR 102746100B1
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KR20230003124A (ko
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아키요시 고토
아키라 타카다
아이나 우시야마
마사후미 코지마
미치히로 시라카와
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후지필름 가부시키가이샤
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    • C07C303/02—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof
    • C07C303/22—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof from sulfonic acids, by reactions not involving the formation of sulfo or halosulfonyl groups; from sulfonic halides by reactions not involving the formation of halosulfonyl groups
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