KR102694720B1 - 특히 마이크로리소그래픽 투영 노광 장치용 광학 시스템 - Google Patents

특히 마이크로리소그래픽 투영 노광 장치용 광학 시스템 Download PDF

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KR102694720B1
KR102694720B1 KR1020187016448A KR20187016448A KR102694720B1 KR 102694720 B1 KR102694720 B1 KR 102694720B1 KR 1020187016448 A KR1020187016448 A KR 1020187016448A KR 20187016448 A KR20187016448 A KR 20187016448A KR 102694720 B1 KR102694720 B1 KR 102694720B1
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South Korea
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reflective surface
optical system
reflective
respect
control loop
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Korean (ko)
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KR20180093923A (ko
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울리히 쇤호프
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칼 짜이스 에스엠테 게엠베하
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/004—Systems comprising a plurality of reflections between two or more surfaces, e.g. cells, resonators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G02B5/122—Reflex reflectors cube corner, trihedral or triple reflector type
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
KR1020187016448A 2015-12-15 2016-12-09 특히 마이크로리소그래픽 투영 노광 장치용 광학 시스템 Active KR102694720B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015225262.0A DE102015225262A1 (de) 2015-12-15 2015-12-15 Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102015225262.0 2015-12-15
PCT/EP2016/080498 WO2017102599A1 (en) 2015-12-15 2016-12-09 Optical system, in particular for a microlithographic projection exposure apparatus

Publications (2)

Publication Number Publication Date
KR20180093923A KR20180093923A (ko) 2018-08-22
KR102694720B1 true KR102694720B1 (ko) 2024-08-14

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Application Number Title Priority Date Filing Date
KR1020187016448A Active KR102694720B1 (ko) 2015-12-15 2016-12-09 특히 마이크로리소그래픽 투영 노광 장치용 광학 시스템

Country Status (6)

Country Link
US (1) US10838306B2 (https=)
JP (1) JP6864685B2 (https=)
KR (1) KR102694720B1 (https=)
DE (1) DE102015225262A1 (https=)
TW (1) TWI720087B (https=)
WO (1) WO2017102599A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017202976A1 (en) * 2016-05-25 2017-11-30 Carl Zeiss Smt Gmbh Position measurement of optical elements in a lithographic apparatus
DE102022208204A1 (de) 2022-08-08 2023-08-31 Carl Zeiss Smt Gmbh Verfahren zur Kompensation von Abbildungsfehlern einer EUV-Projektionsbelichtungsanlage

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004031954A (ja) * 2002-06-21 2004-01-29 Nikon Corp 収差補正システム、収差補正方法、変形レチクルチャック及びｅｕｖ露光装置
JP2004266264A (ja) 2003-02-13 2004-09-24 Canon Inc 光学系、露光装置、デバイス製造方法
JP2004343078A (ja) * 2003-04-04 2004-12-02 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2011014908A (ja) 2009-07-01 2011-01-20 Nikon Corp 投影光学系、露光装置、及びその組立方法
WO2015014753A1 (en) * 2013-07-29 2015-02-05 Carl Zeiss Smt Gmbh Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001215718A (ja) * 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
JP2002231619A (ja) * 2000-11-29 2002-08-16 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
DE10118047A1 (de) 2001-04-11 2002-10-17 Zeiss Carl Katadioptrisches Objektiv
DE10204465A1 (de) * 2002-02-05 2003-08-14 Zeiss Carl Smt Ag Verfahren zur Korrektur von schwingungsinduzierten Abbildungsfehlern in einem Objektiv
AU2003227607A1 (en) * 2002-04-11 2003-10-20 Heidelberg Instruments Mikrotechnik Gmbh Method and device for imaging a mask onto a substrate
JP2006140366A (ja) * 2004-11-15 2006-06-01 Nikon Corp 投影光学系及び露光装置
US7283210B2 (en) * 2005-03-22 2007-10-16 Nikon Corporation Image shift optic for optical system
DE102006003375A1 (de) * 2006-01-24 2007-08-09 Carl Zeiss Smt Ag Gruppenweise korrigiertes Objektiv
JP2007317713A (ja) * 2006-05-23 2007-12-06 Canon Inc 光学素子駆動装置
DE102006034755A1 (de) * 2006-07-24 2008-01-31 Carl Zeiss Smt Ag Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung
JP2010506388A (ja) * 2006-10-02 2010-02-25 カール・ツァイス・エスエムティー・アーゲー 光学システムの結像特性を改善する方法及びその光学システム
CN101548240B (zh) * 2006-12-01 2014-09-17 卡尔蔡司Smt有限责任公司 具有用于减小像差的可替换、可操纵的校正布置的光学系统
US20090042115A1 (en) 2007-04-10 2009-02-12 Nikon Corporation Exposure apparatus, exposure method, and electronic device manufacturing method
JP4986754B2 (ja) 2007-07-27 2012-07-25 キヤノン株式会社 照明光学系及びそれを有する露光装置
EP2388649B1 (en) * 2007-12-21 2013-06-19 Carl Zeiss SMT GmbH Illumination system for illuminating a mask in a microlithographic exposure apparatus
WO2011020690A2 (en) 2009-08-07 2011-02-24 Carl Zeiss Smt Gmbh Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure apparatus for microlithography, and projection exposure apparatus
DE102011087851A1 (de) 2010-12-22 2012-06-28 Carl Zeiss Smt Gmbh Verschlusseinrichtung für eine Lithographievorrichtung und Lithographievorrichtung
NL2007498A (en) 2010-12-23 2012-06-27 Asml Netherlands Bv Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus.
JP6012628B2 (ja) * 2011-01-20 2016-10-25 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光ツールを作動させる方法
DE102012202675A1 (de) 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik
DE102012212064A1 (de) 2012-07-11 2014-01-16 Carl Zeiss Smt Gmbh Lithographianlage mit segmentiertem Spiegel
JP2014120682A (ja) * 2012-12-18 2014-06-30 Canon Inc 露光装置、露光方法及びデバイス製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004031954A (ja) * 2002-06-21 2004-01-29 Nikon Corp 収差補正システム、収差補正方法、変形レチクルチャック及びｅｕｖ露光装置
JP2004266264A (ja) 2003-02-13 2004-09-24 Canon Inc 光学系、露光装置、デバイス製造方法
JP2004343078A (ja) * 2003-04-04 2004-12-02 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2011014908A (ja) 2009-07-01 2011-01-20 Nikon Corp 投影光学系、露光装置、及びその組立方法
WO2015014753A1 (en) * 2013-07-29 2015-02-05 Carl Zeiss Smt Gmbh Projection optical unit for imaging an object field into an image field, and projection exposure apparatus comprising such a projection optical unit

Also Published As

Publication number Publication date
US20180246416A1 (en) 2018-08-30
KR20180093923A (ko) 2018-08-22
TW201732344A (zh) 2017-09-16
TWI720087B (zh) 2021-03-01
DE102015225262A1 (de) 2017-06-22
JP2019505825A (ja) 2019-02-28
WO2017102599A1 (en) 2017-06-22
JP6864685B2 (ja) 2021-04-28
US10838306B2 (en) 2020-11-17

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