KR102653271B1 - 광학계의 파면 효과를 분석하는 방법 및 조립체 - Google Patents

광학계의 파면 효과를 분석하는 방법 및 조립체 Download PDF

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Publication number
KR102653271B1
KR102653271B1 KR1020207008478A KR20207008478A KR102653271B1 KR 102653271 B1 KR102653271 B1 KR 102653271B1 KR 1020207008478 A KR1020207008478 A KR 1020207008478A KR 20207008478 A KR20207008478 A KR 20207008478A KR 102653271 B1 KR102653271 B1 KR 102653271B1
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KR
South Korea
Prior art keywords
measurement
wavefront
pupil
optical system
illumination
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KR1020207008478A
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English (en)
Korean (ko)
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KR20200061339A (ko
Inventor
롤프 프라이만
Original Assignee
칼 짜이스 에스엠테 게엠베하
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Publication of KR20200061339A publication Critical patent/KR20200061339A/ko
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
    • A61B3/10—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions
    • A61B3/1015—Objective types, i.e. instruments for examining the eyes independent of the patients' perceptions or reactions for wavefront analysis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B3/00—Apparatus for testing the eyes; Instruments for examining the eyes
    • A61B3/0008—Apparatus for testing the eyes; Instruments for examining the eyes provided with illuminating means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/12—Generating the spectrum; Monochromators
    • G01J3/26—Generating the spectrum; Monochromators using multiple reflection, e.g. Fabry-Perot interferometer, variable interference filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/48—Laser speckle optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J2009/0223—Common path interferometry; Point diffraction interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J2009/0234—Measurement of the fringe pattern

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Biomedical Technology (AREA)
  • Medical Informatics (AREA)
  • Veterinary Medicine (AREA)
  • Public Health (AREA)
  • Biophysics (AREA)
  • Ophthalmology & Optometry (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • Molecular Biology (AREA)
  • Surgery (AREA)
  • Optics & Photonics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020207008478A 2017-09-27 2018-09-24 광학계의 파면 효과를 분석하는 방법 및 조립체 KR102653271B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102017217251.7 2017-09-27
DE102017217251.7A DE102017217251A1 (de) 2017-09-27 2017-09-27 Verfahren und Anordnung zur Analyse der Wellenfrontwirkung eines optischen Systems
PCT/EP2018/075766 WO2019063468A1 (fr) 2017-09-27 2018-09-24 Procédé et dispositif d'analyse de l'effet de front d'ondes d'un systeme optique

Publications (2)

Publication Number Publication Date
KR20200061339A KR20200061339A (ko) 2020-06-02
KR102653271B1 true KR102653271B1 (ko) 2024-04-02

Family

ID=63798941

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020207008478A KR102653271B1 (ko) 2017-09-27 2018-09-24 광학계의 파면 효과를 분석하는 방법 및 조립체

Country Status (4)

Country Link
US (1) US11426067B2 (fr)
KR (1) KR102653271B1 (fr)
DE (1) DE102017217251A1 (fr)
WO (1) WO2019063468A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023120604A1 (fr) * 2021-12-23 2023-06-29 京セラ株式会社 Dispositif de mesure, dispositif d'ajustement et procédé de mesure
CN117490604B (zh) * 2024-01-03 2024-03-19 中国科学院长春光学精密机械与物理研究所 一种光学平面面形绝对检测方法

Citations (3)

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JP2005507992A (ja) * 2001-05-03 2005-03-24 ザイゴ コーポレイション 干渉計におけるコヒーレントアーティファクトの低減
JP2015524576A (ja) * 2012-07-17 2015-08-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 照明光学ユニット
WO2016184571A2 (fr) * 2015-05-20 2016-11-24 Carl Zeiss Smt Gmbh Procédé de mesure et ensemble de mesure pour un système optique de formation d'image

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DE10053587A1 (de) 2000-10-27 2002-05-02 Zeiss Carl Beleuchtungssystem mit variabler Einstellung der Ausleuchtung
US6438199B1 (en) 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
TW550377B (en) 2000-02-23 2003-09-01 Zeiss Stiftung Apparatus for wave-front detection
US20050259269A1 (en) 2004-05-19 2005-11-24 Asml Holding N.V. Shearing interferometer with dynamic pupil fill
US7113261B2 (en) 2004-06-08 2006-09-26 Asml Netherlands B.V. Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
NL1036305A1 (nl) 2007-12-21 2009-06-23 Asml Netherlands Bv Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system.
DE102008004762A1 (de) 2008-01-16 2009-07-30 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung
DE102008000990B3 (de) 2008-04-04 2009-11-05 Carl Zeiss Smt Ag Vorrichtung zur mikrolithographischen Projektionsbelichtung und Verfahren zum Prüfen einer derartigen Vorrichtung
DE102011005826A1 (de) * 2011-03-21 2012-03-29 Carl Zeiss Smt Gmbh Optische Vorrichtung
DE102011077223B4 (de) * 2011-06-08 2013-08-14 Carl Zeiss Smt Gmbh Messsystem
JP5917877B2 (ja) * 2011-10-11 2016-05-18 ギガフォトン株式会社 アライメントシステム
DE102012204704A1 (de) 2012-03-23 2013-09-26 Carl Zeiss Smt Gmbh Messvorrichtung zum Vermessen einer Abbildungsgüte eines EUV-Objektives
DE102012209412A1 (de) * 2012-06-04 2013-12-05 Carl Zeiss Smt Gmbh Optisches Verfahren und optische Messvorrichtung zum Messen von Winkellagen von Facetten zumindest eines Facettenspiegels für EUV-Anwendungen
DE102013218991A1 (de) 2013-09-20 2015-03-26 Carl Zeiss Smt Gmbh Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems
DE102014226269A1 (de) * 2014-12-17 2016-06-23 Carl Zeiss Smt Gmbh Wellenfrontmesseinrichtung, Projektionsobjektiv mit einer solchen Messeinrichtung und mit einer solchen Messeinrichtung zusammenwirkender optischer Wellenfrontmanipulator
DE102017200428B3 (de) 2017-01-12 2018-06-21 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage sowie Verfahren zum Vermessen eines Abbildungsfehlers
DE102017217371A1 (de) 2017-09-29 2019-04-04 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements
DE102018204626A1 (de) 2018-03-27 2019-04-04 Carl Zeiss Smt Gmbh Beleuchtungsmaske sowie Verfahren zu deren Herstellung

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005507992A (ja) * 2001-05-03 2005-03-24 ザイゴ コーポレイション 干渉計におけるコヒーレントアーティファクトの低減
JP2015524576A (ja) * 2012-07-17 2015-08-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 照明光学ユニット
WO2016184571A2 (fr) * 2015-05-20 2016-11-24 Carl Zeiss Smt Gmbh Procédé de mesure et ensemble de mesure pour un système optique de formation d'image

Also Published As

Publication number Publication date
US20210022602A1 (en) 2021-01-28
DE102017217251A1 (de) 2019-03-28
US11426067B2 (en) 2022-08-30
WO2019063468A1 (fr) 2019-04-04
KR20200061339A (ko) 2020-06-02

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