KR102588341B1 - 저감 장치 - Google Patents

저감 장치 Download PDF

Info

Publication number
KR102588341B1
KR102588341B1 KR1020187009054A KR20187009054A KR102588341B1 KR 102588341 B1 KR102588341 B1 KR 102588341B1 KR 1020187009054 A KR1020187009054 A KR 1020187009054A KR 20187009054 A KR20187009054 A KR 20187009054A KR 102588341 B1 KR102588341 B1 KR 102588341B1
Authority
KR
South Korea
Prior art keywords
porous element
infrared
processing chamber
processing
porous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020187009054A
Other languages
English (en)
Korean (ko)
Other versions
KR20180048901A (ko
Inventor
던칸 마이클 프라이스
게리 피터 나이트
Original Assignee
에드워즈 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에드워즈 리미티드 filed Critical 에드워즈 리미티드
Publication of KR20180048901A publication Critical patent/KR20180048901A/ko
Application granted granted Critical
Publication of KR102588341B1 publication Critical patent/KR102588341B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/005Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by heat treatment
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23DBURNERS
    • F23D14/00Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/12Radiant burners
    • F23D14/16Radiant burners using permeable blocks
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23GCREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G5/00Incineration of waste; Incinerator constructions; Details, accessories or control therefor
    • F23G5/08Incineration of waste; Incinerator constructions; Details, accessories or control therefor having supplementary heating
    • F23G5/10Incineration of waste; Incinerator constructions; Details, accessories or control therefor having supplementary heating electric
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23GCREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G7/00Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
    • F23G7/06Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
    • F23G7/061Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating
    • F23G7/063Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating electric heating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/20Halogens or halogen compounds
    • B01D2257/206Organic halogen compounds
    • B01D2257/2066Fluorine
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/80Employing electric, magnetic, electromagnetic or wave energy, or particle radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Incineration Of Waste (AREA)
KR1020187009054A 2015-09-01 2016-08-22 저감 장치 Active KR102588341B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB1515489.1 2015-09-01
GBGB1515489.1A GB201515489D0 (en) 2015-09-01 2015-09-01 Abatement apparatus
PCT/GB2016/052598 WO2017037419A1 (en) 2015-09-01 2016-08-22 Abatement apparatus

Publications (2)

Publication Number Publication Date
KR20180048901A KR20180048901A (ko) 2018-05-10
KR102588341B1 true KR102588341B1 (ko) 2023-10-11

Family

ID=54326630

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187009054A Active KR102588341B1 (ko) 2015-09-01 2016-08-22 저감 장치

Country Status (7)

Country Link
US (1) US10661217B2 (enExample)
EP (1) EP3344366A1 (enExample)
JP (1) JP6925322B2 (enExample)
KR (1) KR102588341B1 (enExample)
CN (1) CN108136310B (enExample)
GB (1) GB201515489D0 (enExample)
WO (1) WO2017037419A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201505447D0 (en) * 2015-03-30 2015-05-13 Edwards Ltd Radiant burner
GB201718752D0 (en) * 2017-11-13 2017-12-27 Edwards Ltd Vacuum and abatement systems
KR102427056B1 (ko) * 2020-06-02 2022-08-01 씨에스케이(주) 스크러버용 버너
GB2608817A (en) * 2021-07-13 2023-01-18 Edwards Ltd Modular abatement apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2285044A (en) * 1993-12-11 1995-06-28 Donald Richard Mcgee Method and apparatus for removing organic vapours from a gas stream
KR100349698B1 (ko) 1999-04-20 2002-08-22 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 개량된 기상 오염물 저감 장치 및 방법
JP2003251144A (ja) * 2002-03-04 2003-09-09 Sumitomo Metal Ind Ltd ガス分解装置及びガス分解システム
JP2009034636A (ja) 2007-08-03 2009-02-19 Akiji Nishiwaki 排ガス処理方法およびその装置
JP2012217910A (ja) * 2011-04-07 2012-11-12 Iwatani Internatl Corp 排ガス処理装置及び排ガス処理方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4201650C2 (de) * 1992-01-22 1994-08-11 Mahler Dienstleistung Vorrichtung zur thermischen Verbrennung von mit oxidierbaren Schadstoffen belasteten Abgasen
US7129453B2 (en) * 1997-04-04 2006-10-31 Dalton Robert C Artificial dielectric systems and devices with sintered ceramic matrix material
US6891138B2 (en) * 1997-04-04 2005-05-10 Robert C. Dalton Electromagnetic susceptors with coatings for artificial dielectric systems and devices
US6153150A (en) * 1998-01-12 2000-11-28 Advanced Technology Materials, Inc. Apparatus and method for controlled decomposition oxidation of gaseous pollutants
JP2002153726A (ja) * 2000-11-21 2002-05-28 Akiji Nishiwaki 排ガス処理装置
US20040152028A1 (en) * 2003-02-05 2004-08-05 Singh Prem C. Flame-less infrared heater
US7569193B2 (en) * 2003-12-19 2009-08-04 Applied Materials, Inc. Apparatus and method for controlled combustion of gaseous pollutants
US7736599B2 (en) * 2004-11-12 2010-06-15 Applied Materials, Inc. Reactor design to reduce particle deposition during process abatement
GB0706544D0 (en) * 2007-04-04 2007-05-09 Boc Group Plc Combustive destruction of noxious substances
JP2010223569A (ja) * 2009-03-23 2010-10-07 Kimisato Seimei Kogaku Kenkyusho:Kk Pcbの処理法および装置
KR101385126B1 (ko) * 2013-03-26 2014-04-16 (주)제이티에스코리아 히터 방식 공정 폐가스용 연소기
CN203764135U (zh) * 2013-12-30 2014-08-13 邓杰帆 一种有机废气处理装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2285044A (en) * 1993-12-11 1995-06-28 Donald Richard Mcgee Method and apparatus for removing organic vapours from a gas stream
KR100349698B1 (ko) 1999-04-20 2002-08-22 어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드 개량된 기상 오염물 저감 장치 및 방법
JP2003251144A (ja) * 2002-03-04 2003-09-09 Sumitomo Metal Ind Ltd ガス分解装置及びガス分解システム
JP2009034636A (ja) 2007-08-03 2009-02-19 Akiji Nishiwaki 排ガス処理方法およびその装置
JP2012217910A (ja) * 2011-04-07 2012-11-12 Iwatani Internatl Corp 排ガス処理装置及び排ガス処理方法

Also Published As

Publication number Publication date
JP6925322B2 (ja) 2021-08-25
WO2017037419A1 (en) 2017-03-09
US10661217B2 (en) 2020-05-26
EP3344366A1 (en) 2018-07-11
CN108136310B (zh) 2021-10-29
US20180311607A1 (en) 2018-11-01
JP2018526608A (ja) 2018-09-13
GB201515489D0 (en) 2015-10-14
CN108136310A (zh) 2018-06-08
KR20180048901A (ko) 2018-05-10

Similar Documents

Publication Publication Date Title
KR102588341B1 (ko) 저감 장치
JP6996980B2 (ja) 汚染ガスを焼却するための放射バーナー
KR102231596B1 (ko) 가스 주입 장치 및 가스 주입 장치를 포함한 기판 프로세스 챔버
KR102386812B1 (ko) 샤워헤드 설계
EP3278026B1 (en) Radiant burner
KR102277236B1 (ko) 방사 버너
EP3449183B1 (en) Burner system with discrete transverse flame stabilizers
KR20170092547A (ko) 유독가스 소각용 복사 버너
KR20180030541A (ko) 입구 조립체 및 입구 조립체 작동 방법
TW202340652A (zh) 進口頭總成
KR200471723Y1 (ko) 열처리로용 발열체 및 이를 구비한 머플식 열처리로
KR20240165554A (ko) 유해가스 처리 장치

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20180329

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20210611

Comment text: Request for Examination of Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20221004

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20230727

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20231006

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20231006

End annual number: 3

Start annual number: 1

PG1601 Publication of registration