KR102545187B1 - 반사형 마스크 블랭크, 반사형 마스크 및 반도체 장치의 제조방법 - Google Patents
반사형 마스크 블랭크, 반사형 마스크 및 반도체 장치의 제조방법 Download PDFInfo
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- KR102545187B1 KR102545187B1 KR1020177020000A KR20177020000A KR102545187B1 KR 102545187 B1 KR102545187 B1 KR 102545187B1 KR 1020177020000 A KR1020177020000 A KR 1020177020000A KR 20177020000 A KR20177020000 A KR 20177020000A KR 102545187 B1 KR102545187 B1 KR 102545187B1
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- film
- phase shift
- reflective mask
- shift film
- mask blank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Images
Classifications
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- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
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- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
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- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
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- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
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- G—PHYSICS
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- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
- C03C2204/08—Glass having a rough surface
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
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- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020237020102A KR102561655B1 (ko) | 2014-12-24 | 2015-12-15 | 반사형 마스크 블랑크, 반사형 마스크, 및 반도체 장치의 제조 방법 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2014-260280 | 2014-12-24 | ||
| JP2014260280A JP6499440B2 (ja) | 2014-12-24 | 2014-12-24 | 反射型マスクブランク及び反射型マスク |
| PCT/JP2015/085020 WO2016104239A1 (ja) | 2014-12-24 | 2015-12-15 | 反射型マスクブランク、反射型マスク及び半導体装置の製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020237020102A Division KR102561655B1 (ko) | 2014-12-24 | 2015-12-15 | 반사형 마스크 블랑크, 반사형 마스크, 및 반도체 장치의 제조 방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20170096027A KR20170096027A (ko) | 2017-08-23 |
| KR102545187B1 true KR102545187B1 (ko) | 2023-06-19 |
Family
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Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020177020000A Active KR102545187B1 (ko) | 2014-12-24 | 2015-12-15 | 반사형 마스크 블랭크, 반사형 마스크 및 반도체 장치의 제조방법 |
| KR1020237020102A Active KR102561655B1 (ko) | 2014-12-24 | 2015-12-15 | 반사형 마스크 블랑크, 반사형 마스크, 및 반도체 장치의 제조 방법 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020237020102A Active KR102561655B1 (ko) | 2014-12-24 | 2015-12-15 | 반사형 마스크 블랑크, 반사형 마스크, 및 반도체 장치의 제조 방법 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US10394113B2 (enExample) |
| JP (1) | JP6499440B2 (enExample) |
| KR (2) | KR102545187B1 (enExample) |
| TW (2) | TWI682232B (enExample) |
| WO (1) | WO2016104239A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6740107B2 (ja) * | 2016-11-30 | 2020-08-12 | Hoya株式会社 | マスクブランク、転写用マスク及び半導体デバイスの製造方法 |
| WO2018159392A1 (ja) | 2017-03-03 | 2018-09-07 | Hoya株式会社 | 反射型マスクブランク、反射型マスク及び半導体装置の製造方法 |
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| WO2014104276A1 (ja) | 2012-12-28 | 2014-07-03 | Hoya株式会社 | マスクブランク用基板、多層反射膜付き基板、反射型マスクブランク、反射型マスク、マスクブランク用基板の製造方法及び多層反射膜付き基板の製造方法並びに半導体装置の製造方法 |
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| US20190339608A1 (en) | 2019-11-07 |
| JP2016122684A (ja) | 2016-07-07 |
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| US10394113B2 (en) | 2019-08-27 |
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