JP6499440B2 - 反射型マスクブランク及び反射型マスク - Google Patents

反射型マスクブランク及び反射型マスク Download PDF

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Publication number
JP6499440B2
JP6499440B2 JP2014260280A JP2014260280A JP6499440B2 JP 6499440 B2 JP6499440 B2 JP 6499440B2 JP 2014260280 A JP2014260280 A JP 2014260280A JP 2014260280 A JP2014260280 A JP 2014260280A JP 6499440 B2 JP6499440 B2 JP 6499440B2
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JP
Japan
Prior art keywords
film
phase shift
mask blank
shift film
reflective mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2014260280A
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English (en)
Japanese (ja)
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JP2016122684A (ja
JP2016122684A5 (enExample
Inventor
和宏 浜本
和宏 浜本
洋平 池邊
洋平 池邊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2014260280A priority Critical patent/JP6499440B2/ja
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to US15/539,263 priority patent/US10394113B2/en
Priority to KR1020177020000A priority patent/KR102545187B1/ko
Priority to PCT/JP2015/085020 priority patent/WO2016104239A1/ja
Priority to KR1020237020102A priority patent/KR102561655B1/ko
Priority to TW104143235A priority patent/TWI682232B/zh
Priority to TW108143988A priority patent/TWI721681B/zh
Publication of JP2016122684A publication Critical patent/JP2016122684A/ja
Publication of JP2016122684A5 publication Critical patent/JP2016122684A5/ja
Application granted granted Critical
Publication of JP6499440B2 publication Critical patent/JP6499440B2/ja
Priority to US16/504,151 priority patent/US10642149B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3636—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing silicon, hydrogenated silicon or a silicide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties
    • C03C2204/08—Glass having a rough surface

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2014260280A 2014-12-24 2014-12-24 反射型マスクブランク及び反射型マスク Active JP6499440B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2014260280A JP6499440B2 (ja) 2014-12-24 2014-12-24 反射型マスクブランク及び反射型マスク
KR1020177020000A KR102545187B1 (ko) 2014-12-24 2015-12-15 반사형 마스크 블랭크, 반사형 마스크 및 반도체 장치의 제조방법
PCT/JP2015/085020 WO2016104239A1 (ja) 2014-12-24 2015-12-15 反射型マスクブランク、反射型マスク及び半導体装置の製造方法
KR1020237020102A KR102561655B1 (ko) 2014-12-24 2015-12-15 반사형 마스크 블랑크, 반사형 마스크, 및 반도체 장치의 제조 방법
US15/539,263 US10394113B2 (en) 2014-12-24 2015-12-15 Reflective mask blank, reflective mask and method of manufacturing semiconductor device
TW104143235A TWI682232B (zh) 2014-12-24 2015-12-22 反射型光罩基底、反射型光罩及半導體裝置之製造方法
TW108143988A TWI721681B (zh) 2014-12-24 2015-12-22 反射型光罩基底、反射型光罩、及半導體裝置之製造方法
US16/504,151 US10642149B2 (en) 2014-12-24 2019-07-05 Reflective mask blank, reflective mask and method of manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014260280A JP6499440B2 (ja) 2014-12-24 2014-12-24 反射型マスクブランク及び反射型マスク

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019048469A Division JP6678269B2 (ja) 2019-03-15 2019-03-15 反射型マスクブランク及び反射型マスク

Publications (3)

Publication Number Publication Date
JP2016122684A JP2016122684A (ja) 2016-07-07
JP2016122684A5 JP2016122684A5 (enExample) 2018-01-25
JP6499440B2 true JP6499440B2 (ja) 2019-04-10

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Family Applications (1)

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JP2014260280A Active JP6499440B2 (ja) 2014-12-24 2014-12-24 反射型マスクブランク及び反射型マスク

Country Status (5)

Country Link
US (2) US10394113B2 (enExample)
JP (1) JP6499440B2 (enExample)
KR (2) KR102545187B1 (enExample)
TW (2) TWI682232B (enExample)
WO (1) WO2016104239A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6740107B2 (ja) * 2016-11-30 2020-08-12 Hoya株式会社 マスクブランク、転写用マスク及び半導体デバイスの製造方法
WO2018159392A1 (ja) 2017-03-03 2018-09-07 Hoya株式会社 反射型マスクブランク、反射型マスク及び半導体装置の製造方法
JP6861095B2 (ja) * 2017-03-03 2021-04-21 Hoya株式会社 反射型マスクブランク、反射型マスク及び半導体装置の製造方法
KR102402767B1 (ko) 2017-12-21 2022-05-26 삼성전자주식회사 극자외선 마스크 블랭크, 극자외선 마스크 블랭크를 이용하여 제조된 포토마스크, 포토마스크를 이용한 리소그래피 장치 및 포토마스크를 이용한 반도체 장치 제조 방법
TWI835798B (zh) 2018-05-25 2024-03-21 日商Ｈｏｙａ股份有限公司 反射型光罩基底、反射型光罩及其製造方法、以及半導體裝置之製造方法
WO2019225737A1 (ja) * 2018-05-25 2019-11-28 Hoya株式会社 反射型マスクブランク、反射型マスク、並びに反射型マスク及び半導体装置の製造方法
TWI847949B (zh) * 2018-11-30 2024-07-01 日商Ｈｏｙａ股份有限公司 光罩基底、光罩之製造方法及顯示裝置之製造方法
JP6929340B2 (ja) 2019-11-21 2021-09-01 Hoya株式会社 反射型マスクブランクおよび反射型マスク、並びに半導体装置の製造方法
JP7280171B2 (ja) * 2019-12-05 2023-05-23 信越化学工業株式会社 フォトマスクブランク、フォトマスクの製造方法及びフォトマスク
US11111176B1 (en) * 2020-02-27 2021-09-07 Applied Materials, Inc. Methods and apparatus of processing transparent substrates
JP7318565B2 (ja) * 2020-03-03 2023-08-01 信越化学工業株式会社 反射型マスクブランクの製造方法
JP6929983B1 (ja) * 2020-03-10 2021-09-01 Hoya株式会社 反射型マスクブランクおよび反射型マスク、並びに半導体デバイスの製造方法
KR20210155863A (ko) * 2020-06-16 2021-12-24 삼성전자주식회사 극자외선 리소그래피용 위상 반전 마스크 및 이를 이용한 반도체 소자의 제조 방법
US11940725B2 (en) * 2021-01-27 2024-03-26 S&S Tech Co., Ltd. Phase shift blankmask and photomask for EUV lithography
WO2023112767A1 (ja) * 2021-12-13 2023-06-22 Ａｇｃ株式会社 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法
JP7272519B1 (ja) 2021-12-13 2023-05-12 Ａｇｃ株式会社 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法
JP7392236B1 (ja) 2022-07-05 2023-12-06 Ａｇｃ株式会社 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、および反射型マスクの製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100225661B1 (ko) 1995-07-19 1999-10-15 야마나까 마모루 위상 시프트 마스크 블랭크 및 그 제조 방법
JP2004207593A (ja) 2002-12-26 2004-07-22 Toppan Printing Co Ltd 極限紫外線露光用マスク及びブランク並びにパターン転写方法
JP4602430B2 (ja) * 2008-03-03 2010-12-22 株式会社東芝 反射型マスク及びその作製方法
JP5711533B2 (ja) * 2008-05-09 2015-05-07 Hoya株式会社 反射型マスク、反射型マスクブランク及びその製造方法
JP5282507B2 (ja) 2008-09-25 2013-09-04 凸版印刷株式会社 ハーフトーン型ｅｕｖマスク、ハーフトーン型ｅｕｖマスクの製造方法、ハーフトーン型ｅｕｖマスクブランク及びパターン転写方法
US9494851B2 (en) * 2012-03-28 2016-11-15 Hoya Corporation Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
KR102190850B1 (ko) * 2012-11-08 2020-12-14 호야 가부시키가이샤 마스크 블랭크의 제조 방법 및 전사용 마스크의 제조 방법
KR101878164B1 (ko) 2012-12-28 2018-07-13 호야 가부시키가이샤 마스크 블랭크용 기판, 다층 반사막 부착 기판, 반사형 마스크 블랭크, 반사형 마스크, 마스크 블랭크용 기판의 제조방법 및 다층 반사막 부착 기판의 제조방법, 그리고 반도체 장치의 제조방법
JP6147514B2 (ja) * 2013-01-31 2017-06-14 Hoya株式会社 マスクブランク用基板の製造方法、多層反射膜付き基板の製造方法、マスクブランクの製造方法、および転写用マスクの製造方法
WO2014129527A1 (ja) * 2013-02-22 2014-08-28 Hoya株式会社 反射型マスクブランクの製造方法、及び反射型マスクの製造方法

Also Published As

Publication number Publication date
TW202013057A (zh) 2020-04-01
US20190339608A1 (en) 2019-11-07
JP2016122684A (ja) 2016-07-07
KR20230096126A (ko) 2023-06-29
TWI721681B (zh) 2021-03-11
KR102561655B1 (ko) 2023-07-31
KR20170096027A (ko) 2017-08-23
KR102545187B1 (ko) 2023-06-19
US20180329285A1 (en) 2018-11-15
US10642149B2 (en) 2020-05-05
WO2016104239A1 (ja) 2016-06-30
TWI682232B (zh) 2020-01-11
US10394113B2 (en) 2019-08-27
TW201631378A (zh) 2016-09-01

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