KR102520093B1 - Cleaning device of coating machine, and coating device - Google Patents

Abstract

[Problem] To provide an applicator cleaning device and an applicator capable of suppressing distortion due to thermal deformation of the applicator due to the temperature difference accompanying the temperature rise of the cleaning solution.
[Solution Means] An applicator cleaning device that cleans an applicator that forms a coating film on a substrate by discharging a coating liquid from a slit nozzle extending in one direction, wherein the slit nozzle of the applicator can be immersed. A cleaning tank having a shape extending in one direction, a cleaning solution supply unit for supplying a cleaning solution to the cleaning tank, and a vibrator for imparting vibration waves to the cleaning solution in the cleaning tank, wherein the cleaning solution supply unit comprises is supplied over the longitudinal direction, and the supply amount of the washing liquid is set so that the central portion of the washing tank is larger than both ends in the longitudinal direction of the washing tank, and the washing tank has overflow portions for discharging the washing liquid at both ends in the longitudinal direction, , In a state where the slit nozzle is immersed in the cleaning tank, the flow of the cleaning liquid in the cleaning tank flows from the central portion in the longitudinal direction toward the overflow portion.

Description

Coater cleaning device and coating device {CLEANING DEVICE OF COATING MACHINE, AND COATING DEVICE}

The present invention relates to an applicator cleaning device for cleaning an applicator that discharges a coating liquid, and a coating device provided with the applicator cleaning device.

In a flat panel display such as a liquid crystal display or a plasma display, a coating liquid such as a resist liquid is applied onto a substrate such as glass (called a coated substrate). do) is being used. This coated substrate is formed by a coating device that uniformly applies the coating liquid. The coating device has a stage for placing a substrate and an application unit for discharging a coating liquid onto the placed substrate, and moves the substrate and the coating unit relatively while discharging the coating liquid from the coating device of the coating unit. As a result, a coating film is formed on the substrate.

In this applicator, a slit nozzle is formed on the substrate facing surface facing the substrate, and the coating liquid can be uniformly discharged over the longitudinal direction of the slit nozzle. However, in a state where the coating liquid is completely dried and foreign matter (also called foreign matter, etc.) adheres to the slit nozzle, the discharge state of the coating liquid becomes non-uniform due to the foreign matter, such as streaks and unevenness on the coating film. This causes dry spots to form. Therefore, such a mouthpiece is periodically cleaned by an applicator cleaning device in order to maintain the uniformity of the coating film (see Patent Document 1, for example).

As shown in FIG. 4, this applicator cleaning device includes a cleaning tank 100 extending in one direction for collecting organic solvent cleaning liquid, and a cleaning liquid for supplying the cleaning liquid to the cleaning tank 100. It has a supply unit 101 and a vibrator 102 that applies ultrasonic vibration to the cleaning liquid in the cleaning tank 100, and applies ultrasonic vibration in a state in which the slit nozzle 103 is immersed in the cleaning tank 100 As a result, foreign matter and the like adhering to the slit nozzle 103 can be removed. In the washing tank 100, an overflow part 104 is provided on the opposite side in the longitudinal direction of the washing liquid supply part 101, and the washing liquid contaminated by the removal of foreign substances and the like is discharged into the overflow tank 105 to circulate, and clean cleaning liquid always flows from the cleaning liquid supply unit 101, so that a constant cleaning effect can be maintained. In some cases, the inside of the applicator 106 is also cleaned by infiltrating the cleaning solution through the slit nozzle 103 and circulating the inside of the applicator 106 . In this way, the cleaning operation of the applicator 106 can be performed automatically without relying on manual work.

Japanese Unexamined Patent Publication No. 2004-314048

However, in the conventional applicator cleaning device, there is a problem that the applicator 106 is thermally deformed by heat generated in the cleaning liquid, which affects the quality of the coating film. That is, since ultrasonic vibration is applied to the cleaning liquid in the cleaning tank 100, the temperature of the cleaning liquid supplied from the cleaning liquid supply unit 101 rises. Since the cleaning liquid supplied from the cleaning liquid supply unit 101 flows in the longitudinal direction toward the overflow tank 105, the temperature of the cleaning liquid in the cleaning bath 100 gradually rises while flowing toward the overflow tank 105, The high-temperature washing liquid is concentrated in the vicinity of the overflow tank 105. That is, in the cleaning liquid in the cleaning tank 100, a temperature distribution in which the temperature rises from the cleaning liquid supply unit 101 toward the overflow tank 105 is formed.

When the temperature distribution is formed in the cleaning liquid, the applicator 106 immersed in the cleaning liquid causes a temperature difference in the longitudinal direction, so that the opening state (opening width) of the slit nozzle 103 is non-uniform in the longitudinal direction. do. Therefore, there was a problem that the discharge state of the slit nozzle 103 became unstable, affecting the quality of a coating film formed on the substrate.

The present invention has been made in view of the above problems, and an object of the present invention is to provide an applicator cleaning device and an applicator capable of suppressing distortion due to thermal deformation of the applicator due to the temperature difference accompanying the temperature rise of the cleaning solution. there is.

In order to solve the above problems, the applicator cleaning apparatus of the present invention is a coater that forms a coating film on a substrate by discharging a coating liquid from a slit nozzle extending in one direction formed on a surface facing the substrate while scanning the substrate. An applicator cleaning device for cleaning, comprising: a cleaning tank extending in one direction so as to be able to immerse a slit nozzle of the applicator; a cleaning solution supply unit supplying a cleaning solution to the cleaning tub; and a vibrator for imparting vibration waves to the cleaning solution in the cleaning tub. wherein the washing liquid supply unit supplies the washing liquid into the washing tank in a longitudinal direction, and the supply amount of the washing liquid is set so that the central portion of the washing tank is larger than both ends in the longitudinal direction of the washing tank, and the washing tank comprises: An overflow portion for discharging the cleaning liquid is provided at both ends in the direction, and the flow of the cleaning liquid in the cleaning vessel flows from a central portion in the longitudinal direction toward the overflow portion in a state in which the slit nozzle is immersed in the cleaning vessel, wherein the Compared to the case where the washing liquid is supplied from one end in the longitudinal direction and discharged from the other end in the washing tank, the distance through which the washing liquid flows with respect to the slit nozzle is reduced.

According to the present invention, the washing liquid supplied from the washing liquid supplying part flows from the central part toward the overflow part so as to be supplied more at the central part than at both ends in the longitudinal direction. That is, since the cleaning liquid whose temperature has risen due to the vibration wave (ultrasonic vibration, etc.) generated by the vibrator flows from the central portion to the overflow portion at both ends, the temperature in the vicinity of the overflow portion rises, but a new cleaning liquid (temperature In addition to supplying the washing liquid before rising, the distance through which the washing liquid flows can be shortened compared to the conventional case where the washing liquid is supplied from one end in the longitudinal direction and overflowed from the other end. Therefore, since the temperature difference in the longitudinal direction can be suppressed compared to the prior art, the opening state of the slit nozzle becomes non-uniform in the longitudinal direction due to the temperature difference in the longitudinal direction accompanying the temperature rise of the cleaning liquid by ultrasonic cleaning, and the quality of the coating film is improved. deterioration can be prevented.

In addition, the washing liquid supply unit has a washing liquid supply pipe disposed along the longitudinal direction of the washing tank, and a plurality of washing liquid supply holes for discharging the washing liquid are formed in the washing liquid supply pipe, and the washing liquid supply holes are arranged in the washing liquid supply pipe. It is also possible to set it as a configuration in which it is arranged sparsely at both ends in the longitudinal direction of the nail and densely arranged in the central portion.

According to this configuration, the supply amount of the washing liquid is greater at the central portion of the washing tank than at both ends in the longitudinal direction, and the flow of the washing liquid in the washing tank can be formed to easily flow from the central portion in the longitudinal direction toward the overflow portion.

Further, the vibrator may be disposed on a bottom surface of the washing tub in a longitudinal direction, and the washing liquid supply hole may be open toward the vibrator in a direction in which the washing liquid is discharged.

According to this configuration, convection is generated in the washing tank on the vibrator, so that the washing liquid supplied from the vibrator and raised in temperature by the vibration is agitated by the convection, and a local temperature rise in the washing tank can be suppressed.

Further, the overflow portion of the washing tank may have a structure in which the side walls at both ends in the longitudinal direction of the washing tank have notches that are lower in the height direction than the other side walls.

According to this configuration, since the cleaning liquid in the cleaning tank is discharged when the liquid level of the cleaning liquid is higher than the notch portion, the overflow portion can be formed with an easy configuration.

Further, the cleaning tank may be configured such that a seal wall is provided to prevent scattering of the cleaning liquid in the cleaning tank by coming into contact with the surface facing the substrate along the longitudinal direction.

According to this configuration, it is possible to prevent scattering of the cleaning liquid that occurs when the vibrator vibrates the cleaning liquid.

In order to solve the above problems, the coating device of the present invention includes the above-described coating device cleaning device, includes a stage for placing a substrate, and an applicator for discharging a coating liquid from a slit nozzle to a substrate on the stage. A coating film is formed on the substrate by discharging a coating liquid from the coating device while relatively moving the substrate placed thereon and the coating device.

According to the present invention, even if the applicator is cleaned with the applicator cleaning device, unevenness in the longitudinal direction of the opening of the slit nozzle due to the temperature rise of the cleaning liquid can be suppressed, and the quality of the coating film can be stabilized.

According to the present invention, distortion due to thermal deformation of the applicator due to the temperature difference accompanying the temperature rise of the cleaning liquid can be suppressed.

1 is a diagram schematically showing an application device of the present invention.
2 is a diagram schematically showing the applicator cleaning device of the present invention.
Fig. 3 is a view of the applicator cleaning device of the present invention viewed from the longitudinal direction.
4 is a diagram showing a conventional applicator cleaning device.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described based on drawing.

An embodiment related to the present invention will be described using drawings.

1 is a diagram schematically showing the applicator of the present invention, FIG. 2 is a diagram schematically showing an applicator cleaning device provided in the applicator, and FIG. 3 is a view of the applicator cleaning device as viewed from a longitudinal direction. am.

As shown in FIGS. 1 to 3, the coating device 1 forms a coating film of a liquid substance such as a chemical solution or a resist solution (hereinafter referred to as a coating solution) on a substrate 10 , a stage 21 for mounting the substrate 10, and an application unit 3 configured to be movable in a specific direction with respect to the stage 21.

Incidentally, in the following description, the X-axis direction is the direction in which the application unit 3 moves, the Y-axis direction is the direction orthogonal thereto on a horizontal plane, and the Z-axis direction is the direction orthogonal to both the X-axis and Y-axis directions. So let's go ahead and explain.

The stage 21 is to mount the carried substrate 10 by a robot hand or the like. The stage 21 is provided with substrate holding means, and the substrate 10 is held by the substrate holding means. Specifically, a plurality of suction holes formed on the surface of the stage 21 are formed, and a suction force is generated in the suction holes so that the substrate 10 can be attracted to the surface of the stage 21 and held therein. .

In addition, the application unit 3 discharges the coating liquid onto the substrate 10 to form a coating film. As shown in Figs. 1 and 2, the application unit 3 includes an applicator 30 for discharging a coating liquid and a gantry unit 35 for holding the applicator 30. and is formed to be movable in the X-axis direction. Specifically, a rail extending in the X-axis direction is provided at an end of the stage 21 in the Y-axis direction, and a gantry portion 35 is slidably attached to this rail. And, a linear motor is attached to the leg portion 35a, and by driving and controlling the linear motor, the coating unit 3 can move in the X-axis direction and stop at an arbitrary position. has been In this embodiment, it is movable to the stage 21 and the applicator cleaning device 5 installed outside the stage 21 .

Further, a lifting mechanism for lifting the applicator 30 is installed in the gantry unit 35 . Specifically, the applicator 30 can be detached from the substrate 10 by operating the lifting mechanism. As a result, during the coating operation, it can be positioned at an appropriate height position with respect to the substrate 10 on the stage 21, and in the case of cleaning the applicator 30, with respect to the applicator cleaning device 5 It is designed to be adjusted appropriately to an appropriate height position.

In addition, the coater 30 discharges a coating liquid to form a coating film on the substrate 10 . This applicator 30 is a columnar member having a shape extending in one direction, and is installed so as to be substantially orthogonal to the travel direction of the application unit 3 . In this applicator 30, a slit nozzle 32 extending in the longitudinal direction is formed on the substrate facing surface 31 facing the substrate 10, and the coating liquid supplied to the applicator 30 is supplied to the slit nozzle. It is designed to be discharged from (32) in one direction over the longitudinal direction. Therefore, by moving the coating unit 3 in the X-axis direction in a state where the coating liquid is discharged from this slit nozzle 32, a certain thickness is formed on the substrate 10 over the longitudinal direction of the slit nozzle 32. A coating film is formed.

The applicator 1 also includes an applicator cleaning device 5 for cleaning the applicator 30 . This applicator cleaning device 5 is installed on the X-axis direction end side of the stage 21, and by immersing the applicator 30 in the cleaning liquid, the coating liquid adhering to the slit nozzle 32 is dried. This is to remove residual liquid or foreign matter (also referred to as foreign matter, etc.).

This applicator cleaning device 5 includes a cleaning tub 50 extending in one direction, a cleaning liquid supply unit 7 for supplying a cleaning liquid to the cleaning tub 50, and vibration to the cleaning liquid in the cleaning tub 50. It has a vibrator (6) that gives

The washing tank 50 is a liquid container for collecting a certain amount of washing liquid, and includes a washing tank main body 51 into which the slit nozzle 32 can be immersed, and overflow portions at both ends of the washing tank main body 51 in the longitudinal direction. (52). In this washing tank body 51, a side wall 51b extending in a vertical direction orthogonal to the bottom face 51a is provided to surround the bottom face 51a, and the height of the side wall 51b is It is designed to collect the washing liquid within a range that does not exceed . This washing tank main body 51 has a shape extending in one direction, and is formed such that its longitudinal dimension is greater than that of the slit nozzle 32 in its longitudinal direction. The washing tank 50 is arranged so that the longitudinal direction of the washing tank main body 51 coincides with the Y-axis direction. Therefore, when the applicator 30 is lowered by stopping the applicator 3 at the position of the applicator cleaning device 5, a part of the cleaning tub body 51 is accommodated in the cleaning tub body 51, The slit nozzle 32 can be immersed in the cleaning liquid of the body 51.

In addition, a vibrator 6 (ultrasonic vibrator) is installed on the bottom surface portion 51a of the washing tub body 51 . Specifically, on the lower side of the bottom surface portion 51a of the cleaning tank body 51, a plurality of vibrators 6 are arranged along the longitudinal direction at a central position in the width direction (X-axis direction), The vibrating surface of (6) is provided so as to face the lower surface of the bottom surface portion 51a. Therefore, when the vibrator 6 is operated, ultrasonic vibration is applied to the cleaning liquid in the cleaning tank body 51 in the longitudinal direction. This makes it possible to perform ultrasonic cleaning on the slit nozzle 32 immersed in the cleaning tank body 51 .

Further, overflow portions 52 are provided at both ends of the washing tub body 51 in the longitudinal direction. The overflow part 52 is a part for discharging the washing liquid in the washing tank main body 51, and the overflow tank 53 provided at both ends in the longitudinal direction of the washing tank main body 51, and the washing tank main body 51 It is formed by the notch part 54 formed in the side wall 51b of both ends in the longitudinal direction of ).

The overflow tank 53 is installed adjacent to both ends of the washing tank body 51 in the longitudinal direction with side walls 51b interposed therebetween, and is capable of receiving the washing liquid overflowing from the washing tank 50. . A waste liquid port 55 is provided on the bottom surface 51a of the overflow tank 53 so that the washing liquid overflowing into the overflow tank 53 can be discharged.

In addition, notches 54 are formed in the side walls 51b at both ends of the washing tub body 51 in the longitudinal direction. Specifically, as shown in FIG. 3 , the side walls 51b at both ends in the longitudinal direction are formed with notches 54 that are notched to a position lower than the upper end of the side wall 51b, and the washing tub body 51 ) is designed so that the cleaning solution in the inside can flow out preferentially. That is, when the washing liquid is supplied to the washing tank main body 51, the liquid level of the washing liquid gradually rises, but the liquid level of the washing liquid reaches the notch part 54 before reaching the upper end of each side wall 51b, thereby removing the notch part 54. The washing liquid flowing out through the overflow tank 53 may be discharged. Thereby, a flow toward the overflow portion 52 (notch portion 54 in this embodiment) can be formed in the cleaning tank body 51 . In addition, although the washing liquid discharged from the waste liquid port 55 is discarded in this embodiment, it may be reused after purification, and the recycled washing liquid is circulated so that it is supplied to the washing tank main body 51 again. also free

In addition, the cleaning liquid supply unit 7 supplies the cleaning liquid to the cleaning tank main body 51, and in this embodiment, the cleaning liquid supply hole 71 is formed in the cleaning liquid supply pipe 70 so as to be opened. The washing liquid supply pipe 70 is a straight pipe and is installed so as to penetrate the overflow tank 53 and the washing tank main body 51 . And, with regard to the width direction (X-axis direction), as shown in FIG. 3 , the side wall 51b is disposed at a position outside the center position in the width direction of the cleaning tank 50 and is on the left side of the center position in the width direction. placed nearby.

A washing liquid supply hole 71 through which the washing liquid is discharged is formed in the washing liquid supply pipe 70 . Specifically, the washing liquid supply hole 71 is a through hole penetrating the surface of the washing liquid supply pipe 70, and spans the portion where the washing liquid supply pipe 70 is located in the washing tank body 51 in the longitudinal direction. A plurality of them are formed side by side in a row. As a result, the cleaning liquid in the cleaning liquid supply pipe 70 is supplied into the cleaning tank main body 51 through the cleaning liquid supply hole 71 .

In addition, these cleaning liquid supply holes 71 are arranged densely at the central portion in the longitudinal direction and sparse at both ends in the longitudinal direction. Therefore, when the cleaning liquid is supplied to the cleaning liquid supply pipe 70, the cleaning liquid is discharged from each of the cleaning liquid supply holes 71, but the discharge amount of the cleaning liquid is greater at the central portion in the longitudinal direction than at both ends in the longitudinal direction. In this way, the flow of the cleaning liquid in the cleaning tank body 51 is formed so as to flow from the central portion in the longitudinal direction toward the overflow portion 52 . That is, the washing liquid in the washing tank main body 51 flows into the overflow tank 53, but since a larger amount of washing liquid is supplied to the central portion in the longitudinal direction, the washing liquid in the washing tank main body 51 is concentrated in the central portion in the longitudinal direction. The tendency to flow from the overflow tank 53 located at both ends in the longitudinal direction becomes stronger. As a result, the washing liquid in the washing tank main body 51 flows from the central portion in the longitudinal direction to one of the overflow tanks 53, so that the distance the washing liquid flows through the washing tank main body 51 is the same as in the prior art. can be made smaller than in the case where is supplied from one end in the longitudinal direction and discharged from the other end, and a local temperature rise can be suppressed. That is, the temperature of the cleaning liquid in the cleaning tank main body 51 rises due to the ultrasonic vibration from the vibrator 6 . Since this washing liquid flows into the overflow tank 53, the washing liquid whose temperature has risen is concentrated in the overflow portion 52, and a temperature distribution is formed in which the temperature rises in the direction in which the washing liquid flows. However, in this embodiment, since the distance through which the washing liquid flows through the washing tank main body 51 can be reduced, the temperature rise in the longitudinal direction compared to the case where the washing liquid is supplied from one end in the longitudinal direction and discharged from the other end. can suppress Therefore, the temperature change rising in the direction in which the washing liquid flows can be reduced, and the formation of a local temperature difference within the washing tank main body 51 can be reduced.

Further, the cleaning liquid supply hole 71 is formed to open in a direction in which the cleaning liquid can be discharged toward the vibrator 6 . Specifically, since the cleaning liquid supply pipe 70 is located at a position away from the center position in the width direction, the cleaning liquid supply hole 71 is formed toward the center position in the width direction and opens downward. . That is, the cleaning liquid supply hole 71 is formed to open in a direction toward the bottom surface portion 51a of the cleaning tank body 51 . Further, in the bottom face portion 51a, a convection current rising from the bottom face portion 51a is formed by vibration waves given from the vibrator 6 disposed on the back surface (arrow in FIG. 3 ). Therefore, although the temperature of the cleaning liquid discharged from the cleaning liquid supply hole 71 rises due to the ultrasonic vibration, it is agitated by the convection rising from the bottom surface portion 51a, so that it moves in the direction of the spring in the cleaning tank 50. It is possible to suppress the local temperature increase in That is, the temperature distribution of the washing liquid in the washing tank 50 is more uniform as a whole by suppressing a local temperature rise by being stirred. Then, by forming a flow through which the cleaning liquid flows from the central portion in the longitudinal direction to one of the overflow tanks 53, the distance through which the cleaning liquid flows through the cleaning tank main body 51 is reduced, and the local area in the longitudinal direction is reduced. Temperature rise can be suppressed. Due to these synergistic effects, it is possible to reduce the formation of local temperature differences in the cleaning tank body 51 and minimize the influence of heat applied to the slit nozzle 32 during cleaning.

In addition, the cleaning tank 50 is provided with a seal wall 8 that prevents the cleaning liquid from scattering. The seal wall 8 is provided along the side wall 51b of the cleaning tank 50 and is obliquely upward from the base portion 81 attached to the side wall 51b and the base portion 81. It has a tongue part (舌片部) 82 protruding into. The base portion 81 is attached to the upper end of the side wall 51b, and clamps and fixes the upper end of the side wall 51b. Further, the tongue portion 82 is formed of a rubber member, and is formed so that its cross section is annular and extends in the longitudinal direction. That is, it is formed with the same length as the longitudinal dimension of the side wall 51b of the cleaning tank 50. And, in the state where the base part 81 is attached to the side wall 51b, it is formed so that it can maintain the attitude|position of protruding upward in the inside of the washing tank 50. That is, when the tongue piece portion 82 is pressed from above, a restoring force to return to the original posture acts, so that it can be brought into close contact with the contacting member. Therefore, when the applicator 30 descends after being located above the cleaning tank 50, the seal wall 8 is installed on the substrate facing surface 31 where the slit nozzle 32 of the applicator 30 is formed. The piece 82 abuts. When the applicator 30 further descends, a restoring force acts on the tongue portion 82 to bring the tongue portion 82 into close contact with the substrate facing surface 31 in the width direction of the cleaning tank body 51. Both ends are sealed. That is, when ultrasonic vibration is applied to the cleaning liquid in the cleaning tank body 51, the cleaning liquid in the cleaning tank body 51 is greatly undulated, and liquid splashing occurs frequently. By sealing, it is possible to prevent the cleaning liquid from scattering to the outside of the cleaning tank 50 .

In this way, according to the applicator cleaning device 5 and the applicator 1 in the above embodiment, since more supply is supplied at the central portion than at both ends in the longitudinal direction, the flow flows from the central portion toward the overflow portion 52. . That is, since the cleaning liquid whose temperature has risen due to ultrasonic vibration or the like flows from the central portion to the overflow portion 52 at both ends, the temperature in the vicinity of the overflow portion 52 rises, but a new cleaning liquid ( In addition to supplying the washing liquid before the temperature rise), compared to the conventional case where the washing liquid is supplied from one end in the longitudinal direction and overflowed from the other end, the distance through which the washing liquid flows can be shortened, compared to the prior art. The temperature difference in can be suppressed. Therefore, it is possible to suppress the deterioration of the quality of the coated film due to the non-uniform opening of the slit nozzle 32 in the longitudinal direction due to the temperature difference in the longitudinal direction accompanying the temperature increase of the cleaning liquid by ultrasonic cleaning.

Further, in the above embodiment, the case was described in the case of one cleaning liquid supply pipe 70, but a configuration in which two or more are arranged is also acceptable. Even in this case, it is preferable that the opening direction of the cleaning liquid supply hole 71 is opened in a direction toward the bottom surface of the washing tank 50 on which the vibrator 6 is disposed on the back surface.

In addition, in the above embodiment, the cleaning liquid supply pipe 70 located in the cleaning tank body 51 has been described with respect to an example of arranging the cleaning liquid supply pipe 70 to be dense at the central portion and sparse at both ends in the longitudinal direction, but the cleaning liquid supply hole in the central portion By making the diameter of 71 larger than the diameter of both ends, the structure in which the supply amount of the washing liquid in the center part is larger than that of both ends may be used.

Further, in the above embodiment, an example of cleaning the foreign matter adhering to the slit nozzle 32 has been described, but the cleaning liquid is sucked from the slit nozzle 32 to clean the inside of the applicator 30. do.

1: applicator
3: application unit
5: applicator cleaning device
7: cleaning solution supply unit
10: substrate
21: Stage
30: applicator
32: slit nozzle
50: cleaning tank
51: washing tank body
52: overflow part
53: overflow jaw
54: notch
70: cleaning liquid supply pipe
71: cleaning fluid supply hole

Claims (6)

Cleaning the applicator that cleans the applicator that forms the coating film on the substrate by discharging the coating liquid from the slit nozzle extending in one direction formed on the surface facing the substrate while scanning the substrate. is a device,
A cleaning tank extending in one direction to allow the slit nozzle of the applicator to be immersed;
A cleaning liquid supply unit supplying a cleaning liquid to the cleaning tank;
Vibrator for applying vibration waves to the cleaning liquid in the cleaning tank
to provide,
The washing liquid supply unit supplies the washing liquid into the washing tank in the longitudinal direction, and the supply amount of the washing liquid is set so that the central portion of the washing tank is larger than both ends in the longitudinal direction of the washing tank,
The washing tank has an overflow part for discharging the washing liquid at both ends in the longitudinal direction,
In a state where the slit nozzle is immersed in the washing tank, the flow of the washing liquid in the washing tank is formed so as to flow from the central part in the longitudinal direction toward the overflow portion, and the washing liquid is supplied from one end in the longitudinal direction in the washing tank and is supplied from the other end. The applicator cleaning device characterized in that the distance through which the cleaning liquid flows to the slit nozzle is reduced compared to the case of discharging from the end. According to claim 1,
The washing liquid supply part has a washing liquid supply pipe disposed along the longitudinal direction of the washing tank, and a plurality of washing liquid supply holes for discharging the washing liquid are formed in the washing liquid supply pipe, and the washing liquid supply holes are formed along the longitudinal direction of the washing tank. An applicator cleaning device characterized in that they are sparsely arranged at both ends in the direction and densely arranged at the central portion. According to claim 2,
The applicator cleaning apparatus according to claim 1 , wherein the vibrator is disposed on a bottom surface of the cleaning tank in a longitudinal direction, and the cleaning liquid supply hole is opened in a direction in which the cleaning liquid is discharged toward the vibrator. . According to any one of claims 1 to 3,
The overflow part of the washing tank has a notch section in which side walls at both ends in the longitudinal direction of the washing tank are lower in a height direction than other side walls. According to any one of claims 1 to 3,
The applicator cleaning device according to claim 1, wherein the cleaning tub is provided with a seal wall that prevents the cleaning liquid in the cleaning tub from scattering by coming into contact with the substrate facing surface along the longitudinal direction. Equipped with the applicator cleaning device according to any one of claims 1 to 3,
A stage for placing a substrate, and an applicator for discharging a coating liquid to the substrate on the stage from a slit nozzle, wherein the coating liquid is discharged from the coating device while moving the substrate placed on the stage and the coating device relatively. An application device that forms a coating film on a substrate by doing so.

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