JPH0415233U - - Google Patents
Info
- Publication number
- JPH0415233U JPH0415233U JP5496590U JP5496590U JPH0415233U JP H0415233 U JPH0415233 U JP H0415233U JP 5496590 U JP5496590 U JP 5496590U JP 5496590 U JP5496590 U JP 5496590U JP H0415233 U JPH0415233 U JP H0415233U
- Authority
- JP
- Japan
- Prior art keywords
- tank
- plate
- rectifier
- overflow surface
- cone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 238000012993 chemical processing Methods 0.000 claims 1
- 230000007423 decrease Effects 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Description
第１図は薬液処理装置の一実施例を示す断面図
、第２図および第３図は本考案装置要部の斜視図
である。また、第４図は従来の薬液処理装置の断
面図である。
１Ａ……槽、２……薬液または純水の供給口、
３……溢流面、９……錐状整流板、９Ａ……通液
孔、１１……薬液処理装置。
FIG. 1 is a sectional view showing one embodiment of a chemical liquid processing apparatus, and FIGS. 2 and 3 are perspective views of the main parts of the apparatus of the present invention. Moreover, FIG. 4 is a sectional view of a conventional chemical liquid processing apparatus. 1A...tank, 2...chemical solution or pure water supply port,
3... Overflow surface, 9... Conical current plate, 9A... Liquid passage hole, 11... Chemical liquid processing device.
Claims (1)
固定し、槽の上方に薬液の溢流面を形成してなる
有底器体において、 前記整流板を中高な角錐体もしくは円錐体に形
成し、この整流板の上面から前記溢流面迄の鉛直
方向距離を、前記槽の内周壁面側から中央部に向
つて漸減させたことを特徴とする薬液処理装置。[Scope of Claim for Utility Model Registration] In a bottomed container body comprising a rectifier plate with a large number of liquid passage holes fixed in the lower part of the tank and an overflow surface for the chemical solution formed in the upper part of the tank, the rectifier is provided with: The plate is formed into a medium-height pyramid or cone, and the vertical distance from the upper surface of the current plate to the overflow surface gradually decreases from the inner peripheral wall side of the tank toward the center. chemical processing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5496590U JPH0415233U (en) | 1990-05-25 | 1990-05-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5496590U JPH0415233U (en) | 1990-05-25 | 1990-05-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0415233U true JPH0415233U (en) | 1992-02-06 |
Family
ID=31577500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5496590U Pending JPH0415233U (en) | 1990-05-25 | 1990-05-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0415233U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017109180A (en) * | 2015-12-17 | 2017-06-22 | 東レエンジニアリング株式会社 | Coater cleaning apparatus and coating apparatus |
-
1990
- 1990-05-25 JP JP5496590U patent/JPH0415233U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017109180A (en) * | 2015-12-17 | 2017-06-22 | 東レエンジニアリング株式会社 | Coater cleaning apparatus and coating apparatus |
| KR20170072789A (en) * | 2015-12-17 | 2017-06-27 | 도레 엔지니아린구 가부시키가이샤 | Cleaning device of coating machine, and coating device |
| TWI698290B (en) * | 2015-12-17 | 2020-07-11 | 日商東麗工程股份有限公司 | Applicator cleaning device and coating device |