KR102487545B1 - 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 - Google Patents

착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 Download PDF

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Publication number
KR102487545B1
KR102487545B1 KR1020160137519A KR20160137519A KR102487545B1 KR 102487545 B1 KR102487545 B1 KR 102487545B1 KR 1020160137519 A KR1020160137519 A KR 1020160137519A KR 20160137519 A KR20160137519 A KR 20160137519A KR 102487545 B1 KR102487545 B1 KR 102487545B1
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KR
South Korea
Prior art keywords
resin composition
photosensitive resin
colored photosensitive
pigment
weight
Prior art date
Application number
KR1020160137519A
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English (en)
Korean (ko)
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KR20180043994A (ko
Inventor
이현보
김훈식
Original Assignee
동우 화인켐 주식회사
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Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020160137519A priority Critical patent/KR102487545B1/ko
Priority to CN201710962765.7A priority patent/CN107976865B/zh
Priority to JP2017200796A priority patent/JP7015138B2/ja
Priority to TW106135696A priority patent/TWI771329B/zh
Publication of KR20180043994A publication Critical patent/KR20180043994A/ko
Application granted granted Critical
Publication of KR102487545B1 publication Critical patent/KR102487545B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
KR1020160137519A 2016-10-21 2016-10-21 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 KR102487545B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020160137519A KR102487545B1 (ko) 2016-10-21 2016-10-21 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
CN201710962765.7A CN107976865B (zh) 2016-10-21 2017-10-17 着色感光性树脂组合物、利用其制造的滤色器和图像显示装置
JP2017200796A JP7015138B2 (ja) 2016-10-21 2017-10-17 着色感光性樹脂組成物、これを利用して製造されたカラーフィルターおよび画像表示装置
TW106135696A TWI771329B (zh) 2016-10-21 2017-10-18 著色感光性樹脂組合物及利用彼製造的濾色片與影像顯示裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020160137519A KR102487545B1 (ko) 2016-10-21 2016-10-21 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치

Publications (2)

Publication Number Publication Date
KR20180043994A KR20180043994A (ko) 2018-05-02
KR102487545B1 true KR102487545B1 (ko) 2023-01-11

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Application Number Title Priority Date Filing Date
KR1020160137519A KR102487545B1 (ko) 2016-10-21 2016-10-21 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치

Country Status (4)

Country Link
JP (1) JP7015138B2 (ja)
KR (1) KR102487545B1 (ja)
CN (1) CN107976865B (ja)
TW (1) TWI771329B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108828833B (zh) * 2018-07-02 2022-07-01 京东方科技集团股份有限公司 一种掩膜板、隔垫物制作方法、显示面板及显示装置
KR20230124647A (ko) * 2021-02-25 2023-08-25 후지필름 가부시키가이샤 착색 조성물, 막, 컬러 필터 및 고체 촬상 소자

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JP3048126B2 (ja) * 1995-04-24 2000-06-05 大日精化工業株式会社 ブラックマトリックス用組成物、ブラックマトリックスの形成方法及びブラックマトリックスを付した液晶系ディスプレイ
JP3347934B2 (ja) * 1996-02-28 2002-11-20 大日精化工業株式会社 ブラックマトリックス用着色組成物、ブラックマトリックスの製造方法及び遮光性ブラックマトリックスを付した発光型フラットパネルディスプレイパネル
US5998090A (en) * 1997-12-01 1999-12-07 Brewer Science, Inc. High optical density ultra thin organic black matrix system
JP4401101B2 (ja) * 2003-04-18 2010-01-20 富士フイルム株式会社 ブラックマトリックス作製用着色組成物及び感光性転写材料、ブラックマトリックス及びその製造方法、カラーフィルター、液晶表示素子並びにブラックマトリックス基板
JP4745093B2 (ja) 2006-03-17 2011-08-10 東京応化工業株式会社 黒色感光性組成物
JP5196738B2 (ja) * 2006-05-26 2013-05-15 富士フイルム株式会社 カラーフィルタ用着色硬化性組成物、カラーフィルタ、及びその製造方法
WO2009025297A1 (ja) * 2007-08-22 2009-02-26 Mitsubishi Chemical Corporation 樹脂ブラックマトリックス、遮光性感光性樹脂組成物、ｔｆｔ素子基板及び液晶表示装置
WO2010038978A2 (en) * 2008-09-30 2010-04-08 Kolon Industries, Inc. Photopolymer resin composition
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CN103890660B (zh) * 2011-10-25 2019-05-31 三菱化学株式会社 着色感光性组合物、着色间隔物、滤色片及液晶显示装置
KR20160094668A (ko) * 2015-02-02 2016-08-10 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이로써 제조된 컬럼 스페이서 및 이를 구비한 액정 표시 장치
KR102173148B1 (ko) * 2015-02-04 2020-11-02 동우 화인켐 주식회사 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 이를 포함하는 화상 표시 장치
KR102361595B1 (ko) * 2015-03-11 2022-02-11 동우 화인켐 주식회사 흑색 감광성 수지 조성물 및 이로부터 제조된 액정표시장치용 블랙 매트릭스 및 컬럼 스페이서
KR102279575B1 (ko) * 2015-03-26 2021-07-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 화상 표시 장치

Also Published As

Publication number Publication date
JP2018066992A (ja) 2018-04-26
CN107976865A (zh) 2018-05-01
CN107976865B (zh) 2021-10-15
KR20180043994A (ko) 2018-05-02
JP7015138B2 (ja) 2022-02-02
TW201823376A (zh) 2018-07-01
TWI771329B (zh) 2022-07-21

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