CN107976865B - 着色感光性树脂组合物、利用其制造的滤色器和图像显示装置 - Google Patents
着色感光性树脂组合物、利用其制造的滤色器和图像显示装置 Download PDFInfo
- Publication number
- CN107976865B CN107976865B CN201710962765.7A CN201710962765A CN107976865B CN 107976865 B CN107976865 B CN 107976865B CN 201710962765 A CN201710962765 A CN 201710962765A CN 107976865 B CN107976865 B CN 107976865B
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- China
- Prior art keywords
- photosensitive resin
- resin composition
- pigment
- colored photosensitive
- color filter
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160137519A KR102487545B1 (ko) | 2016-10-21 | 2016-10-21 | 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 |
KR10-2016-0137519 | 2016-10-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107976865A CN107976865A (zh) | 2018-05-01 |
CN107976865B true CN107976865B (zh) | 2021-10-15 |
Family
ID=62012432
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710962765.7A Active CN107976865B (zh) | 2016-10-21 | 2017-10-17 | 着色感光性树脂组合物、利用其制造的滤色器和图像显示装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7015138B2 (ja) |
KR (1) | KR102487545B1 (ja) |
CN (1) | CN107976865B (ja) |
TW (1) | TWI771329B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108828833B (zh) * | 2018-07-02 | 2022-07-01 | 京东方科技集团股份有限公司 | 一种掩膜板、隔垫物制作方法、显示面板及显示装置 |
KR20230124647A (ko) * | 2021-02-25 | 2023-08-25 | 후지필름 가부시키가이샤 | 착색 조성물, 막, 컬러 필터 및 고체 촬상 소자 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3048126B2 (ja) * | 1995-04-24 | 2000-06-05 | 大日精化工業株式会社 | ブラックマトリックス用組成物、ブラックマトリックスの形成方法及びブラックマトリックスを付した液晶系ディスプレイ |
JP3347934B2 (ja) * | 1996-02-28 | 2002-11-20 | 大日精化工業株式会社 | ブラックマトリックス用着色組成物、ブラックマトリックスの製造方法及び遮光性ブラックマトリックスを付した発光型フラットパネルディスプレイパネル |
US5998090A (en) * | 1997-12-01 | 1999-12-07 | Brewer Science, Inc. | High optical density ultra thin organic black matrix system |
JP4401101B2 (ja) * | 2003-04-18 | 2010-01-20 | 富士フイルム株式会社 | ブラックマトリックス作製用着色組成物及び感光性転写材料、ブラックマトリックス及びその製造方法、カラーフィルター、液晶表示素子並びにブラックマトリックス基板 |
JP4745093B2 (ja) | 2006-03-17 | 2011-08-10 | 東京応化工業株式会社 | 黒色感光性組成物 |
JP5196738B2 (ja) * | 2006-05-26 | 2013-05-15 | 富士フイルム株式会社 | カラーフィルタ用着色硬化性組成物、カラーフィルタ、及びその製造方法 |
WO2009025297A1 (ja) * | 2007-08-22 | 2009-02-26 | Mitsubishi Chemical Corporation | 樹脂ブラックマトリックス、遮光性感光性樹脂組成物、tft素子基板及び液晶表示装置 |
WO2010038978A2 (en) * | 2008-09-30 | 2010-04-08 | Kolon Industries, Inc. | Photopolymer resin composition |
KR20130021139A (ko) * | 2011-08-22 | 2013-03-05 | 성균관대학교산학협력단 | 흑색 감광성 수지 조성물 및 이를 구비한 화상표시장치 |
CN103890660B (zh) * | 2011-10-25 | 2019-05-31 | 三菱化学株式会社 | 着色感光性组合物、着色间隔物、滤色片及液晶显示装置 |
KR20160094668A (ko) * | 2015-02-02 | 2016-08-10 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 이로써 제조된 컬럼 스페이서 및 이를 구비한 액정 표시 장치 |
KR102173148B1 (ko) * | 2015-02-04 | 2020-11-02 | 동우 화인켐 주식회사 | 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 이를 포함하는 화상 표시 장치 |
KR102361595B1 (ko) * | 2015-03-11 | 2022-02-11 | 동우 화인켐 주식회사 | 흑색 감광성 수지 조성물 및 이로부터 제조된 액정표시장치용 블랙 매트릭스 및 컬럼 스페이서 |
KR102279575B1 (ko) * | 2015-03-26 | 2021-07-20 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 화상 표시 장치 |
-
2016
- 2016-10-21 KR KR1020160137519A patent/KR102487545B1/ko active IP Right Grant
-
2017
- 2017-10-17 CN CN201710962765.7A patent/CN107976865B/zh active Active
- 2017-10-17 JP JP2017200796A patent/JP7015138B2/ja active Active
- 2017-10-18 TW TW106135696A patent/TWI771329B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR102487545B1 (ko) | 2023-01-11 |
JP2018066992A (ja) | 2018-04-26 |
CN107976865A (zh) | 2018-05-01 |
KR20180043994A (ko) | 2018-05-02 |
JP7015138B2 (ja) | 2022-02-02 |
TW201823376A (zh) | 2018-07-01 |
TWI771329B (zh) | 2022-07-21 |
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