KR102441106B1 - 박막 광결합기들을 이용하여 형성된 능동 매트릭스 백플레인 - Google Patents
박막 광결합기들을 이용하여 형성된 능동 매트릭스 백플레인 Download PDFInfo
- Publication number
- KR102441106B1 KR102441106B1 KR1020160056203A KR20160056203A KR102441106B1 KR 102441106 B1 KR102441106 B1 KR 102441106B1 KR 1020160056203 A KR1020160056203 A KR 1020160056203A KR 20160056203 A KR20160056203 A KR 20160056203A KR 102441106 B1 KR102441106 B1 KR 102441106B1
- Authority
- KR
- South Korea
- Prior art keywords
- optical switch
- backplane
- light
- light source
- input
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000010409 thin film Substances 0.000 title claims abstract description 24
- 239000011159 matrix material Substances 0.000 title claims abstract description 17
- 230000003287 optical effect Effects 0.000 claims abstract description 80
- 239000003990 capacitor Substances 0.000 claims abstract description 12
- 239000007787 solid Substances 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 13
- 239000012212 insulator Substances 0.000 claims description 8
- 230000007246 mechanism Effects 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 description 18
- 238000010586 diagram Methods 0.000 description 8
- 238000003491 array Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 229910015202 MoCr Inorganic materials 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000004298 light response Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136213—Storage capacitors associated with the pixel electrode
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/005—Projectors using an electronic spatial light modulator but not peculiar thereto
- G03B21/008—Projectors using an electronic spatial light modulator but not peculiar thereto using micromirror devices
-
- H01L27/3244—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/441—Interconnections, e.g. scanning lines
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G2300/00—Aspects of the constitution of display devices
- G09G2300/08—Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
- G09G2300/0809—Several active elements per pixel in active matrix panels
- G09G2300/0842—Several active elements per pixel in active matrix panels forming a memory circuit, e.g. a dynamic memory with one capacitor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F55/00—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto
- H10F55/20—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the electric light source controls the radiation-sensitive semiconductor devices, e.g. optocouplers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Crystallography & Structural Chemistry (AREA)
- Computer Hardware Design (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Theoretical Computer Science (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- General Engineering & Computer Science (AREA)
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
- Light Receiving Elements (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/725,472 US10192892B2 (en) | 2015-05-29 | 2015-05-29 | Active matrix backplane formed using thin film optocouplers |
| US14/725,472 | 2015-05-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160140377A KR20160140377A (ko) | 2016-12-07 |
| KR102441106B1 true KR102441106B1 (ko) | 2022-09-07 |
Family
ID=57397233
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020160056203A Active KR102441106B1 (ko) | 2015-05-29 | 2016-05-09 | 박막 광결합기들을 이용하여 형성된 능동 매트릭스 백플레인 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10192892B2 (enExample) |
| JP (2) | JP2016225612A (enExample) |
| KR (1) | KR102441106B1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10558204B2 (en) | 2016-09-19 | 2020-02-11 | Palo Alto Research Center Incorporated | System and method for scalable real-time micro-object position control with the aid of a digital computer |
| US10397529B2 (en) | 2017-04-28 | 2019-08-27 | Palo Alto Research Center Incorporated | Transparent optical coupler active matrix array |
| CN109962085B (zh) * | 2017-12-25 | 2023-08-01 | 上海耕岩智能科技有限公司 | 一种监控显示像素发光强度的方法和装置 |
| CN109274425B (zh) * | 2018-11-02 | 2021-11-30 | 国网四川省电力公司广安供电公司 | 一种智能跳纤系统的设计方法 |
| US12020399B2 (en) | 2020-11-16 | 2024-06-25 | Xerox Corporation | System and method for multi-object micro-assembly control with the aid of a digital computer |
| US11893327B2 (en) | 2020-12-14 | 2024-02-06 | Xerox Corporation | System and method for machine-learning enabled micro-assembly control with the aid of a digital computer |
| US11921488B2 (en) | 2020-12-15 | 2024-03-05 | Xerox Corporation | System and method for machine-learning-enabled micro-object density distribution control with the aid of a digital computer |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012121372A1 (ja) * | 2011-03-10 | 2012-09-13 | シャープ株式会社 | 表示素子及び電子機器 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4779126A (en) | 1983-11-25 | 1988-10-18 | International Rectifier Corporation | Optically triggered lateral thyristor with auxiliary region |
| JPS60193384A (ja) * | 1984-03-15 | 1985-10-01 | Toshiba Corp | 光スイツチングデバイス及び光スイツチング表示装置 |
| KR910007142A (ko) | 1988-09-30 | 1991-04-30 | 미다 가쓰시게 | 박막 광트랜지스터와 그것을 사용한 광센서어레이 |
| US5200634A (en) | 1988-09-30 | 1993-04-06 | Hitachi, Ltd. | Thin film phototransistor and photosensor array using the same |
| US5264720A (en) | 1989-09-22 | 1993-11-23 | Nippondenso Co., Ltd. | High withstanding voltage transistor |
| US5028788A (en) | 1990-04-03 | 1991-07-02 | Electromed International Ltd. | X-ray sensor array |
| US5083175A (en) * | 1990-09-21 | 1992-01-21 | Xerox Corporation | Method of using offset gated gap-cell thin film device as a photosensor |
| JPH06266318A (ja) * | 1993-03-17 | 1994-09-22 | Nippon Telegr & Teleph Corp <Ntt> | アクティブマトリクス形液晶装置の駆動方法 |
| JP2878137B2 (ja) | 1994-06-29 | 1999-04-05 | シャープ株式会社 | 増幅型光電変換素子、それを用いた増幅型固体撮像装置、及び増幅型光電変換素子の製造方法 |
| US7038242B2 (en) | 2001-02-28 | 2006-05-02 | Agilent Technologies, Inc. | Amorphous semiconductor open base phototransistor array |
| US6885789B2 (en) | 2002-06-07 | 2005-04-26 | Fujitsu Limited | Optical switch fabricated by a thin film process |
| JP2004264349A (ja) * | 2003-02-07 | 2004-09-24 | Agilent Technol Inc | アクティブマトリクスディスプレイ回路基板、それを含むディスプレイパネル、その検査方法、及びそのための検査装置 |
| GB0401578D0 (en) | 2004-01-24 | 2004-02-25 | Koninkl Philips Electronics Nv | Phototransistor |
| EP1679749A1 (en) | 2005-01-11 | 2006-07-12 | Ecole Polytechnique Federale De Lausanne Epfl - Sti - Imm - Lmis3 | Semiconductor photodiode and method of making |
| JP4792899B2 (ja) * | 2005-09-29 | 2011-10-12 | ブラザー工業株式会社 | 光走査装置及びそれを備えた網膜走査表示装置 |
| JP4122503B2 (ja) * | 2006-11-30 | 2008-07-23 | イーイメージテクノロジー株式会社 | Ledディスプレイ |
| JP2009266938A (ja) * | 2008-04-23 | 2009-11-12 | Rohm Co Ltd | 半導体素子 |
| US9305497B2 (en) * | 2012-08-31 | 2016-04-05 | Qualcomm Mems Technologies, Inc. | Systems, devices, and methods for driving an analog interferometric modulator |
| US20140212085A1 (en) * | 2013-01-29 | 2014-07-31 | Georgios Margaritis | Optocoupler |
| US9946135B2 (en) * | 2015-05-29 | 2018-04-17 | Palo Alto Research Center Incorporated | High voltage thin film optical switch |
-
2015
- 2015-05-29 US US14/725,472 patent/US10192892B2/en active Active
-
2016
- 2016-05-09 KR KR1020160056203A patent/KR102441106B1/ko active Active
- 2016-05-12 JP JP2016096520A patent/JP2016225612A/ja active Pending
-
2020
- 2020-03-30 JP JP2020059425A patent/JP6794563B2/ja active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012121372A1 (ja) * | 2011-03-10 | 2012-09-13 | シャープ株式会社 | 表示素子及び電子機器 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2020123732A (ja) | 2020-08-13 |
| JP2016225612A (ja) | 2016-12-28 |
| KR20160140377A (ko) | 2016-12-07 |
| US10192892B2 (en) | 2019-01-29 |
| US20160351584A1 (en) | 2016-12-01 |
| JP6794563B2 (ja) | 2020-12-02 |
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Legal Events
| Date | Code | Title | Description |
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| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20160509 |
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| PG1501 | Laying open of application | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20210507 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20160509 Comment text: Patent Application |
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Patent event date: 20210507 Patent event code: PA03022R01D Comment text: Request for Accelerated Examination Patent event date: 20160509 Patent event code: PA03021R01I Comment text: Patent Application |
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Comment text: Notification of reason for refusal Patent event date: 20210915 Patent event code: PE09021S01D |
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Comment text: Final Notice of Reason for Refusal Patent event date: 20220209 Patent event code: PE09021S02D |
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| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20220531 |
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Comment text: Registration of Establishment Patent event date: 20220902 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
Payment date: 20220905 End annual number: 3 Start annual number: 1 |
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