KR102369410B1 - 감광성 수지 조성물 및 이로부터 제조된 경화막 - Google Patents

감광성 수지 조성물 및 이로부터 제조된 경화막 Download PDF

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Publication number
KR102369410B1
KR102369410B1 KR1020140168873A KR20140168873A KR102369410B1 KR 102369410 B1 KR102369410 B1 KR 102369410B1 KR 1020140168873 A KR1020140168873 A KR 1020140168873A KR 20140168873 A KR20140168873 A KR 20140168873A KR 102369410 B1 KR102369410 B1 KR 102369410B1
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KR
South Korea
Prior art keywords
weight
parts
siloxane polymer
group
photosensitive resin
Prior art date
Application number
KR1020140168873A
Other languages
English (en)
Korean (ko)
Other versions
KR20160064780A (ko
Inventor
권진
허근
나종호
이은영
Original Assignee
롬엔드하스전자재료코리아유한회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 롬엔드하스전자재료코리아유한회사 filed Critical 롬엔드하스전자재료코리아유한회사
Priority to KR1020140168873A priority Critical patent/KR102369410B1/ko
Priority to JP2015221137A priority patent/JP6783051B2/ja
Priority to TW109120225A priority patent/TWI755757B/zh
Priority to TW104137393A priority patent/TWI699622B/zh
Priority to CN201510813178.2A priority patent/CN105652593B/zh
Publication of KR20160064780A publication Critical patent/KR20160064780A/ko
Application granted granted Critical
Publication of KR102369410B1 publication Critical patent/KR102369410B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Silicon Polymers (AREA)
KR1020140168873A 2014-11-28 2014-11-28 감광성 수지 조성물 및 이로부터 제조된 경화막 KR102369410B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020140168873A KR102369410B1 (ko) 2014-11-28 2014-11-28 감광성 수지 조성물 및 이로부터 제조된 경화막
JP2015221137A JP6783051B2 (ja) 2014-11-28 2015-11-11 感光性樹脂組成物及びそれより調製される硬化膜
TW109120225A TWI755757B (zh) 2014-11-28 2015-11-12 感光性樹脂組合物及由其製備之固化膜
TW104137393A TWI699622B (zh) 2014-11-28 2015-11-12 感光性樹脂組合物及由其製備之固化膜
CN201510813178.2A CN105652593B (zh) 2014-11-28 2015-11-20 感光性树脂组合物和由其制备的固化膜

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140168873A KR102369410B1 (ko) 2014-11-28 2014-11-28 감광성 수지 조성물 및 이로부터 제조된 경화막

Publications (2)

Publication Number Publication Date
KR20160064780A KR20160064780A (ko) 2016-06-08
KR102369410B1 true KR102369410B1 (ko) 2022-03-02

Family

ID=56102776

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140168873A KR102369410B1 (ko) 2014-11-28 2014-11-28 감광성 수지 조성물 및 이로부터 제조된 경화막

Country Status (4)

Country Link
JP (1) JP6783051B2 (ja)
KR (1) KR102369410B1 (ja)
CN (1) CN105652593B (ja)
TW (2) TWI699622B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180307141A1 (en) * 2015-11-06 2018-10-25 Rohm And Haas Electronic Materials Korea Ltd. Photosensitive resin composition and cured film prepared therefrom
CN107918249A (zh) * 2016-10-05 2018-04-17 罗门哈斯电子材料韩国有限公司 感光性树脂组合物和由其制备的固化膜
KR102493962B1 (ko) * 2016-10-19 2023-02-01 롬엔드하스전자재료코리아유한회사 감광성 수지 조성물 및 이로부터 제조된 경화막
CN111443574B (zh) * 2019-01-16 2023-02-17 台湾永光化学工业股份有限公司 负型感光性树脂组合物及其用途
JP6639724B1 (ja) * 2019-03-15 2020-02-05 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ ポジ型感光性ポリシロキサン組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010068027A2 (ko) 2008-12-10 2010-06-17 주식회사 동진쎄미켐 포지티브형 감광성 유-무기 하이브리드 절연막 조성물

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1662322B1 (en) 2004-11-26 2017-01-11 Toray Industries, Inc. Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film
JP2009251538A (ja) * 2008-04-11 2009-10-29 Nippon Zeon Co Ltd 感放射線樹脂組成物
KR101754841B1 (ko) * 2009-05-01 2017-07-06 후지필름 가부시키가이샤 포지티브형 감광성 수지 조성물 및 그것을 사용한 경화막 형성 방법
JP5533232B2 (ja) * 2009-06-29 2014-06-25 Ｊｓｒ株式会社 ポジ型感放射線性組成物、硬化膜、層間絶縁膜、層間絶縁膜の形成方法、表示素子、及び層間絶縁膜形成用のシロキサンポリマー
JP5338532B2 (ja) * 2009-07-13 2013-11-13 Ｊｎｃ株式会社 ポジ型感光性組成物
JP5413124B2 (ja) * 2009-10-22 2014-02-12 Ｊｓｒ株式会社 ポジ型感放射線性組成物、層間絶縁膜及びその形成方法
JP5659561B2 (ja) * 2010-06-02 2015-01-28 東レ株式会社 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子
US9321862B2 (en) * 2011-05-20 2016-04-26 Nissan Chemical Industries, Ltd. Photosensitive resin composition
JP6166526B2 (ja) * 2011-12-09 2017-07-19 株式会社日本触媒 硬化性樹脂組成物及びその用途
CN110095941B (zh) * 2011-12-26 2023-02-17 东丽株式会社 感光性树脂组合物和半导体元件的制造方法
TWI479264B (zh) * 2012-12-20 2015-04-01 Chi Mei Corp 感光性樹脂組成物、彩色濾光片及其液晶顯示元件
KR20150068899A (ko) * 2013-12-12 2015-06-22 제이엔씨 주식회사 포지티브형 감광성 조성물

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010068027A2 (ko) 2008-12-10 2010-06-17 주식회사 동진쎄미켐 포지티브형 감광성 유-무기 하이브리드 절연막 조성물

Also Published As

Publication number Publication date
TWI755757B (zh) 2022-02-21
TW201626108A (zh) 2016-07-16
CN105652593B (zh) 2021-03-19
KR20160064780A (ko) 2016-06-08
TW202040271A (zh) 2020-11-01
TWI699622B (zh) 2020-07-21
JP2016105161A (ja) 2016-06-09
JP6783051B2 (ja) 2020-11-11
CN105652593A (zh) 2016-06-08

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