KR102312480B1 - 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법 - Google Patents

밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법 Download PDF

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KR102312480B1
KR102312480B1 KR1020217019061A KR20217019061A KR102312480B1 KR 102312480 B1 KR102312480 B1 KR 102312480B1 KR 1020217019061 A KR1020217019061 A KR 1020217019061A KR 20217019061 A KR20217019061 A KR 20217019061A KR 102312480 B1 KR102312480 B1 KR 102312480B1
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South Korea
Prior art keywords
actuator
flow path
valve body
piezoelectric actuator
valve
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KR1020217019061A
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KR20210079403A (ko
Inventor
토시히데 요시다
토모히로 나카타
츠토무 시노하라
토시유키 이나다
타카시 후나코시
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가부시키가이샤 후지킨
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston
    • F16K31/1225—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston with a plurality of pistons
    • H01L21/67017—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K7/00—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves
    • F16K7/12—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm
    • F16K7/14—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm arranged to be deformed against a flat seat
    • F16K7/17—Diaphragm valves or cut-off apparatus, e.g. with a member deformed, but not moved bodily, to close the passage ; Pinch valves with flat, dished, or bowl-shaped diaphragm arranged to be deformed against a flat seat the diaphragm being actuated by fluid pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/004—Actuating devices; Operating means; Releasing devices actuated by piezoelectric means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/004—Actuating devices; Operating means; Releasing devices actuated by piezoelectric means
    • F16K31/007—Piezoelectric stacks
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston
    • F16K31/1221—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston one side of the piston being spring-loaded
    • H01L21/0228—
    • H01L21/67253—
    • H01L21/67276—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
    • H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H10P14/6339—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE or pulsed CVD
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0612—Production flow monitoring, e.g. for increasing throughput

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Electrically Driven Valve-Operating Means (AREA)
  • Automation & Control Theory (AREA)
  • Fluid-Driven Valves (AREA)
  • Chemical Vapour Deposition (AREA)
  • Lift Valve (AREA)
KR1020217019061A 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법 Active KR102312480B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2016-218093 2016-11-08
JP2016218093 2016-11-08
KR1020197015535A KR20190077477A (ko) 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법
PCT/JP2017/039729 WO2018088326A1 (ja) 2016-11-08 2017-11-02 バルブ装置、このバルブ装置を用いた流量制御方法および半導体製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020197015535A Division KR20190077477A (ko) 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법

Publications (2)

Publication Number Publication Date
KR20210079403A KR20210079403A (ko) 2021-06-29
KR102312480B1 true KR102312480B1 (ko) 2021-10-14

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KR1020217019061A Active KR102312480B1 (ko) 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법
KR1020197015535A Ceased KR20190077477A (ko) 2016-11-08 2017-11-02 밸브 장치, 이 밸브 장치를 사용한 유량제어방법 및 반도체 제조 방법

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Country Status (7)

Country Link
US (1) US11098819B2 (https=)
EP (1) EP3540280A4 (https=)
JP (2) JP6336692B1 (https=)
KR (2) KR102312480B1 (https=)
CN (1) CN109952459B (https=)
TW (1) TWI671483B (https=)
WO (1) WO2018088326A1 (https=)

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CN110023659B (zh) * 2016-11-30 2021-01-29 株式会社富士金 阀装置、使用该阀装置的流量控制方法和半导体制造方法
WO2018235900A1 (ja) 2017-06-22 2018-12-27 株式会社フジキン 流量制御装置および流量制御装置の流量制御方法
JP7113529B2 (ja) * 2017-09-25 2022-08-05 株式会社フジキン バルブ装置、流量調整方法、流体制御装置、流量制御方法、半導体製造装置および半導体製造方法
US11536386B2 (en) * 2018-08-30 2022-12-27 Fujikin Incorporated Fluid control device
WO2020158459A1 (ja) * 2019-01-31 2020-08-06 株式会社フジキン バルブ装置、このバルブ装置を用いた流量制御方法、流体制御装置、半導体製造方法、および半導体製造装置
JP7308506B2 (ja) * 2019-01-31 2023-07-14 株式会社フジキン バルブ装置、このバルブ装置を用いた流量制御方法、半導体製造方法、および半導体製造装置
CN113423987A (zh) * 2019-01-31 2021-09-21 株式会社富士金 阀装置、流量控制方法、流体控制装置、半导体制造方法以及半导体制造装置
CN110307351A (zh) * 2019-07-10 2019-10-08 广东工业大学 一种压电陶瓷限流阀
US11079035B2 (en) * 2019-07-12 2021-08-03 Pivotal Systems Corporation Preloaded piezo actuator and gas valve employing the actuator
IL268254B2 (en) * 2019-07-24 2024-10-01 Ham Let Israel Canada Ltd Fluid-flow control device
JP7382054B2 (ja) * 2019-08-29 2023-11-16 株式会社フジキン バルブ装置および流量制御装置
WO2021106472A1 (ja) 2019-11-25 2021-06-03 株式会社エム・システム技研 アクチュエータ、及び、流体制御機器
KR20230131613A (ko) 2022-03-07 2023-09-14 주식회사 코일넷 미생물 분뇨처리조가 구비된 변기
DE102022003518A1 (de) * 2022-09-23 2024-03-28 Vat Holding Ag Pneumatisches gaseinlassventil mit verstellbarem anschlag
JP2024158856A (ja) * 2023-04-28 2024-11-08 株式会社堀場エステック 流体制御弁、流体制御装置、及び、材料供給システム

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JP7113529B2 (ja) 2017-09-25 2022-08-05 株式会社フジキン バルブ装置、流量調整方法、流体制御装置、流量制御方法、半導体製造装置および半導体製造方法
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Also Published As

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JP2018132195A (ja) 2018-08-23
US11098819B2 (en) 2021-08-24
TWI671483B (zh) 2019-09-11
EP3540280A4 (en) 2019-11-27
JP6336692B1 (ja) 2018-06-06
JPWO2018088326A1 (ja) 2018-11-15
US20190285176A1 (en) 2019-09-19
CN109952459A (zh) 2019-06-28
WO2018088326A1 (ja) 2018-05-17
TW201825817A (zh) 2018-07-16
EP3540280A1 (en) 2019-09-18
CN109952459B (zh) 2021-02-26
KR20190077477A (ko) 2019-07-03
KR20210079403A (ko) 2021-06-29

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