KR102292882B1 - 레이저 생성 플라즈마 극자외 광원용 타겟 - Google Patents

레이저 생성 플라즈마 극자외 광원용 타겟 Download PDF

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KR102292882B1
KR102292882B1 KR1020207025013A KR20207025013A KR102292882B1 KR 102292882 B1 KR102292882 B1 KR 102292882B1 KR 1020207025013 A KR1020207025013 A KR 1020207025013A KR 20207025013 A KR20207025013 A KR 20207025013A KR 102292882 B1 KR102292882 B1 KR 102292882B1
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pulse
radiation
target material
target
vacuum chamber
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KR20200105546A (ko
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로버트 제이. 라팍
예젱 타오
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에이에스엠엘 네델란즈 비.브이.
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0088—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam for preconditioning the plasma generating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/025—Constructional details of solid state lasers, e.g. housings or mountings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/0035—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state the material containing metals as principal radiation-generating components
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/005—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state containing a metal as principal radiation generating component

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
  • Lasers (AREA)
KR1020207025013A 2013-03-14 2014-02-18 레이저 생성 플라즈마 극자외 광원용 타겟 Active KR102292882B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US13/830,461 2013-03-14
US13/830,461 US8872143B2 (en) 2013-03-14 2013-03-14 Target for laser produced plasma extreme ultraviolet light source
KR1020157027195A KR102151765B1 (ko) 2013-03-14 2014-02-18 레이저 생성 플라즈마 극자외 광원용 타겟
PCT/US2014/016967 WO2014143504A1 (en) 2013-03-14 2014-02-18 Target for laser produced plasma extreme ultraviolet light source

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020157027195A Division KR102151765B1 (ko) 2013-03-14 2014-02-18 레이저 생성 플라즈마 극자외 광원용 타겟

Publications (2)

Publication Number Publication Date
KR20200105546A KR20200105546A (ko) 2020-09-07
KR102292882B1 true KR102292882B1 (ko) 2021-08-24

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KR1020157027195A Active KR102151765B1 (ko) 2013-03-14 2014-02-18 레이저 생성 플라즈마 극자외 광원용 타겟
KR1020207025013A Active KR102292882B1 (ko) 2013-03-14 2014-02-18 레이저 생성 플라즈마 극자외 광원용 타겟

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KR1020157027195A Active KR102151765B1 (ko) 2013-03-14 2014-02-18 레이저 생성 플라즈마 극자외 광원용 타겟

Country Status (5)

Country Link
US (4) US8872143B2 (enExample)
JP (3) JP6397884B2 (enExample)
KR (2) KR102151765B1 (enExample)
TW (2) TWI636709B (enExample)
WO (1) WO2014143504A1 (enExample)

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US9357625B2 (en) * 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
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US9713240B2 (en) 2015-08-12 2017-07-18 Asml Netherlands B.V. Stabilizing EUV light power in an extreme ultraviolet light source
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
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US20170311429A1 (en) 2016-04-25 2017-10-26 Asml Netherlands B.V. Reducing the effect of plasma on an object in an extreme ultraviolet light source
WO2018029759A1 (ja) * 2016-08-08 2018-02-15 ギガフォトン株式会社 極端紫外光生成方法
US9778022B1 (en) 2016-09-14 2017-10-03 Asml Netherlands B.V. Determining moving properties of a target in an extreme ultraviolet light source
US10149375B2 (en) * 2016-09-14 2018-12-04 Asml Netherlands B.V. Target trajectory metrology in an extreme ultraviolet light source
WO2018083727A1 (ja) * 2016-11-01 2018-05-11 ギガフォトン株式会社 極端紫外光生成装置
CN110088682B (zh) 2016-12-13 2022-06-10 Asml荷兰有限公司 辐射源设备和方法、光刻设备和检查设备
US11266002B2 (en) * 2017-10-26 2022-03-01 Asml Netherlands B.V. System for monitoring a plasma
US10959318B2 (en) 2018-01-10 2021-03-23 Kla-Tencor Corporation X-ray metrology system with broadband laser produced plasma illuminator
US10925142B2 (en) * 2018-07-31 2021-02-16 Taiwan Semiconductor Manufacturing Co., Ltd. EUV radiation source for lithography exposure process
US11153959B2 (en) * 2018-08-17 2021-10-19 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for generating extreme ultraviolet radiation
NL2023633A (en) * 2018-09-25 2020-04-30 Asml Netherlands Bv Laser system for target metrology and alteration in an euv light source
NL2025013A (en) 2019-03-07 2020-09-11 Asml Netherlands Bv Laser system for source material conditioning in an euv light source
TWI861161B (zh) 2019-08-15 2024-11-11 荷蘭商Ａｓｍｌ荷蘭公司 用於產生極紫外線輻射之裝置及方法
KR20220166280A (ko) 2020-04-09 2022-12-16 에이에스엠엘 네델란즈 비.브이. 방사선 소스용 시드 레이저 시스템
JP7434096B2 (ja) 2020-07-30 2024-02-20 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法
KR20220030350A (ko) 2020-08-27 2022-03-11 삼성전자주식회사 광원 및 이를 이용한 극자외선 광원 시스템
KR20220030382A (ko) 2020-08-28 2022-03-11 삼성전자주식회사 극자외선 노광 방법 및 이를 이용한 반도체 제조 방법

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Also Published As

Publication number Publication date
US20140264087A1 (en) 2014-09-18
JP6397884B2 (ja) 2018-09-26
JP2016512382A (ja) 2016-04-25
TW201838483A (zh) 2018-10-16
US20140264090A1 (en) 2014-09-18
TWI636709B (zh) 2018-09-21
WO2014143504A1 (en) 2014-09-18
US8927952B2 (en) 2015-01-06
US9107279B2 (en) 2015-08-11
KR20150131084A (ko) 2015-11-24
JP2018146988A (ja) 2018-09-20
US9232624B2 (en) 2016-01-05
US20150189729A1 (en) 2015-07-02
TWI690243B (zh) 2020-04-01
TW201444417A (zh) 2014-11-16
JP2019207423A (ja) 2019-12-05
JP6799645B2 (ja) 2020-12-16
US8872143B2 (en) 2014-10-28
KR102151765B1 (ko) 2020-09-04
JP6563563B2 (ja) 2019-08-21
KR20200105546A (ko) 2020-09-07
US20150342016A1 (en) 2015-11-26

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