KR102246552B1 - 에어로졸 제트식 인쇄용 솔더 마스크 조성물 - Google Patents
에어로졸 제트식 인쇄용 솔더 마스크 조성물 Download PDFInfo
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- KR102246552B1 KR102246552B1 KR1020160003203A KR20160003203A KR102246552B1 KR 102246552 B1 KR102246552 B1 KR 102246552B1 KR 1020160003203 A KR1020160003203 A KR 1020160003203A KR 20160003203 A KR20160003203 A KR 20160003203A KR 102246552 B1 KR102246552 B1 KR 102246552B1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
- C09D11/033—Printing inks characterised by features other than the chemical nature of the binder characterised by the solvent
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/36—Inkjet printing inks based on non-aqueous solvents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/32—Inkjet printing inks characterised by colouring agents
- C09D11/322—Pigment inks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
- H05K3/3463—Solder compositions in relation to features of the printed circuit board or the mounting process
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Ink Jet (AREA)
Abstract
Description
도 1은 종래 솔더 마스크 적층 공정을 보인다.
도 2는 본원의 실시태양들에 의한 예시적 솔더 마스크의 용매 첨가에 따른 점도 (25 ℃) 및 전단박화지수의 이중 도표를 도시한 것이다. 전단박화지수는 높은 전단속도 484 1/s에서의 점도에 대한 낮은 전단속도 10 1/s에서의 점도 비율이다.
도 3은 프로필렌 글리콜 모노메틸 에테르 아세테이트 및 디프로필렌 글리콜 모노메틸 에테르 아세테이트 (PGMEA/DPGMEA)의 조합으로 제제된 본원의 실시태양들에 의한 예시적 솔더 마스크의 내스크래치성 및 부착력 시험을 보인다. 테이프로 재료가 이동되지 않았고, 이는 우수한 부착력 5B를 의미한다. 솔더 마스크에 대하여 가장 높은 등급인 연필경도는 6H이었다.
도 4A는 폴리에틸렌 테레프탈레이트 (PET) 기재에 다른 속도 (5.0 mm/s, 10 mm/s 및 20 mm/s)로 인쇄된 본원의 실시태양들에 의한 예시적 경화 솔더 마스크 사진이다.
도 4B는 도 4A에서 10 mm/s로 인쇄된 라인의 광학 현미경 사진이고; 라인은 유연한 모서리를 보인다.
| 샘플 | 용매 첨가 | 내스크래치성 | 연필경도 |
| 대조 A | 무 | 4-5 B | 6H |
| 대조 B | 부틸 카르비톨 | 3-4 B | 2-3H |
| 실시예1 | PGMEA/DPGMEA | 5 B | 6H |
Claims (11)
- ⅰ) 수지 또는 UV 경화성 단량체;
ⅱ) 무기 안료; 및
ⅲ) 잉크 총 중량의 20 내지 50%의 용매;를 포함하는 솔더 마스크 잉크로서,
상기 용매는 프로필렌 글리콜 모노메틸 에테르 아세테이트 및 디프로필렌 글리콜 모노메틸 에테르 아세테이트 용매의 1:1 조합이고,
상기 솔더 마스크 잉크 제제는 25℃, 전단 속도 10 1/s에서 50 cps 내지 800 cps의 점도, 및 1.0 내지 1.5의 전단박화지수를 갖는 솔더 마스크 잉크. - 청구항 1에 있어서,
상기 무기 안료는 금속 산화물, 금속 황산염, 금속 황화물, 금속 붕산염, 남동석(azurite), 오레올린(aureolin), 코발트 블루(cobalt blue), 크롬 옐로우(chrome yellow), 세루리안(cerulean), 크롬산칼슘, 바이스 코발트 그린(bice cobalt green), 이집트 블루(Egyptian blue), 한 퍼플(han purple), 한 블루(han blue), 리토폰(lithopone), 망간 바이올렛(manganese violet), 프러시안 블루(Prussian blue), 울트라마린(ultramarine), 베니스 연백(venetian ceruse), 녹청(verdigris), 주색(vermilion), 및 청록색(viridian)으로 이루어진 군으로부터 선택되는 솔더 마스크 잉크. - 청구항 1에 있어서,
상기 용매는 프로필렌 글리콜 모노메틸 에테르 아세테이트, 디프로필렌 글리콜 모노메틸 에테르 아세테이트 또는 이들의 조합인 솔더 마스크 잉크. - 청구항 1에 있어서,
상기 용매의 1:1 조합은 솔더 마스크 잉크의 20 내지 35 중량%로 포함되는 솔더 마스크 잉크. - 청구항 1에 있어서,
상기 무기 안료는 금속 산화물인 솔더 마스크 잉크. - 청구항 5에 있어서,
상기 금속 산화물은 티탄의 산화물, 삼산화안티몬, 크롬 산화물, 이산화망간, 또는 납 산화물인 솔더 마스크 잉크. - 청구항 1에 있어서,
상기 수지 또는 UV 경화성 단량체는 비스페놀 A 에폭시, 노보락 에폭시, 아크릴산 변성 에폭시, 지환족- 또는 헤테로환-계 에폭시, 및 이들의 조합으로 이루어진 군으로부터 선택되고, 상기 수지는 페놀, 아민, 또는 무수물과 가교될 수 있는 솔더 마스크 잉크. - 솔더 마스크 잉크를 기판 상에 패턴으로 에어로졸 제트식 인쇄하는 단계; 및
상기 제팅(jetted)된 솔더를 경화하는 단계;를 포함하는 방법으로서,
상기 솔더 마스크 잉크는
ⅰ) 수지 또는 UV 경화성 단량체;
ⅱ) 무기 안료; 및
ⅲ) 20 내지 50 중량%의 프로필렌 글리콜 기반의 에테르 또는 에스테르 용매;를 포함하고,
상기 솔더 마스크 잉크는 25℃, 전단 속도 10 1/s에서 50 cps 내지 800 cps의 점도, 및 1 내지 1.5의 전단박화지수를 갖는 방법. - 청구항 8에 있어서,
상기 경화 단계는 열적 또는 UV 경화 단계인 방법. - 청구항 8에 있어서,
상기 무기 안료는 이산화티탄을 포함하는 방법. - 청구항 8에 있어서,
내스크래치성 4-5B 및 연필경도 5-6H를 갖는 방법.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/595,814 | 2015-01-13 | ||
| US14/595,814 US9540529B2 (en) | 2015-01-13 | 2015-01-13 | Solder mask compositions for aerosol jet printing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160087347A KR20160087347A (ko) | 2016-07-21 |
| KR102246552B1 true KR102246552B1 (ko) | 2021-04-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020160003203A Active KR102246552B1 (ko) | 2015-01-13 | 2016-01-11 | 에어로졸 제트식 인쇄용 솔더 마스크 조성물 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US9540529B2 (ko) |
| JP (1) | JP6603583B2 (ko) |
| KR (1) | KR102246552B1 (ko) |
| CN (1) | CN105785708B (ko) |
| DE (1) | DE102016200046A1 (ko) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI695657B (zh) * | 2015-03-30 | 2020-06-01 | 日商則武股份有限公司 | 柔性配線基板及其利用 |
| US10322545B1 (en) * | 2016-09-08 | 2019-06-18 | The United States Of America As Represented By The Director, National Security Agency | Measuring ink stream deposition rate of an aerosol-jet printer |
| AU2018271457B2 (en) * | 2017-05-22 | 2021-10-21 | Nippon Steel Corporation | Threaded connection for pipes or tubes and method for producing the threaded connection for pipes or tubes |
| US10577515B1 (en) * | 2018-10-02 | 2020-03-03 | Xerox Corporation | Dielectric ink composition |
| CN109575673B (zh) * | 2019-01-14 | 2020-11-17 | 四川大学 | 一种适用于3d打印的功能墨水及其制备方法 |
| DE102021110298A1 (de) * | 2021-04-22 | 2022-10-27 | Infineon Technologies Ag | Bleifreies lotmaterial, schichtstruktur, verfahren zur herstellung eines lotmaterials und verfahren zur herstellung einer schichtstruktur |
| CN115440867B (zh) * | 2022-08-22 | 2024-10-22 | 江西兆驰半导体有限公司 | 一种倒装发光二极管芯片及其制备方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020086914A1 (en) | 2000-11-09 | 2002-07-04 | 3M Innovative Properties Company | Weather resistant, ink jettable, radiation curable, fluid compositions particularly suitable for outdoor applications |
| US20070270568A1 (en) | 2005-01-12 | 2007-11-22 | Shigeru Ushiki | Curable resin composition for ink jet printer, cured product thereof, and printed wiring board using the same |
| WO2009119821A1 (ja) | 2008-03-28 | 2009-10-01 | 太陽インキ製造株式会社 | 硬化性樹脂組成物とその硬化物、およびプリント配線板 |
| US20110271870A1 (en) | 2009-01-23 | 2011-11-10 | Pentel Kabushiki Kaisha | Ink for ballpoint pens and ballpoint pen using same |
| JP2013156506A (ja) | 2012-01-31 | 2013-08-15 | Taiyo Ink Mfg Ltd | 感光性樹脂組成物及びプリント配線板 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6060214A (en) * | 1990-07-02 | 2000-05-09 | Armstrong World Industries, Inc. | Photopolymerizable, coatable plastisol |
| JP3276833B2 (ja) * | 1995-12-13 | 2002-04-22 | 太陽インキ製造株式会社 | 光硬化性・熱硬化性艶消しレジストインキ組成物 |
| AU2003238250B2 (en) * | 2002-06-14 | 2009-06-11 | Hyperion Catalysis International, Inc. | Electroconductive carbon fibril-based inks and coatings |
| JP4309225B2 (ja) * | 2003-10-14 | 2009-08-05 | 太陽インキ製造株式会社 | 硬化性組成物、その硬化物及びそれを用いたプリント配線板 |
| JP4290519B2 (ja) * | 2003-10-14 | 2009-07-08 | 太陽インキ製造株式会社 | インクジェット用カチオン硬化性組成物とその硬化物、及びそれを用いたプリント配線板 |
| WO2005090031A1 (en) * | 2004-03-11 | 2005-09-29 | Akzo Nobel Coatings International B.V. | Repair of natural damage during the production of wood-comprising articles |
| TW200613903A (en) * | 2004-05-26 | 2006-05-01 | Showa Denko Kk | Photosensitive resin composition, and cured product and use thereof |
| US20090110843A1 (en) * | 2005-08-17 | 2009-04-30 | Izhar Halahmi | Thermosetting ink formulation for ink-jet applications |
| EP1937785A1 (en) * | 2005-08-31 | 2008-07-02 | Printar Ltd. | Uv curable hybridcuring ink jet ink composition and solder mask using the same |
| US20070073008A1 (en) * | 2005-09-28 | 2007-03-29 | Cookson Singapore Pte, Ltd. | Compositions effective to suppress void formation |
| JP5425360B2 (ja) * | 2006-07-12 | 2014-02-26 | 太陽ホールディングス株式会社 | 光硬化性・熱硬化性の一液型ソルダーレジスト組成物及びそれを用いたプリント配線板 |
| JP5238342B2 (ja) * | 2008-05-07 | 2013-07-17 | 太陽ホールディングス株式会社 | プリント配線板の穴埋め用熱硬化性樹脂組成物及びそれを用いたプリント配線板 |
| JP5819619B2 (ja) * | 2010-03-19 | 2015-11-24 | 富士フイルム株式会社 | インクジェットインク、表面金属膜材料及びその製造方法、金属パターン材料及びその製造方法 |
| US8765025B2 (en) | 2010-06-09 | 2014-07-01 | Xerox Corporation | Silver nanoparticle composition comprising solvents with specific hansen solubility parameters |
| JP2014141568A (ja) * | 2013-01-23 | 2014-08-07 | Jnc Corp | 光硬化性インクジェットインクおよびその用途 |
-
2015
- 2015-01-13 US US14/595,814 patent/US9540529B2/en active Active
-
2016
- 2016-01-04 CN CN201610003930.1A patent/CN105785708B/zh active Active
- 2016-01-05 DE DE102016200046.2A patent/DE102016200046A1/de active Pending
- 2016-01-08 JP JP2016002584A patent/JP6603583B2/ja active Active
- 2016-01-11 KR KR1020160003203A patent/KR102246552B1/ko active Active
- 2016-11-01 US US15/340,896 patent/US9926455B2/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020086914A1 (en) | 2000-11-09 | 2002-07-04 | 3M Innovative Properties Company | Weather resistant, ink jettable, radiation curable, fluid compositions particularly suitable for outdoor applications |
| US20070270568A1 (en) | 2005-01-12 | 2007-11-22 | Shigeru Ushiki | Curable resin composition for ink jet printer, cured product thereof, and printed wiring board using the same |
| WO2009119821A1 (ja) | 2008-03-28 | 2009-10-01 | 太陽インキ製造株式会社 | 硬化性樹脂組成物とその硬化物、およびプリント配線板 |
| US20110271870A1 (en) | 2009-01-23 | 2011-11-10 | Pentel Kabushiki Kaisha | Ink for ballpoint pens and ballpoint pen using same |
| JP2013156506A (ja) | 2012-01-31 | 2013-08-15 | Taiyo Ink Mfg Ltd | 感光性樹脂組成物及びプリント配線板 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20170044388A1 (en) | 2017-02-16 |
| US20160200927A1 (en) | 2016-07-14 |
| KR20160087347A (ko) | 2016-07-21 |
| US9926455B2 (en) | 2018-03-27 |
| CN105785708B (zh) | 2019-07-26 |
| CN105785708A (zh) | 2016-07-20 |
| JP2016130311A (ja) | 2016-07-21 |
| US9540529B2 (en) | 2017-01-10 |
| JP6603583B2 (ja) | 2019-11-06 |
| DE102016200046A1 (de) | 2016-07-14 |
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