KR102236810B1 - 크로매틱 공초점 계측의 속도 향상 장치 및 방법 - Google Patents

크로매틱 공초점 계측의 속도 향상 장치 및 방법 Download PDF

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KR102236810B1
KR102236810B1 KR1020197009858A KR20197009858A KR102236810B1 KR 102236810 B1 KR102236810 B1 KR 102236810B1 KR 1020197009858 A KR1020197009858 A KR 1020197009858A KR 20197009858 A KR20197009858 A KR 20197009858A KR 102236810 B1 KR102236810 B1 KR 102236810B1
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white light
wafer
sensors
sensor body
rows
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KR20190040356A (ko
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폴 혼
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케이엘에이 코포레이션
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G01J2003/282—Modified CCD or like
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0638—Refractive parts
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/08—Optical fibres; light guides
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Polarising Elements (AREA)
KR1020197009858A 2016-09-07 2017-09-06 크로매틱 공초점 계측의 속도 향상 장치 및 방법 Active KR102236810B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201662384324P 2016-09-07 2016-09-07
US62/384,324 2016-09-07
US15/690,969 US10317344B2 (en) 2016-09-07 2017-08-30 Speed enhancement of chromatic confocal metrology
US15/690,969 2017-08-30
PCT/US2017/050326 WO2018048938A1 (en) 2016-09-07 2017-09-06 Speed enhancement of chromatic confocal metrology

Publications (2)

Publication Number Publication Date
KR20190040356A KR20190040356A (ko) 2019-04-17
KR102236810B1 true KR102236810B1 (ko) 2021-04-08

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KR1020197009858A Active KR102236810B1 (ko) 2016-09-07 2017-09-06 크로매틱 공초점 계측의 속도 향상 장치 및 방법

Country Status (6)

Country Link
US (1) US10317344B2 (enExample)
EP (1) EP3510350A4 (enExample)
JP (2) JP2019529895A (enExample)
KR (1) KR102236810B1 (enExample)
CN (1) CN109690238B (enExample)
WO (1) WO2018048938A1 (enExample)

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US11441893B2 (en) * 2018-04-27 2022-09-13 Kla Corporation Multi-spot analysis system with multiple optical probes
USD923121S1 (en) * 2019-08-23 2021-06-22 Air Box Co., Ltd. Exercise mat combined hammock
EP4211726A4 (en) * 2020-09-08 2024-11-27 Massachusetts Institute Of Technology PREDICTION OF SEMICONDUCTOR DEVICE PERFORMANCE
US11899375B2 (en) 2020-11-20 2024-02-13 Kla Corporation Massive overlay metrology sampling with multiple measurement columns
FR3118175B1 (fr) * 2020-12-18 2025-05-30 Unity Semiconductor Procede d’inspection d’une surface d’un objet
JP7532288B2 (ja) * 2021-03-04 2024-08-13 キオクシア株式会社 検査結果分析装置および検査結果分析プログラム

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CN101588209A (zh) 2008-05-23 2009-11-25 中兴通讯股份有限公司 一种自适应色散补偿方法
CN106931911A (zh) 2017-04-01 2017-07-07 浙江协同光电科技有限公司 白光光谱共焦线扫描装置

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US6552803B1 (en) 1998-02-24 2003-04-22 Kla-Tencor Corporation Detection of film thickness through induced acoustic pulse-echos
US6248988B1 (en) * 1998-05-05 2001-06-19 Kla-Tencor Corporation Conventional and confocal multi-spot scanning optical microscope
US6636310B1 (en) * 1998-05-12 2003-10-21 Metroptic Technologies, Ltd. Wavelength-dependent surface contour measurement system and method
WO2001037025A1 (en) * 1999-11-16 2001-05-25 Agilent Technologies, Inc. Confocal imaging
JP3726028B2 (ja) * 2001-03-30 2005-12-14 住友重機械工業株式会社 ３次元形状計測装置
JP3210654B1 (ja) 2001-05-02 2001-09-17 レーザーテック株式会社 光学式走査装置及び欠陥検出装置
US6917421B1 (en) 2001-10-12 2005-07-12 Kla-Tencor Technologies Corp. Systems and methods for multi-dimensional inspection and/or metrology of a specimen
IL146174A (en) 2001-10-25 2007-08-19 Camtek Ltd Confocal system for testing woofers
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TWI432698B (zh) 2006-07-11 2014-04-01 Camtek Ltd 用於探針標記分析之系統及方法
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EP0240000A2 (en) 1986-04-02 1987-10-07 Hewlett-Packard Company Apparatus for separating electromagnetic waves
CN101588209A (zh) 2008-05-23 2009-11-25 中兴通讯股份有限公司 一种自适应色散补偿方法
CN106931911A (zh) 2017-04-01 2017-07-07 浙江协同光电科技有限公司 白光光谱共焦线扫描装置

Also Published As

Publication number Publication date
US10317344B2 (en) 2019-06-11
EP3510350A4 (en) 2020-03-18
CN109690238A (zh) 2019-04-26
CN109690238B (zh) 2020-11-06
KR20190040356A (ko) 2019-04-17
US20180067058A1 (en) 2018-03-08
EP3510350A1 (en) 2019-07-17
JP2022081498A (ja) 2022-05-31
JP2019529895A (ja) 2019-10-17
WO2018048938A1 (en) 2018-03-15

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