JP2019529895A - クロマティック共焦点計量の速度向上 - Google Patents

クロマティック共焦点計量の速度向上 Download PDF

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Publication number
JP2019529895A
JP2019529895A JP2019512871A JP2019512871A JP2019529895A JP 2019529895 A JP2019529895 A JP 2019529895A JP 2019512871 A JP2019512871 A JP 2019512871A JP 2019512871 A JP2019512871 A JP 2019512871A JP 2019529895 A JP2019529895 A JP 2019529895A
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Japan
Prior art keywords
white light
wafer
sensors
sensor body
lenses
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Pending
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JP2019512871A
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English (en)
Japanese (ja)
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JP2019529895A5 (enExample
Inventor
パウル ホルン
パウル ホルン
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KLA Corp
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KLA Corp
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Application filed by KLA Corp filed Critical KLA Corp
Publication of JP2019529895A publication Critical patent/JP2019529895A/ja
Publication of JP2019529895A5 publication Critical patent/JP2019529895A5/ja
Priority to JP2022022585A priority Critical patent/JP2022081498A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/2803—Investigating the spectrum using photoelectric array detector
    • G01J2003/282—Modified CCD or like
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/063—Illuminating optical parts
    • G01N2201/0638—Refractive parts
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/08—Optical fibres; light guides
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Polarising Elements (AREA)
JP2019512871A 2016-09-07 2017-09-06 クロマティック共焦点計量の速度向上 Pending JP2019529895A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022022585A JP2022081498A (ja) 2016-09-07 2022-02-17 高さ計測装置及び方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201662384324P 2016-09-07 2016-09-07
US62/384,324 2016-09-07
US15/690,969 US10317344B2 (en) 2016-09-07 2017-08-30 Speed enhancement of chromatic confocal metrology
US15/690,969 2017-08-30
PCT/US2017/050326 WO2018048938A1 (en) 2016-09-07 2017-09-06 Speed enhancement of chromatic confocal metrology

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022022585A Division JP2022081498A (ja) 2016-09-07 2022-02-17 高さ計測装置及び方法

Publications (2)

Publication Number Publication Date
JP2019529895A true JP2019529895A (ja) 2019-10-17
JP2019529895A5 JP2019529895A5 (enExample) 2020-10-15

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
JP2019512871A Pending JP2019529895A (ja) 2016-09-07 2017-09-06 クロマティック共焦点計量の速度向上
JP2022022585A Pending JP2022081498A (ja) 2016-09-07 2022-02-17 高さ計測装置及び方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022022585A Pending JP2022081498A (ja) 2016-09-07 2022-02-17 高さ計測装置及び方法

Country Status (6)

Country Link
US (1) US10317344B2 (enExample)
EP (1) EP3510350A4 (enExample)
JP (2) JP2019529895A (enExample)
KR (1) KR102236810B1 (enExample)
CN (1) CN109690238B (enExample)
WO (1) WO2018048938A1 (enExample)

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US11441893B2 (en) * 2018-04-27 2022-09-13 Kla Corporation Multi-spot analysis system with multiple optical probes
USD923121S1 (en) * 2019-08-23 2021-06-22 Air Box Co., Ltd. Exercise mat combined hammock
EP4211726A4 (en) * 2020-09-08 2024-11-27 Massachusetts Institute Of Technology PREDICTION OF SEMICONDUCTOR DEVICE PERFORMANCE
US11899375B2 (en) 2020-11-20 2024-02-13 Kla Corporation Massive overlay metrology sampling with multiple measurement columns
FR3118175B1 (fr) * 2020-12-18 2025-05-30 Unity Semiconductor Procede d’inspection d’une surface d’un objet
JP7532288B2 (ja) * 2021-03-04 2024-08-13 キオクシア株式会社 検査結果分析装置および検査結果分析プログラム

Citations (4)

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JP2002296018A (ja) * 2001-03-30 2002-10-09 Sumitomo Heavy Ind Ltd ３次元形状計測装置
US20090225399A1 (en) * 2008-03-04 2009-09-10 Kla-Tencor Corporation Multi-spot scanning system and method
JP2011017552A (ja) * 2009-07-07 2011-01-27 Oputouea Kk 多点変位検出装置
US20120019821A1 (en) * 2010-07-23 2012-01-26 National Taipei University Of Technology Linear chromatic confocal microscopic system

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US4844617A (en) * 1988-01-20 1989-07-04 Tencor Instruments Confocal measuring microscope with automatic focusing
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US6248988B1 (en) * 1998-05-05 2001-06-19 Kla-Tencor Corporation Conventional and confocal multi-spot scanning optical microscope
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JP3210654B1 (ja) 2001-05-02 2001-09-17 レーザーテック株式会社 光学式走査装置及び欠陥検出装置
US6917421B1 (en) 2001-10-12 2005-07-12 Kla-Tencor Technologies Corp. Systems and methods for multi-dimensional inspection and/or metrology of a specimen
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KR100807218B1 (ko) * 2007-02-02 2008-02-28 삼성전자주식회사 웨이퍼 검사 장치 및 방법
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JP2002296018A (ja) * 2001-03-30 2002-10-09 Sumitomo Heavy Ind Ltd ３次元形状計測装置
US20090225399A1 (en) * 2008-03-04 2009-09-10 Kla-Tencor Corporation Multi-spot scanning system and method
JP2011017552A (ja) * 2009-07-07 2011-01-27 Oputouea Kk 多点変位検出装置
US20120019821A1 (en) * 2010-07-23 2012-01-26 National Taipei University Of Technology Linear chromatic confocal microscopic system

Also Published As

Publication number Publication date
US10317344B2 (en) 2019-06-11
EP3510350A4 (en) 2020-03-18
CN109690238A (zh) 2019-04-26
KR102236810B1 (ko) 2021-04-08
CN109690238B (zh) 2020-11-06
KR20190040356A (ko) 2019-04-17
US20180067058A1 (en) 2018-03-08
EP3510350A1 (en) 2019-07-17
JP2022081498A (ja) 2022-05-31
WO2018048938A1 (en) 2018-03-15

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