KR102228630B1 - 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물 - Google Patents

카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물 Download PDF

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Publication number
KR102228630B1
KR102228630B1 KR1020180171703A KR20180171703A KR102228630B1 KR 102228630 B1 KR102228630 B1 KR 102228630B1 KR 1020180171703 A KR1020180171703 A KR 1020180171703A KR 20180171703 A KR20180171703 A KR 20180171703A KR 102228630 B1 KR102228630 B1 KR 102228630B1
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KR
South Korea
Prior art keywords
photoresist composition
butyl
meth
hexyl
pentyl
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KR1020180171703A
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English (en)
Korean (ko)
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KR20200081810A (ko
Inventor
이원중
이득락
오천림
신승림
전근
안경룡
박활기
Original Assignee
주식회사 삼양사
한국화학연구원
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Application filed by 주식회사 삼양사, 한국화학연구원 filed Critical 주식회사 삼양사
Priority to KR1020180171703A priority Critical patent/KR102228630B1/ko
Priority to TW108148093A priority patent/TWI723705B/zh
Priority to PCT/KR2019/018657 priority patent/WO2020139042A2/ko
Priority to CN201980086476.2A priority patent/CN113227050B/zh
Priority to JP2021538079A priority patent/JP7263522B2/ja
Publication of KR20200081810A publication Critical patent/KR20200081810A/ko
Application granted granted Critical
Publication of KR102228630B1 publication Critical patent/KR102228630B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Structural Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Indole Compounds (AREA)
  • Optical Filters (AREA)
  • Plural Heterocyclic Compounds (AREA)
KR1020180171703A 2018-12-28 2018-12-28 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물 KR102228630B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020180171703A KR102228630B1 (ko) 2018-12-28 2018-12-28 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물
TW108148093A TWI723705B (zh) 2018-12-28 2019-12-27 咔唑多β-肟酯衍生化合物以及包含其之光聚合起始劑及光阻組成物
PCT/KR2019/018657 WO2020139042A2 (ko) 2018-12-28 2019-12-27 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물
CN201980086476.2A CN113227050B (zh) 2018-12-28 2019-12-27 咔唑多β-肟酯衍生化合物以及包含该咔唑多β-肟酯衍生化合物的光聚合引发剂及光刻胶组合物
JP2021538079A JP7263522B2 (ja) 2018-12-28 2019-12-27 カルバゾールマルチβ－オキシムエステル誘導体化合物、それを含む光重合開始剤、及びフォトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020180171703A KR102228630B1 (ko) 2018-12-28 2018-12-28 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물

Publications (2)

Publication Number Publication Date
KR20200081810A KR20200081810A (ko) 2020-07-08
KR102228630B1 true KR102228630B1 (ko) 2021-03-16

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KR1020180171703A KR102228630B1 (ko) 2018-12-28 2018-12-28 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물

Country Status (5)

Country Link
JP (1) JP7263522B2 (ja)
KR (1) KR102228630B1 (ja)
CN (1) CN113227050B (ja)
TW (1) TWI723705B (ja)
WO (1) WO2020139042A2 (ja)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115704994A (zh) * 2021-08-13 2023-02-17 达兴材料股份有限公司 感光性树脂组合物及其用途、显示设备、和半导体装置
JP7267533B1 (ja) 2022-04-20 2023-05-02 東洋インキＳｃホールディングス株式会社 感光性組成物、光学フィルタ、画像表示装置、及び固体撮像素子
JP7274078B1 (ja) 2022-04-20 2023-05-16 東洋インキＳｃホールディングス株式会社 感光性着色組成物、及びその用途
JP7267532B1 (ja) 2022-04-20 2023-05-02 東洋インキＳｃホールディングス株式会社 感光性組成物、光学フィルタ、画像表示装置、及び固体撮像素子
CN117348340A (zh) * 2022-06-24 2024-01-05 常州强力先端电子材料有限公司 负型感光性树脂组合物、固化膜及其制备方法、el元件和显示装置
CN117510396A (zh) * 2022-07-27 2024-02-06 常州强力电子新材料股份有限公司 肟酯光引发剂、其制备方法及应用

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WO2002100903A1 (en) 2001-06-11 2002-12-19 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators having a combined structure
TW200714651A (en) 2002-10-28 2007-04-16 Mitsubishi Chem Corp Photopolymerization composition and color filter using the same
JP4484482B2 (ja) * 2003-09-25 2010-06-16 東洋インキ製造株式会社 感光性着色組成物およびカラーフィルタ
JP4736328B2 (ja) 2004-02-09 2011-07-27 コニカミノルタホールディングス株式会社 インクジェット記録方法
JP4631594B2 (ja) * 2005-08-16 2011-02-16 Ｊｓｒ株式会社 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル
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JP5117397B2 (ja) 2005-12-20 2013-01-16 チバ ホールディング インコーポレーテッド オキシムエステル光開始剤
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CN103833872B (zh) 2014-03-18 2016-04-06 常州强力先端电子材料有限公司 一种双肟酯类光引发剂及其制备方法和应用
JP6762739B2 (ja) 2016-03-17 2020-09-30 株式会社Ｄｎｐファインケミカル カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、表示装置
TWI635079B (zh) * 2016-07-08 2018-09-11 韓國化學研究院 高敏感肟酯光聚合起始劑以及包含該起始劑的光聚合組合物

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Also Published As

Publication number Publication date
TWI723705B (zh) 2021-04-01
JP2022515524A (ja) 2022-02-18
TW202039432A (zh) 2020-11-01
KR20200081810A (ko) 2020-07-08
WO2020139042A3 (ko) 2020-08-20
WO2020139042A2 (ko) 2020-07-02
CN113227050A (zh) 2021-08-06
JP7263522B2 (ja) 2023-04-24
CN113227050B (zh) 2024-03-12

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