KR102160070B1 - 근자외선 발광 소자 - Google Patents
근자외선 발광 소자 Download PDFInfo
- Publication number
- KR102160070B1 KR102160070B1 KR1020130128201A KR20130128201A KR102160070B1 KR 102160070 B1 KR102160070 B1 KR 102160070B1 KR 1020130128201 A KR1020130128201 A KR 1020130128201A KR 20130128201 A KR20130128201 A KR 20130128201A KR 102160070 B1 KR102160070 B1 KR 102160070B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- type contact
- algan
- emitting device
- light emitting
- Prior art date
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- 229910002704 AlGaN Inorganic materials 0.000 claims abstract description 79
- 230000004888 barrier function Effects 0.000 claims description 64
- 229910002601 GaN Inorganic materials 0.000 claims description 34
- 239000012535 impurity Substances 0.000 claims description 27
- 230000002265 prevention Effects 0.000 claims description 22
- 238000002347 injection Methods 0.000 claims description 18
- 239000007924 injection Substances 0.000 claims description 18
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 claims description 15
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- RNQKDQAVIXDKAG-UHFFFAOYSA-N aluminum gallium Chemical compound [Al].[Ga] RNQKDQAVIXDKAG-UHFFFAOYSA-N 0.000 claims description 5
- 238000000034 method Methods 0.000 claims 16
- 230000006798 recombination Effects 0.000 abstract description 8
- 238000005215 recombination Methods 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 415
- 239000013078 crystal Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 13
- 239000004065 semiconductor Substances 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 239000007789 gas Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 230000003111 delayed effect Effects 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 229910052733 gallium Inorganic materials 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229910052594 sapphire Inorganic materials 0.000 description 3
- 239000010980 sapphire Substances 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- -1 InGaN Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
- H01L33/145—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure with a current-blocking structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
- H01L33/32—Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020130128201A KR102160070B1 (ko) | 2013-10-28 | 2013-10-28 | 근자외선 발광 소자 |
US14/526,110 US9312447B2 (en) | 2012-03-29 | 2014-10-28 | Near UV light emitting device |
CN201410587650.0A CN104576855B (zh) | 2013-10-28 | 2014-10-28 | 近紫外光发射装置 |
CN201420631593.7U CN204179101U (zh) | 2013-10-28 | 2014-10-28 | 近紫外光发射装置 |
US15/096,252 US10164150B2 (en) | 2012-03-29 | 2016-04-11 | Near UV light emitting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020130128201A KR102160070B1 (ko) | 2013-10-28 | 2013-10-28 | 근자외선 발광 소자 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20150048337A KR20150048337A (ko) | 2015-05-07 |
KR102160070B1 true KR102160070B1 (ko) | 2020-09-25 |
Family
ID=52567886
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020130128201A KR102160070B1 (ko) | 2012-03-29 | 2013-10-28 | 근자외선 발광 소자 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR102160070B1 (zh) |
CN (2) | CN104576855B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105914273B (zh) * | 2016-05-09 | 2018-07-31 | 华灿光电(苏州)有限公司 | 一种红黄光发光二极管外延片及其制备方法 |
CN115101641A (zh) * | 2016-06-24 | 2022-09-23 | 苏州立琻半导体有限公司 | 半导体器件和包括半导体器件的半导体器件封装 |
CN109360879A (zh) * | 2018-11-27 | 2019-02-19 | 华灿光电(浙江)有限公司 | 一种发光二极管的外延片及其制备方法 |
CN109768130A (zh) * | 2018-12-28 | 2019-05-17 | 华灿光电(浙江)有限公司 | 一种氮化镓基发光二极管外延片及其制作方法 |
CN111816742A (zh) * | 2020-07-27 | 2020-10-23 | 中国科学院半导体研究所 | 用于可见光通信的GaN基LED外延结构及其制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001148507A (ja) | 1999-03-29 | 2001-05-29 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
JP2003115642A (ja) | 2001-03-28 | 2003-04-18 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3599841B2 (ja) * | 1995-08-24 | 2004-12-08 | 三洋電機株式会社 | 半導体レーザ素子 |
JP3366188B2 (ja) * | 1996-05-21 | 2003-01-14 | 日亜化学工業株式会社 | 窒化物半導体素子 |
CN1112087C (zh) * | 1996-11-19 | 2003-06-18 | 洛氏两合公司里塔尔工厂 | 带有装配板的开关柜 |
JP4032636B2 (ja) * | 1999-12-13 | 2008-01-16 | 日亜化学工業株式会社 | 発光素子 |
EP1453160B1 (en) * | 2001-11-05 | 2008-02-27 | Nichia Corporation | Semiconductor element |
JP5641173B2 (ja) * | 2009-02-27 | 2014-12-17 | 独立行政法人理化学研究所 | 光半導体素子及びその製造方法 |
KR20130013968A (ko) * | 2011-07-29 | 2013-02-06 | 엘지이노텍 주식회사 | 발광소자 |
US9224913B2 (en) * | 2012-03-29 | 2015-12-29 | Seoul Viosys Co., Ltd. | Near UV light emitting device |
KR101997020B1 (ko) * | 2012-03-29 | 2019-07-08 | 서울바이오시스 주식회사 | 근자외선 발광 소자 |
-
2013
- 2013-10-28 KR KR1020130128201A patent/KR102160070B1/ko active IP Right Grant
-
2014
- 2014-10-28 CN CN201410587650.0A patent/CN104576855B/zh active Active
- 2014-10-28 CN CN201420631593.7U patent/CN204179101U/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001148507A (ja) | 1999-03-29 | 2001-05-29 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
JP2003115642A (ja) | 2001-03-28 | 2003-04-18 | Nichia Chem Ind Ltd | 窒化物半導体素子 |
Also Published As
Publication number | Publication date |
---|---|
CN204179101U (zh) | 2015-02-25 |
CN104576855A (zh) | 2015-04-29 |
KR20150048337A (ko) | 2015-05-07 |
CN104576855B (zh) | 2018-04-13 |
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