KR102132051B1 - 기판 처리 장치 - Google Patents

기판 처리 장치 Download PDF

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Publication number
KR102132051B1
KR102132051B1 KR1020157012879A KR20157012879A KR102132051B1 KR 102132051 B1 KR102132051 B1 KR 102132051B1 KR 1020157012879 A KR1020157012879 A KR 1020157012879A KR 20157012879 A KR20157012879 A KR 20157012879A KR 102132051 B1 KR102132051 B1 KR 102132051B1
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KR
South Korea
Prior art keywords
substrate
heater
wafer
holding means
temperature
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KR1020157012879A
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English (en)
Korean (ko)
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KR20150070354A (ko
Inventor
아키오 하시즈메
다카시 오타
Original Assignee
가부시키가이샤 스크린 홀딩스
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Publication of KR20150070354A publication Critical patent/KR20150070354A/ko
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    • H01L21/324—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/286—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials
    • H10P50/287—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials by chemical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1015—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • H01L21/31133—
    • H01L21/67017—
    • H01L21/67098—
    • H01L21/67109—
    • H01L21/6715—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020157012879A 2012-10-16 2013-08-29 기판 처리 장치 Active KR102132051B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2012-229139 2012-10-16
JP2012229139A JP6168273B2 (ja) 2012-10-16 2012-10-16 基板処理装置および基板処理方法
PCT/JP2013/073195 WO2014061353A1 (ja) 2012-10-16 2013-08-29 基板処理装置

Publications (2)

Publication Number Publication Date
KR20150070354A KR20150070354A (ko) 2015-06-24
KR102132051B1 true KR102132051B1 (ko) 2020-07-08

Family

ID=50487930

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157012879A Active KR102132051B1 (ko) 2012-10-16 2013-08-29 기판 처리 장치

Country Status (5)

Country Link
US (2) US20150258582A1 (https=)
JP (1) JP6168273B2 (https=)
KR (1) KR102132051B1 (https=)
TW (1) TWI508793B (https=)
WO (1) WO2014061353A1 (https=)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6271304B2 (ja) * 2013-03-29 2018-01-31 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法
KR102229786B1 (ko) * 2014-05-26 2021-03-19 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
KR101919122B1 (ko) * 2014-08-12 2018-11-15 주식회사 제우스 공정 분리형 기판 처리장치 및 처리방법
KR102343226B1 (ko) * 2014-09-04 2021-12-23 삼성전자주식회사 스팟 히터 및 이를 이용한 웨이퍼 클리닝 장치
JP6742708B2 (ja) * 2015-09-29 2020-08-19 芝浦メカトロニクス株式会社 基板処理方法
JP6586697B2 (ja) * 2015-12-25 2019-10-09 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP6689719B2 (ja) * 2016-09-23 2020-04-28 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
SG11201908117VA (en) 2017-03-06 2019-10-30 Acm Research Shanghai Inc Apparatus for cleaning semiconductor substrates
JP6945314B2 (ja) * 2017-03-24 2021-10-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6967922B2 (ja) * 2017-09-22 2021-11-17 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
KR102030068B1 (ko) 2017-10-12 2019-10-08 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
JP7004579B2 (ja) * 2018-01-15 2022-01-21 東京エレクトロン株式会社 基板処理装置、基板処理方法および記憶媒体
JP7263078B2 (ja) * 2018-09-27 2023-04-24 東京エレクトロン株式会社 基板処理装置および基板処理方法
GB201901637D0 (en) * 2019-02-06 2019-03-27 Lam Res Ag Apparatus for processing a wafer, and method of controlling such an apparatus
KR102188261B1 (ko) * 2019-08-02 2020-12-09 세미기어, 인코포레이션 기판 냉각 장치 및 방법
KR102395805B1 (ko) * 2019-08-26 2022-05-11 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
JP6886546B2 (ja) * 2020-05-12 2021-06-16 芝浦メカトロニクス株式会社 基板処理装置
US20220390840A1 (en) * 2021-06-03 2022-12-08 Mks Instruments, Inc. Light-Enhanced Ozone Wafer Processing System and Method of Use
KR102577853B1 (ko) * 2021-06-22 2023-09-13 티오에스주식회사 기판 처리 장비용 고토크형 매뉴퓰레이터
KR20230102300A (ko) * 2021-12-30 2023-07-07 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
JP7826058B2 (ja) * 2022-02-28 2026-03-09 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および処理カップ洗浄方法
JP7778016B2 (ja) * 2022-03-23 2025-12-01 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Citations (2)

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JP2005217226A (ja) * 2004-01-30 2005-08-11 Matsushita Electric Ind Co Ltd 半導体基板の洗浄方法及び洗浄装置
JP2012156264A (ja) * 2011-01-25 2012-08-16 Tokyo Electron Ltd 液処理装置および液処理方法

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US20020096196A1 (en) * 2001-01-23 2002-07-25 Takayuki Toshima Substrate processing apparatus and substrate processing method
JP3837026B2 (ja) * 2001-01-23 2006-10-25 東京エレクトロン株式会社 基板洗浄装置及び基板洗浄方法
JP2005277268A (ja) * 2004-03-26 2005-10-06 Dainippon Screen Mfg Co Ltd 基板処理装置及び基板処理方法
TWI343840B (en) * 2005-07-06 2011-06-21 Applied Materials Inc Apparatus for electroless deposition of metals onto semiconductor substrates
US7914626B2 (en) * 2005-11-24 2011-03-29 Tokyo Electron Limited Liquid processing method and liquid processing apparatus
JP2007173432A (ja) * 2005-12-21 2007-07-05 Seiko Epson Corp 半導体基板処理装置及び半導体装置の製造方法
JP4787089B2 (ja) 2006-06-26 2011-10-05 大日本スクリーン製造株式会社 基板処理方法および基板処理装置
US20130087309A1 (en) * 2011-10-11 2013-04-11 Applied Materials, Inc. Substrate support with temperature control
JP6317547B2 (ja) * 2012-08-28 2018-04-25 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005217226A (ja) * 2004-01-30 2005-08-11 Matsushita Electric Ind Co Ltd 半導体基板の洗浄方法及び洗浄装置
JP2012156264A (ja) * 2011-01-25 2012-08-16 Tokyo Electron Ltd 液処理装置および液処理方法

Also Published As

Publication number Publication date
JP6168273B2 (ja) 2017-07-26
JP2014082318A (ja) 2014-05-08
US20170117160A1 (en) 2017-04-27
TW201420212A (zh) 2014-06-01
TWI508793B (zh) 2015-11-21
US10497581B2 (en) 2019-12-03
WO2014061353A1 (ja) 2014-04-24
KR20150070354A (ko) 2015-06-24
US20150258582A1 (en) 2015-09-17

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