KR102090459B1 - Cleaning apparatus for substrate - Google Patents

Abstract

The present invention relates to a substrate cleaning apparatus, and more particularly, to a dry cleaning apparatus for cleaning a substrate by spraying a cleaning gas in a tornado form to the substrate.
A feature of the present invention is to provide a rotary induction structure that rotates by thrust of the cleaning gas supplied from the pressurized flow path between the pressurized flow path and the discharge portion of the dry cleaning device, and sprays through the discharge portion by rotation of the rotary induction structure. Since the cleaning gas discharged to the outside of the nozzle is sprayed in a tornado type, foreign substances remaining on the substrate can be more easily removed, and the substrate can be cleaned through a very strong cleaning power.
In addition, it is possible to easily remove foreign substances remaining on the substrate even at a low injection flow rate, thereby preventing damage to the surface of the substrate due to the high injection flow rate.
In addition, since a separate drying process is not required after the cleaning process, it is possible to shorten the process time and reduce the process cost, thereby improving the efficiency of the process. It is possible to prevent occurrence of damage to the surface of the substrate.

Description

Cleaning apparatus for substrate

The present invention relates to a substrate cleaning apparatus, and more particularly, to a dry cleaning apparatus for cleaning a substrate by spraying a cleaning gas in a tornado form to the substrate.

In recent years, as the society has entered a full-fledged information age, the display field for processing and displaying a large amount of information has rapidly developed, and in response, various various flat panel display devices have been developed and attracting attention.

Specific examples of such a flat panel display device include a liquid crystal display device (LCD), a plasma display panel device (PDP), a field emission display device (FED), and an electroluminescent display device (Electroluminescence display device: ELD), organic light emitting diodes (OLED), and the like. These flat panel display devices show excellent performance of thinning, lightening, and low power consumption. Conventional cathode ray tube (CRT) ) Is quickly replacing it.

Meanwhile, in the manufacturing process of the flat panel display device, a thin film deposition process of forming a thin film layer of a predetermined material on a substrate surface, a photo lithography process of exposing a selected portion of the thin film, and removing the exposed portion of the thin film The etching process of patterning in a desired shape is repeatedly included, and in addition, numerous processes such as cleaning and cutting are involved.

The double cleaning process is an important process that is essential for reducing reliability as well as improving the reliability of other processes, and it occupies more than 30% of the entire manufacturing process of flat panel display devices. In the case of considering the cost reduction aspect due to the reduction of defects, the importance is gradually increasing.

In addition, the substrate cleaning process adopts a so-called in-line method, which is usually performed simultaneously with the transfer of the substrate, to save time and money, and the inline method is an IPA (Isopropyl Alcohol) or DI (Deionized) cleaning solution. Is sprayed onto the substrate for cleaning.

However, the wet cleaning method, which removes foreign substances on the substrate by spraying IPA (Isopropyl Alcohol) or DI (Deionized) cleaning solution, is required to proceed with the drying process after cleaning. This causes problems such as surface damage of the product due to the cleaning liquid.

In view of these problems, recently, research on the dry cleaning method has been actively conducted to clean the surface of the substrate by physically colliding high-pressure CDA, which has the effect of convenience or low cost, on the contaminated surface compared to the wet cleaning method. Is going on.

In particular, the dry cleaning method has an excellent effect for cleaning the microcircuit.

However, the dry cleaning method of spraying high pressure CDA is also not effective to remove foreign substances on the substrate. Therefore, uncleaned foreign substances remain on the substrate, and the residual foreign substances cause product defects in a subsequent process.

The present invention is to solve the above problems, and an object of the present invention is to further improve the cleaning power of the substrate cleaning process of the flat panel display device.

In order to achieve the above object, the present invention is a substrate; It is located on the substrate, and includes a dry cleaning device including a plurality of injection nozzles having a rotation inducing structure at the discharge port, and the cleaning gas has a rotational force by rotation of the rotation induction structure and has the substrate through the discharge port. Provided is a substrate cleaning apparatus that is blown upward and applies a blow to the top and side surfaces of a foreign object remaining on the substrate.

At this time, the injection nozzle is defined as a fastening part and an injection part, and the injection part receives the cleaning gas, the discharge port for discharging the cleaning gas to the outside, and the cleaning gas from the inlet toward the discharge port. It consists of a pressurized flow path to be supplied, and the pressurized flow path is formed with a narrower width than the inlet along the inner edge of the injection nozzle, and the rotary induction structure is located between the pressurized flow path and the outlet, and the rotary induction The structure is composed of a disc portion and a plurality of guide blocks provided on one side of the disc portion and disposed radially, and between the guide blocks is fixed at an angle in a clockwise or counterclockwise direction based on one direction toward the center of the disc portion. Air slits that incline to induce the cleaning gas to the outside of the rotating induction structure It is formed.

In addition, the dry cleaning device has a bar shape, a supply path through which the cleaning gas is supplied, and an injection port through which the cleaning gas is supplied from the outside through the supply path, and the injection nozzle is through the fastening part. It is mounted on the supply path, and the injection portion is angled from 30 to 90 degrees from the fastening portion.

At this time, the cleaning gas is made of one selected from nitrogen (N2) gas or CDA (clean dry air), and is made by mixing with carbon dioxide (CO2) or argon (Ar) gas.

As described above, according to the present invention, a rotary induction structure rotated by thrust of the cleaning gas supplied from the pressurized flow path between the pressurized flow path and the discharge portion of the dry cleaning apparatus is provided, and the rotational induction structure is rotated. By allowing the cleaning gas discharged to the outside of the injection nozzle through the discharge portion to be sprayed in a tornado type, foreign substances remaining on the substrate can be more easily removed, thereby cleaning the substrate through a very strong cleaning power.

In addition, it is possible to easily remove foreign substances remaining on the substrate even at a low injection flow rate, thereby preventing the surface damage of the substrate from being caused by the high injection flow rate.

In addition, since there is no need for a separate drying process after the cleaning process, it is possible to shorten the process time and reduce the process cost, thereby improving the efficiency of the process. There is an effect that can prevent the damage to the surface of the substrate caused by the chemical cleaning solution.

1 is a flow chart showing the manufacturing process of a flat panel display step by step.
Figure 2 is a perspective view schematically showing the structure of a dry cleaning device according to an embodiment of the present invention.
Figure 3a is a perspective view schematically showing the tornado injection nozzle of Figure 2;
Figure 3b is an exploded perspective view of Figure 3a.
Figure 3c is a cross-sectional view of Figure 3a.
Figure 4 is a perspective view schematically showing the rotation induction structure.
5A to 5B are cross-sectional views schematically illustrating a state in which foreign substances on a substrate, which is an object to be treated by a cleaning gas injected in a tornado type, are removed through an injection nozzle of a dry cleaning apparatus according to an embodiment of the present invention.
6A to 6B are photographs of the substrate surface after performing the dry cleaning process by spraying the cleaning gas at the same 3 m / s injection flow rate through Sample 1 and Sample 2.

Hereinafter, embodiments according to the present invention will be described in detail with reference to the drawings.

1 is a flowchart showing the manufacturing process of a flat panel display device step by step. Among the flat panel display devices, the contrast ratio is large, suitable for moving picture display, and has low power consumption, and is used in various fields such as laptops, monitors, and TVs. The liquid crystal display device being used will be described as an example.

The liquid crystal display device first performs a TFT-LCD cell process (St10), and forms a liquid crystal cell through the cell process (St10).

Looking at this in more detail, the TFT-LCD cell process (St10) largely consists of forming a color filter substrate and an array substrate (St11), forming an alignment layer (St12), forming failure turns and spacers (St13), injecting liquid crystal (St14), and bonding ( St15), cutting (St17), and inspection process (St17).

Accordingly, the first step (St11) of the TFT-LCD cell process (St10) is a step of forming an upper substrate as a color filter substrate and a lower substrate as an array substrate, respectively.

At this time, a plurality of gate lines and data lines are intersected on the inner surface of the array substrate, and pixels are defined, and thin film transistors (TFTs) are provided at each intersection to correspond one-to-one with the transparent pixel electrodes formed on each pixel. Connected.

In addition, as an example corresponding to each pixel on the inner surface of the color filter substrate, there are red (R), green (G), and blue (B) color filters, and each of them has a gate line, a data line, and a thin film transistor. A black matrix is provided to cover non-display elements such as, and a transparent common electrode is provided to cover them.

The second step (St12) is a step of forming an alignment film on the color filter substrate and the array substrate, and includes coating and curing of the alignment film and a rubbing treatment process.

In the third step (St13), a failure turn is printed so that the liquid crystal to be interposed between the color filter substrate and the array substrate does not leak, and a spacer of a constant size is maintained to maintain a precise and uniform gap between the color filter substrate and the array substrate. It is a process of spreading.

The fourth step (St14) of the TFT-LCD cell process (St10) is a step of dropping liquid crystal on a selected one of both substrates, and the fifth step (St15) is a step of bonding the color filter substrate and the array substrate. Then, a sixth step (St16) of cutting the substrate in units of cells is performed.

Finally, the seventh step (St17) of the TFT-LCD cell process (St10) is an inspection process of the liquid crystal cell. Through the inspection process, high quality liquid crystal cells are selected.

Thus, the TFT-LCD cell process (St10) is completed, and the liquid crystal cell is completed.

Next, a polarizing plate attaching process (St20) of attaching a polarizing plate to each outside of the array substrate and the color filter substrate of the completed liquid crystal cell is performed. do.

Then, a process of attaching a driving circuit (St30) is performed. The driving circuit is a TAB method in which a driving circuit connecting an electrical signal with an array substrate of a liquid crystal cell is directly mounted on a tape carrier package (TCP). , Attached to the liquid crystal cell.

Thus, a liquid crystal panel that can be actually driven is completed.

The driving circuit is divided into a gate driving circuit that scans and transmits an on / off signal of a thin film transistor as a gate line of a liquid crystal panel and a data driving circuit that transmits an image signal for each frame to a data line. It can be positioned with two adjacent edges.

Accordingly, when the thin film transistor selected for each gate line is turned on by the on / off signal of the gate driving circuit, the liquid crystal panel having the above-described structure transmits the signal voltage of the data driving circuit through the data line. It is transferred to the corresponding pixel electrode, and accordingly, the arrangement direction of the liquid crystal molecules is changed by an electric field between the pixel electrode and the common electrode, thereby indicating a difference in transmittance.

The next step is a cell test process (St40), and when a liquid crystal panel attached to a driving circuit is completed, the cell test process is completely driven to check whether it is possible to display.

After such an inspection process, a good quality liquid crystal panel is selected.

The following is a backlight unit assembly and case assembly process (St50). The backlight unit assembly process includes a light source on a lower surface of a liquid crystal panel, a light source guide guiding a light source, and a light guide plate for advancing light incident from the light source toward the liquid crystal panel. Includes an optical sheet.

Alternatively, in the above description, although an edge type method using a light guide plate has been described, a direct type in which a plurality of light sources are arranged side by side under the liquid crystal panel in a state in which the light guide plate is omitted is also possible.

After the backlight unit assembly process, the case is assembled. The case assembly is modularized through the top cover, support main, and cover bottom. The top cover is a rectangular frame shape with a cross section bent in the shape of “a” to cover the top and side edges of the liquid crystal panel. The liquid crystal is opened by opening the front of the top cover. It is configured to display an image implemented in a panel.

In addition, the cover bottom, which is the basis for assembling the entire structure of the liquid crystal display module by mounting the liquid crystal panel and the backlight unit, is constituted by vertically bending the four edges of the plate in a square shape.

In addition, the support main seating on the cover bottom and covering the edges of the liquid crystal panel and the backlight unit is assembled with the top cover and cover bottom to complete the liquid crystal display module.

On the other hand, as described above, in the liquid crystal display device of the present invention, since the color filter substrate and the array substrate constituting the liquid crystal panel involve a number of mechanical and chemical treatment processes, a cleaning process for cleaning the surface after each process is essential. .

In particular, the liquid crystal display device of the present invention is dry-cleaned through a dry cleaning device that physically collides high-pressure CDA, which has the convenience of process or low cost, on a contaminated surface compared to a wet cleaning method to clean the surface of the substrate. Characterized in that the cleaning process through a method.

At this time, the dry cleaning method according to the embodiment of the present invention cleans the substrate through a stronger cleaning power.

This will be described in more detail with reference to FIGS. 2, 3A to 3B, and FIG. 4.

2 is a perspective view schematically showing the structure of a dry cleaning device according to an embodiment of the present invention.

And, Figure 3a is a perspective view schematically showing the tornado-type injection nozzle of Figure 2a, Figure 3b is an exploded perspective view of Figure 3a.

And, Figure 3c is a cross-sectional view of Figure 3a, Figure 4 is a perspective view schematically showing the rotation induction structure.

As shown, the dry cleaning apparatus 100 according to an embodiment of the present invention has a length corresponding to the substrate (160 in FIG. 5A) to be processed, and a bar (bar) across the upper portion of the substrate (160 in FIG. 5A) In the shape, a plurality of injection nozzles configured with a supply passage 110 through which the cleaning gas 150 is supplied and a discharge part 139 for injecting the cleaning gas 150 supplied through the supply passage 110 to the outside 130).

Here, the dry cleaning apparatus 100 according to an embodiment of the present invention, the lower surface 112, the upper surface 114 and the lower surface 112 and the upper surface 114, the injection nozzle 130 is formed It is made of a side 116 that defines a supply path 110 through which the cleaning gas 150 is supplied.

At this time, the upper surface 114 is provided with a plurality of injection ports 120, and through each injection port 120, the cleaning gas 150 located outside the dry cleaning device 100 is stored in the supply path 110 inside. And receiving the cleaning gas 150 from a storage unit (not shown).

Here, a pressure regulator (not shown) and a flow regulator (not shown) are sequentially installed on the inlet 120, and the pressure regulator (not shown) is cleaned from an external storage (not shown) through the inlet 120. The pressure of the gas 150 is controlled, and a flow regulator (not shown) serves to control the discharge flow rate of the cleaning gas 150 supplied from the storage unit (not shown).

In addition, a plurality of injection nozzles 130 formed on the lower surface 112 of the dry cleaning device 100 are formed at regular intervals.

Meanwhile, the cleaning gas 150 may be made of high-purity nitrogen (N2) gas or CDA (clean dry air), and high-purity carbon dioxide (CO2) or argon (Ar) gas is compressed high-purity nitrogen (N2) gas or It may be mixed with CDA (clean dry air).

As described above, the dry cleaning apparatus 100 sprays the cleaning gas 150 through the injection nozzle 130 in the processing chamber in a vacuum atmosphere or an atmospheric pressure atmosphere, and the substrate is processed according to the type of the substrate (160 in FIG. 5A). The injection angle may be adjusted at an angle of about 30 to 90 degrees based on (160 in FIG. 5A).

Here, the cleaning gas 150 is injected onto the substrate (160 in FIG. 5A) at high speed and high pressure through the injection nozzle 130, and the dry cleaning apparatus 100 of the present invention is external to the injection nozzle 130. Characterized in that the cleaning gas 150 is injected in a tornado type.

That is, the injection nozzle 130 of the dry cleaning apparatus 100 of the present invention is to have a momentary rotational force when the cleaning gas 150 is injected to the outside through the injection nozzle 130, so that it is injected in a tornado type.

The cleaning gas 150 injected in the form of a tornado hits both the upper surface and the side surface of the foreign material (170 in FIG. 5A) remaining on the substrate (160 in FIG. 5A), thereby being applied to the substrate (160 in FIG. 5A). The remaining foreign matter (170 in FIG. 5A) can be more easily removed.

Therefore, the dry cleaning apparatus 100 according to the embodiment of the present invention cleans the substrate (160 in FIG. 5A) through a very strong cleaning power.

Here, the injection nozzle 130 is largely composed of a fastening unit 131 mounted on the supply path 110 and an injection unit 133 for spraying the cleaning gas 150, wherein the injection unit 133 is a fastening unit ( From 131), the injection angle can be adjusted from about 30 to 90 degrees.

And, inside the fastening part 131, the inlet 132 receiving the cleaning gas 150 from the supply path 110, the discharge port 139 for injecting the cleaning gas 150 to the outside and the inlet 132 It consists of a pressurized flow path (134) for supplying the cleaning gas 150 from the discharge port (139).

Here, the pressurized flow path 134 is formed to have a narrower width than the inlet 132 along the inner edge of the injection nozzle 130 by a buffer (135) formed in the center of the injection nozzle 130, Between the pressurized flow path 134 and the discharge portion 139, a rotation induction structure 137 rotated by thrust of the cleaning gas 150 supplied from the pressurized flow path 134 is provided, and the rotation induction structure 137 ), The cleaning gas 150 discharged to the outside of the injection nozzle 130 through the discharge unit 139 has rotational force.

Accordingly, the cleaning gas 150 discharged to the outside through the injection nozzle 130 is injected in a tornado type, and hits both the upper and side surfaces of the foreign material (170 in FIG. 5A) remaining on the substrate (160 in FIG. 5A). By applying, it is possible to more easily remove the foreign matter (170 in FIG. 5A) remaining on the substrate (160 in FIG. 5A).

Therefore, the dry cleaning apparatus 100 according to the embodiment of the present invention cleans the substrate through a very strong cleaning power.

Here, referring to FIG. 4, the rotation induction structure 137 provided inside the injection nozzle 130 of the dry cleaning apparatus 100 according to the embodiment of the present invention will be described in more detail with respect to the rotation induction structure 137. 135) a disc portion 137a having a fitting hole 137b into which it is fitted, and a plurality of guide blocks 137c provided on one side of the disc portion 137a and disposed radially around the fitting hole 137b. It is made, between each guide block (137c) is formed an air slit (137d) for guiding the cleaning gas 150 to the outside of the rotating induction structure.

At this time, all of the air slits 137d are formed obliquely toward the fitting hole 137b from the outside of the rotation induction structure 137.

That is, the air slit 137d is formed to be inclined at a constant angle both in the counterclockwise direction or in the clockwise direction based on one direction toward the fitting hole 137b from the outside of the rotation induction structure 137.

Through this, the cleaning gas 150 supplied through the pressurized flow path 134 is guided from the inside of the rotating induction structure 137 to the outside of the rotating induction structure 137 through the air slit 137d, at this time. The cleaning gas 150 induced from the inside of the structure 137 to the outside is guided in the circumferential direction of the rotation induction structure 137.

Therefore, the rotation induction structure 137 is rotated in one direction along the direction in which the air slits 137d are formed obliquely by thrust of the cleaning gas 150 induced in the circumferential direction.

As described above, as the rotation induction structure 137 is rotated in one direction, the cleaning gas 150 induced to the outside of the rotation induction structure 137 is given rotational force, and thus, through the discharge unit 139 The cleaning gas 150 discharged to the outside of the injection nozzle 130 also has rotational force.

5A to 5B are cross-sectional views schematically illustrating a state in which foreign substances on a substrate, which is an object to be treated, are removed by a cleaning gas injected in a tornado form through an injection nozzle of a dry cleaning device according to an embodiment of the present invention.

As shown in FIG. 5A, a foreign material 170 remains in the process of performing a plurality of processes on a substrate 160 as a processing object, and the dry cleaning device (100 of FIG. 2A) is applied to the upper surface of the substrate 160. The tornado type cleaning gas 150 is injected through the injection nozzle 130 to remove the foreign matter 170 remaining on the substrate 160.

At this time, the dry cleaning device according to an embodiment of the present invention (100 in FIG. 2A) has a rotating induction structure 137 by thrust of the cleaning gas 150 supplied through the pressurized flow path 134 of the injection nozzle 130. Through this, the cleaning gas 150 is supplied with a rotational force and is sprayed onto the substrate 160 in the form of a tornado.

Therefore, as shown in FIG. 5B, both the upper surface and the side surface of the foreign material 170 remaining on the substrate 160 are hit, thereby substantially applying a large force to the foreign material 170 remaining on the substrate 160. Therefore, the foreign material 170 remaining on the substrate 160 can be more easily removed.

That is, the dry cleaning device of the present invention (100 in FIG. 2A) sprays the cleaning gas 150 on the substrate 160 in a tornado form, thereby more easily removing the foreign matter 170 remaining on the substrate 160. It is possible to clean the substrate 160 through a very strong cleaning power.

In addition, it is possible to easily remove the foreign matter 170 remaining on the substrate 160 even at a low injection flow rate, it is possible to prevent the surface damage of the substrate 160 caused by the high injection flow rate.

As an example, an alignment layer having a rubbing axis formed on the substrate 160 is formed, and in order to remove the foreign material 170 on the alignment layer, when the cleaning gas 150 is injected at a high jet flow rate, the foreign material on the substrate 160 ( Although 170) is removed, the rubbing axis of the alignment layer is changed, thereby lowering the contrast characteristic.

However, the dry cleaning device according to an embodiment of the present invention (100 in FIG. 2A) removes foreign substances on the substrate 160 with excellent cleaning power compared to a general dry cleaning device even at a low injection flow rate, thereby causing the above problems. It can be prevented.

In addition, since a separate drying process is not required after the cleaning process, the process time can be shortened and the process cost can be reduced, thereby improving the efficiency of the process. It is possible to prevent the damage to the surface of the substrate 160 caused.

Table (1) below is a simulation result of comparing and measuring the cleaning power of a general dry cleaning device and a dry cleaning device according to an embodiment of the present invention (100 in FIG. 2A), and FIGS. 6A to 6B are identical through Sample 1 and Sample 2 This is a photograph of the surface of the substrate 160 after the dry cleaning process is performed by spraying the cleaning gas 150 at an injection flow rate of 3 m / s.

Injection flow rate Cleaning power (= removal rate) Sample 1 Sample 2 2 m / s - 65% 3 m / s 50% 100% 4 m / s - 100% 5 m / s 70% 6 m / s - 7 m / s 80%

Here, Sample 1 is a general dry cleaning device, and Sample 2 shows a dry cleaning device (100 in FIG. 2A) according to an embodiment of the present invention.

Referring to the table (1) above, when the cleaning gas 150 is sprayed onto the substrate 160 at an injection flow rate of 3 m / s, the removal rate of the foreign material 170 on the substrate 160 is only 50%. However, when Sample 2 is injected onto the substrate 160 at the same injection flow rate as Sample 1, it can be confirmed that the removal rate of the foreign material 170 on the substrate 160 is 100%.

That is, the dry cleaning device according to an embodiment of the present invention (100 in FIG. 2A) has a much stronger cleaning power than a general dry cleaning device by spraying the cleaning gas 150 in a tornado type.

On the other hand, referring to FIGS. 6A and 6B, the difference can be clearly confirmed.

That is, referring to FIG. 6A, even if the cleaning gas 150 is injected at the same injection flow rate (3 m / s) on the substrate 160, the substrate subjected to the dry cleaning process according to Sample 1 using a general dry cleaning device ( 160) It can be seen that a large amount of foreign matter 170 remains on the image.

The cleaning power at this time is only about 50%.

On the other hand, referring to Figure 6b, even if the cleaning gas 150 is injected at the same injection flow rate (3m / s) on the substrate 160, through the dry cleaning device (100 in Figure 2a) according to an embodiment of the present invention It can be seen that the foreign material 170 does not remain on the substrate 160 that has undergone the dry cleaning process.

Therefore, the dry cleaning device according to an embodiment of the present invention (100 in FIG. 2A) can more easily remove the foreign matter 170 remaining on the substrate 160 by spraying the cleaning gas 150 in a tornado format. , It has a much stronger cleaning power than a general dry cleaning device.

In addition, by having a high cleaning power even at a low injection flow rate, it is not necessary to increase the injection flow rate, and thus it is possible to prevent the surface damage of the substrate 160 from being caused by the high injection flow rate.

As described above, the dry cleaning device according to an embodiment of the present invention (100 in FIG. 2A) is the thrust of the cleaning gas 150 supplied from the pressure passage 134 between the pressure passage 134 and the discharge part 139. The cleaning gas 150 discharged to the outside of the injection nozzle 130 through the discharge part 139 by the rotation of the rotation induction structure 137 is provided with a rotation induction structure 137 rotated by (thrust) By spraying in a tornado type, foreign substances 170 remaining on the substrate 160 can be more easily removed, thereby cleaning the substrate 160 through a very strong cleaning power.

In addition, since the foreign material 170 remaining on the substrate 160 can be easily removed even at a low injection flow rate, surface damage of the substrate 160 may be prevented from occurring due to the high injection flow rate.

In addition, since a separate drying process is not required after the cleaning process, it is possible to shorten the process time and reduce the process cost, thereby improving the efficiency of the process. It is possible to prevent the damage to the surface of the substrate 160 caused.

The present invention is not limited to the above-described embodiments, and can be implemented by variously changing within the limits without departing from the gist of the present invention.

130: spray nozzle
131: fastening part, 132: inlet part, 133: injection part, 134: pressurized flow path
135: buffer, 137: rotating induction structure, 139: discharge port
150: cleaning gas, 160: substrate, 170: foreign matter

Claims (6)

A substrate;
Dry cleaning device that is located on the substrate, and includes a plurality of injection nozzles equipped with a rotating induction structure at the discharge port
It includes,
The injection nozzle includes an inlet through which a cleaning gas is supplied, a discharge port through which the cleaning gas is discharged, and a pressurized flow path through which the cleaning gas is supplied from the inlet toward the discharge port.
The rotating induction structure includes a disc portion and a plurality of guide blocks provided on one side of the disc portion and disposed radially, and between the guide blocks is clockwise or counterclockwise based on one direction toward the center of the disc portion The slits are inclined at an angle to form an air slit for guiding the cleaning gas to the outside of the rotating induction structure,
The rotating induction structure is located between the pressurized flow path and the discharge port,
The cleaning gas has a rotational force by rotation of the rotation-inducing structure and is sprayed onto the substrate through the discharge port to strike the upper surface and side surfaces of foreign matter remaining on the substrate.
According to claim 1,
The injection nozzle is defined as a fastening portion and an injection portion, the injection portion includes the inlet portion, the discharge port and the pressurized flow path,
The pressurized flow path is formed with a narrower width than the inlet portion along the inner edge of the injection nozzle, and the rotating induction structure is a substrate cleaning apparatus positioned between the pressurized flow path and the discharge port.
delete According to claim 2,
The dry cleaning device has a bar shape, and includes a supply path through which the cleaning gas is supplied, and an injection port through which the cleaning gas is supplied from the outside. A substrate cleaning device mounted on the furnace.
The method of claim 4,
The injection unit is a substrate cleaning apparatus that is angle-adjusted from 30 to 90 degrees from the fastening portion.
According to claim 1,
The cleaning gas is a substrate cleaning apparatus made of nitrogen (N2) gas or CDA (clean dry air) selected from carbon dioxide (CO2) or argon (Ar) gas.

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