KR20130020069A - In-line apparatus for developing having a cleaning device and method of fabricating liquid crystal display device using thereof - Google Patents

Abstract

PURPOSE: An in-line film developing apparatus having a cleaning device and a method for fabricating a liquid crystal display device using thereof are provided to improve cleaning power by controlling the injection angle of the cleaning device. CONSTITUTION: A substrate is loaded on a loading unit. A cleaning unit(200) washes the substrate using spraying units(140a,140b). A photo process unit performs a photoresist coating, an exposure, and a developing process on the substrate. An etching unit etches the substrate. An unloading unit unloads the substrate. A loading unit, a cleaning unit, a photo process unit, the etching unit, and the unloading unit are arranged inline.

Description

IN-LINE APPARATUS FOR DEVELOPING HAVING A CLEANING DEVICE AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY DEVICE USING THEREOF}

The present invention provides an in-line developing apparatus for developing and etching a plurality of substrates in-line, and includes an in-line developing apparatus having a cleaning apparatus for performing cleaning on a substrate before and after developing, and the same. The manufacturing method of the used liquid crystal display device is related.

Recently, interest in information display has increased, and a demand for using portable information media has increased, and a light-weight flat panel display (FPD) that replaces a cathode ray tube (CRT) And research and commercialization are being carried out. Particularly, among such flat panel display devices, a liquid crystal display (LCD) is an apparatus for displaying an image using the optical anisotropy of a liquid crystal, and is excellent in resolution, color display and picture quality and is actively applied to a notebook or a desktop monitor have.

The liquid crystal display comprises a color filter substrate, an array substrate, and a liquid crystal layer formed between the color filter substrate and the array substrate.

The color filter substrate distinguishes between a color filter composed of a plurality of sub-color filters that implements red (R), green (G), and blue (B) colors and the sub-color filter. A black matrix blocking light passing through the liquid crystal layer and a transparent common electrode applying a voltage to the liquid crystal layer.

The array substrate may include a plurality of gate lines and data lines arranged vertically and horizontally to define a plurality of pixel regions, thin film transistors (TFTs), which are switching elements formed at intersections of the gate lines and data lines, and the The pixel electrode is formed on the pixel region.

The color filter substrate and the array substrate configured as described above are joined to face each other by sealants formed on the outer side of the image display area to form a liquid crystal display device. The combination of the color filter substrate and the array substrate is connected to the color filter substrate or the array substrate. Through the formed key.

In order to manufacture most flat panel display devices including the liquid crystal display device, a plurality of photolithography processes are required.

The photolithography process is a series of processes in which a pattern drawn on a mask is transferred onto a substrate on which a thin film is deposited to form a desired pattern as one of photolithography processes, including photoresist (PR) coating, mask alignment and exposure, It consists of many complex processes such as developing process.

As these processes are generally performed in different process equipments, a number of movements are required, such as transfer and transfer of substrates between process equipments. There is a problem of this contamination.

In addition, it is necessary to clean to remove this, if the cleaning power is lowered foreign matters are not removed, causing a quality problem when the subsequent process proceeds.

The present invention is to solve the above problems, in-line development equipment and a liquid crystal display device using the same to simplify the process while minimizing the contamination of the substrate by progressing the development and etching process for a plurality of substrates in-line The purpose is to provide a method for producing.

Another object of the present invention is to provide a cleaning device for cleaning the substrate before and after development to manufacture the in-line developing equipment having a cleaning device to improve the impact force and the removal force during cleaning and the manufacturing of the liquid crystal display device using the same To provide a method.

Other objects and features of the present invention will be described in the following description of the invention and claims.

In order to achieve the above object, the in-line developing apparatus provided with the cleaning apparatus of the present invention includes a loading unit for loading a substrate; A cleaning unit for cleaning the substrate through at least one spraying unit installed at a predetermined angle with respect to a vertical direction of the loaded substrate; A photo process unit for performing photoresist (PR) coating, exposure and development on the cleaned substrate; An etching unit for etching the developed substrate to form a predetermined pattern; And an unloading part for unloading the substrate on which the pattern is formed, wherein the loading part, the cleaning part, the photoprocessing part, the etching part, and the unloading part are arranged in an in-line shape while being in-line. It is characterized by advancing a substrate and each process in a form.

At this time, it is characterized in that the conveyance of the substrate in the form of in-line using the conveying means such as a conveyor and each process.

The cleaning unit may include a plurality of cleaning units that proceed in-line.

In this case, the plurality of cleaning units may include a plasma cleaning unit, a primary cleaning unit, a secondary cleaning unit, a final cleaning unit, and a drying unit.

The primary cleaning unit is characterized in that the primary cleaning using a roll brush.

The drying unit is characterized in that the drying process using the air knife.

The spraying unit is an initial spraying unit, an intermediate spraying unit, and a final spraying unit for spraying washing water at a predetermined angle with respect to the substrate to be transported, respectively installed in the primary cleaning unit, the secondary cleaning unit, and the final cleaning unit along a transfer path of the substrate. It is characterized by including a wealth.

The spraying part is inclined at a predetermined angle to remove the impact by hitting the lower end of the foreign material on the substrate surface.

The injection unit is characterized in that installed at an angle of 5 ° to 15 ° with respect to the vertical direction of the substrate.

A method of manufacturing a liquid crystal display device of the present invention is a method of manufacturing a liquid crystal display device comprising a color filter substrate, an array substrate, and a liquid crystal layer formed between the color filter substrate and the array substrate, wherein the photofilter is applied to the color filter substrate or the array substrate. The cleaning of the color filter substrate or the array substrate before and after proceeding includes: (a) removing organic substances present on the surface of the color filter substrate or the array substrate; (b) spraying the washing water at a predetermined angle with respect to the vertical direction of the color filter substrate or the array substrate from which the organic material has been removed, and performing the first washing, the second washing, and the last washing on the color filter substrate or the array substrate. ; And (c) drying the cleaned color filter substrate or array substrate, wherein steps (a) to (c) are performed in-line.

At this time, the steps (a) to (c) is characterized in that the color filter substrate or the array substrate transfer and cleaning process in the in-line form.

The first cleaning is characterized by using a roll brush.

The first cleaning, the second cleaning, and the last cleaning of the color filter substrate or the array substrate may be performed through at least one spraying unit installed at a predetermined angle with respect to the vertical direction of the color filter substrate or the array substrate from which the organic material has been removed. The washing water is sprayed at a predetermined angle with respect to the color filter substrate or the array substrate.

At this time, the spraying unit is inclined at a predetermined angle to remove the hitting the lower end of the foreign material on the surface of the color filter substrate or the array substrate.

The jetting unit may be installed at an angle of 5 ° to 15 ° with respect to the vertical direction of the color filter substrate or the array substrate.

As described above, the in-line developing apparatus having the cleaning apparatus according to the present invention and the manufacturing method of the liquid crystal display device using the same are subjected to the cleaning of the substrate transferred in-line a plurality of times, By changing the slope angle to improve the striking force and removal force it is possible to effectively remove the foreign matter generated between the transfer and transfer of the substrate.

This improves yield and quality, while providing the effect of preventing unwanted equipment down and loss of work due to foreign material from previous processes. For example, the cleaning apparatus according to the present invention provides an effect of improving the yield by about 0.15% by improving the cleaning power.

In particular, the cleaning device according to the present invention has the advantage that can be applied to the cleaning of the equipment of any configuration as well as other equipment.

1 is a flowchart sequentially illustrating a method of manufacturing a liquid crystal display device according to an exemplary embodiment of the present invention.
2 is a flowchart sequentially illustrating another manufacturing method of the liquid crystal display according to the exemplary embodiment of the present invention.
Figure 3 is a block diagram schematically showing the in-line developing apparatus according to an embodiment of the present invention.
4 is a block diagram sequentially showing a photo process in the photo process unit of the in-line developing apparatus shown in FIG.
FIG. 5 is a block diagram sequentially illustrating a cleaning process in the cleaning unit of the in-line developing apparatus shown in FIG.
6 is an exemplary view schematically showing a configuration of a cleaning device according to an embodiment of the present invention.
Figure 7a and 7b is an exemplary view schematically showing the principle of improving the striking force and the removal force in the cleaning device according to the embodiment of the present invention shown in Figure 6 by changing the injection angle of the cleaning device.
FIG. 8 is an exemplary view schematically showing a method for setting a maximum value of an injection angle of a cleaning device in the cleaning device according to the embodiment of the present invention shown in FIG. 6.

Hereinafter, with reference to the accompanying drawings will be described in detail a preferred embodiment of the in-line developing equipment having a cleaning apparatus according to the present invention and a method of manufacturing a liquid crystal display device using the same.

1 is a flowchart sequentially illustrating a method of manufacturing a liquid crystal display device according to an embodiment of the present invention, and FIG. 2 is a flowchart sequentially illustrating another method of manufacturing a liquid crystal display device according to another embodiment of the present invention.

1 illustrates a method of manufacturing a liquid crystal display device when a liquid crystal layer is formed by a liquid crystal injection method, and FIG. 2 illustrates a method of manufacturing a liquid crystal display device when a liquid crystal layer is formed by a liquid crystal drop method.

The manufacturing process of the liquid crystal display device may be classified into a driving element array process of forming a driving element on a lower array substrate, a color filter process of forming a color filter on an upper color filter substrate, and a cell process.

First, a plurality of gate lines and data lines which are arranged in an array substrate and define a pixel region are formed by an array process, and a thin film transistor which is a driving element connected to the gate line and the data line is formed in each of the pixel regions (S101 ). In addition, a pixel electrode connected to the thin film transistor through the array process and driving the liquid crystal layer as a signal is applied through the thin film transistor is formed.

In addition, the color filter substrate is formed with a color filter layer and a common electrode composed of red, green, and blue sub-color filters that implement color by a color filter process (S103). In this case, when a liquid crystal display device having an in-plane switching (IPS) method is manufactured, the common electrode is formed on an array substrate on which the pixel electrode is formed through the array process.

At this time, a plurality of the color filter substrate and the array substrate are divided into a large-sized mother substrate. In other words, a plurality of panel regions are defined in a large-sized mother substrate, and thin film transistors and color filters, which are driving elements, are formed in each of the panel regions.

Subsequently, after the alignment film is printed on the color filter substrate and the array substrate, the alignment control force or the surface fixing force (that is, the pretilt angle and orientation) is applied to the liquid crystal molecules of the liquid crystal layer formed between the color filter substrate and the array substrate. Direction) to rub the alignment film (S102, S104).

As shown in FIGS. 1 and 2, the color filter substrate and the array substrate that have completed the rubbing process are inspected for defects of the alignment layer through an alignment layer inspector (S105).

If the rubbing is not uniform, the alignment degree of the liquid crystal molecules is not spatially constant, resulting in a defect that shows locally different optical characteristics.

Such a rubbing defect inspection method includes a first inspection for inspecting the presence of spots, streaks or pin holes on the surface of the coated alignment film after the alignment film is applied, and the uniformity and scratch of the surface of the rubbed alignment film after rubbing. There is a secondary test that checks for the presence of a scratch or the like.

As shown in FIG. 1, a spacer for maintaining a constant cell gap is formed on the array substrate after the alignment layer inspection, and a sealing material is coated on an outer portion of the color filter substrate, and then, on the color filter substrate and the array substrate. A pressure is applied and it adheres (S106, S107, S108). In this case, the spacer may be a ball spacer by a scattering method, or may be a column spacer by patterning.

As described above, a plurality of panel regions are formed in a large area of the mother substrate, and a thin film transistor and a color filter layer serving as driving elements are formed in each of the panel regions, so that the mother substrate is cut to manufacture a single liquid crystal display panel. , Must be processed (S109).

Thereafter, the liquid crystal is injected into the liquid crystal display panel processed as described above through the liquid crystal inlet, and the liquid crystal inlet is encapsulated to form a liquid crystal layer. S111).

At this time, the injection of the liquid crystal uses a vacuum injection method using a pressure difference, the vacuum injection method is a container filled with the liquid crystal in a chamber in which a constant vacuum is set in the liquid crystal inlet of the unit liquid crystal display panel separated from the mother substrate of a large area The liquid crystal is filled into the liquid crystal display panel by injecting the liquid crystal into the liquid crystal display panel by the pressure difference between the inside and the outside of the liquid crystal display panel by dipping the liquid into a liquid. The liquid crystal layer of the liquid crystal display panel is formed. Therefore, when the liquid crystal layer is formed on the liquid crystal display panel through a vacuum injection method, a part of the failure turn should be opened to have a function of the liquid crystal injection hole.

However, the vacuum injection method as described above has the following problems.

First, it takes a very long time to fill the liquid crystal in the liquid crystal display panel. In general, since the bonded liquid crystal display panel has a gap of several μm in an area of several hundred cm ² , the amount of liquid crystal injection per unit time is very small even when a vacuum injection method using a pressure difference is applied. For example, when manufacturing a liquid crystal display panel of about 15 inches takes about 8 hours to fill the liquid crystal there is a problem that the production of the liquid crystal display panel takes a lot of time, productivity is lowered. In addition, as the size of the liquid crystal display panel increases in size, the time required for filling the liquid crystal becomes longer, resulting in poor filling of the liquid crystal, and as a result, the size of the liquid crystal display panel cannot be coped with.

Second, the consumption of liquid crystal is high. In general, the amount of liquid crystal actually injected into the liquid crystal display panel is very small compared to the amount of liquid crystal filled in the container, and when the liquid crystal is exposed to the atmosphere or a specific gas, it reacts with the gas and deteriorates. Therefore, even if the liquid crystals filled in the container are filled in a plurality of liquid crystal display panels, a large amount of liquid crystals remaining after the filling should be discarded. As such, the expensive liquid crystals are discarded, thereby increasing the unit cost of the liquid crystal display panel. It is a factor that weakens the price competitiveness of the product.

The dropping method can be applied to overcome the problems of the vacuum injection method as described above.

As shown in FIG. 2, in the case of using the dropping method, after completing the alignment layer inspection (S105), a predetermined failure turn is formed with a sealant on the color filter substrate and a liquid crystal layer is formed on the array substrate. (S106 ', S107').

The dropping method uses a dispenser to drop and dispense liquid crystals in an image display area of a large area of a first mother substrate on which a plurality of array substrates are arranged or a second mother substrate on which a plurality of color filter substrates are disposed. The liquid crystal layer is formed by uniformly distributing the liquid crystals to the entire image display area by the pressure for bonding the first and second mother substrates together.

Therefore, when the liquid crystal layer is formed on the liquid crystal display panel by dropping, the failure turn should be formed in a closed pattern surrounding the pixel area region to prevent the liquid crystal from leaking out of the image display region.

The dropping method can drop the liquid crystal in a short time compared to the vacuum injection method, and can form the liquid crystal layer very quickly even when the liquid crystal display panel is enlarged.

In addition, since only the required amount of liquid crystal is dropped on the substrate, the price competitiveness of the liquid crystal display panel due to the disposal of expensive liquid crystal, such as a vacuum injection method, is prevented, thereby enhancing the price competitiveness of the product.

Thereafter, the first mother substrate and the second mother substrate are bonded together by the sealing material by applying pressure while the liquid crystal is dropped and the first mother substrate and the second mother substrate coated with the sealing material are aligned as described above. The liquid crystal dropped by the application of pressure is spread evenly over the entire liquid crystal display panel (S108 '). By such a process, a plurality of liquid crystal display panels having a liquid crystal layer are formed on the first and second mother substrates having a large area, and the first and second mother substrates are processed and cut and separated into a plurality of liquid crystal display panels. By inspecting each liquid crystal display panel, a liquid crystal display device is manufactured (S109 ', S110').

As described above, the flat panel display device including the liquid crystal display device is manufactured through a plurality of photolithography processes (hereinafter, referred to as a photo process). The photo process is a kind of photolithography process. It is a series of processes for transferring a deposited substrate onto a desired pattern to form a desired pattern, and consists of a number of complex processes such as photoresist (PR) application, mask alignment and exposure, and development. In addition, the substrate cleaning process may be performed before or after the photo process, and the etching process may be performed after the photo process.

In this case, in the present invention, the substrate is transported and transported between a plurality of processes, such as a cleaning process, a photo process, and an etching process, through a developing apparatus in an in-line form using a conveying means such as a conveyor to minimize substrate contamination. Meanwhile, the process can be simplified. Hereinafter, the in-line developing apparatus according to the embodiment of the present invention will be described in detail with reference to the accompanying drawings.

3 is a block diagram schematically illustrating an in-line developing apparatus according to an exemplary embodiment of the present invention.

Referring to the drawings, the in-line developing apparatus according to an embodiment of the present invention is a loading unit 100 is loaded with a substrate, a cleaning unit 200 for cleaning the loaded substrate, PR coating for the cleaned substrate, A photo process unit 300 for performing exposure and development, an etching unit 400 for forming a predetermined pattern by etching the developed substrate, and an unloading unit 500 for unloading the substrate on which the pattern is formed. It may be made of.

In this case, the loading part 100, the cleaning part 200, the photo processing part 300, the etching part 400 and the unloading part 400 according to the embodiment of the present invention are arranged in an in-line shape, , Using a conveying means such as a conveyor is characterized in that the transfer of the substrate and each process in the in-line form.

The loading unit 100 is an area in which the substrate is seated in order to transfer the substrate to the cleaning process, the photo process and the etching process, and the cleaning process, the photo process and the etching process are performed along the in-line conveyor. That is, the in-line developing apparatus according to the embodiment of the present invention is a cleaning solution, a developer or an etchant on the upper, lower or upper and lower surfaces of the substrate which are horizontally transferred at a constant speed by a conveying means such as a conveyor. By treating the treatment liquid of the substrate surface, the substrate surface is cleaned, developed or etched. The result is a simplified process while minimizing contamination of the substrate.

The cleaning process, the photo process, and the etching process are all completed, and the unloading unit 500 is finished by carrying out the substrate to the next process facility.

Hereinafter, the cleaning process and the photo process in the cleaning unit 200 and the photo process unit 300 according to the embodiment of the present invention will be described in detail with reference to the drawings.

FIG. 4 is a block diagram sequentially illustrating a photo process in the photo process unit of the in-line developing apparatus shown in FIG. 3.

First, after PR is coated on a thin film to form a predetermined pattern, a first baking (soft baking) for drying the coated PR (S110, S120) is performed.

Next, an exposure process of aligning the photomask on which the pattern is formed and exposing the PR is performed (S130). In this case, the photomask to be used is composed of a predetermined transmission area and a blocking area, and the light passing through the transmission area chemically changes the PR.

The chemical change of the PR is dependent on the type of PR, the positive type of PR is changed to the property that the lighted portion is dissolved by the developer, the negative type of PR is the property that the lighted portion is not dissolved in the developer Is changed. Here, the case where the positive type PR is used is demonstrated as an example.

Subsequent to the exposure process, if the unnecessary PR, that is, the exposed portion of the PR is removed by the developer, a predetermined PR pattern is formed on the thin film (S140).

Next, after the hard baking is performed to heat and harden the PR pattern, the thin film is etched in the form of the PR pattern through the etching solution in the above-described etching unit, and then, a stripper is used as a stripper. If the remaining PR pattern is removed, a thin film pattern of a predetermined form is formed (S150).

Thus, when forming a pattern in the manufacturing process of flat panel display devices, such as a liquid crystal display device, PR coating is performed, but before a PR coating, the board | substrate washing | cleaning which remove | eliminates foreign substances, such as an organic substance and inorganic substance which exists in the surface of a board | substrate, is performed.

FIG. 5 is a block diagram sequentially illustrating a cleaning process in the cleaning unit of the in-line developing apparatus illustrated in FIG. 3.

6 is an exemplary view schematically showing a configuration of a cleaning device according to an embodiment of the present invention.

Referring to FIG. 6, the cleaning device according to the embodiment of the present invention includes a plurality of cleaning parts that proceed to the in-line conveyor 130, and the cleaning parts 200 sequentially clean the plasma 210. And a first cleaning unit 220, a second cleaning unit 230, a final cleaning unit 250, and a drying unit 260.

In this case, the first cleaning unit 220 performs a first cleaning using a roll brush (135), the second cleaning unit 230 is a general cleaning, high pressure pump, bubble jet (bubble jet) The secondary cleaning by the process, etc., the drying unit 260 proceeds the drying process using an air knife (145).

The cleaning apparatus according to the embodiment of the present invention is a substrate that is installed in each of the first cleaning unit 220, the second cleaning unit 230, the last cleaning unit 250 along the transfer path of the substrate (S) It further includes an initial injection unit 140a, an intermediate injection unit 140b, and a final injection unit 140c for sequentially spraying the washing water with respect to (S).

In addition, the second storage unit 151b and the second storage unit 151b for collecting and supplying the washing water discharged from the final spray unit 140c of the final cleaning unit 250 to the substrate S and supplied to the intermediate spray unit 140b. The storage unit 151 further includes a storage unit 151 including a first storage unit 151a for recovering and supplying the washing water discharged and discharged from the intermediate sprayer 140b to the substrate S to the initial sprayer 140a. do. Therefore, each of the jetting parts 140a to 140c is gradually supplied with increasingly high purity cleaning water along the substrate transfer direction. However, the present invention is not limited thereto, and the storage unit 151 may be configured to recover the washing water discharged from the final injection unit 140c and the intermediate injection unit 140b to the substrate S together. It can also be considered.

The final injection unit 140c may be supplied with ultrapure cleaning water through the supply line 152 of the washing water supply source 150, and the washing water used in the initial injection unit 140a may be a discharge line 155. Can be discharged through.

For reference, reference numerals 153a, 153b, and P1 and P2 denote circulation lines and pumps, respectively.

Accordingly, the substrate S is horizontally transported in one direction and organic matters are removed from the surface through the plasma apparatus installed in the plasma cleaning unit 210, and then passes through the respective injection units 140a to 140c in turn. It is sequentially washed by the washing water sprayed from (140a ~ 140c), it will be described in detail.

First, the in-line conveyor 130 is an area where the substrate S is seated in order to transfer the substrate S to the cleaning process, and pre-cleaning is performed along the in-line conveyor 130.

Since the substrate S mounted on the in-line conveyor 130 is not deionized water, the organic material existing on the surface of the substrate S cannot be removed, and thus the organic material removing process using the atmospheric pressure plasma is performed (S210). . However, the present invention is not limited thereto, and organic materials existing on the surface of the substrate S may be removed using an excimer UV lamp.

Subsequently, a first cleaning process of removing foreign substances on the surface of the substrate S by applying a physical force using the roll brush 135 is performed (S220). The first cleaning process using the roll brush 135 is effective in removing foreign matter and organic matter having a relatively large size.

In addition, in consideration of the bending of the large substrate (S), the roll brush 135 may be installed to face each other up and down.

In addition, the primary cleaning process using the roll brush 135 is not always used, it may be used depending on the process. For example, where a flattening pattern is formed, cleaning is performed through a roll brush, but where a pattern form is formed, a roll brush process is not used because it may damage the pattern.

Subsequently, droplets are generated by first mixing the liquid and the gas with the pressure of the high pressure pump in the intermediate injection units 140a and 140b, and the droplets are accelerated and sprayed by the high-speed gas flow, thereby onto the substrate S. Second and third cleaning processes are performed to remove foreign substances on the surface by the elasticity of the fluid (S230, S240).

Thereafter, a shower using the final sprayer 140c is finally rinsed on the substrate S, and a final cleaning step of finally removing foreign matters is performed (S250).

At this time, the injection unit (140a ~ 140c) essentially includes an initial injection unit 140a and the final injection unit 140c to inject a plurality of washing water to the substrate (S) to be transferred, the first injection unit 140a ) And the final injection unit 140c is preferably provided with a single or multiple intermediate injection unit (140b).

Each of the spray units 140a to 140c may include a plurality of hole shower nozzles to spray washing water.

Thereafter, a drying process of completely removing and drying the water remaining on the substrate S using the air knife 145 is performed (S260).

On the other hand, despite such a plurality of cleaning, there is a case that the foreign matter is not removed after cleaning, which is that when the foreign matter was removed by the cleaning but moved and attached again, it may not be removed in the cleaning as it adheres to the substrate. .

In the first case, the impact force is good, but the removal force is weak, so that the foreign material dropped from the surface of the substrate but failed to remove, and in the latter case, the impact force itself is weak, the foreign material does not drop from the substrate surface. In the latter case, the foreign material may not be lifted by, for example, beating the upper surface of the foreign material.

Accordingly, the cleaning apparatus of the present invention can effectively remove foreign substances generated between transfer and conveyance of the substrate by changing the angle of the injection unit to improve the impact force and the removal force, which will be described in detail with reference to the accompanying drawings.

7a and 7b is an exemplary view schematically showing the principle of improving the impact force and the removal force by changing the injection angle of the cleaning device in the cleaning device according to the embodiment of the present invention shown in FIG.

8 is an exemplary view schematically showing a method of setting the maximum value of the injection angle of the cleaning device in the cleaning device according to the embodiment of the present invention shown in FIG.

First, as shown in FIG. 7A, the injection unit 140 is installed at a predetermined angle α with respect to the vertical direction of the substrate S to be opposite to the entrance direction of the substrate S (arrow direction shown). By spraying the washing water to maximize the removal force it is possible to completely remove the foreign material (D) dropped from the surface of the substrate (S).

In addition, as shown in Figure 7b, it is difficult to remove the foreign material (D) by hitting the upper surface of the foreign material (S) attached to the substrate (S) as described above, the injection portion 140 as described above a predetermined angle (α). If you tilt to the bottom of the foreign material (D) hitting the impact force is maximized to effectively remove the foreign material (D).

The tilt angle α of the injection unit 140 may vary according to the conditions of the equipment. However, when it exceeds 15 °, it may be difficult to enter the substrate S as shown in FIG. 8, and thus 5 °. Can be set to ~ 15 °.

This improves yield and quality while preventing unwanted equipment downtime and loss of work due to foreign material from previous processes. For example, the cleaning apparatus according to the present invention provides an effect of improving the yield by about 0.15% by improving the cleaning power.

In particular, the cleaning device according to the present invention has the advantage that can be applied to the cleaning of the equipment of any configuration as well as other equipment. That is, the present invention may be applied to any field of cleaning PR, PI (polyimide) or a corresponding material applied to a substrate, including a flat panel display such as a semiconductor or a liquid crystal display using photo technology.

Many details are set forth in the foregoing description but should be construed as illustrative of preferred embodiments rather than to limit the scope of the invention. Therefore, the invention should not be construed as limited to the embodiments described, but should be determined by equivalents to the appended claims and the claims.

100: loading unit 130: in-line conveyor
140,140a ~ 140c: Injector 145: Air Knife
200: cleaning unit 210: plasma cleaning unit
220: primary cleaning unit 230: secondary cleaning unit
250: final washing unit 260: drying unit
300: photo process unit 400: etching unit
500: unloading portion S: substrate

Claims (15)

A loading unit in which a substrate is loaded;
A cleaning unit for cleaning the substrate through at least one spraying unit installed at a predetermined angle with respect to a vertical direction of the loaded substrate;
A photo process unit for performing photoresist (PR) coating, exposure and development on the cleaned substrate;
An etching unit for etching the developed substrate to form a predetermined pattern; And
And an unloading part for unloading the substrate on which the pattern is formed, wherein the loading part, the cleaning part, the photoprocessing part, the etching part, and the unloading part are arranged in-line, and in-line shape. In-line developing equipment, characterized in that for carrying out the transfer of the substrate and each process. The in-line developing apparatus according to claim 1, wherein the substrate is conveyed and each process is performed in an in-line form using a conveying means such as a conveyor. The in-line developing apparatus of claim 1, wherein the cleaning unit comprises a plurality of cleaning units which proceed in an in-line form. The in-line developing apparatus of claim 3, wherein the plurality of cleaning units comprises a plasma cleaning unit, a primary cleaning unit, a secondary cleaning unit, a final cleaning unit, and a drying unit. The in-line developing apparatus of claim 4, wherein the first cleaning unit performs a first cleaning using a roll brush. The in-line developing apparatus of claim 4, wherein the drying unit performs a drying process using an air knife. The spraying apparatus of claim 4, wherein the spraying unit comprises: an initial spraying unit spraying the washing water at a predetermined angle with respect to the substrate to be installed and transported respectively in the primary cleaning unit, the secondary cleaning unit, and the last cleaning unit along the transfer path of the substrate; In-line developing equipment, characterized in that it comprises an intermediate injection unit and the last injection unit. The in-line developing apparatus according to claim 1, wherein the jetting part is inclined at a predetermined angle to strike and remove the lower end of the foreign material on the substrate surface. The in-line developing apparatus of claim 1, wherein the jetting unit is installed at an angle of 5 ° to 15 ° with respect to a vertical direction of the substrate. In the manufacturing method of a liquid crystal display device comprising a color filter substrate and an array substrate and a liquid crystal layer formed between the color filter substrate and the array substrate,
The step of cleaning the color filter substrate or the array substrate before and after performing a photo process on the color filter substrate or the array substrate
(a) removing organic substances present on the surface of the color filter substrate or the array substrate;
(b) spraying the washing water at a predetermined angle with respect to the vertical direction of the color filter substrate or the array substrate from which the organic material has been removed, and performing the first washing, the second washing, and the last washing on the color filter substrate or the array substrate. ; And
(c) drying the cleaned color filter substrate or array substrate, wherein steps (a) to (c) are performed in-line. 11. The method of claim 10, wherein the steps (a) to (c) are carried out in the in-line form to convey the color filter substrate or the array substrate and to perform each cleaning process. The method of claim 10, wherein the first cleaning uses a roll brush. The method of claim 10, wherein the first cleaning, the second cleaning, and the last cleaning of the color filter substrate or the array substrate are performed at a predetermined angle with respect to the vertical direction of the color filter substrate or the array substrate from which the organic material is removed. And spraying the washing water at a predetermined angle with respect to the color filter substrate or the array substrate through at least one spraying unit. The method of claim 13, wherein the jetting part is inclined at a predetermined angle to blow off the lower end of the foreign material on the surface of the color filter substrate or the array substrate. The method of claim 13, wherein the jetting unit is disposed at an angle of 5 ° to 15 ° with respect to the vertical direction of the color filter substrate or the array substrate.

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