KR102088905B1 - 구동기 유도 노즐 세정 기능을 갖는 방울 생성기 - Google Patents

구동기 유도 노즐 세정 기능을 갖는 방울 생성기 Download PDF

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Publication number
KR102088905B1
KR102088905B1 KR1020197002104A KR20197002104A KR102088905B1 KR 102088905 B1 KR102088905 B1 KR 102088905B1 KR 1020197002104 A KR1020197002104 A KR 1020197002104A KR 20197002104 A KR20197002104 A KR 20197002104A KR 102088905 B1 KR102088905 B1 KR 102088905B1
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South Korea
Prior art keywords
waveform
droplets
series
droplet
frequency
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Expired - Fee Related
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English (en)
Korean (ko)
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KR20190011820A (ko
Inventor
치라그 라즈야구루
피터 바움가르트
조글리 오. 바스첸코
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에이에스엠엘 네델란즈 비.브이.
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0023—Constructional details of the ejection system
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0094—Reduction, prevention or protection from contamination; Cleaning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/006—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state details of the ejection system, e.g. constructional details of the nozzle
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/005—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state containing a metal as principal radiation generating component
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020197002104A 2011-05-13 2012-03-29 구동기 유도 노즐 세정 기능을 갖는 방울 생성기 Expired - Fee Related KR102088905B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/107,804 US8513629B2 (en) 2011-05-13 2011-05-13 Droplet generator with actuator induced nozzle cleaning
US13/107,804 2011-05-13
PCT/US2012/031257 WO2013077901A1 (en) 2011-05-13 2012-03-29 Droplet generator with actuator induced nozzle cleaning

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020137032824A Division KR101943528B1 (ko) 2011-05-13 2012-03-29 구동기 유도 노즐 세정 기능을 갖는 방울 생성기

Publications (2)

Publication Number Publication Date
KR20190011820A KR20190011820A (ko) 2019-02-07
KR102088905B1 true KR102088905B1 (ko) 2020-03-16

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020137032824A Expired - Fee Related KR101943528B1 (ko) 2011-05-13 2012-03-29 구동기 유도 노즐 세정 기능을 갖는 방울 생성기
KR1020197002104A Expired - Fee Related KR102088905B1 (ko) 2011-05-13 2012-03-29 구동기 유도 노즐 세정 기능을 갖는 방울 생성기

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020137032824A Expired - Fee Related KR101943528B1 (ko) 2011-05-13 2012-03-29 구동기 유도 노즐 세정 기능을 갖는 방울 생성기

Country Status (6)

Country Link
US (1) US8513629B2 (enExample)
EP (1) EP2707099A4 (enExample)
JP (1) JP5863955B2 (enExample)
KR (2) KR101943528B1 (enExample)
TW (1) TWI539867B (enExample)
WO (1) WO2013077901A1 (enExample)

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US8829477B2 (en) 2010-03-10 2014-09-09 Asml Netherlands B.V. Droplet generator with actuator induced nozzle cleaning
JP6081711B2 (ja) * 2011-09-23 2017-02-15 エーエスエムエル ネザーランズ ビー．ブイ． 放射源
US8816305B2 (en) * 2011-12-20 2014-08-26 Asml Netherlands B.V. Filter for material supply apparatus
JP6099241B2 (ja) * 2012-06-28 2017-03-22 ギガフォトン株式会社 ターゲット供給装置
TWI618453B (zh) * 2013-01-10 2018-03-11 Ａｓｍｌ荷蘭公司 用以調整雷射光束脈衝時序以調節極端紫外光劑量之方法及系統
JP6168797B2 (ja) * 2013-03-08 2017-07-26 ギガフォトン株式会社 極端紫外光生成装置
JP6151941B2 (ja) 2013-03-22 2017-06-21 ギガフォトン株式会社 ターゲット生成装置及び極端紫外光生成装置
JP6426602B2 (ja) * 2013-05-21 2018-11-21 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光の生成方法
US9241395B2 (en) * 2013-09-26 2016-01-19 Asml Netherlands B.V. System and method for controlling droplet timing in an LPP EUV light source
US9497840B2 (en) * 2013-09-26 2016-11-15 Asml Netherlands B.V. System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source
WO2015111219A1 (ja) * 2014-01-27 2015-07-30 ギガフォトン株式会社 レーザ装置、及び極端紫外光生成システム
US9678431B2 (en) * 2015-03-16 2017-06-13 Taiwan Semiconductor Manufacturing Company, Ltd. EUV lithography system and method with optimized throughput and stability
US9888554B2 (en) * 2016-01-21 2018-02-06 Asml Netherlands B.V. System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
WO2018069976A1 (ja) * 2016-10-11 2018-04-19 ギガフォトン株式会社 ターゲット供給装置
TWI634391B (zh) * 2017-06-23 2018-09-01 台灣積體電路製造股份有限公司 噴嘴模組、微影裝置及其操作方法
US10824083B2 (en) * 2017-09-28 2020-11-03 Taiwan Semiconductor Manufacturing Co., Ltd. Light source, EUV lithography system, and method for generating EUV radiation
TWI821231B (zh) 2018-01-12 2023-11-11 荷蘭商Ａｓｍｌ荷蘭公司 用於控制在液滴串流中液滴聚結之裝置與方法
JP7428654B2 (ja) * 2018-03-28 2024-02-06 エーエスエムエル ネザーランズ ビー．ブイ． 液滴発生器性能を監視及び制御する装置及び方法
US10719020B2 (en) 2018-06-29 2020-07-21 Taiwan Semiconductor Manufacturing Co., Ltd. Droplet generator and method of servicing extreme ultraviolet radiation source apparatus
US20200057376A1 (en) * 2018-08-14 2020-02-20 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and lithography method
NL2023879A (en) 2018-09-26 2020-05-01 Asml Netherlands Bv Apparatus for and method of controlling introduction of euv target material into an euv chamber
TWI826559B (zh) * 2018-10-29 2023-12-21 荷蘭商Ａｓｍｌ荷蘭公司 延長靶材輸送系統壽命之裝置及方法
WO2020163283A1 (en) * 2019-02-07 2020-08-13 University Of Washington Devices and systems for droplet generation and methods for generating droplets
WO2020173677A1 (en) 2019-02-26 2020-09-03 Asml Netherlands B.V. Apparatus for and method of controlling droplet generator performance
KR20220003531A (ko) 2019-05-06 2022-01-10 에이에스엠엘 네델란즈 비.브이. 액적 형성을 제어하기 위한 장치 및 방법
CN114846908A (zh) * 2019-12-20 2022-08-02 Asml荷兰有限公司 源材料传输系统、euv辐射系统、光刻设备及其方法
US12295088B2 (en) 2020-05-22 2025-05-06 Asml Netherlands B.V. Hybrid droplet generator for extreme ultraviolet light sources in lithographic radiation systems
US20240006838A1 (en) * 2020-12-16 2024-01-04 Cymer, Llc Apparatus for and method of modulating a wavelength of an excimer laser as a function of its repetition frequency
CN120188574A (zh) 2022-11-16 2025-06-20 Asml荷兰有限公司 液滴流对准机构及其方法
CN116528448A (zh) * 2023-04-11 2023-08-01 广东省智能机器人研究院 均匀液滴产生装置及极紫外光源
CN116567903A (zh) * 2023-04-26 2023-08-08 中国科学院上海光学精密机械研究所 极紫外光刻光源产生稳定液滴靶的调控系统和方法
WO2025140811A1 (en) 2023-12-29 2025-07-03 Asml Netherlands B.V. Extreme ultraviolet light generation sequence for an extreme ultraviolet light source
WO2025140805A1 (en) 2023-12-29 2025-07-03 Asml Netherlands B.V. Systems and methods of laser-to-droplet positioning with tilt range keep assist during extreme ultraviolet radiation generation
WO2025153240A1 (en) 2024-01-16 2025-07-24 Asml Netherlands B.V. Gas flow reallocation in light source
WO2025256809A1 (en) 2024-06-12 2025-12-18 Asml Netherlands B.V. Systems and methods of increasing laser optical output

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Also Published As

Publication number Publication date
EP2707099A1 (en) 2014-03-19
JP5863955B2 (ja) 2016-02-17
KR20190011820A (ko) 2019-02-07
TW201247033A (en) 2012-11-16
US8513629B2 (en) 2013-08-20
KR101943528B1 (ko) 2019-01-29
JP2014519682A (ja) 2014-08-14
KR20140041537A (ko) 2014-04-04
WO2013077901A1 (en) 2013-05-30
EP2707099A4 (en) 2014-12-17
TWI539867B (zh) 2016-06-21
US20120286176A1 (en) 2012-11-15

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