KR102072212B1 - 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터 - Google Patents
신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터 Download PDFInfo
- Publication number
- KR102072212B1 KR102072212B1 KR1020170003109A KR20170003109A KR102072212B1 KR 102072212 B1 KR102072212 B1 KR 102072212B1 KR 1020170003109 A KR1020170003109 A KR 1020170003109A KR 20170003109 A KR20170003109 A KR 20170003109A KR 102072212 B1 KR102072212 B1 KR 102072212B1
- Authority
- KR
- South Korea
- Prior art keywords
- formula
- represented
- compound
- group
- photosensitive resin
- Prior art date
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- XDYGKKDGVJMLCF-UHFFFAOYSA-N Clc1cccc(Cl)c1Oc(c(Cl)c(c1c2/N=C(/c(c(Cl)c3Cl)c4c(Cl)c3Oc(c(Cl)ccc3)c3Cl)\N=C4/N=C(/c(c(Cl)c3Cl)c(/C4=N/C(c(c5c(c(Oc(cccc6)c6-c6ccccc6)c6Cl)Cl)c6Cl)=N/C5=N5)c(Cl)c3Oc(c(Cl)ccc3)c3Cl)\N4[Zn][n]2c5c11)Cl)c1Cl Chemical compound Clc1cccc(Cl)c1Oc(c(Cl)c(c1c2/N=C(/c(c(Cl)c3Cl)c4c(Cl)c3Oc(c(Cl)ccc3)c3Cl)\N=C4/N=C(/c(c(Cl)c3Cl)c(/C4=N/C(c(c5c(c(Oc(cccc6)c6-c6ccccc6)c6Cl)Cl)c6Cl)=N/C5=N5)c(Cl)c3Oc(c(Cl)ccc3)c3Cl)\N4[Zn][n]2c5c11)Cl)c1Cl XDYGKKDGVJMLCF-UHFFFAOYSA-N 0.000 description 2
- PYTTVOUWXTYAPM-UHFFFAOYSA-N Clc(cc1)cc(Oc(c(Cl)c(c2c3/N=C(/c(c(Cl)c4Cl)c5c(Cl)c4Oc(cccc4)c4-c4ccccc4)\N=C5/N=C(/c(c(Cl)c4Cl)c(/C5=N/C(c(c6c(c(Oc(cccc7)c7-c7ccccc7)c7Cl)Cl)c7Cl)=N/C6=N6)c(Cl)c4Oc(cc(cc4)Cl)c4Cl)\N5[Zn][n]3c6c22)Cl)c2Cl)c1Cl Chemical compound Clc(cc1)cc(Oc(c(Cl)c(c2c3/N=C(/c(c(Cl)c4Cl)c5c(Cl)c4Oc(cccc4)c4-c4ccccc4)\N=C5/N=C(/c(c(Cl)c4Cl)c(/C5=N/C(c(c6c(c(Oc(cccc7)c7-c7ccccc7)c7Cl)Cl)c7Cl)=N/C6=N6)c(Cl)c4Oc(cc(cc4)Cl)c4Cl)\N5[Zn][n]3c6c22)Cl)c2Cl)c1Cl PYTTVOUWXTYAPM-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
- C07D487/22—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains four or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B47/00—Porphines; Azaporphines
- C09B47/04—Phthalocyanines abbreviation: Pc
- C09B47/08—Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
- C09B47/085—Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex substituting the central metal atom
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710177372.5A CN107522704B (zh) | 2016-06-16 | 2017-03-23 | 新颖化合物、包含其的感光性树脂组成物以及彩色滤光片 |
| TW106109877A TWI627234B (zh) | 2016-06-16 | 2017-03-24 | 新穎化合物、包括其的光敏樹脂組成物及彩色濾光片 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20160075318 | 2016-06-16 | ||
| KR1020160075318 | 2016-06-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20170142096A KR20170142096A (ko) | 2017-12-27 |
| KR102072212B1 true KR102072212B1 (ko) | 2020-01-31 |
Family
ID=60938695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020170003109A KR102072212B1 (ko) | 2016-06-16 | 2017-01-09 | 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터 |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR102072212B1 (zh) |
| CN (1) | CN107522704B (zh) |
| TW (1) | TWI627234B (zh) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102061244B1 (ko) * | 2017-05-17 | 2019-12-31 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터 |
| KR102325836B1 (ko) * | 2018-11-06 | 2021-11-11 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터 |
| KR102577766B1 (ko) * | 2020-03-20 | 2023-09-12 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러필터 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014028950A (ja) * | 2012-07-04 | 2014-02-13 | Nippon Shokubai Co Ltd | 組成物およびカラーフィルタ |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102059198B1 (ko) * | 2012-03-22 | 2019-12-24 | 가부시키가이샤 닛폰 쇼쿠바이 | 광 선택 투과 필터, 수지 시트 및 고체 촬상 소자 |
| KR101750462B1 (ko) * | 2014-05-12 | 2017-06-23 | 제일모직 주식회사 | 신규한 화합물, 신규한 혼합물, 감광성 수지 조성물, 및 컬러 필터 |
-
2017
- 2017-01-09 KR KR1020170003109A patent/KR102072212B1/ko active IP Right Grant
- 2017-03-23 CN CN201710177372.5A patent/CN107522704B/zh active Active
- 2017-03-24 TW TW106109877A patent/TWI627234B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014028950A (ja) * | 2012-07-04 | 2014-02-13 | Nippon Shokubai Co Ltd | 組成物およびカラーフィルタ |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107522704A (zh) | 2017-12-29 |
| TW201800497A (zh) | 2018-01-01 |
| TWI627234B (zh) | 2018-06-21 |
| KR20170142096A (ko) | 2017-12-27 |
| CN107522704B (zh) | 2022-06-07 |
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