KR102047392B1 - 나노구조화된 재료 및 그의 제조방법 - Google Patents

나노구조화된 재료 및 그의 제조방법 Download PDF

Info

Publication number
KR102047392B1
KR102047392B1 KR1020147029907A KR20147029907A KR102047392B1 KR 102047392 B1 KR102047392 B1 KR 102047392B1 KR 1020147029907 A KR1020147029907 A KR 1020147029907A KR 20147029907 A KR20147029907 A KR 20147029907A KR 102047392 B1 KR102047392 B1 KR 102047392B1
Authority
KR
South Korea
Prior art keywords
nanostructured
polymeric matrix
layer
phase
acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020147029907A
Other languages
English (en)
Korean (ko)
Other versions
KR20140139074A (ko
Inventor
타-후아 유
모세스 엠 데이비드
압두자바르 케이 디레
알버트 아이 에버에츠
윌리암 블레이크 콜브
토드 엠 샌드맨
?스케 스즈키
스코트 에이 워커
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쓰리엠 이노베이티브 프로퍼티즈 캄파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 캄파니
Publication of KR20140139074A publication Critical patent/KR20140139074A/ko
Application granted granted Critical
Publication of KR102047392B1 publication Critical patent/KR102047392B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/118Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/16Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B2207/00Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
    • G02B2207/101Nanooptics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334Etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334Etching
    • H01J2237/3343Problems associated with etching
    • H01J2237/3345Problems associated with etching anisotropy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/778Nanostructure within specified host or matrix material, e.g. nanocomposite films
    • Y10S977/781Possessing nonosized surface openings that extend partially into or completely through the host material

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biophysics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
KR1020147029907A 2012-03-26 2013-02-22 나노구조화된 재료 및 그의 제조방법 Expired - Fee Related KR102047392B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261615646P 2012-03-26 2012-03-26
US61/615,646 2012-03-26
PCT/US2013/027348 WO2013148031A1 (en) 2012-03-26 2013-02-22 Nanostructured material and method of making the same

Publications (2)

Publication Number Publication Date
KR20140139074A KR20140139074A (ko) 2014-12-04
KR102047392B1 true KR102047392B1 (ko) 2019-11-21

Family

ID=47913545

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147029907A Expired - Fee Related KR102047392B1 (ko) 2012-03-26 2013-02-22 나노구조화된 재료 및 그의 제조방법

Country Status (7)

Country Link
US (2) US9651715B2 (https=)
EP (1) EP2831648B1 (https=)
JP (2) JP6339557B2 (https=)
KR (1) KR102047392B1 (https=)
CN (1) CN104335078B (https=)
SG (1) SG11201406122WA (https=)
WO (1) WO2013148031A1 (https=)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6339557B2 (ja) 2012-03-26 2018-06-06 スリーエム イノベイティブ プロパティズ カンパニー ナノ構造化材料及びその作製方法
US20150202834A1 (en) 2014-01-20 2015-07-23 3M Innovative Properties Company Lamination transfer films for forming antireflective structures
TW201539736A (zh) 2014-03-19 2015-10-16 3M新設資產公司 用於藉白光成色之 oled 裝置的奈米結構
SG11201706397XA (en) * 2015-02-04 2017-09-28 Agency Science Tech & Res Anti-reflection coating
CN107533286B (zh) * 2015-04-29 2022-02-08 3M创新有限公司 溶胀性成膜组合物及采用所述溶胀性成膜组合物进行纳米压印光刻的方法
CN108136065A (zh) 2015-06-29 2018-06-08 3M创新有限公司 抗微生物制品及其使用方法
JP6784487B2 (ja) 2015-10-30 2020-11-11 デクセリアルズ株式会社 光学体、および表示装置
WO2017196721A1 (en) 2016-05-12 2017-11-16 3M Innovative Properties Company Protective headgear comprising a curved switchable shutter and comprising multiple antireflective layers
EP3694815A4 (en) * 2017-10-10 2020-11-11 Central Glass Co., Ltd. IMPROVED ANTI-REFLECTIVE FUNCTIONAL COATING FOR GLAZING
US11422294B2 (en) 2017-10-10 2022-08-23 Central Glass Company, Limited Durable functional coatings
US20200238667A1 (en) * 2017-10-10 2020-07-30 Central Glass Company, Limited Use of uv-sensitive interlayer materials with nano-structured functional coating
CA3083615A1 (en) * 2017-12-21 2019-06-27 Brent MACINNIS Eyewear and methods for making eyewear
EP3735574A1 (en) 2018-01-05 2020-11-11 3M Innovative Properties Company Stray light absorbing film
CN112334549A (zh) * 2018-06-20 2021-02-05 美国圣戈班性能塑料公司 具有抗反射涂层的复合膜
EP3924770A4 (en) 2019-02-14 2022-04-27 Central Glass Co., Ltd. VEHICLE WINDSHIELD INTENDED FOR USE WITH A HEAD-UP DISPLAY SYSTEM
DE112019007446T5 (de) * 2019-06-11 2022-03-03 Nalux Co., Ltd. Verfahren zur herstellung eines kunststoffelements, das mit feineroberflächenrauigkeit bereitgestellt ist
DE102023111441A1 (de) * 2023-05-03 2024-11-07 Gesellschaft für angewandte Mikro- und Optoelektronik mit beschränkter Haftung - AMO GmbH Verfahren zur Herstellung eines strukturierten Bauteils, sowie strukturiertes Bauteil

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010123528A2 (en) * 2008-12-30 2010-10-28 3M Innovative Properties Company Nanostructured articles and methods of making nanostructured articles

Family Cites Families (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2064987B (en) 1979-11-14 1983-11-30 Toray Industries Process for producing transparent shaped article having enhanced anti-reflective effect
KR100430351B1 (ko) 1993-12-21 2004-05-04 미네소타 마이닝 앤드 매뉴팩춰링 캄파니 휘도 향상 디바이스
EP0962807B1 (en) 1993-12-21 2008-12-03 Minnesota Mining And Manufacturing Company Multilayered optical film
KR100344364B1 (ko) 1993-12-21 2002-11-30 미네소타 마이닝 앤드 매뉴팩춰링 캄파니 광학편광자및디스플레이장치
US5882774A (en) 1993-12-21 1999-03-16 Minnesota Mining And Manufacturing Company Optical film
CN1052795C (zh) 1993-12-21 2000-05-24 美国3M公司 光学显示器
CN1106937C (zh) 1995-06-26 2003-04-30 美国3M公司 带有附加涂层或附加层的多层聚合物薄膜
US5867316A (en) 1996-02-29 1999-02-02 Minnesota Mining And Manufacturing Company Multilayer film having a continuous and disperse phase
US5825543A (en) 1996-02-29 1998-10-20 Minnesota Mining And Manufacturing Company Diffusely reflecting polarizing element including a first birefringent phase and a second phase
US5888594A (en) 1996-11-05 1999-03-30 Minnesota Mining And Manufacturing Company Process for depositing a carbon-rich coating on a moving substrate
US6210858B1 (en) 1997-04-04 2001-04-03 Fuji Photo Film Co., Ltd. Anti-reflection film and display device using the same
KR100601228B1 (ko) 1998-01-13 2006-07-19 미네소타 마이닝 앤드 매뉴팩춰링 캄파니 다층 광학 필름의 제조 방법
EP1548045B1 (en) 1998-01-13 2009-06-03 Minnesota Mining And Manufacturing Company Modified copolyesters
US6808658B2 (en) 1998-01-13 2004-10-26 3M Innovative Properties Company Method for making texture multilayer optical films
JP4316696B2 (ja) 1998-02-12 2009-08-19 株式会社きもと アンチニュートンリング性フィルム
KR100905142B1 (ko) 2001-01-15 2009-06-29 쓰리엠 이노베이티브 프로퍼티즈 컴파니 가시 파장 영역에서의 높고 평활한 투과율을 가진 다층적외선 반사 필름 및 그로부터 제조된 라미네이트 제품
US6645843B2 (en) 2001-01-19 2003-11-11 The United States Of America As Represented By The Secretary Of The Navy Pulsed laser deposition of transparent conducting thin films on flexible substrates
DE10241708B4 (de) 2002-09-09 2005-09-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Reduzierung der Grenzflächenreflexion von Kunststoffsubstraten sowie derart modifiziertes Substrat und dessen Verwendung
EP1539378A2 (en) 2002-09-19 2005-06-15 Optimax Technology Corp. Antiglare and antireflection coatings of surface active nanoparticles
EP1479734B1 (en) 2003-05-20 2009-02-11 DSM IP Assets B.V. Nano-structured surface coating process, nano-structured coatings and articles comprising the coating
JP5201435B2 (ja) 2004-03-30 2013-06-05 株式会社ニコン 光学系
US7378136B2 (en) 2004-07-09 2008-05-27 3M Innovative Properties Company Optical film coating
US7345137B2 (en) 2004-10-18 2008-03-18 3M Innovative Properties Company Modified copolyesters and optical films including modified copolyesters
US20090231714A1 (en) * 2005-09-19 2009-09-17 Yang Zhao Transparent anti-reflective article and method of fabricating same
JP2007334150A (ja) * 2006-06-16 2007-12-27 Fujifilm Corp 窓用偏光膜及び乗り物用前窓
CN101657522B (zh) 2007-04-13 2014-05-07 3M创新有限公司 防静电光学透明的压敏粘合剂
US7604381B2 (en) 2007-04-16 2009-10-20 3M Innovative Properties Company Optical article and method of making
GB0712605D0 (en) * 2007-06-28 2007-08-08 Microsharp Corp Ltd Optical film
JP5380803B2 (ja) 2007-08-03 2014-01-08 王子ホールディングス株式会社 非平面上単粒子膜の製造方法、該単粒子膜エッチングマスクを用いた微細構造体の製造方法および該製造方法で得られた微細構造体。
US20090059368A1 (en) * 2007-08-27 2009-03-05 Fujifilm Corporation Optical film, and glass
US20090087629A1 (en) 2007-09-28 2009-04-02 Everaerts Albert I Indium-tin-oxide compatible optically clear adhesive
JP2009128538A (ja) 2007-11-21 2009-06-11 Panasonic Corp 反射防止構造体の製造方法
US20100294989A1 (en) * 2007-12-28 2010-11-25 Shaffer Ii Edward O Small scale functional materials
JP4945460B2 (ja) 2008-01-04 2012-06-06 株式会社東芝 反射防止構造の形成方法および反射防止構造
US8673419B2 (en) 2008-03-14 2014-03-18 3M Innovative Properties Company Stretch releasable adhesive tape
NZ605100A (en) 2008-03-14 2014-12-24 3M Innovative Properties Co Assembly comprising a stretch releasable adhesive article
US20100028564A1 (en) 2008-07-29 2010-02-04 Ming Cheng Antistatic optical constructions having optically-transmissive adhesives
EP2315663B1 (en) 2008-08-12 2020-09-23 3M Innovative Properties Company Adhesives compatible with corrosion sensitive layers
KR20110110240A (ko) 2008-12-30 2011-10-06 쓰리엠 이노베이티브 프로퍼티즈 컴파니 반사방지 용품 및 이의 제조 방법
EP2379442A4 (en) * 2008-12-30 2014-02-26 3M Innovative Properties Co METHOD FOR PRODUCING NANOSTRUCTURED SURFACES
EP2379660A1 (en) 2008-12-31 2011-10-26 3M Innovative Properties Company Stretch releasable adhesive tape
SG183850A1 (en) 2010-03-03 2012-10-30 3M Innovative Properties Co Composite with nano-structured layer
KR20130014525A (ko) 2010-03-03 2013-02-07 쓰리엠 이노베이티브 프로퍼티즈 컴파니 나노구조화된 표면을 갖는 코팅된 편광기 및 이의 제조 방법
JP5977260B2 (ja) 2011-02-02 2016-08-24 スリーエム イノベイティブ プロパティズ カンパニー 暗い多層導電体トレースを有するパターン化基材
US20140004304A1 (en) 2011-03-14 2014-01-02 3M Innovative Properties Company Multilayer nanostructured articles
BR112013023128A2 (pt) 2011-03-14 2019-09-24 3M Innovative Properties Co artigos nanoestruturados
SG2014011746A (en) 2011-08-17 2014-08-28 3M Innovative Properties Co Nanostructured articles and methods to make the same
JP6339557B2 (ja) 2012-03-26 2018-06-06 スリーエム イノベイティブ プロパティズ カンパニー ナノ構造化材料及びその作製方法
SG11201405941QA (en) 2012-03-26 2014-10-30 3M Innovative Properties Co Article and method of making the same
US9400343B1 (en) * 2014-04-30 2016-07-26 Magnolia Optical Technologies, Inc. Highly durable hydrophobic antireflection structures and method of manufacturing the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010123528A2 (en) * 2008-12-30 2010-10-28 3M Innovative Properties Company Nanostructured articles and methods of making nanostructured articles

Also Published As

Publication number Publication date
WO2013148031A1 (en) 2013-10-03
EP2831648B1 (en) 2016-09-14
KR20140139074A (ko) 2014-12-04
EP2831648A1 (en) 2015-02-04
US10126469B2 (en) 2018-11-13
US20150077854A1 (en) 2015-03-19
CN104335078B (zh) 2017-08-08
US20170221680A1 (en) 2017-08-03
JP6339557B2 (ja) 2018-06-06
JP2018028693A (ja) 2018-02-22
CN104335078A (zh) 2015-02-04
JP6685987B2 (ja) 2020-04-22
US9651715B2 (en) 2017-05-16
SG11201406122WA (en) 2014-10-30
JP2015514231A (ja) 2015-05-18

Similar Documents

Publication Publication Date Title
KR102047392B1 (ko) 나노구조화된 재료 및 그의 제조방법
JP6298042B2 (ja) 物品及びその作製方法
EP2686389B1 (en) Nanostructured articles
EP2686716B1 (en) Multilayer nanostructured articles
CN102822253B (zh) 具有纳米结构化层的复合材料
EP2744857B1 (en) Nanostructured articles and methods to make the same

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20221025

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20231116

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20231116