KR102039920B1 - 이온 빔을 다루기 위한 장치 - Google Patents

이온 빔을 다루기 위한 장치 Download PDF

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Publication number
KR102039920B1
KR102039920B1 KR1020157013442A KR20157013442A KR102039920B1 KR 102039920 B1 KR102039920 B1 KR 102039920B1 KR 1020157013442 A KR1020157013442 A KR 1020157013442A KR 20157013442 A KR20157013442 A KR 20157013442A KR 102039920 B1 KR102039920 B1 KR 102039920B1
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South Korea
Prior art keywords
ion beam
electrodes
voltages
voltage
series
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KR1020157013442A
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English (en)
Korean (ko)
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KR20150074139A (ko
Inventor
성우 장
Original Assignee
베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크.
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Publication of KR20150074139A publication Critical patent/KR20150074139A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/121—Lenses electrostatic characterised by shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
KR1020157013442A 2012-10-24 2013-10-22 이온 빔을 다루기 위한 장치 Active KR102039920B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/658,990 US9165744B2 (en) 2012-10-24 2012-10-24 Apparatus for treating ion beam
US13/658,990 2012-10-24
PCT/US2013/066160 WO2014066375A1 (en) 2012-10-24 2013-10-22 Apparatus for treating ion beam

Publications (2)

Publication Number Publication Date
KR20150074139A KR20150074139A (ko) 2015-07-01
KR102039920B1 true KR102039920B1 (ko) 2019-11-04

Family

ID=49519127

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157013442A Active KR102039920B1 (ko) 2012-10-24 2013-10-22 이온 빔을 다루기 위한 장치

Country Status (6)

Country Link
US (1) US9165744B2 (https=)
JP (1) JP6453756B2 (https=)
KR (1) KR102039920B1 (https=)
CN (1) CN104823263B (https=)
TW (1) TWI597760B (https=)
WO (1) WO2014066375A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3193567A4 (en) * 2014-09-12 2018-05-09 Mitsubishi Electric Corporation Beam delivery system and particle beam therapy device
JP6462718B2 (ja) * 2014-12-04 2019-01-30 株式会社東芝 粒子線ビーム調整装置及び方法、粒子線治療装置
US9679745B2 (en) 2015-10-14 2017-06-13 Varian Semiconductor Equipment Associates, Inc. Controlling an ion beam in a wide beam current operation range
CN113380598A (zh) * 2020-03-09 2021-09-10 北京烁科中科信电子装备有限公司 一种离子注入机电扫描图形识别注入方法
US11217427B1 (en) * 2020-11-27 2022-01-04 Applied Materials, Inc. System, apparatus and method for bunched ribbon ion beam
CN113140436A (zh) * 2021-04-22 2021-07-20 大连交通大学 扫描式氩离子源
CN115376874B (zh) * 2022-08-23 2024-10-18 浙江陶特容器科技股份有限公司 一种基于离子注入机的离子束注入控制方法及装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110095175A1 (en) * 2004-04-20 2011-04-28 Micromass Uk Limited Mass spectrometer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5769653A (en) * 1980-10-20 1982-04-28 Fujitsu Ltd Charged particle beam device
JP2881649B2 (ja) 1989-03-22 1999-04-12 日本真空技術株式会社 イオン注入装置
JP3859437B2 (ja) * 2000-08-04 2006-12-20 株式会社東芝 荷電ビーム露光装置
JP4032111B2 (ja) 2001-07-19 2008-01-16 独立行政法人産業技術総合研究所 荷電粒子ビーム装置
JP5085887B2 (ja) * 2006-05-30 2012-11-28 株式会社Ｓｅｎ ビーム処理装置及びビーム処理方法
JP5329050B2 (ja) 2007-04-20 2013-10-30 株式会社Ｓｅｎ ビーム処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110095175A1 (en) * 2004-04-20 2011-04-28 Micromass Uk Limited Mass spectrometer

Also Published As

Publication number Publication date
CN104823263B (zh) 2017-05-24
WO2014066375A1 (en) 2014-05-01
US20140110596A1 (en) 2014-04-24
KR20150074139A (ko) 2015-07-01
JP2016502733A (ja) 2016-01-28
TW201421529A (zh) 2014-06-01
CN104823263A (zh) 2015-08-05
JP6453756B2 (ja) 2019-01-16
US9165744B2 (en) 2015-10-20
TWI597760B (zh) 2017-09-01

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