KR102004550B1 - 착색 감광성 수지 조성물, 컬러 필터 및 컬러 액정 표시 소자 - Google Patents

착색 감광성 수지 조성물, 컬러 필터 및 컬러 액정 표시 소자 Download PDF

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Publication number
KR102004550B1
KR102004550B1 KR1020130163743A KR20130163743A KR102004550B1 KR 102004550 B1 KR102004550 B1 KR 102004550B1 KR 1020130163743 A KR1020130163743 A KR 1020130163743A KR 20130163743 A KR20130163743 A KR 20130163743A KR 102004550 B1 KR102004550 B1 KR 102004550B1
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KR
South Korea
Prior art keywords
group
organic
hydrogen atom
resin composition
photosensitive resin
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KR1020130163743A
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English (en)
Korean (ko)
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KR20140083909A (ko
Inventor
다이 시오타
구니히로 노다
다츠로 이시카와
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도쿄 오카 고교 가부시키가이샤
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Publication of KR20140083909A publication Critical patent/KR20140083909A/ko
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Publication of KR102004550B1 publication Critical patent/KR102004550B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
    • C07D295/18—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carboxylic acids, or sulfur or nitrogen analogues thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
KR1020130163743A 2012-12-26 2013-12-26 착색 감광성 수지 조성물, 컬러 필터 및 컬러 액정 표시 소자 KR102004550B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012282919A JP6157111B2 (ja) 2012-12-26 2012-12-26 着色感光性樹脂組成物、カラーフィルタ及びカラー液晶表示素子
JPJP-P-2012-282919 2012-12-26

Publications (2)

Publication Number Publication Date
KR20140083909A KR20140083909A (ko) 2014-07-04
KR102004550B1 true KR102004550B1 (ko) 2019-10-01

Family

ID=51406224

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130163743A KR102004550B1 (ko) 2012-12-26 2013-12-26 착색 감광성 수지 조성물, 컬러 필터 및 컬러 액정 표시 소자

Country Status (3)

Country Link
JP (1) JP6157111B2 (zh)
KR (1) KR102004550B1 (zh)
TW (1) TWI621911B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI778035B (zh) * 2018-03-27 2022-09-21 奇美實業股份有限公司 負型白色感光性樹脂組成物及其應用

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4367280A (en) * 1977-01-20 1983-01-04 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JP2011095635A (ja) * 2009-10-30 2011-05-12 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物及びそれを用いたパターン形成方法
JP2012113256A (ja) 2010-11-26 2012-06-14 Wako Pure Chem Ind Ltd 感光性樹脂組成物

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928325B2 (ja) * 1976-11-22 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS5461164A (en) * 1977-10-20 1979-05-17 Fuji Photo Film Co Ltd 2-arylnaphtho1,8-bcfuran-5-ones, compositions and materials containing them
JP4635935B2 (ja) * 2006-03-29 2011-02-23 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP2008248109A (ja) * 2007-03-30 2008-10-16 The Inctec Inc 顔料分散液および着色感光性組成物
CN102365341B (zh) * 2009-03-31 2014-12-31 大日本印刷株式会社 碱产生剂、感光性树脂组合物、含有该感光性树脂组合物的图案形成用材料、使用该感光性树脂组合物的图案形成方法以及物品
JPWO2011013318A1 (ja) * 2009-07-29 2013-01-07 Jsr株式会社 着色組成物、カラーフィルタ及びカラー液晶表示素子
CN102439089B (zh) * 2010-06-28 2015-05-06 株式会社艾迪科 固化性树脂组合物
WO2012176693A1 (ja) * 2011-06-24 2012-12-27 東京応化工業株式会社 新規化合物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4367280A (en) * 1977-01-20 1983-01-04 Fuji Photo Film Co., Ltd. Photopolymerizable composition
JP2011095635A (ja) * 2009-10-30 2011-05-12 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物及びそれを用いたパターン形成方法
JP2012113256A (ja) 2010-11-26 2012-06-14 Wako Pure Chem Ind Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
JP6157111B2 (ja) 2017-07-05
JP2014126677A (ja) 2014-07-07
TW201439671A (zh) 2014-10-16
TWI621911B (zh) 2018-04-21
KR20140083909A (ko) 2014-07-04

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