JP6157111B2 - 着色感光性樹脂組成物、カラーフィルタ及びカラー液晶表示素子 - Google Patents

着色感光性樹脂組成物、カラーフィルタ及びカラー液晶表示素子 Download PDF

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Publication number
JP6157111B2
JP6157111B2 JP2012282919A JP2012282919A JP6157111B2 JP 6157111 B2 JP6157111 B2 JP 6157111B2 JP 2012282919 A JP2012282919 A JP 2012282919A JP 2012282919 A JP2012282919 A JP 2012282919A JP 6157111 B2 JP6157111 B2 JP 6157111B2
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group
organic
resin composition
photosensitive resin
meth
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JP2012282919A
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English (en)
Japanese (ja)
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JP2014126677A (ja
Inventor
大 塩田
大 塩田
国宏 野田
国宏 野田
達郎 石川
達郎 石川
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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP2012282919A priority Critical patent/JP6157111B2/ja
Priority to TW102145363A priority patent/TWI621911B/zh
Priority to KR1020130163743A priority patent/KR102004550B1/ko
Publication of JP2014126677A publication Critical patent/JP2014126677A/ja
Application granted granted Critical
Publication of JP6157111B2 publication Critical patent/JP6157111B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
    • C07D295/18—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carboxylic acids, or sulfur or nitrogen analogues thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
JP2012282919A 2012-12-26 2012-12-26 着色感光性樹脂組成物、カラーフィルタ及びカラー液晶表示素子 Active JP6157111B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012282919A JP6157111B2 (ja) 2012-12-26 2012-12-26 着色感光性樹脂組成物、カラーフィルタ及びカラー液晶表示素子
TW102145363A TWI621911B (zh) 2012-12-26 2013-12-10 著色感光性樹脂組成物、彩色濾光片及彩色液晶顯示元件
KR1020130163743A KR102004550B1 (ko) 2012-12-26 2013-12-26 착색 감광성 수지 조성물, 컬러 필터 및 컬러 액정 표시 소자

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012282919A JP6157111B2 (ja) 2012-12-26 2012-12-26 着色感光性樹脂組成物、カラーフィルタ及びカラー液晶表示素子

Publications (2)

Publication Number Publication Date
JP2014126677A JP2014126677A (ja) 2014-07-07
JP6157111B2 true JP6157111B2 (ja) 2017-07-05

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JP2012282919A Active JP6157111B2 (ja) 2012-12-26 2012-12-26 着色感光性樹脂組成物、カラーフィルタ及びカラー液晶表示素子

Country Status (3)

Country Link
JP (1) JP6157111B2 (zh)
KR (1) KR102004550B1 (zh)
TW (1) TWI621911B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI778035B (zh) * 2018-03-27 2022-09-21 奇美實業股份有限公司 負型白色感光性樹脂組成物及其應用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928325B2 (ja) * 1976-11-22 1984-07-12 富士写真フイルム株式会社 光重合性組成物
JPS6026122B2 (ja) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 光重合性組成物
JPS5461164A (en) * 1977-10-20 1979-05-17 Fuji Photo Film Co Ltd 2-arylnaphtho1,8-bcfuran-5-ones, compositions and materials containing them
JP4635935B2 (ja) * 2006-03-29 2011-02-23 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタおよびカラー液晶表示素子
JP2008248109A (ja) * 2007-03-30 2008-10-16 The Inctec Inc 顔料分散液および着色感光性組成物
JP5516574B2 (ja) * 2009-03-31 2014-06-11 大日本印刷株式会社 塩基発生剤、感光性樹脂組成物、当該感光性樹脂組成物からなるパターン形成用材料、当該感光性樹脂組成物を用いたパターン形成方法並びに物品
JPWO2011013318A1 (ja) * 2009-07-29 2013-01-07 Jsr株式会社 着色組成物、カラーフィルタ及びカラー液晶表示素子
JP2011095635A (ja) * 2009-10-30 2011-05-12 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物及びそれを用いたパターン形成方法
CN102439089B (zh) * 2010-06-28 2015-05-06 株式会社艾迪科 固化性树脂组合物
JP5617564B2 (ja) 2010-11-26 2014-11-05 和光純薬工業株式会社 感光性樹脂組成物
EP2725011B1 (en) * 2011-06-24 2021-10-27 Tokyo Ohka Kogyo Co., Ltd. Novel base generator and adhesion enhancer

Also Published As

Publication number Publication date
JP2014126677A (ja) 2014-07-07
TWI621911B (zh) 2018-04-21
TW201439671A (zh) 2014-10-16
KR102004550B1 (ko) 2019-10-01
KR20140083909A (ko) 2014-07-04

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