KR101968798B1 - 진공 증착 장치 - Google Patents
진공 증착 장치 Download PDFInfo
- Publication number
- KR101968798B1 KR101968798B1 KR1020150131559A KR20150131559A KR101968798B1 KR 101968798 B1 KR101968798 B1 KR 101968798B1 KR 1020150131559 A KR1020150131559 A KR 1020150131559A KR 20150131559 A KR20150131559 A KR 20150131559A KR 101968798 B1 KR101968798 B1 KR 101968798B1
- Authority
- KR
- South Korea
- Prior art keywords
- film
- organic material
- film thickness
- crystal
- evaporation
- Prior art date
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract description 16
- 239000013078 crystal Substances 0.000 claims abstract description 181
- 239000011368 organic material Substances 0.000 claims abstract description 147
- 239000010453 quartz Substances 0.000 claims abstract description 138
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 138
- 238000001704 evaporation Methods 0.000 claims abstract description 134
- 230000008020 evaporation Effects 0.000 claims abstract description 131
- 238000000151 deposition Methods 0.000 claims abstract description 82
- 230000010355 oscillation Effects 0.000 claims abstract description 71
- 230000008021 deposition Effects 0.000 claims abstract description 70
- 238000000034 method Methods 0.000 claims abstract description 21
- 230000008569 process Effects 0.000 claims abstract description 9
- 239000010408 film Substances 0.000 claims description 333
- 238000007740 vapor deposition Methods 0.000 claims description 43
- 239000000463 material Substances 0.000 claims description 37
- 238000012544 monitoring process Methods 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 22
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 238000005137 deposition process Methods 0.000 claims description 15
- 238000007738 vacuum evaporation Methods 0.000 claims description 13
- 230000007246 mechanism Effects 0.000 claims description 12
- 239000010409 thin film Substances 0.000 claims description 11
- 238000005019 vapor deposition process Methods 0.000 claims description 4
- 150000002739 metals Chemical class 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000012528 membrane Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- -1 composed of Al or Al Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H01L51/56—
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- H01L21/203—
-
- H01L51/001—
-
- H01L2251/56—
Landscapes
- Physical Vapour Deposition (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014200860A JP6448279B2 (ja) | 2014-09-30 | 2014-09-30 | 真空蒸着装置 |
| JPJP-P-2014-200860 | 2014-09-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160038746A KR20160038746A (ko) | 2016-04-07 |
| KR101968798B1 true KR101968798B1 (ko) | 2019-04-12 |
Family
ID=55601530
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020150131559A KR101968798B1 (ko) | 2014-09-30 | 2015-09-17 | 진공 증착 장치 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6448279B2 (zh) |
| KR (1) | KR101968798B1 (zh) |
| CN (1) | CN105463377B (zh) |
| TW (1) | TWI681066B (zh) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018077388A1 (en) * | 2016-10-25 | 2018-05-03 | Applied Materials, Inc. | Measurement assembly for measuring a deposition rate, evaporation source, deposition apparatus, and method therefor |
| US10763143B2 (en) * | 2017-08-18 | 2020-09-01 | Applied Materials, Inc. | Processing tool having a monitoring device |
| KR101870581B1 (ko) * | 2017-09-29 | 2018-06-22 | 캐논 톡키 가부시키가이샤 | 수정진동자의 수명 판정방법, 막두께 측정장치, 성막방법, 성막장치, 및 전자 디바이스 제조방법 |
| JP7301578B2 (ja) * | 2019-03-29 | 2023-07-03 | キヤノントッキ株式会社 | 成膜装置及び成膜方法 |
| CN109930112A (zh) * | 2019-04-15 | 2019-06-25 | 湖畔光电科技（江苏）有限公司 | 一种蒸镀腔体结构 |
| TWI701641B (zh) * | 2019-10-01 | 2020-08-11 | 龍翩真空科技股份有限公司 | 無線傳輸薄膜厚度監控裝置 |
| WO2021079589A1 (ja) * | 2019-10-21 | 2021-04-29 | 株式会社アルバック | 成膜装置 |
| CN111829428B (zh) * | 2020-06-17 | 2022-02-15 | 华中科技大学 | 一种双石英晶振膜厚控制仪及误差校正方法 |
| KR20220011924A (ko) * | 2020-07-22 | 2022-02-03 | 주식회사 엘지화학 | 실리콘계 코팅 조성물 및 이를 포함하는 실리콘계 이형필름 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005325400A (ja) * | 2004-05-13 | 2005-11-24 | Seiko Epson Corp | 真空蒸着装置及び薄膜形成方法 |
| JP2014065942A (ja) * | 2012-09-26 | 2014-04-17 | Hitachi High-Technologies Corp | 真空蒸着装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4233644B2 (ja) | 1998-09-22 | 2009-03-04 | 株式会社アルバック | 膜厚モニター用水晶振動子 |
| KR20120023273A (ko) * | 2010-09-01 | 2012-03-13 | (주)알파플러스 | 셔터를 이용하는 진공증착막의 두께 모니터링 방법 및 이 방법을 채용하는 진공증착장치 |
| JP5854731B2 (ja) * | 2010-11-04 | 2016-02-09 | キヤノン株式会社 | 成膜装置及びこれを用いた成膜方法 |
| TW201337013A (zh) * | 2012-03-12 | 2013-09-16 | Hitachi High Tech Corp | 蒸發源裝置及真空蒸鍍裝置及有機ｅｌ顯示裝置之製造方法 |
| JP2014070238A (ja) * | 2012-09-28 | 2014-04-21 | Hitachi High-Technologies Corp | 真空蒸着装置及びその蒸着方法 |
| CN103469172B (zh) * | 2013-08-31 | 2015-08-05 | 上海膜林科技有限公司 | 石英晶体镀膜厚度控制方法及石英晶体镀膜装置 |
| JP6223275B2 (ja) * | 2014-05-15 | 2017-11-01 | キヤノントッキ株式会社 | 水晶発振式膜厚計 |
-
2014
- 2014-09-30 JP JP2014200860A patent/JP6448279B2/ja active Active
-
2015
- 2015-08-17 TW TW104126707A patent/TWI681066B/zh active
- 2015-09-17 KR KR1020150131559A patent/KR101968798B1/ko active IP Right Grant
- 2015-09-22 CN CN201510607517.1A patent/CN105463377B/zh active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005325400A (ja) * | 2004-05-13 | 2005-11-24 | Seiko Epson Corp | 真空蒸着装置及び薄膜形成方法 |
| JP2014065942A (ja) * | 2012-09-26 | 2014-04-17 | Hitachi High-Technologies Corp | 真空蒸着装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016069694A (ja) | 2016-05-09 |
| CN105463377A (zh) | 2016-04-06 |
| CN105463377B (zh) | 2019-08-23 |
| KR20160038746A (ko) | 2016-04-07 |
| TW201627514A (zh) | 2016-08-01 |
| JP6448279B2 (ja) | 2019-01-09 |
| TWI681066B (zh) | 2020-01-01 |
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