KR101967359B1 - Substrate processing apparatus, apparatus management controller and program - Google Patents

Abstract

The structure which can shorten the time of abnormal analysis investigation is provided.
An operation unit for transmitting the device data generated during the execution of the recipe for processing the substrate to the storage unit; And a data matching control unit for matching each of the plurality of pieces of device data stored in the storage unit, wherein the operation unit notifies the data matching control unit of data indicating that an abnormal phenomenon has occurred in the device. The data matching control unit may include: a selecting unit which selects a recipe executed from the storage unit under the same condition as a recipe in which the abnormal phenomenon occurs; An acquisition unit for acquiring the device data from each of a recipe in which the abnormal phenomenon occurs and a recipe selected from the selection unit; And an operation unit for calculating a difference between the acquired device data, wherein the data matching control unit is configured to obtain the device data obtained from a recipe before and after occurrence of the abnormal phenomenon based on data indicating that the abnormal phenomenon has occurred. A substrate processing apparatus is provided that is configured to collide with.

Description

Substrate Processing Units, Device Management Controllers and Programs {SUBSTRATE PROCESSING APPARATUS, APPARATUS MANAGEMENT CONTROLLER AND PROGRAM}

The present invention relates to a substrate processing apparatus, an apparatus management controller, and a program.

In the semiconductor manufacturing field, information of a device, such as a substrate processing apparatus, is stored in a server in order to improve device operation rate or production efficiency. The accumulated information can be used when analyzing a device's trouble or monitoring the device's status. As used herein, "trouble" refers to an abnormal situation such as an abnormal situation in which a film is formed or a stop of the device due to a failure of the device.

When the conventional method of specifying the cause of the trouble is applied to an apparatus in which a large amount of data is held during substrate processing, the efficiency is low, it takes considerable time to identify the cause of the trouble, and the amount of data used is also large. Therefore, the method of specifying the cause of the conventional trouble may vary according to the skill of the repairman who analyzes the trouble. In addition, there are cases where the cause of the trouble cannot be specified when analyzing a conventional trouble due to reasons such as missing confirmation of important data. Therefore, various studies have been attempted to improve the operation rate of the apparatus by quickly identifying the cause of abnormality when analyzing a trouble.

For example, Patent Document 1 describes a method of collectively comparing files used in a substrate processing apparatus connected to a management device, and correcting the difference when a difference is extracted as a result of comparing the files. In addition, Patent Document 2 describes comparing files between conventional recipes, for example, comparing files of Process Recipe A and Process Recipe B. The ability to compare these files has the advantage that you can simply extract different data between the files. According to the analysis using the function of comparing files, it is expected to improve the efficiency of identifying the cause of the abnormality.

International Publication WO2014 / 189045 2. Japanese Patent No. 4587753

An object of the present invention is to provide a technique that can shorten the time for analyzing abnormalities.

According to one embodiment of the present invention, there is provided an apparatus comprising: an operation unit for transferring device data generated during execution of a recipe for processing a substrate to a storage unit; And a data matching control unit for matching each of the plurality of pieces of device data stored in the storage unit, wherein the operation unit notifies the data matching control unit of data indicating that an abnormal phenomenon has occurred in the device. The data matching control unit may include: a selecting unit which selects a recipe executed from the storage unit under the same condition as a recipe in which the abnormal phenomenon occurs; An acquisition unit for acquiring the device data from each of a recipe in which the abnormal phenomenon occurs and a recipe selected from the selection unit; And an operation unit for calculating a difference between the acquired device data, wherein the data matching control unit is configured to obtain the device data obtained from a recipe before and after occurrence of the abnormal phenomenon based on data indicating that the abnormal phenomenon has occurred. A technique is provided that includes a substrate processing apparatus that is configured to collide with.

According to the present invention, it is possible to shorten the time for analyzing the abnormality of the device in which the abnormality has occurred, and to reduce the device down time.

1 is a perspective view showing a substrate processing apparatus that is preferably used in one embodiment of the present invention.
2 is a side cross-sectional view showing a substrate processing apparatus preferably used in one embodiment of the present invention.
3 is a diagram showing the functional configuration of a control system preferably used in one embodiment of the present invention.
4 is a diagram showing a functional configuration of a main controller preferably used in one embodiment of the present invention.
5 is a diagram showing the configuration of a substrate processing system preferably used in one embodiment of the present invention.
6 is a view for explaining a functional configuration of a device management controller preferably used in one embodiment of the present invention.
7A illustrates a functional configuration of a device state monitoring control unit according to an embodiment of the present invention, and 7B illustrates a functional configuration of a data matching control unit according to an embodiment of the present invention.
8 is a view for explaining device data acquired by a device state monitoring control unit according to an embodiment of the present invention.
9 is a diagram for describing device data to be compared with files according to an embodiment of the present invention.
10 is a diagram showing an example of a processing flow executed by a data matching controller according to an embodiment of the present invention.
11 is a view showing an example for explaining a matching rate according to an embodiment of the present invention.
12 illustrates an example for explaining a method of calculating a threshold value used for calculating a matching rate according to an embodiment of the present invention.
FIG. 13 exemplarily shows a matching rate of device data according to an embodiment of the present invention in descending order. FIG.
14 is a view for explaining a file comparison function according to another embodiment of the present invention.
15 is a diagram illustrating a performance evaluation waveform table according to another embodiment of the present invention.
16 exemplarily shows a verification history screen according to an embodiment of the present invention.
17 is a diagram illustrating a data detail display screen according to an embodiment of the present invention.
18 is a diagram illustrating raw waveform data according to an embodiment of the present invention.
19 exemplarily shows a result of recipe comparison according to an embodiment of the present invention.

<Overview of Substrate Processing Unit>

Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. First, with reference to FIG. 1 and FIG. 2, the substrate processing apparatus 1 (henceforth simply a "device") to which this invention is implemented is demonstrated.

The substrate processing apparatus 1 is provided with a housing 2. An opening 4 (front maintenance sphere) is provided in the lower portion of the front wall 3 of the housing 2 so as to be maintainable, and the opening 4 is opened and closed by the front maintenance door 5.

A pod carrying in / out 6 is opened in the front wall 3 of the housing 2 so that the pod carrying in / out 6 communicates with the inside and outside of the housing 2, and the pod carrying in / out 6 is opened and closed by the front shutter 7 to carry in the pod. A load port 8 is provided at the front front side of the discharging opening 6, and the load port 8 is configured to align the placed pod 9.

The pod 9 is a hermetically sealed substrate transfer container, and is carried on the load port 8 by an in-process transfer device (not shown) and is carried out on the load port 8.

A rotary pod shelf 11 is provided at an upper portion in a substantially center portion in the front and rear direction in the housing 2, and the rotary pod shelf 11 is configured to store a plurality of pods 9.

The rotary pod shelf 11 includes a support 12 vertically inserted and intermittently rotated, and a plurality of shelf boards 13 radially supported at each position of the upper and lower ends of the support 12. (13) is comprised so that the pod 9 may be stored in the state which mounted several.

A pod opener 14 is provided below the rotary pod shelf 11, and the pod opener 14 includes a configuration in which the pod 9 is mounted and the lid of the pod 9 can be opened and closed. do.

A pod carrying mechanism 15 is provided between the load port 8, the rotary pod shelf 11, and the pod opener 14, and the pod carrying mechanism 15 holds and lifts the pod 9. It is possible to move forward and backward in a horizontal direction, and is configured to convey the pod 9 between the load port 8, the rotary pod shelf 11, and the pod opener 14.

The sub-body 16 is provided in the lower part in the substantially center part of the front-back direction in the front body 2 over a rear end. The front wall 17 of the sub-body 16 has a pair of wafer loading / unloading ports 19 for carrying in / out of the wafer 18 (hereinafter also referred to as a substrate) into the sub-body 16 in a vertical direction. The pod openers 14 are arranged in two stages, and are provided with respect to the upper and lower wafer loading and unloading ports 19.

The pod opener 14 includes a mounting table 21 on which the pod 9 is mounted, and an opening / closing mechanism 22 for opening and closing the cover of the pod 9. The pod opener 14 is configured to open and close the wafer entrance and exit of the pod 9 by opening and closing the lid of the pod 9 mounted on the mounting table 21 by the opening and closing mechanism 22.

The sub-mineral 16 constitutes a transfer chamber 23 which is hermetically sealed to a space (pod carrying space) in which the pod carrying mechanism 15 and the rotary pod shelf 11 are disposed. A wafer transfer mechanism 24 (substrate transfer mechanism) is provided in the front region of the transfer chamber 23, and the substrate transfer mechanism 24 requires the number of sheets for mounting the substrate 18 (five in the figure). A wafer placing plate 25, the wafer placing plate 25 being movable in the horizontal direction, rotatable in the horizontal direction, and lifting up and down. The substrate transfer mechanism 24 includes the boat 26 (substrate holding). The substrate 18 is configured to be loaded and discharged with respect to the sieve.

In the rear region of the transfer room 23, a waiting portion 27 is provided for receiving and waiting a boat 26. The upper portion of the waiting portion 27 is provided with a vertical processing. 28 is installed. The processing furnace 28 has a processing chamber 29 formed therein, the lower end of the processing chamber 29 serves as a furnace opening, and the furnace opening is opened and closed by a furnace opening shutter 31.

Between the right end of the housing 2 and the right end of the waiting section 27 of the sub-body 16, a boat elevator 32, which is a lifting mechanism for lifting the boat 26, is provided. A seal cap 34, which is an individual, is horizontally mounted on the arm 33 connected to the platform of the boat elevator 32, and the seal cap 34 supports the boat 26 vertically. The furnace 26 is hermetically closed in a state where the boat 26 is inserted into the processing chamber 29.

The boat 26 is comprised so that the board | substrate 18 of several sheets (for example, about 50-125 sheets) may be hold | maintained in multiple stages in the horizontal position centering on the center.

A clean unit 35 is disposed at a position facing the boat elevator 32 side, and the clean unit 35 is supplied with a supply fan and dustproof to supply clean air 36 which is a clean atmosphere or an inert gas. It consists of a filter. Between the substrate transfer mechanism 24 and the clean unit 35, a notch matching device (not shown), which is a substrate matching device that matches the position in the circumferential direction of the substrate 18, is provided.

The clean air 36 discharged from the clean unit 35 is sucked by a duct not shown after being distributed to the notch matching device (not shown) and the substrate transfer mechanism 24 and the boat 26 and the It is comprised so that it may be exhausted to the outside or discharged in the transfer chamber 23 by the clean unit 35.

Next, operation | movement of the substrate processing apparatus 1 is demonstrated.

When the pod 9 is supplied to the load port 8, the pod loading and unloading opening 6 is opened by the front shutter 7. The pod 9 on the load port 8 is carried by the pod carrying device 15 into the interior of the housing 2 through the pod carrying-out port 6, and designated shelf plate 13 of the rotary pod shelf 11. Wit). After the pod 9 is temporarily stored in the rotary pod shelf 11, it is conveyed from the shelf board 13 to one of the pod openers 14 by the pod conveying device 15, and placed on the mounting table 21. ) Or on the mounting table 21 directly from the load port (8).

At this time, the wafer loading / unloading port 19 is closed by the opening / closing mechanism 22 and the transfer chamber 23 is filled with the clean air 36 flowing. Since the transfer chamber 23 is filled with nitrogen gas as the clean air 36, the oxygen concentration in the transfer chamber 23 is lower than the oxygen concentration inside the housing 2.

The pod 9 mounted on the mounting table 21 has a cross section at the opening side of the pod 9 of the opening of the wafer loading / unloading port 19 in the front wall 17 of the sub-body 16. ), The lid is removed by the opening / closing mechanism 22 to open the wafer entrance and exit.

When the pod 9 is opened by the pod opener 14, the substrate 18 is taken out from the pod 9 by the substrate transfer mechanism 24 and transferred to a notch matching device (not shown), After matching the substrate 18 in the notch matching device, the substrate transfer mechanism 24 loads the substrate 18 into the standby portion 27 behind the transfer chamber 23 and loads it in the boat 26.

The board transfer mechanism 24 which transfers the board | substrate 18 to the said boat 26 returns to the pod 9, and loads the next board | substrate 18 to the boat 26. FIG.

Rotating pods to the pod opener 14 on the other (bottom or top) during the loading operation to the boat 26 of the substrate 18 by the substrate transfer mechanism 24 on one (top or bottom) pod opener 14. Another pod 9 is transferred from the shelf 11 by the pod carrying device 15 and transferred, and the opening work of the pod 9 by the other pod opener 14 proceeds simultaneously.

When a predetermined number of substrates 18 are loaded in the boat 26, the furnace port portion of the processing furnace 28 closed by the furnace port shutter 31 is opened by the furnace port shutter 31. Subsequently, the boat 26 is lifted up by the boat elevator 32 and loaded into the processing chamber 29 (loading).

After loading, the furnace port part is hermetically closed by the seal cap 34. In addition, the present embodiment includes a purge process (pre purge process) in which the internal atmosphere of the processing chamber 29 is replaced with an inert gas after loading.

The process chamber 29 is evacuated by a gas exhaust mechanism (not shown) so as to have a desired pressure (vacuum degree). In addition, a heater driver (not shown) is heated to a predetermined temperature so that the processing chamber 29 has a desired temperature distribution.

In addition, a process gas controlled at a predetermined flow rate is supplied by a gas supply mechanism (not shown), and the process gas contacts the surface of the substrate 18 in the process of circulating the process chamber 29 and thus on the surface of the substrate 18. The predetermined process is performed. In addition, the process gas after reaction is exhausted from the process chamber 29 by the gas exhaust mechanism.

When a predetermined processing time elapses, an inert gas is supplied from an inert gas supply source (not shown) by the gas supply mechanism, and the processing chamber 29 is replaced with the inert gas, and the pressure in the processing chamber 29 is returned to normal pressure ( After purge process). The boat 26 is lowered by the boat elevator 32 via the seal cap 34.

As for carrying out of the board | substrate 18 after a process, the board | substrate 18 and the pod 9 are sent out to the exterior of the said housing 2 in the order opposite to the above description. An unprocessed substrate 18 is also loaded in the boat 26 so that the processing of the substrate 18 is repeated.

<Function Configuration of Control System 200>

Next, with reference to FIG. 3, the functional structure of the control system 200 centering on the main controller 201 which is an operation part is demonstrated. In the present specification, the main controller 201 may also be referred to as an operation unit 201. As shown in FIG. 3, the control system 200 includes a main controller 201, a transfer controller 211 as a transfer controller, a process controller 212 as a process controller, and a device management controller 215 as a data monitor. do. The device management controller 215 functions as a data collection controller, collects device data in and out of the device 1, and monitors the health of the device data in the device 1. In this embodiment, the control system 200 is housed in the device 1.

As used herein, "device data" means data relating to substrate processing (also referred to as control parameters), such as processing temperature, processing pressure, and flow rate of the processing gas when the apparatus 1 processes the substrate 18, eg, formed Data on the quality of the manufactured product substrate, such as the thickness of the film and the cumulative value of the thickness, and data on the components of the device 1 such as quartz reaction tubes, heaters, valves and mass flow controllers (e.g. , The measured value means data generated by operating each component when the substrate processing apparatus 1 processes the substrate 18.

Data collected during the execution of a recipe may also be referred to as process data. The device data also includes process data such as, for example, raw waveform data, which is data collected at specific intervals (for example, one second) from the start of the recipe to the end, and statistics data of each step in the recipe. Statistics data includes data such as maximum, minimum and average values. The device data may include event data (eg, data representing maintenance history) indicating various device events when the recipe is not executed (eg, when the substrate 1 is not in the idle state).

The main controller 201 is electrically connected to the carrier controller 211 and the process controller 212 via a LAN line such as 100BASE-T. Therefore, the main controller 201 may transmit and receive device data or download and upload files between the carrier controller 211 and the process controller 212.

The operation unit 201 is provided with a port, which is a mounting unit into which a recording medium (for example, a USB key) which is an external storage device is inserted or removed. The operating unit 201 installs an OS corresponding to the port. In addition, the host computer is connected to the operation unit 201 via, for example, a communication network. For this reason, even if the substrate processing apparatus 1 is installed in a clean room, the host computer can be arranged in an office or the like outside the clean room.

The device management controller 215 is connected to the operation unit 201 via a LAN line, and is configured to collect device data from the operation unit 201, quantify the operation state of the device and display it on the screen. The device management controller 215 will be described later in detail.

The conveying system controller 211 is mainly constituted by a rotary pod shelf 11, a boat elevator 32, a pod conveying device 15, a substrate transfer mechanism 24, a boat 26, and a rotating mechanism (not shown). It is connected to the board | substrate conveyance system 211A. The conveying system controller 211 carries out conveying operations of the rotary pod shelf 11, the boat elevator 32, the pod conveying apparatus 15, the substrate transfer mechanism 24, the boat 26, and the rotating mechanism (not shown), respectively. Configured to control. In particular, the conveying system controller 211 is configured to control the conveying operations of the boat elevator 32, the pod conveying apparatus 15, and the substrate transfer mechanism 24 via the motion controller 211a.

The process system controller 212 includes a temperature controller 212a, a pressure controller 212b, a gas flow controller 212c, and a sequencer 212d. These temperature controller 212a, pressure controller 212b, gas flow controller 212c and sequencer 212d are sub-controllers. The temperature controller 212a, the pressure controller 212b, the gas flow controller 212c, and the sequencer 212d are electrically connected to the process controller 212, and transmit or receive data of each device to or from the process controller 212. It is configured to download and upload files. While the process controller 212 and the sub controller are shown in separate configurations, the process controller 212 and the sub controller may be integrated.

The temperature controller 212a is connected to a heating mechanism 212A which mainly includes configurations such as a heater and a temperature sensor. The temperature controller 212a is configured to adjust the temperature in the processing furnace 28 by controlling the temperature of the heater of the processing furnace 28. In addition, the temperature controller 212a is configured to perform switching (on-off) control of the thyristor (not shown), and to control the power supplied to the heater element wire (not shown).

The pressure controller 212b is connected to a gas exhaust mechanism 212B mainly constituted by a pressure sensor, an APC valve serving as a pressure valve, and a vacuum pump (not shown). The pressure controller 212b controls the opening degree of the APC valve and switching (on / off) of the vacuum pump so that the pressure in the processing chamber 29 becomes a desired pressure at a desired timing based on the pressure value detected by the pressure sensor. Is configured to.

The gas flow controller 212c is configured by MFC. The sequencer 212d is configured to control supplying the gas to the process gas supply pipe or the purge gas supply pipe or by stopping the supply of the gas by opening and closing the valve 212D. In addition, the process system controller 212 is configured to control the MFC 212c and the valve 212D such that the flow rate of the gas supplied into the process chamber 29 is a desired flow rate at a desired timing.

In addition, the main controller 201, the carrier system controller 211, the process controller 212 and the device management controller 215 according to the present embodiment can be implemented by a dedicated system, as well as a conventional computer system It can also be implemented. For example, by installing the above program using a recording medium (for example, a USB key) that stores a program for executing the above-described processing in a general-purpose computer, each controller for executing a predetermined process can be configured.

And there are various ways to supply their programs. As described above, not only a method for supplying via a predetermined recording medium but also a method for supplying via a configuration such as a communication line, a communication network, or a communication system is possible. In this case, for example, the program can be posted on a bulletin board of a communication network, and the program can be provided superimposed on a carrier wave via a network. Then, a predetermined process can be executed by starting the program provided in this way and executing it like other application programs under the control of the OS.

<Configuration of Main Controller 201>

Next, the configuration of the main controller 201 will be described with reference to FIG. 4.

The main controller 201 includes an operation display unit 227 including a main controller control unit 220, a hard disk (HDD) 222 serving as a main controller storage unit, a display unit for displaying various types of information, and an input unit for receiving various instructions from an operator. And a transmit / receive module 228 which is a main controller communication unit for communicating with the device 1. Operators may also include device administrators, device engineers, maintenance workers and operators, as well as device operators. The main controller control unit 220 includes a CPU 224 (central processing unit), which is a processing unit, and a memory 226, which is a temporary storage unit such as RAM and ROM, and is configured as a computer having a clock function (not shown).

The hard disk 222 includes, for example, a recipe file such as a recipe in which processing conditions and processing order of a substrate are defined, a control program file for executing a recipe file, a parameter file in which parameters for executing a recipe are defined, and an error processing program file. And various screen files including an input screen for inputting process parameters as well as a parameter file for error processing and files such as various icon files (both not shown).

In addition, the operation screen of the operation display unit 227 indicates an operation instruction to the substrate transfer system 211A or the substrate processing system (heating mechanism 212A, gas exhaust mechanism 212B, and gas supply system 212C) shown in FIG. It is also possible to provide each operation button which is an input unit to input.

The operation display unit 227 is configured to display an operation screen for operating the apparatus 1. The operation display unit 227 displays information on the operation screen based on the device data generated in the substrate processing apparatus 100 via the operation screen. The operation screen of the operation display unit 227 is, for example, a touch panel using liquid crystal. The operation display unit 227 receives the operator's input data (input instruction) through the operation screen and transmits the input data to the main controller 201. In addition, the operation display unit 227 instructs to execute an arbitrary substrate processing recipe (hereinafter also referred to as a process recipe) among recipes stored in the memory 226 (RAM) or the like and stored in the main controller storage unit 222 (hereinafter referred to as process recipe). Control instruction) is received and sent to the main controller controller 220.

In the present embodiment, the device management controller 215 reads each screen file and data table stored in advance by executing various programs and the like at the time of startup, and reads the device data so that the operation state of the device is changed. Each screen shown is configured to be displayed on the operation display unit 227.

The main controller communication unit 228 is connected to a configuration such as a switching hub (not shown), so that the main controller 201 transmits and receives data to an external computer or other controller in the device 1 via a network. It is composed.

The main controller 201 also transmits device data such as the state of the device 1 to an external host computer, for example, a host computer, via a network (not shown). In addition, the substrate processing operation of the apparatus 1 is controlled by the control system 200 based on each recipe file, each parameter file, etc. stored in the main controller storage unit 222.

<Substrate processing method>

Next, a substrate processing method including a predetermined processing step performed using the apparatus 1 according to the present embodiment will be described. Here, the predetermined processing step is an example of carrying out a substrate processing step (herein, a film formation step) which is one step of a semiconductor device manufacturing step.

When performing the substrate processing process, a substrate processing recipe (process recipe) corresponding to the substrate processing to be performed is stored in a memory such as a RAM in the process system controller 212, for example. If necessary, operation instructions are given from the main controller 201 to the process controller 212 or the carrier controller 211. The substrate processing step performed in this manner includes at least an import step, a film formation step and a carrying out step.

Transfer process

From the main controller 201, a drive instruction of the substrate transfer mechanism 24 is generated to the transfer system controller 211. And according to the instruction | indication from the conveyance system controller 211, the board | substrate transfer mechanism 24 starts the transfer process of the board | substrate 18 to the boat 26 from the pod 9 on the delivery stage 21 which is a mounting base. This transfer processing is performed until the loading of all the predetermined substrates 18 to the boat 26 (wafer charge) is completed.

<Import process>

When the predetermined number of substrates 18 are loaded into the boat 26, the boat 26 is lifted by the boat elevator 32 operating according to the instructions from the transfer system controller 211 and formed in the processing furnace 28. It is charged (boat loaded) into the processing chamber 29. When the boat 26 is fully charged, the seal cap 34 of the boat elevator 32 hermetically closes the bottom of the manifold of the treatment furnace 28.

Film Formation Process

Next, the internal atmosphere of the processing chamber 29 is evacuated by the vacuum exhaust device so as to have a predetermined film forming pressure (vacuum degree) in accordance with an instruction from the pressure control unit 212b. In addition, the inside of the process chamber 29 is heated by the heater so that it may become predetermined temperature according to the instruction | indication from the temperature control part 212a. Subsequently, rotation of the boat 26 and the substrate 18 by the rotating mechanism is started in accordance with the instruction from the transfer system controller 211. Then, a predetermined gas (process gas) is supplied to the plurality of substrates 18 held by the boat 26 in a state of being maintained at a predetermined pressure and a predetermined temperature, and the predetermined processing (for example, film formation is performed) on the substrate 18. Processing) takes place. It is also possible to drop the temperature from the processing temperature (predetermined temperature) before the next carrying out process.

<Export process>

When the film formation process with respect to the board | substrate 18 mounted in the boat 26 is complete | finished, according to the instruction | indication from the transfer system controller 211, the rotation of the boat 26 and the board | substrate 18 by a rotating mechanism is stopped, and the boat The seal cap 34 is lowered by the elevator 32 to open the lower end of the manifold, and the boat 26 holding the processed substrate 18 is carried out to the outside of the processing furnace 28 (boat unloading). )do.

<Recovery process>

The boat 26 holding the processed substrate 18 is cooled very effectively by the clean air 36 blown out through the clean unit 35. Then, for example, when cooled to 150 ° C. or less, after removing the processed substrate 18 from the boat 26 and transferring it to the pod 9, the boat 26 of the new unprocessed substrate 18 is transferred. The transfer to) is performed.

<Configuration of Substrate Processing System>

5 is a diagram showing the configuration of a substrate processing system used in the present embodiment. In this substrate processing system, the master devices 1-M and the repeat devices 1-1 to 1-6 are connected via a network. In the example of FIG. 5, six repeating apparatuses 1-1 to 1-6 are shown, but the number of repeating apparatuses is not limited to six. In addition, the master apparatus 1-M and the repeating apparatuses 1-1 to 1-6 are each configured as a substrate processing apparatus, that is, the apparatus 1. In the present specification, the master device 1-M and the repeat devices 1-1 to 1-6 are referred to as the device 1, respectively, and the master device 1-M and the repeat device 1-1 to 1 are respectively referred to. -6) collectively referred to as device (1).

The master device 1-M is a device 1 containing device data as a standard. The master device 1-M includes the same hardware configuration as the substrate processing apparatus 1 and also includes the device management controller 215. The master device 1-M is, for example, the first device of the device 1 in which the device data is appropriately adjusted. In the present specification, the "first issuer" is the device 1 initially delivered to the customer's factory, and the "repeat device" is, for example, the device 1 delivered to the second or later customer factory after the first issuer. The repeating apparatuses 1-1 to 1-6 receive copies of various types of information included in the master apparatuses 1-M from the master apparatus 1-M via a network, and each repeating apparatus 1-1 to 1-6 is received. Are stored in the storage units 1-6).

Thus, in this embodiment, the device management controller 215 is provided in each device 1. In addition, each of the repeating devices 1-1 to 1-6 is connected to each other by the network of the device management controllers 215 installed in the master devices 1 -M and the repeating devices 1-1 to 1-6, respectively. Various information of the master device 1-M can be shared. Specifically, each repeat device 1-1 to 1-6 copies a file such as the device data of the master device 1-M, or compares and contrasts with a file of the master device 1-M (described later). Tool matching). In addition, since the network is used, there is no need to use a recording medium for copying the device data, and the merit that the device maker's maintenance staff can easily perform file editing without moving to the front of the device 1 installed in the clean room is provided. There is.

<Function Configuration of Device Management Controller 215>

The device management controller 215, which is a health check controller that checks the health state of the device 1 shown in FIG. 6, is associated with information relating to various health states of the device 1, for example, a matching state with the master device 1-M. The device 1 while performing the quantification of information such as the amount of change in device data with time, the deterioration state of the components constituting the device 1, and the occurrence of failure information of the device 1 from the time of shipment or installation of the device 1; The controller is configured to monitor whether 1) can continue to operate normally. Here, "at the time of setup" is when the apparatus 1 is first started (powered on) after being delivered to the customer's factory.

As shown in FIG. 6, the device management controller 215 may include a data matching control unit 215c, a device state monitoring control unit 215e, a communication unit 215g for transmitting and receiving device data to and from the main controller 201, and various types. A storage unit 215h for storing data is provided. Specifically, the device management controller 215 determines the validity of the device status monitoring control unit 215e for monitoring the health of the device data obtained from the operating states of the components constituting the device and the facility data provided from the factory facilities. It includes at least a data matching control section 215c. The device management controller 215 evaluates the operation state of the device 1 based on the device state monitoring result data acquired from the device state monitoring control unit 215e and the validity determination result data determined by the data matching control unit 215c. It is configured to derive.

The device management controller 215 monitors the health state based on a quantified value of the information evaluating the operation state of the device 1, and when the health state is worsened, for example, by outputting an alarm sound or displaying an alarm. It is configured to issue a. In addition, the device management controller 215 is configured to be able to operate functions useful in the stable operation of the device 1, such as data matching and device status monitoring, on the operation display unit 227 of the device 1, for example.

The device management controller 215 includes a memory (not shown) that stores, for example, a CPU (not shown) and an operation program of the device management controller 215 as a hardware configuration. The CPU operates in accordance with the operation program. In the present embodiment, the device management controller 215 stores the device data generated during the execution of the recipe for processing the substrate in the storage unit 215h by executing the operation program. And at least a data matching control unit 215c configured to collate device data obtained from a recipe before and after the occurrence of abnormality on the basis of data indicating that the abnormality has occurred.

The storage unit 215h includes device data acquired later from abnormal analysis information used by the data matching control unit 215c described later or master device 1-M described later used by the device state monitoring control unit 215e (to be described later). Standard data). In addition, various programs such as a data matching program, a device state monitoring program, and a waveform matching program, which will be described later, are stored at least in the storage unit 215h. In addition, the main controller memory 222 or the temporary memory 226 may be used instead of the memory 215h. Then, the device management controller 215 (and / or the data matching control unit 215c, the device state monitoring control unit 215e, and the communication unit 215g) execute the screen display program to respectively display the device data to the data for screen display. Processing is performed so that screen display data is created and displayed on the operation display unit 227.

<Data Matching Control Unit 215c>

The data matching control unit 215c will be described later to perform copying or comparison between the file of the device 1 and the file of the master device 1-M received from the main controller 201 by executing a data matching program. Run the tool matching function. Also, in the present embodiment, the data matching control unit 215c is configured to compare process recipes before and after abnormality occurs using the tool matching function. Thereby, the data matching control part 215c is comprised so that the waveform data of each device data before and after abnormality generate | occur | produces and may display on the operation display part 227 in order of the difference of the waveform data in big order.

Next, as shown in FIG. 7B, the data matching control unit 215c includes a selecting unit 321 for selecting a recipe executed from the storage unit 215h under the same condition as a recipe having an abnormality, a recipe having an abnormality, and a selecting unit. An acquisition unit 322 for acquiring device data from each of the recipes selected by 321 and an operation unit 323 for calculating a difference between the acquired device data. In this embodiment, the data matching control unit 215c is configured to collate the device data obtained from the recipe before and after the occurrence of the abnormality based on the data indicating that the abnormality has occurred.

In addition, as shown in FIG. 7B, the calculator 323 calculates an absolute value of the data difference between the device data and calculates a ratio in which the device data coincide, and the threshold is set in advance with the absolute value. And a comparator 325 for comparing the values and determining whether the device data match, and a calculator 326 for calculating a standard deviation from the absolute values.

<Device Status Monitoring Control Unit 215e>

The device status monitoring control unit 215e includes a device status monitoring program and executes a device status monitoring function. The device state monitoring control unit 215e receives the device data of the device 1 from the main controller 201, updates and accumulates the device data stored in the storage unit 215h, and master device 1 -M. Monitoring of the device data of the device 1 is performed on the basis of the standard data obtained from the standard data, i.e., the standard data to be targeted by the device 1 such as the time-lapse waveform, the upper limit value and the lower limit value of the reaction chamber temperature. In other words, the device data of the device 1 is monitored in comparison with the standard data.

In addition, although the device management controller 215 is provided separately from the main controller 201 which has a board | substrate processing function and a higher report function in this embodiment, this embodiment is not limited to such a structure. For example, from the device data collected by the main controller 201, data relating to monitoring of device status (device status monitoring data), data for evaluating device performance (evaluation item waveform data), data relating to abnormal analysis (abnormal analysis data), and It goes without saying that various data such as data related to alarm monitoring (disturbation information data) may be generated.

<Device status monitoring function>

Next, a device state monitoring function of the present embodiment, that is, a device state monitoring program executed by the device state monitoring control unit 215e will be described with reference to FIG. 7A. The device state monitoring program is stored in a memory (for example, the storage unit 215h) of the device management controller 215 to realize the device state monitoring control unit 215e.

As shown in FIG. 7A, the apparatus state monitoring controller 215e includes a setting unit 311, a band generator 312, a fault detection & classification (FDC) monitoring unit 313, a coefficient display unit 314, and a diagnosis unit ( 315).

In accordance with an input from the operation display unit 227 such as an input of an operation command, the setting unit 311 instructs the band generation unit 312, the FDC monitoring unit 313, and the diagnosis unit 315 to set the designated band management. do.

The band generation unit 312 generates a band based on the standard data set by the setting unit 311, and the designated value of the upper limit and the designated value of the lower limit. In the present embodiment, "band" refers to a range that is determined to have a margin with respect to a waveform by standard data (here, device data of the master device 1-M). Specifically, the band refers to a range determined by specifying an upper limit value or a lower limit value, or an upper limit value and a lower limit value based on values of respective data points constituting standard data.

The FDC monitoring unit 313 includes a comparison unit 313a for comparing the band generated by the band generation unit 312 with device data generated from the device 1 at every moment, and a counting unit for counting the number of times that the device data deviates from the band ( 313b) and a determination unit 313c which determines that the device data is abnormal when out of the band more than a predetermined number of times. When the abnormality is detected, the FDC monitoring unit 313 is configured to display, for example, that the abnormality is detected on the operation display unit 227. In this way, the FDC monitoring unit 313 monitors the device data by comparing the device data received from the main controller 201 with the generated bands with respect to the master data serving as the determination criterion of the device data. In addition, the band generation unit 312 described above may be configured to be included in the FDC monitoring unit 313,

The coefficient display unit 314 is configured to display on the operation display unit 227 the number of exclusion points for each batch process for the exclusion point counted by the FDC monitoring unit 313. In this embodiment, a data point that is out of the band by comparing the band with the device data is called an exclusion point.

The diagnosis unit 315 diagnoses the statistical data among the device data constituted from the number of exclusion points using the abnormal diagnosis rule. In addition, the diagnosis unit 315 is configured to display, for example, that the abnormality is detected on the operation display unit 227 when it is diagnosed as abnormal.

The device data collected by the device state monitoring control unit 215e is stored in the storage unit 215h, but is not limited thereto. For example, the device data may be configured to be stored in the main controller storage unit 222.

The device state monitoring control unit 215e accumulates the device data from the start to the end of the process recipe in the storage unit 215h at specific intervals by executing the above-described device state monitoring program as shown in FIG. At the end of the step, the statistic data is calculated so as to calculate the statistic (for example, the maximum value of the device data, the minimum value of the device data, the average value of the device data) and store it in the storage unit 215h. The device state monitoring control unit 215e is also configured to accumulate event data including maintenance information while the process recipe is not executed. The apparatus state monitoring control unit 215e is configured to accumulate, in the storage unit 215h, the device data including the heating temperature waveform of the supply piping or the exhaust piping as well as the temperature rising waveform and the decompression waveform as the live waveform data. Based on the temperature waveform, for example, a cold spot can be generated to confirm the possibility of the occurrence of byproduct deposition.

As shown in Fig. 9, data analysis at the time of abnormal occurrence in a recently used device 1 which holds a large amount (more than 500 kinds) of device data takes considerable time. In addition, due to the large amount of data, it takes time to specify the cause of the abnormality by missing important device data by the skill of the maintenance worker who performs data analysis. In addition, it is difficult to confirm the change over time only by visually comparing the live waveform data, and it is difficult to identify the cause of the abnormality because the gradually changed data also appears as a difference. As a result, downtime is increased, resulting in lower device utilization.

<Analysis support processing>

Next, the processing flow of analysis support using the data matching function (tool matching function) executed by the data matching control unit 215c will be mainly described with reference to FIG.

<Data Receiving Process (S110)>

First, the data matching control unit 215c drives the waveform matching program when receiving abnormal analysis information from the operation unit 201 via the communication unit 215g. The data matching control unit 215c includes a selecting unit 321 for selecting recipes executed under the same conditions as an abnormal recipe and an acquisition unit 322 for acquiring device data from each of the recipe having an abnormality and a recipe selected by the selecting unit. And a calculation unit 323 for calculating a difference between the acquired device data.

In this embodiment, the abnormality analysis information includes at least information specifying the abnormality and recipe specifying information specifying the recipe executed by the apparatus 1 in which the abnormality has occurred. The data matching control unit 215c may be configured to receive abnormal analysis information via the communication unit 215g by a condition input by an operator on the operation display unit 227. Further, the abnormality analysis information may be configured such that at least one of the threshold value, step, group, and item described later can be set by a condition input by an operator on the operation display unit 227.

<File Selection Process (S120)>

The data matching control unit 215c acquires recipe specifying information based on the received abnormal analysis information. The data matching control unit 215c searches for the presence or absence of recipes having the same conditions as the recipe specifying information obtained by referring to the production history information among the device data in the storage unit 215h. The retrieval by the data matching control unit 215c is performed by, for example, going back to the past recipe from a recipe in which an abnormality has occurred in the plurality of recipes recorded in the production history information. When the data matching control unit 215c detects a recipe in which the conditions match within the production history information, the data matching control unit 215c acquires the start time and the end time of the recipe specified by the recipe specifying information, respectively. The data matching control unit 215c also acquires step information from the start time to the end time of the steps constituting the recipe. In this way, the data matching control unit 215c selects a recipe executed under the same condition as a recipe in which an abnormality has occurred.

<Data Acquisition Process (S130)>

The data matching control unit 215c reads from the storage unit 215h the device data related to the recipe specifying information which is generated from the start time to the end time of the step based on the acquired step information. Specifically, the data matching control unit 215c stores the device data defined in FIG. 9 stored by the device state monitoring control unit 215e from the storage unit 215h for each of the recipes in which an abnormality occurred and the recipes detected by the search. Configured to acquire. Acquiring data for each step is repeated until the recipe is finished.

Recent recipes have a large number of steps, for example, sometimes more than 100 steps. In this case, since the combination of the item type of the device data shown in Fig. 9 and these steps is 500x100 = 50000, it is difficult to find out which waveform is bad. Therefore, it is preferable to set in advance which data of steps to be acquired in accordance with abnormality by the condition input by the operator on the operation display unit 227. Similarly, Groups and items may be set in advance.

<Data Matching Step (S140)>

Next, the data matching control unit 215c compares the device data acquired for each step with respect to each of recipes having the same conditions as those of the recipes detected by the abnormality and the recipes detected by the search. Specifically, the data matching controller 215c calculates an absolute value of the data difference of the device data every unit time while setting the start time of the recipe based on the data time information related to the abnormal analysis information, and sets the absolute value to a preset threshold value. And each unit time is compared to determine whether the device data coincides, and the ratio (matching rate) at which the device data coincides in a predetermined period within the step is calculated. In the present embodiment, the "matching rate" refers to the ratio of periods in which a certain deviation (eg, 3σ) is different after finding a standard deviation? In addition, in this embodiment, a specific period is a period for collecting device data. However, since the time from the start of a step to the end may differ even in a recipe having the same condition, it is preferable that the step time can set a predetermined period within the step.

As shown in FIG. 11, waveform data (e.g., temperature) every two unit times (e.g., device data read in each of the recipes in which an abnormality occurred and the recipe executed before) in unit time (5 seconds in the example of FIG. 11). Find the absolute value of the difference of the difference, and set the case where the absolute value of the difference is equal to or greater than the threshold value (e.g. 30) as the dotted line NG, and the case where the absolute value of the difference is less than the threshold value is called the solid line OK. In the example of 11, 10) is used as the denominator, and the matching ratio is the ratio of the number of solid lines OK, that is, the ratio of the number (the difference is less than the threshold value) determined to match by comparison. In FIG. 11, when a recipe in which an abnormality occurs is compared with a line A and a recipe executed before the recipe as a line B, a matching rate in a predetermined period (here, 00:00:00 to 00:50:00) is 90%. .

The threshold 30 is configured to be set in accordance with the condition input by the operator on the operation display unit 227. In addition, FIG. 11 shows only a part of the recipe separated for the purpose of explaining the matching rate calculation.

In this embodiment, the data matching control section 215c is configured to include an calculating section 326 that calculates an absolute value of the data difference between the device data within a predetermined period and calculates a standard deviation from the absolute value. In detail, the calculator 326 calculates an absolute value of the data difference of the device data every unit time (for example, 0.1 second or a time such as 1 second), and the data difference of the device data and the ratio at which the device data matches in steps. It is configured to calculate the standard deviation of the absolute value of.

The calculator 326 is also configured to update the threshold value using the calculated standard deviation. The calculating unit 323 is also configured to compare the absolute value of the data difference of the device data with the calculated threshold to determine whether the device data matches.

The threshold of FIG. 11 is a fixed value by manual input. However, there are many types of process data, and threshold values suitable for each type may be set in advance to calculate the threshold value automatically. For example, the operator on the operation display unit 227 can set whether or not to automatically calculate the threshold value by inputting a condition.

In addition, waveform data of the line A and the line B of FIG. For example, as shown in FIG. 12, the standard deviation sigma (10.25) is found from the absolute value of the data difference (difference data) of the waveform data to be compared, and 3 sigma (30.75), which is three times the threshold value, is set as the threshold value. A method of finding the waveform data matching rate by considering the excess difference data as a mismatch NG is shown. Since the threshold value is set automatically by this, the effort of manually inputting a threshold value can be skipped. However, this method can be used for waveform data in which waveform differences cross, but it is not suitable for waveform data along parallel lines. Therefore, first of all, it is preferable to use the threshold value by automatic calculation in which the threshold value is automatically set, and to switch the one which requires adjustment to the threshold value by manual input. The threshold may be 2σ (20.5) or may be set to change the value of the threshold in accordance with the step. For example, you may comprise so that a threshold value may be set to 3 (sigma) in a temperature rising step with a large temperature fluctuation, and a threshold value is set to 2 (sigma) in the film forming step in which temperature fluctuation is comparatively stable.

When comparing the whole recipe, it is necessary to consider the delay of a step. For example, when a delay occurs in the temperature rising step and the start of the subsequent steps is delayed, the misaligned waveforms are compared to determine the error. Since the present embodiment has been improved to compare on a step-by-step basis, matching (matching) is possible regardless of the case where the end condition of the step is set to HOLD without being satisfied.

In addition, the data matching process S140 may be configured to collate recipes executed at the time of abnormal occurrence with recipe data before and after the recipe for all types and device data of all items. If the type or item can be specified in response to an abnormality, the specific device data extracted for the specific type or the specific item may be collated. For example, the specific device data is selected from the group consisting of temperature data, pressure data, gas flow rate data, heater power data, concentration data and valve data.

<Data Display Process (S150)>

The data matching control unit 215c is configured to display on the operation display unit 227 in order from the device data having the smallest matching rate from the matching rates calculated for the device data of all types and all items. For example, the recipes executed at the time of abnormal occurrence and the recipes executed before are shown in FIG. 13 in which 10 data having a poor matching rate (that is, 10 data in the order of low matching rate). However, regardless of this aspect, for example, the operation display unit 227 may be displayed in order from the device data having the smallest matching rate for each Group, Item, or Step. In this embodiment, "group" is a data type such as temperature, pressure, and gas flow rate, and "item" is, for example, in case of temperature data, a temperature measured value of the U zone, a temperature measured value of the CU zone, a temperature measured value of the C zone, Temperature data such as the temperature measured value of the CL zone and the temperature measured value of the L zone. "Gas flow rate" is also the channel number of the MFC, for example. In addition, the data matching control unit 215c may display the data matching control unit separately according to the matching rate. The data matching controller 215c may display the matching rate in red for device data including a matching rate of less than 80%, and display the matching rate in blue for device data including a matching rate of 80% or more. Also, in the present embodiment, ten pieces of device data are displayed in order of poor matching rate, but the number is not limited thereto.

In this way, the data matching control unit 215c is configured to display on the operation display unit 227 in the order of the device data with the smallest matching rate, that is, the device data with the large data difference. As a result, it is possible to determine which trouble has occurred due to which device data of a certain step, which contributes to the reduction of trouble analysis time and the reduction of analysis errors due to the nonuniformity of the maintenance staff.

19, the result of the data matching process S140 may be displayed on the operation display part 227 as a detailed data confirmation screen. The detailed data confirmation screen is configured to display a matching ratio of the entire recipe (TOTAL) on the upper side. This is the average of the matching rates calculated from each category and every item. Moreover, it is preferable that the matching ratio of the whole recipe is 80% or more.

In addition, the matching rate is displayed in units of categories under the matching rate of the total recipe (TOTAL). In addition, as shown in FIG. 19, a detailed data confirmation screen may be displayed for each type. 19 may be displayed as a detailed data confirmation screen when a recipe is selected on a history reference screen to be described later.

As shown in FIG. 19, it is possible to suggest which type (type such as temperature and pressure) is caused by abnormality in the data detail confirmation screen. Also in this embodiment, the matching rate is configured to be displayed by changing the color for each item (item) of less than 50%.

In the present embodiment, the data display step (S150) shows the result of comparing two recipes, a recipe executed at the time of abnormal occurrence and a recipe executed before, but the present embodiment is not limited to this embodiment. For example, the result of calculating a matching rate by matching each recipe and a plurality of recipes performed at the time of abnormal occurrence may be displayed in time series. For example, the matching rate of the entire recipe TOTAL, the matching rate of the whole specific step, and the matching rate in the specific device data may be collectively displayed. As a result, the change history of the matching rate can be confirmed until an abnormality occurs.

According to the present embodiment described above, the description is given when a recipe having the same condition as the recipe in which abnormality occurs in the file selection step S120 exists in the storage unit 215h. However, as a result of the search, the recipe having the same condition is stored in the storage unit 215h. The case where it does not exist in the inside is demonstrated below.

The data matching control unit 215c searches the storage unit 215h of the device management controller 215 of the master device 1-M and detects a recipe having the same condition, and the data matching control unit 215c selects a corresponding recipe file and a file related to the recipe file. All of them are received from the master device 1-M and stored in the storage unit 215h of the device 1 in which abnormality has occurred. Since it is the same after the next process, it abbreviate | omits. If the storage unit 215h in the master device is searched and there is no recipe under the same condition, the storage unit 215h of the device management controller 215 of the other device 1 is searched. As a result, if a recipe with the same condition is not found, there is a clear missetting, and the parameter setting becomes abnormal.

According to this embodiment, there are one or more effects described below.

(a) The data matching control unit 215c according to the present embodiment refers to abnormal analysis information, extracts device data before and after abnormality occurs, and displays the device data in the order of low matching rate (highest difference). Is configured to display. This makes it possible to efficiently analyze data even if a low-skilled maintenance worker performs a large amount of time-consuming abnormal analysis, thereby reducing downtime in the event of an abnormal occurrence.

(b) The data matching control unit 215c according to the present embodiment is configured to extract the device data before and after the abnormality occurs with reference to the abnormal analysis information and display the device data on the screen in the order of the difference. This makes it possible to reduce the burden on the repairman who performs the abnormal analysis and to shorten the time taken by the repairman to analyze the factor.

(c) The data matching control unit 215c according to the present embodiment is configured to extract device data before and after abnormality occurs and display the device data on the screen in the order of the difference. This makes it possible to shorten the time taken to specify an abnormal factor even when the maintenance staff has an artificial miss (for example, an input miss in the set value of the device data). In particular, even if there is an incorrect setting, which is one of the factors causing film formation abnormalities, the time required for specifying the factor can be shortened.

(d) The data matching control unit 215c according to the present exemplary embodiment is configured to display, on the screen, a result of matching the device data in time series from the execution of the recipe in which the abnormality occurs. As a result, the change over time of the device data can be confirmed by visualizing the change history of the matching rate until the occurrence of abnormality, so that the maintenance staff can shorten the time taken for analyzing the abnormality factor.

<Other Embodiments>

Next, a file (data) matching function (tool matching function) at the time of device setup by the data matching control unit 215c will be described with reference to FIGS. 14 to 19. In the present embodiment, the only difference between the file comparison targets is the files held by the repeat devices 1-1 to 1-6 and the master devices 1-M. The flow shown in FIG. 215c) performs the same thing.

In this embodiment, each of the data matching controllers 215c of the repeating devices 1-1 to 1-6 communicates directly with the data matching controller 215c of the master device 1-M, and the master devices 1-M. Will be described below. In the present embodiment, the data matching control unit 215c executes a program for realizing the tool matching function, thereby repeating the repeating devices 1-1 to 1-6 without intervening a HOST computer which is a kind of management device or a higher level computer. ) Can be used to match files already used and working on the master device (1-M).

As shown in Fig. 14, the name of the master device 1-M as initial information in the main controller storage unit 222 of the repeating devices 1-1 to 1-6, for example, the repeating device 1-2, and It is possible to set the IP address (Internet Protocol Address). The name and IP address of this master device 1-M are set by the operator from the operation display unit 227 of the repeat device 1-2, for example, but the repeat device 1-2 from the master device 1-M. It may be configured to transmit to. The reason for using the two information of the IP address and the name for the connection with the master device 1-M is that the device name is checked after establishing a communication connection by the IP address with the master device 1-M. It is because it is set as a structure. Thereby, the erroneous connection by the mistake of setting of an IP address can be prevented, and a worker can perform matching (data matching) operation | work without conscious of the master apparatus 1-M.

In the data matching control shown in FIG. 14, the data matching control unit 215c of the device 1 including the repeating device 1-2 is a recipe file from the main controller storage unit 222 of the master device 1-M. Alternatively, the parameter file is read, stored in the main controller storage unit 222 of the apparatus 1, and matched (matched). In this embodiment, a comparison and verification of the recipe file of the master device 1-M and the recipe file of the device 1 is performed. In addition, the recipe file received from the master device 1-M may not be stored in the main controller storage unit 222, but may be stored in the storage unit 215h of the device 1 to perform file matching.

15 is a table defining performance evaluation waveforms. It is registered in advance to the master device 1-M, and up to 20 waveforms can be registered. This is because after the first device of the device 1, that is, the master device 1-M is delivered, the user acquires the optimum parameters during the operation of the device 1 and manages them as know-how. In order to match the performance of the apparatus 1 and the master apparatus 1-M at the time of set-up (granulation) operation, waveform data of the matching (matching) object related to the performance in advance is defined as shown in FIG. 15. For example, specific waveform data such as an elevated temperature waveform up to 1200 ° C. or a reduced pressure waveform up to 2 Pa is a target, and temperature waveform data of pipe heating not related to performance (not defined in FIG. 15) is not a match target. By using the table shown in FIG. 15, the set up operation can be efficiently performed.

FIG. 16 shows an example of a history reference screen displayed when a button for referring to the history of data matching (tool matching) is pressed on a menu screen (not shown). 17 shows a data matching detail confirmation screen displayed when the temperature Temp is selected.

As shown in FIG. 17, information of each step number of 80% or more and less than 80% of all the number of steps (for example, 20) of the process recipe is displayed, and each item (U, CU, C, CL, L) is configured to display the matching rate. Also, 84% of the matching rate described below shows the matching rate of the device data with respect to the temperature (Temp) throughout the recipe. That is, the average value in the entire recipe of the matching rate calculated for each item in step units.

At 80% or more and less than 80%, an identification mark is made, making it easy to see which item is declining at which step. When the button Trace displaying the live waveform data is pressed, the live waveform data shown in FIG. 18 is displayed.

18 shows the raw waveform data of each item (U, CU, C, CL, L) of the process file of the master device 1-M and each item (U, CU, C, CL of the process file of the device 1). , L) is configured to display from the predetermined step.

As described above, items having a poor matching rate can be compared in the live waveform data.

According to this embodiment, there are one or a plurality of effects described below.

(a) The data matching control unit 215c according to the present embodiment calculates a matching rate in units of steps of a process recipe and matches from each item (eg, a temperature measured value of a U zone) of a plurality of types (temperature, gas, etc.). It is configured to easily extract the device data with a small rate. As a result, only information relating to the performance of the device can be displayed, so that downtime during setup can be reduced.

(b) The data matching control unit 215c according to the present embodiment calculates a matching rate in units of steps of a process recipe and matches from each item (eg, a temperature measured value of a U zone) of a plurality of types (temperature, gas, etc.). It is configured to easily extract the device data with a small rate. As a result, the burden on the operator performing the setup operation can be reduced, and the time taken by the operator for the setup operation can be shortened.

Moreover, the substrate processing apparatus 1 in the Example of this invention is applicable not only to the semiconductor manufacturing apparatus which manufactures a semiconductor, but also the apparatus which processes glass substrates, such as an LCD apparatus. It goes without saying that the present invention can also be applied to various substrate processing apparatuses such as an exposure apparatus, a lithographic apparatus, a coating apparatus, and a processing apparatus using plasma.

1: Substrate Processing Unit 215: Device Management Controller
215c: data matching control unit 215e: device status monitoring control unit
215h: memory 227: operation display

Claims (13)

An operation unit for transmitting the device data generated during the execution of the recipe for processing the substrate to the storage unit; And a data matching control unit for matching the plurality of the device data stored in the storage unit, respectively;
The operation unit notifies the data matching control unit of data indicating that an abnormal phenomenon has occurred in the apparatus,
The data matching control unit,
A selecting unit which selects a recipe executed from the storage unit on the same condition as the recipe in which the abnormal phenomenon occurs;
An acquisition unit for acquiring the device data from each of a recipe in which the abnormal phenomenon occurs and a recipe selected from the selection unit; And
An operation unit for calculating a difference between the acquired device data
Including,
The calculation unit,
A calculator configured to calculate a rate at which the device data coincides while calculating an absolute value of the data difference of the device data every unit time within a predetermined period; And
A comparator which compares the absolute value with a preset threshold and determines whether the device data matches
More,
And processing the device data obtained from a recipe before and after the occurrence of the abnormal phenomenon on the basis of data indicating that the abnormal phenomenon has occurred. The method of claim 1,
A display device for displaying the result of the collation;
And the display device is configured to display the device data in order of a difference in the device data between a recipe in which the abnormal phenomenon occurs and a recipe selected by the selection unit. delete The method of claim 1,
The calculation unit,
A calculation unit for calculating a standard deviation of the absolute value of the data difference of the device data within the predetermined period,
The calculation unit calculates the threshold value using the standard deviation,
And the calculating section compares the absolute value with the calculated threshold to determine whether the device data matches. The method of claim 1,
The recipe includes a plurality of steps,
The computing unit is configured to calculate an absolute value of the data difference of the device data every unit time to calculate a standard deviation of the ratio of the device data coinciding in the step unit and the absolute value of the data difference of the device data. . The method of claim 1,
The data matching control unit acquires data abnormality analysis related information from the storage unit, and adjusts the start time of a recipe based on data time information related to the data abnormality analysis related information while the absolute difference of the data difference of the device data every unit time. Calculating a value, comparing the absolute value with a preset threshold value every unit time to determine whether the device data matches, and calculating a ratio at which the device data matches within a predetermined period of time. The method of claim 1,
The data matching control section searches within the storage section, reads a plurality of recipes executed on the same condition as the found recipe in which the abnormal phenomenon occurred, obtains the device data from the read plurality of recipes, And calculating a matching rate based on a difference in the device data between the device data obtained from a recipe and a recipe in which the abnormal phenomenon occurs. The method of claim 7, wherein
A display device for displaying a result of the calculation;
And the display device is configured to display a matching ratio with a recipe in which the abnormal phenomenon occurs for each batch in which the recipe is executed. The method of claim 8,
The data matching control unit,
And a matching ratio with a recipe in which the abnormal phenomenon has occurred with respect to specific device data among the device data. The method of claim 9,
And said specific device data is selected from the group consisting of temperature data, pressure data, gas flow rate data, heater power data, concentration data and valve data. The method of claim 1,
The data matching control unit,
When there is no recipe executed under the same condition in the storage unit when a recipe executed under the same condition as the recipe in which the abnormal phenomenon occurs has occurred, the abnormal phenomenon occurs before and after the abnormal phenomenon occurs. A substrate processing apparatus configured to collate the device data obtained from a recipe. An apparatus state monitoring control unit which stores, in the storage unit, the device data generated during the execution of the recipe for processing the substrate; And
A data matching control section, comprising: a selecting section for selecting recipes executed under the same conditions as a recipe in which an abnormal phenomenon occurs from the storage section; An acquisition unit for acquiring the device data from each of a recipe in which an abnormal phenomenon occurs and a recipe selected by the selection unit; And a calculation unit for calculating a difference between the acquired device data, and the calculation unit calculating a ratio in which the device data is matched while calculating an absolute value of the data difference of the device data every unit time within a predetermined period. And a comparing unit for comparing the absolute value with a preset threshold value and determining whether the device data matches, and obtaining from a recipe before and after occurrence of the abnormal phenomenon based on data indicating that an abnormal phenomenon has occurred. The data matching control configured to match the generated device data
Device management controller comprising a. An apparatus state monitoring control unit which stores, in the storage unit, device data generated during the execution of the recipe for processing the substrate; And a data matching control unit for collating a plurality of the device data stored in the storage unit, respectively.
Receiving data indicating that an abnormal phenomenon has occurred in the apparatus;
Selecting a recipe executed from the storage unit on the same condition as the recipe in which the abnormal phenomenon occurs;
Obtaining the device data from each of the recipe in which the abnormal phenomenon occurs and the selected recipe, and calculating a difference between the obtained device data; And
A procedure of collating the device data obtained from the recipe before and after the occurrence of the abnormal phenomenon on the basis of the data indicating that the abnormal phenomenon has occurred.
A program stored in a recording medium for causing the device management controller to execute
In the order of calculating the difference of the device data, the order of calculating the rate at which the device data is matched while calculating the absolute value of the data difference of the device data every unit time within a predetermined time period, and the threshold value is set in advance to the absolute value; And a step of determining whether the device data matches by comparing with a value.

Images