JP4587753B2 - Substrate processing apparatus, display method of substrate processing apparatus, and substrate processing method - Google Patents

Description

  The present invention relates to a substrate processing apparatus.

  Conventionally, in a substrate processing apparatus such as a vertical diffusion CVD apparatus, recipes, tables, and the like are edited and stored as files on the HDD. FIG. 9 shows a functional block diagram of a conventional substrate processing apparatus.

  As shown in the figure, the conventional substrate processing apparatus includes a wafer transfer device 3, a heater (reactor) 4, a pump / pressure valve 5, a gas pipe / MFC 6, an operation unit 1J, a memory L, and a control unit 2J. It becomes the composition which becomes.

  The wafer transfer device 3 plays the role of transporting the wafer, the heater (reaction furnace) 4 plays the role of heating the wafer in the furnace, the pump / pressure valve 5 plays the role of adjusting the pressure in the furnace, the gas piping / MFC 6 Has a role of supplying gas into the furnace.

  The operation unit 1J includes a recipe / table parameter editing screen display module 101, an HDD 102, and an editing screen data input unit 103. Here, the recipe / table parameter editing screen display module 101 plays a role of performing screen display when editing recipe and table data in the operation unit 1J, and the HDD 102 is data edited by the editing screen data input unit 103. The edit screen data input unit 103 has a role of reflecting data input by user operation input in data stored in the HDD 102.

  The memory L stores various setting parameters 204, common setting parameters 205, and recipe data 206. Specifically, the various setting parameters 204 are parameters such as temperature, speed, and time that are referred to when executing each step in the recipe, and the common setting parameter 205 is a parameter commonly used by a plurality of steps in the same recipe. The recipe data 206 is recipe data executed in the substrate processing apparatus.

  The control unit 2J includes a control parameter expansion module 201, a shared setting parameter expansion module 202, and a recipe sequence control module 203. Here, the control parameter development module 201 applies the control parameters (various setting parameters 204) referred to in the steps to be executed in the recipe to the parts using the control parameters (for example, the wafer transfer device 3 and the heater 4). The shared setting parameter expansion module 202 has a role of referring to the shared setting parameter 205 stored in the memory L according to the recipe step, and the recipe sequence control module 203 is stored in the memory L. It has a role of executing each step in the recipe while referring to the recipe data 206.

  The conventional substrate processing apparatus does not support history management (file generation management) of all types of files that can be stored in the HDD, so depending on the type of file, who changed which part of the data to what. May not be confirmed. Therefore, in such a case, if an incorrect setting is made (especially if 100 ° C is mistakenly set to 10 ° C, 10 minutes is mistakenly set to 1 minute, etc.) If it is easy to miss), it is difficult to specify a place where an incorrect setting is made.

  In addition, since there is no history when a recipe, table, or the like is changed, it is necessary to visually check the recipe and table file every time for checking. However, when the process is performed, especially when the film formation conditions required by the customer do not meet the requirements, the recipe is composed of a plurality of steps, so it takes time and effort to open and check the recipe each time. It is not preferable from the viewpoint of improvement in work efficiency and cost reduction.

  The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a substrate processing apparatus that can contribute to improvement in work efficiency and cost reduction in file management.

In order to solve the above-described problems, a substrate processing apparatus according to the present invention displays a history file storage unit that stores a history file of an edited file, and a list of history files stored in the history file storage unit. A history file display unit; and a history file display control unit that highlights a difference in content between at least two arbitrary history files among the history files displayed in the history file display unit, and displays the screen. It is characterized by becoming.
Furthermore, the substrate processing apparatus according to the present invention includes an edit file storage unit that stores an edited file, a history file storage unit that stores a history file related to an edit history of the edited file, and the edit file storage unit. A history file display unit for displaying a list of history files stored in the history file storage unit in correspondence with each editing performed on an arbitrary file among the stored files, and the display Among the history files, a history file display control unit for emphasizing the difference in contents between at least two arbitrary history files and displaying the screen is provided.

  As described in detail above, according to the present invention, it is possible to provide a substrate processing apparatus that can contribute to improvement in work efficiency and cost reduction in file management.

  Embodiments of the present invention will be described below with reference to the drawings.

  First, the overall configuration of the substrate processing apparatus according to the present embodiment will be described with reference to the drawings. In the following description, a case will be described in which a vertical apparatus (hereinafter simply referred to as a processing apparatus) that performs diffusion processing, CVD processing, or the like is applied to a substrate as the substrate processing apparatus. FIG. 1 is an external perspective view of a substrate processing apparatus applied to the present invention. This figure is drawn as a perspective view. FIG. 2 is a plan view of the substrate processing apparatus shown in FIG.

  In the substrate processing apparatus according to the present embodiment, a pod (substrate storage container) 100 storing a wafer (substrate) 200 made of silicon or the like is inserted into the housing 101 from the outside, and vice versa. An I / O stage (holding member transfer member) 105 for paying out from the outside is attached to the front surface of the housing 101, and a cassette shelf (mounting means) for storing the inserted pod 100 in the housing 101 ) 110 is laid. Further, an N 2 purge chamber (first airtight chamber) 103 for transferring the wafer 200 is provided in the middle of the housing 101. The N 2 purge chamber 103 is a sealed container so that the inside of the N 2 purge chamber 103 when processing the wafer 200 is filled with an inert gas such as N 2 gas in order to prevent a natural oxide film on the wafer 200. ing.

  As the pod 100, a FOUP (Front Opening Unified Pod) type is currently used in the mainstream, and an opening provided on one side surface of the pod 100 is closed with a lid (not shown) to allow wafers from the atmosphere. The wafer 200 can be transported in isolation, and the wafer 200 can be put into and out of the pod 100 by removing the lid. A pod opener (opening / closing means) 108 is provided on the front side of the N2 purge chamber 103 in order to remove the lid of the pod 100 and to communicate the atmosphere in the pod with the atmosphere of the N2 purge chamber 103. The pod 100 is transferred between the pod opener 108, the cassette shelf 110, and the I / O stage 105 by a cassette transfer machine 114. Air that has been cleaned by a clean unit (not shown) provided in the casing 101 is caused to flow in the transport space of the pod 100 by the cassette transfer device 114.

  Two load lock chambers (second hermetic chambers) 102 connected to the N 2 purge chamber 103 are provided behind the housing 101, and the wafer 200 is processed above the load lock chambers 102. One processing furnace 202 is provided.

  Each load lock chamber 102 is provided with a load lock door 123 as partition means for opening and closing an opening communicating with the N2 purge chamber 103. By closing the load lock door 123, the load lock chamber 102 becomes an airtight chamber independent of the N2 purge chamber 103. The load lock chamber 102 is filled with an inert gas such as N 2 or is in a reduced pressure atmosphere.

  The load lock chamber 102 is provided with a boat 218 for loading wafers in multiple stages, and a boat elevator (elevating means) 113 for loading and unloading the boat 218 to and from the processing furnace 202.

  Inside the N 2 purge chamber 103, the substrate alignment device 106 for adjusting the position of the notch (or orientation flat) of the wafer 200 to an arbitrary position, and the wafer before and after performing the processing of the wafer 200 in the processing furnace 202 are temporarily stored. Wafer transfer machine (transfer) for transferring wafers between the mounting table 124 to be temporarily placed, the pod 100 on the pod opener 108, the substrate alignment device 106, the mounting table 124, and the boat 217 in the load lock chamber 102. Means) 112.

  Next, the operation of the substrate processing apparatus according to this embodiment will be described.

  First, the pod 100 conveyed from the outside of the housing 101 by an AGV (Automated Guided Vehicle), an OHT (Overhead Hoist Transport), or the like is placed on the I / O stage 105. The pod 100 placed on the I / O stage 105 is directly transported onto the pod opener 108 by the cassette transfer device 114, or once stocked on the cassette shelf 110 and then transported onto the pod opener 108. The The pod 100 transferred onto the pod opener 108 is removed by the pod opener 108, and the internal atmosphere of the pod 100 is communicated with the atmosphere of the N 2 purge chamber 103.

  Next, the wafer 200 is taken out from the pod 100 in a state communicating with the atmosphere of the N 2 purge chamber 103 by the wafer transfer device 112. The extracted wafer 200 is aligned by the substrate alignment device 106 so that a notch is determined at an arbitrary position. After the alignment, the wafer 200 is temporarily placed by the wafer transfer device 112 on the boat 217 in one of the two load lock chambers 102 or after being temporarily placed on the mounting table 124. It is conveyed to the boat 217.

  Which of the two boats 217 the wafers 200 are transferred to can be arbitrarily selected. For example, the wafers 200 may be transferred alternately to the two boats 217, or one of the processing furnaces 202 may be maintained. In such a case, various settings can be made such as transporting only to the other boat 217.

  When the transfer of the wafer 200 to the boat 217 is completed, the load lock door 123 is closed, and the load lock chamber 102 is filled with an inert gas or has a reduced pressure atmosphere.

  Here, the point of being filled with an inert gas will be described in detail. As described above, since the N 2 purge chamber 103 is originally filled with an inert gas, if the load lock door 123 is opened, the load lock chamber 102 also has an inert gas atmosphere. The intention of filling the load lock chamber with the inert gas after the load lock door 123 is closed is that when the wafer 200 heated by the heat of the processing furnace 202 is not heated when loading and unloading into the processing furnace 202. A natural oxide film is more likely to be formed than the conventional one. By increasing the inert gas concentration in the load lock chamber to be higher than the inert gas concentration in the N 2 purge chamber 103, the natural oxide film on the wafer 200 is further increased. It is that prevention of adhesion can be achieved.

  Accordingly, when the load lock chamber 102 is also filled with the inert gas, the N 2 purge chamber and the load lock chamber each have an introduction path (not shown) for introducing the inert gas while adjusting the flow rate. It will be connected to an inert gas source.

  When the load lock chamber 102 is in a reduced pressure atmosphere, a pump is connected to an exhaust pipe (not shown) for exhausting the atmosphere of the load lock chamber 102 and the end of the exhaust pipe.

  When the load lock chamber 102 is in an arbitrary inert gas atmosphere (concentration) or in an arbitrary reduced pressure state, the furnace port shutter 116 of the processing furnace 202 is opened, and the boat 217 loaded with the wafers 200 is loaded by the boat elevator 115. To do.

  After loading, arbitrary processing is performed on the wafer 200 in the processing furnace 202. After the processing, the wafer 200 and the pod 100 are discharged out of the housing 101 in the reverse procedure described above.

  FIG. 3 shows functional blocks in the substrate processing apparatus configured as described above.

  The substrate processing apparatus according to the present embodiment is obtained by adding a function for managing file history to the conventional substrate processing apparatus shown in FIG. Hereinafter, parts having the same configurations and functions as those already described in FIG. 9 are denoted by the same reference numerals, and description thereof is omitted.

  Specifically, in the substrate processing apparatus according to the present embodiment, the operation unit 1 and the control unit 2 are not integrally configured, but are configured to be connected to each other via a network (such as a LAN connection).

  In addition to the configuration of the operation unit 1J in the conventional substrate processing apparatus, the operation unit 1 includes an edit file HDD storage module 104, an edit history file HDD storage module 106, a file history screen display module 105, a data transmission / reception module 110, and a memory M. It has.

  Here, the edit file HDD storage module 104 and the HDD 102 constitute an edit file storage unit. The editing history file HDD storage module 106 and HDD 102 constitute a history file storage unit. The file history screen display module 105 corresponds to a history file display unit and a history file display control unit.

  The control unit 2 includes a data transmission / reception module 207 and a memory N in addition to the configuration of the control unit 2J in the conventional substrate processing apparatus.

  Here, the memory M and the memory N both store at least various setting parameters 204, common setting parameters 205, and recipe data 206.

  The operation unit 1 and the control unit 2 can communicate with each other via the network by the data transmission / reception module 110 and the data transmission / reception module 207, so that, for example, one of the operation unit 1 and the control unit 2 can be communicated with the other. It is also possible to refer to data stored in the memory. In addition, by configuring the operation unit 1 and the control unit 2 to store the various setting parameters 204, the common setting parameter 205, and the recipe data 206, troubles such as a failure may occur in one of the operation unit 1 and the control unit 2, for example. Even in the case where there is, it is possible to access information such as the various setting parameters 204 on the other side, which can contribute to the improvement of the operational stability of the entire apparatus.

  Next, a processing flow in the substrate processing apparatus according to the present embodiment will be described. FIG. 4 is a flowchart showing the flow of processing in the substrate processing apparatus according to the present embodiment.

  First, a recipe / table edit screen is displayed by the recipe / table parameter edit screen display module 101 (S101).

  When desired data is set by the edit screen data input unit 103 on the recipe / table edit screen, the edit content is stored in the HDD 102 as the latest edit file by the edit file HDD storage module 104 (edit file storage step). (S102).

  In addition, the editing history file HDD storage module 106 stores the data related to the editing content history in the above-described step (S102) as a history file in the HDD 102 for up to 10 files separately from the editing file (history file storage). Step) (S103).

  As described above, when the file data edited in the HDD 102 and the editing history file for the file are stored, for example, a file list screen as shown in FIG. 5 is displayed in the recipe / table parameter editing screen display module 101. Displayed on the screen. When an arbitrary file S (here, file “TEMP”) is selected on this file list screen and the history button R is selected, a history file list screen as shown in FIG. 6 is displayed by the file history screen display module 105. (History file display step) (S104). On this history file list screen, history files for up to 10 generations are displayed as a list. Examples of displayed contents include a history number (history number) 701 indicating how many generations the file is, an update counter 702 indicating how many times the file has been updated in the past, a file name, an editor, Edit date and time and comments. In the figure, for the file “TEMP”, history files “TEMP” and “TEMP.1” are listed.

  Subsequently, any two or more of the history files displayed on the history file list screen as described above (here, as an example, at least two histories relating to temperature correction of “TEMP” and “TEMP.1”). When a file) is selected and a difference button 703 is selected, a history file reference screen as shown in FIGS. 7 and 8 is displayed (S105).

  7 shows a screen display example when the button “TEMP” 801 is selected on the history file reference screen, and FIG. 8 shows a screen display example when the button “TEMP.1” 802 is selected on the history file reference screen. . In FIG. 7 and FIG. 8, the difference (that is, the changed part) between the data content 805a of the temperature correction table in the history file “TEMP” and the data content 805b of the temperature correction table in the history file “TEMP.1” is bold. It is highlighted by surrounding it with a frame (history file display control step).

  In this way, by highlighting the changed part, it is possible to increase the visibility of the changed part and contribute to the suppression of the occurrence of human error and the improvement of operability. . In addition, as a method of highlighting the above-described differences, not only the above-described method of enclosing numerical values and the like with the thick frame, but also display with different display colors and fonts may be used.

  In the present embodiment, all files stored in the HDD are targets. Examples of files stored in the HDD include process recipes, sub-recipes, abort recipes, WAP tables, CAP tables, speed tables, Files related to the position table, link check table, profile table, and the like. That is, the file stored in the HDD includes a so-called recipe file. Although the maximum number of files is 10, this value can be changed as appropriate.

  In this embodiment, an example in which the present invention is applied to a vertical substrate processing apparatus has been described. However, the present invention is not limited to this, and the substrate processing apparatus as a single wafer apparatus or a horizontal apparatus is used. It goes without saying that is also applicable.

  The substrate processing apparatus may be not only a semiconductor manufacturing apparatus but also an apparatus for processing a glass substrate such as an LCD apparatus. In other words, the present invention is applicable to any apparatus that processes a substrate (semiconductor substrate, glass substrate, etc.). Of course, the treatment in the furnace may be any kind of treatment, and can be applied to the case of CVD, oxidation, diffusion, annealing treatment or the like.

  As described above, the substrate processing apparatus according to the present embodiment includes the controller that stores the edited file and the file (history file) that represents the history of the file, and executes the file by the controller. In the substrate processing apparatus for processing a substrate, a list of the files is displayed on the operation screen, and when a certain file is selected, a history file display for displaying a list of history files up to several generations before the file is displayed. And a history file display control means for comparing the contents of two history files in the history file and highlighting the difference between the contents to be displayed on the operation screen.

  The substrate processing method according to the present embodiment includes an edit file saving step for saving an edited file, a history file saving step for saving a history file relating to an editing history of the edited file, and the edit file saving unit. A history file display step for displaying a list of history files stored in the history file storage unit in correspondence with each editing performed on an arbitrary file among the files stored in A history file display control step for emphasizing a difference in contents between at least two arbitrary history files, and displaying the screen on a screen.

  In the substrate processing method as described above, each step is realized by causing a CPU (not shown) to execute a program stored in a storage unit (not shown) provided in the substrate processing apparatus having the above-described configuration. It is what is done.

  As described above, according to the present embodiment, generation management of files such as recipes and tables is performed, and the changed data portion is highlighted on the history confirmation screen by coloring, so that the changed portion can be identified. It is easy.

  With the configuration as described above, it is easy to find an operator's setting mistake early, and the parameter change history remains, so it is easy to check the change point, which can contribute to improvement in productivity and operability.

  When the process is executed, if it does not meet the process conditions requested by the customer, it is necessary to check the recipe setting and to know which parameter has been changed. In such a case, conventionally, it has been necessary to open and check a file such as a process recipe every time, which is troublesome. However, in this embodiment, the difference is easily understood by a simple operation. Not only can the parameters be changed immediately, but also the recipe settings can be easily changed and the process can be carried out, leading to an improvement in the operating rate of the apparatus.

It is an external appearance perspective view of the substrate processing apparatus applied to this invention. It is a top view of the substrate processing apparatus shown in FIG. It is a functional block diagram in the substrate processing apparatus by this Embodiment. It is a flowchart which shows the flow of a process in the substrate processing apparatus by this Embodiment. It is a figure for demonstrating a file list screen. It is a figure for demonstrating the log | history file list screen. It is a figure for demonstrating the log | history file reference screen. It is a figure for demonstrating the log | history file reference screen. It is a functional block diagram of the conventional substrate processing apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Operation part, 104 Edit file HDD storage module, 106 Edit file HDD storage module, 105 File history screen display module, 110 Data transmission / reception module, M memory, 2 Control part, 207 Data transmission / reception module, N memory

Claims (3)

A history file storage unit for storing a history file of a file such as a recipe or a table composed of a plurality of edited steps , and an arbitrary history file selected from the history files stored in the history file storage unit and the history file display portion for displaying the list, the history of the history file that is displayed on the file display section, the history file display control for the screen display by highlighting the differences contents between at least two arbitrary history file An operation unit including at least a control unit, and a control unit that executes each step in the recipe ,
In the displayed file list screen, the operation unit can select an arbitrary file from a process recipe, a sub recipe, an abort recipe, a WAP table, a CAP table, a speed table, a position table, a leak check table, a temperature profile table, and a temperature correction table. Is selected and a history button is selected, a list of history files related to the arbitrary file is displayed. When at least two history files are selected from among the displayed history files, Highlight the part where the data content of any recipe or table has been changed, and display it on the screen.
The substrate processing apparatus , wherein the control unit executes a recipe in which the data content is changed to perform substrate processing. A history file storage unit for storing a history file of a file such as a recipe or a table composed of a plurality of edited steps, and an arbitrary history file selected from the history files stored in the history file storage unit History file display control for displaying a list of files and history file display control for emphasizing the difference in content between at least two arbitrary history files among the history files displayed in the history file display portion And a display method of a substrate processing apparatus comprising an operation unit including at least a unit,
On the file list screen, any file is selected from the process recipe, sub-recipe, abort recipe, WAP table, CAP table, speed table, position table, leak check table, temperature profile table, and temperature correction table, and the history button is displayed. When selected, the history files related to the arbitrary file are displayed in a list. When at least two of the displayed history files are selected, the data content of an arbitrary recipe or table between the history files is selected. A display method for a substrate processing apparatus, comprising: emphasizing a changed part and displaying on a screen. On the file list screen, any file is selected from the process recipe, sub-recipe, abort recipe, WAP table, CAP table, speed table, position table, leak check table, temperature profile table, and temperature correction table, and the history button is displayed. When selected, the history files related to the arbitrary file are displayed in a list. When at least two of the displayed history files are selected, the data content of an arbitrary recipe or table between the history files is selected. A substrate processing method comprising: emphasizing a changed part and displaying it on a screen, and executing a recipe by changing the data content to process the substrate.

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