KR101940162B1 - 레이저 생성 플라즈마 광원 내의 완충가스 흐름 안정화를 위한 시스템 및 방법 - Google Patents

레이저 생성 플라즈마 광원 내의 완충가스 흐름 안정화를 위한 시스템 및 방법 Download PDF

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KR101940162B1
KR101940162B1 KR1020137032594A KR20137032594A KR101940162B1 KR 101940162 B1 KR101940162 B1 KR 101940162B1 KR 1020137032594 A KR1020137032594 A KR 1020137032594A KR 20137032594 A KR20137032594 A KR 20137032594A KR 101940162 B1 KR101940162 B1 KR 101940162B1
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optical member
light source
gas
volume
flow
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KR20140036219A (ko
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아이고르 브이. 포멘코프
블라디미르 비. 플레우로프
윌리엄 엔. 파틀로
알렉산더 아이. 에르쇼프
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에이에스엠엘 네델란즈 비.브이.
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020137032594A 2011-06-08 2012-05-10 레이저 생성 플라즈마 광원 내의 완충가스 흐름 안정화를 위한 시스템 및 방법 Active KR101940162B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/156,188 US9516730B2 (en) 2011-06-08 2011-06-08 Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
US13/156,188 2011-06-08
PCT/US2012/037363 WO2012170144A1 (en) 2011-06-08 2012-05-10 Systems and methods for buffer gas flow stabilization in a laser produced plasma light source

Publications (2)

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KR20140036219A KR20140036219A (ko) 2014-03-25
KR101940162B1 true KR101940162B1 (ko) 2019-01-18

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KR1020137032594A Active KR101940162B1 (ko) 2011-06-08 2012-05-10 레이저 생성 플라즈마 광원 내의 완충가스 흐름 안정화를 위한 시스템 및 방법

Country Status (6)

Country Link
US (1) US9516730B2 (enExample)
EP (1) EP2719261A4 (enExample)
JP (1) JP6043789B2 (enExample)
KR (1) KR101940162B1 (enExample)
TW (1) TWI576013B (enExample)
WO (1) WO2012170144A1 (enExample)

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US9155178B1 (en) * 2014-06-27 2015-10-06 Plex Llc Extreme ultraviolet source with magnetic cusp plasma control
US9544986B2 (en) 2014-06-27 2017-01-10 Plex Llc Extreme ultraviolet source with magnetic cusp plasma control
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KR102536355B1 (ko) * 2017-01-06 2023-05-25 에이에스엠엘 네델란즈 비.브이. 안내 장치 및 관련 시스템
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US10959318B2 (en) * 2018-01-10 2021-03-23 Kla-Tencor Corporation X-ray metrology system with broadband laser produced plasma illuminator
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JP7143439B2 (ja) 2018-11-15 2022-09-28 ギガフォトン株式会社 極端紫外光生成装置及び電子デバイスの製造方法
KR102869765B1 (ko) * 2019-05-17 2025-10-13 삼성전자주식회사 소스 용기용 잔류물 제거 장치, 소스 용기 및 극자외선 노광장치
JP7368984B2 (ja) * 2019-09-05 2023-10-25 ギガフォトン株式会社 極端紫外光生成装置、及び電子デバイスの製造方法
US10923311B1 (en) * 2019-11-11 2021-02-16 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Cathode for ion source comprising a tapered sidewall
JP2023121488A (ja) 2022-02-21 2023-08-31 ギガフォトン株式会社 極端紫外光生成装置及び電子デバイスの製造方法

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Also Published As

Publication number Publication date
US20120313016A1 (en) 2012-12-13
TWI576013B (zh) 2017-03-21
WO2012170144A1 (en) 2012-12-13
EP2719261A1 (en) 2014-04-16
TW201251517A (en) 2012-12-16
US9516730B2 (en) 2016-12-06
EP2719261A4 (en) 2015-04-08
JP6043789B2 (ja) 2016-12-14
KR20140036219A (ko) 2014-03-25
JP2014523640A (ja) 2014-09-11

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