KR101940162B1 - 레이저 생성 플라즈마 광원 내의 완충가스 흐름 안정화를 위한 시스템 및 방법 - Google Patents

레이저 생성 플라즈마 광원 내의 완충가스 흐름 안정화를 위한 시스템 및 방법 Download PDF

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KR101940162B1
KR101940162B1 KR1020137032594A KR20137032594A KR101940162B1 KR 101940162 B1 KR101940162 B1 KR 101940162B1 KR 1020137032594 A KR1020137032594 A KR 1020137032594A KR 20137032594 A KR20137032594 A KR 20137032594A KR 101940162 B1 KR101940162 B1 KR 101940162B1
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optical member
light source
gas
volume
flow
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KR20140036219A (ko
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아이고르 브이. 포멘코프
블라디미르 비. 플레우로프
윌리엄 엔. 파틀로
알렉산더 아이. 에르쇼프
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에이에스엠엘 네델란즈 비.브이.
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020137032594A 2011-06-08 2012-05-10 레이저 생성 플라즈마 광원 내의 완충가스 흐름 안정화를 위한 시스템 및 방법 Active KR101940162B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/156,188 2011-06-08
US13/156,188 US9516730B2 (en) 2011-06-08 2011-06-08 Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
PCT/US2012/037363 WO2012170144A1 (en) 2011-06-08 2012-05-10 Systems and methods for buffer gas flow stabilization in a laser produced plasma light source

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KR20140036219A KR20140036219A (ko) 2014-03-25
KR101940162B1 true KR101940162B1 (ko) 2019-01-18

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US (1) US9516730B2 (enExample)
EP (1) EP2719261A4 (enExample)
JP (1) JP6043789B2 (enExample)
KR (1) KR101940162B1 (enExample)
TW (1) TWI576013B (enExample)
WO (1) WO2012170144A1 (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9390892B2 (en) 2012-06-26 2016-07-12 Kla-Tencor Corporation Laser sustained plasma light source with electrically induced gas flow
JP6099241B2 (ja) * 2012-06-28 2017-03-22 ギガフォトン株式会社 ターゲット供給装置
US8853655B2 (en) * 2013-02-22 2014-10-07 Kla-Tencor Corporation Gas refraction compensation for laser-sustained plasma bulbs
US8791440B1 (en) * 2013-03-14 2014-07-29 Asml Netherlands B.V. Target for extreme ultraviolet light source
US8872143B2 (en) 2013-03-14 2014-10-28 Asml Netherlands B.V. Target for laser produced plasma extreme ultraviolet light source
US8680495B1 (en) * 2013-03-15 2014-03-25 Cymer, Llc Extreme ultraviolet light source
US9560730B2 (en) 2013-09-09 2017-01-31 Asml Netherlands B.V. Transport system for an extreme ultraviolet light source
US9557650B2 (en) * 2013-09-09 2017-01-31 Asml Netherlands B.V. Transport system for an extreme ultraviolet light source
WO2015086232A1 (en) * 2013-12-09 2015-06-18 Asml Netherlands B.V. Radiation source device, lithographic apparatus and device manufacturing method
US9338870B2 (en) 2013-12-30 2016-05-10 Asml Netherlands B.V. Extreme ultraviolet light source
US9539622B2 (en) * 2014-03-18 2017-01-10 Asml Netherlands B.V. Apparatus for and method of active cleaning of EUV optic with RF plasma field
US9155178B1 (en) 2014-06-27 2015-10-06 Plex Llc Extreme ultraviolet source with magnetic cusp plasma control
US9544986B2 (en) 2014-06-27 2017-01-10 Plex Llc Extreme ultraviolet source with magnetic cusp plasma control
US9357625B2 (en) 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
JP6393196B2 (ja) * 2015-01-19 2018-09-19 浜松ホトニクス株式会社 レーザ光増幅装置
US9776218B2 (en) * 2015-08-06 2017-10-03 Asml Netherlands B.V. Controlled fluid flow for cleaning an optical element
US10128016B2 (en) 2016-01-12 2018-11-13 Asml Netherlands B.V. EUV element having barrier to hydrogen transport
EP3291650B1 (en) * 2016-09-02 2019-06-05 ETH Zürich Device and method for generating uv or x-ray radiation by means of a plasma
US10149375B2 (en) * 2016-09-14 2018-12-04 Asml Netherlands B.V. Target trajectory metrology in an extreme ultraviolet light source
JP7193459B2 (ja) * 2017-01-06 2022-12-20 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線源（ｅｕｖ源）
US10955749B2 (en) 2017-01-06 2021-03-23 Asml Netherlands B.V. Guiding device and associated system
US10165664B1 (en) * 2017-11-21 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for decontaminating windows of an EUV source module
US10959318B2 (en) * 2018-01-10 2021-03-23 Kla-Tencor Corporation X-ray metrology system with broadband laser produced plasma illuminator
NL2022644A (en) 2018-03-05 2019-09-10 Asml Netherlands Bv Prolonging optical element lifetime in an euv lithography system
US12078934B2 (en) * 2018-09-25 2024-09-03 Asml Netherlands B.V. Laser system for target metrology and alteration in an EUV light source
JP7143439B2 (ja) * 2018-11-15 2022-09-28 ギガフォトン株式会社 極端紫外光生成装置及び電子デバイスの製造方法
KR102869765B1 (ko) * 2019-05-17 2025-10-13 삼성전자주식회사 소스 용기용 잔류물 제거 장치, 소스 용기 및 극자외선 노광장치
JP7368984B2 (ja) * 2019-09-05 2023-10-25 ギガフォトン株式会社 極端紫外光生成装置、及び電子デバイスの製造方法
US10923311B1 (en) * 2019-11-11 2021-02-16 Xia Tai Xin Semiconductor (Qing Dao) Ltd. Cathode for ion source comprising a tapered sidewall
JP2023121488A (ja) 2022-02-21 2023-08-31 ギガフォトン株式会社 極端紫外光生成装置及び電子デバイスの製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004501491A (ja) * 2000-06-09 2004-01-15 サイマー，　インコーポレイテッド 活性ガス及びバッファガス制御を有するプラズマ集束光源
JP2010161092A (ja) * 2009-01-06 2010-07-22 Komatsu Ltd 極端紫外光源装置
WO2010112171A1 (en) * 2009-04-02 2010-10-07 Eth Zurich Extreme ultraviolet light source with a debris-mitigated and cooled collector optics

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6452199B1 (en) 1997-05-12 2002-09-17 Cymer, Inc. Plasma focus high energy photon source with blast shield
TW508980B (en) * 1999-12-23 2002-11-01 Koninkl Philips Electronics Nv Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
US7465946B2 (en) 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US7843632B2 (en) * 2006-08-16 2010-11-30 Cymer, Inc. EUV optics
US20060255298A1 (en) 2005-02-25 2006-11-16 Cymer, Inc. Laser produced plasma EUV light source with pre-pulse
US7405416B2 (en) 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7897947B2 (en) 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US7491954B2 (en) 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7671349B2 (en) * 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US7164144B2 (en) 2004-03-10 2007-01-16 Cymer Inc. EUV light source
US7087914B2 (en) 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US7184124B2 (en) 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
US7402825B2 (en) * 2005-06-28 2008-07-22 Cymer, Inc. LPP EUV drive laser input system
US8158960B2 (en) 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
DE102007023444B4 (de) * 2007-05-16 2009-04-09 Xtreme Technologies Gmbh Einrichtung zur Erzeugung eines Gasvorhangs für plasmabasierte EUV-Strahlungsquellen
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US8115900B2 (en) * 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5339742B2 (ja) * 2008-03-04 2013-11-13 ウシオ電機株式会社 極端紫外光が出射する装置と極端紫外光が導入される装置との接続装置
US7872245B2 (en) 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
KR101697610B1 (ko) 2008-09-11 2017-01-18 에이에스엠엘 네델란즈 비.브이. 방사선 소스 및 리소그래피 장치
JP5312959B2 (ja) 2009-01-09 2013-10-09 ギガフォトン株式会社 極端紫外光源装置
US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
US8304752B2 (en) * 2009-04-10 2012-11-06 Cymer, Inc. EUV light producing system and method utilizing an alignment laser
JP5693587B2 (ja) 2009-09-25 2015-04-01 エーエスエムエル ネザーランズ ビー．ブイ． 放射源コレクタ装置、リソグラフィ装置およびデバイス製造方法
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US8368039B2 (en) * 2010-04-05 2013-02-05 Cymer, Inc. EUV light source glint reduction system
US9066412B2 (en) * 2010-04-15 2015-06-23 Asml Netherlands B.V. Systems and methods for cooling an optic
US9013679B2 (en) * 2010-04-22 2015-04-21 Asml Netherlands B.V. Collector mirror assembly and method for producing extreme ultraviolet radiation

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004501491A (ja) * 2000-06-09 2004-01-15 サイマー，　インコーポレイテッド 活性ガス及びバッファガス制御を有するプラズマ集束光源
JP2010161092A (ja) * 2009-01-06 2010-07-22 Komatsu Ltd 極端紫外光源装置
WO2010112171A1 (en) * 2009-04-02 2010-10-07 Eth Zurich Extreme ultraviolet light source with a debris-mitigated and cooled collector optics

Also Published As

Publication number Publication date
EP2719261A1 (en) 2014-04-16
TWI576013B (zh) 2017-03-21
JP2014523640A (ja) 2014-09-11
JP6043789B2 (ja) 2016-12-14
KR20140036219A (ko) 2014-03-25
US20120313016A1 (en) 2012-12-13
EP2719261A4 (en) 2015-04-08
WO2012170144A1 (en) 2012-12-13
US9516730B2 (en) 2016-12-06
TW201251517A (en) 2012-12-16

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