TWI576013B - 雷射生成電漿光源中緩衝氣流穩定化的系統與方法 - Google Patents
雷射生成電漿光源中緩衝氣流穩定化的系統與方法 Download PDFInfo
- Publication number
- TWI576013B TWI576013B TW101116337A TW101116337A TWI576013B TW I576013 B TWI576013 B TW I576013B TW 101116337 A TW101116337 A TW 101116337A TW 101116337 A TW101116337 A TW 101116337A TW I576013 B TWI576013 B TW I576013B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- volume
- gas
- light source
- beam path
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 22
- 230000000087 stabilizing effect Effects 0.000 title description 2
- 239000007789 gas Substances 0.000 claims description 94
- 230000003287 optical effect Effects 0.000 claims description 35
- 239000001257 hydrogen Substances 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 18
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 15
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 6
- 239000001307 helium Substances 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000013077 target material Substances 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 14
- 229910052718 tin Inorganic materials 0.000 description 14
- 239000000463 material Substances 0.000 description 12
- 150000002500 ions Chemical class 0.000 description 11
- 239000000758 substrate Substances 0.000 description 7
- 230000036278 prepulse Effects 0.000 description 6
- 230000003321 amplification Effects 0.000 description 5
- 230000003750 conditioning effect Effects 0.000 description 5
- 238000003199 nucleic acid amplification method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 238000009499 grossing Methods 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 230000033001 locomotion Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- KXCAEQNNTZANTK-UHFFFAOYSA-N stannane Chemical compound [SnH4] KXCAEQNNTZANTK-UHFFFAOYSA-N 0.000 description 3
- 229910000083 tin tetrahydride Inorganic materials 0.000 description 3
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 229910000807 Ga alloy Inorganic materials 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000007726 management method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910000846 In alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- -1 SnBr 4 Chemical compound 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 239000011538 cleaning material Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000013529 heat transfer fluid Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000000155 isotopic effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000009304 pastoral farming Methods 0.000 description 1
- 238000002601 radiography Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000009331 sowing Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000009469 supplementation Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/002—Supply of the plasma generating material
- H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
- H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
- H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/156,188 US9516730B2 (en) | 2011-06-08 | 2011-06-08 | Systems and methods for buffer gas flow stabilization in a laser produced plasma light source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201251517A TW201251517A (en) | 2012-12-16 |
| TWI576013B true TWI576013B (zh) | 2017-03-21 |
Family
ID=47292352
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101116337A TWI576013B (zh) | 2011-06-08 | 2012-05-08 | 雷射生成電漿光源中緩衝氣流穩定化的系統與方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9516730B2 (enExample) |
| EP (1) | EP2719261A4 (enExample) |
| JP (1) | JP6043789B2 (enExample) |
| KR (1) | KR101940162B1 (enExample) |
| TW (1) | TWI576013B (enExample) |
| WO (1) | WO2012170144A1 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9390892B2 (en) | 2012-06-26 | 2016-07-12 | Kla-Tencor Corporation | Laser sustained plasma light source with electrically induced gas flow |
| JP6099241B2 (ja) * | 2012-06-28 | 2017-03-22 | ギガフォトン株式会社 | ターゲット供給装置 |
| US8853655B2 (en) * | 2013-02-22 | 2014-10-07 | Kla-Tencor Corporation | Gas refraction compensation for laser-sustained plasma bulbs |
| US8872143B2 (en) | 2013-03-14 | 2014-10-28 | Asml Netherlands B.V. | Target for laser produced plasma extreme ultraviolet light source |
| US8791440B1 (en) * | 2013-03-14 | 2014-07-29 | Asml Netherlands B.V. | Target for extreme ultraviolet light source |
| US8680495B1 (en) * | 2013-03-15 | 2014-03-25 | Cymer, Llc | Extreme ultraviolet light source |
| US9560730B2 (en) | 2013-09-09 | 2017-01-31 | Asml Netherlands B.V. | Transport system for an extreme ultraviolet light source |
| US9557650B2 (en) * | 2013-09-09 | 2017-01-31 | Asml Netherlands B.V. | Transport system for an extreme ultraviolet light source |
| WO2015086232A1 (en) * | 2013-12-09 | 2015-06-18 | Asml Netherlands B.V. | Radiation source device, lithographic apparatus and device manufacturing method |
| US9338870B2 (en) | 2013-12-30 | 2016-05-10 | Asml Netherlands B.V. | Extreme ultraviolet light source |
| US9539622B2 (en) * | 2014-03-18 | 2017-01-10 | Asml Netherlands B.V. | Apparatus for and method of active cleaning of EUV optic with RF plasma field |
| US9155178B1 (en) * | 2014-06-27 | 2015-10-06 | Plex Llc | Extreme ultraviolet source with magnetic cusp plasma control |
| US9544986B2 (en) | 2014-06-27 | 2017-01-10 | Plex Llc | Extreme ultraviolet source with magnetic cusp plasma control |
| US9357625B2 (en) | 2014-07-07 | 2016-05-31 | Asml Netherlands B.V. | Extreme ultraviolet light source |
| JP6393196B2 (ja) * | 2015-01-19 | 2018-09-19 | 浜松ホトニクス株式会社 | レーザ光増幅装置 |
| US9776218B2 (en) | 2015-08-06 | 2017-10-03 | Asml Netherlands B.V. | Controlled fluid flow for cleaning an optical element |
| US10128016B2 (en) * | 2016-01-12 | 2018-11-13 | Asml Netherlands B.V. | EUV element having barrier to hydrogen transport |
| EP3291650B1 (en) * | 2016-09-02 | 2019-06-05 | ETH Zürich | Device and method for generating uv or x-ray radiation by means of a plasma |
| US10149375B2 (en) * | 2016-09-14 | 2018-12-04 | Asml Netherlands B.V. | Target trajectory metrology in an extreme ultraviolet light source |
| US10955749B2 (en) | 2017-01-06 | 2021-03-23 | Asml Netherlands B.V. | Guiding device and associated system |
| JP7193459B2 (ja) * | 2017-01-06 | 2022-12-20 | エーエスエムエル ネザーランズ ビー．ブイ． | 極端紫外線源（ｅｕｖ源） |
| US10165664B1 (en) * | 2017-11-21 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for decontaminating windows of an EUV source module |
| US10959318B2 (en) * | 2018-01-10 | 2021-03-23 | Kla-Tencor Corporation | X-ray metrology system with broadband laser produced plasma illuminator |
| NL2022644A (en) * | 2018-03-05 | 2019-09-10 | Asml Netherlands Bv | Prolonging optical element lifetime in an euv lithography system |
| NL2023633A (en) * | 2018-09-25 | 2020-04-30 | Asml Netherlands Bv | Laser system for target metrology and alteration in an euv light source |
| JP7143439B2 (ja) * | 2018-11-15 | 2022-09-28 | ギガフォトン株式会社 | 極端紫外光生成装置及び電子デバイスの製造方法 |
| KR102869765B1 (ko) * | 2019-05-17 | 2025-10-13 | 삼성전자주식회사 | 소스 용기용 잔류물 제거 장치, 소스 용기 및 극자외선 노광장치 |
| JP7368984B2 (ja) * | 2019-09-05 | 2023-10-25 | ギガフォトン株式会社 | 極端紫外光生成装置、及び電子デバイスの製造方法 |
| US10923311B1 (en) * | 2019-11-11 | 2021-02-16 | Xia Tai Xin Semiconductor (Qing Dao) Ltd. | Cathode for ion source comprising a tapered sidewall |
| JP2023121488A (ja) | 2022-02-21 | 2023-08-31 | ギガフォトン株式会社 | 極端紫外光生成装置及び電子デバイスの製造方法 |
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| US20080043321A1 (en) * | 2006-08-16 | 2008-02-21 | Cymer, Inc. | EUV optics |
| US7402825B2 (en) * | 2005-06-28 | 2008-07-22 | Cymer, Inc. | LPP EUV drive laser input system |
| US20090057567A1 (en) * | 2007-08-31 | 2009-03-05 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
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| US6586757B2 (en) * | 1997-05-12 | 2003-07-01 | Cymer, Inc. | Plasma focus light source with active and buffer gas control |
| US6452199B1 (en) | 1997-05-12 | 2002-09-17 | Cymer, Inc. | Plasma focus high energy photon source with blast shield |
| TW508980B (en) * | 1999-12-23 | 2002-11-01 | Koninkl Philips Electronics Nv | Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit |
| US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
| US7439530B2 (en) | 2005-06-29 | 2008-10-21 | Cymer, Inc. | LPP EUV light source drive laser system |
| US20060255298A1 (en) | 2005-02-25 | 2006-11-16 | Cymer, Inc. | Laser produced plasma EUV light source with pre-pulse |
| US7405416B2 (en) | 2005-02-25 | 2008-07-29 | Cymer, Inc. | Method and apparatus for EUV plasma source target delivery |
| US7465946B2 (en) | 2004-03-10 | 2008-12-16 | Cymer, Inc. | Alternative fuels for EUV light source |
| US7897947B2 (en) | 2007-07-13 | 2011-03-01 | Cymer, Inc. | Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave |
| US7491954B2 (en) | 2006-10-13 | 2009-02-17 | Cymer, Inc. | Drive laser delivery systems for EUV light source |
| US7372056B2 (en) | 2005-06-29 | 2008-05-13 | Cymer, Inc. | LPP EUV plasma source material target delivery system |
| US7671349B2 (en) * | 2003-04-08 | 2010-03-02 | Cymer, Inc. | Laser produced plasma EUV light source |
| US7087914B2 (en) | 2004-03-17 | 2006-08-08 | Cymer, Inc | High repetition rate laser produced plasma EUV light source |
| US7164144B2 (en) | 2004-03-10 | 2007-01-16 | Cymer Inc. | EUV light source |
| US7184124B2 (en) | 2004-10-28 | 2007-02-27 | Asml Holding N.V. | Lithographic apparatus having an adjustable projection system and device manufacturing method |
| US8158960B2 (en) | 2007-07-13 | 2012-04-17 | Cymer, Inc. | Laser produced plasma EUV light source |
| DE102007023444B4 (de) * | 2007-05-16 | 2009-04-09 | Xtreme Technologies Gmbh | Einrichtung zur Erzeugung eines Gasvorhangs für plasmabasierte EUV-Strahlungsquellen |
| US7812329B2 (en) * | 2007-12-14 | 2010-10-12 | Cymer, Inc. | System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus |
| US8115900B2 (en) * | 2007-09-17 | 2012-02-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP5339742B2 (ja) * | 2008-03-04 | 2013-11-13 | ウシオ電機株式会社 | 極端紫外光が出射する装置と極端紫外光が導入される装置との接続装置 |
| US7872245B2 (en) | 2008-03-17 | 2011-01-18 | Cymer, Inc. | Systems and methods for target material delivery in a laser produced plasma EUV light source |
| WO2010028899A1 (en) | 2008-09-11 | 2010-03-18 | Asml Netherlands B.V. | Radiation source and lithographic apparatus |
| JP5314433B2 (ja) * | 2009-01-06 | 2013-10-16 | ギガフォトン株式会社 | 極端紫外光源装置 |
| JP5312959B2 (ja) * | 2009-01-09 | 2013-10-09 | ギガフォトン株式会社 | 極端紫外光源装置 |
| EP2414898A1 (en) | 2009-04-02 | 2012-02-08 | ETH Zurich | Extreme ultraviolet light source with a debris-mitigated and cooled collector optics |
| US8138487B2 (en) * | 2009-04-09 | 2012-03-20 | Cymer, Inc. | System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber |
| US8304752B2 (en) * | 2009-04-10 | 2012-11-06 | Cymer, Inc. | EUV light producing system and method utilizing an alignment laser |
| US9091944B2 (en) * | 2009-09-25 | 2015-07-28 | Asml Netherlands B.V. | Source collector, lithographic apparatus and device manufacturing method |
| US8173985B2 (en) * | 2009-12-15 | 2012-05-08 | Cymer, Inc. | Beam transport system for extreme ultraviolet light source |
| US8368039B2 (en) * | 2010-04-05 | 2013-02-05 | Cymer, Inc. | EUV light source glint reduction system |
| US9066412B2 (en) * | 2010-04-15 | 2015-06-23 | Asml Netherlands B.V. | Systems and methods for cooling an optic |
| WO2011131431A1 (en) * | 2010-04-22 | 2011-10-27 | Asml Netherlands B.V. | Collector mirror assembly and method for producing extreme ultraviolet radiation |
-
2011
- 2011-06-08 US US13/156,188 patent/US9516730B2/en active Active
-
2012
- 2012-05-08 TW TW101116337A patent/TWI576013B/zh active
- 2012-05-10 WO PCT/US2012/037363 patent/WO2012170144A1/en not_active Ceased
- 2012-05-10 KR KR1020137032594A patent/KR101940162B1/ko active Active
- 2012-05-10 EP EP12797256.0A patent/EP2719261A4/en not_active Withdrawn
- 2012-05-10 JP JP2014514465A patent/JP6043789B2/ja active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7402825B2 (en) * | 2005-06-28 | 2008-07-22 | Cymer, Inc. | LPP EUV drive laser input system |
| US20080043321A1 (en) * | 2006-08-16 | 2008-02-21 | Cymer, Inc. | EUV optics |
| US20090057567A1 (en) * | 2007-08-31 | 2009-03-05 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2719261A1 (en) | 2014-04-16 |
| TW201251517A (en) | 2012-12-16 |
| WO2012170144A1 (en) | 2012-12-13 |
| KR101940162B1 (ko) | 2019-01-18 |
| US9516730B2 (en) | 2016-12-06 |
| KR20140036219A (ko) | 2014-03-25 |
| US20120313016A1 (en) | 2012-12-13 |
| JP2014523640A (ja) | 2014-09-11 |
| JP6043789B2 (ja) | 2016-12-14 |
| EP2719261A4 (en) | 2015-04-08 |
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