KR101911196B1 - 화학적 증기 증착 코팅, 물품, 및 방법 - Google Patents

화학적 증기 증착 코팅, 물품, 및 방법 Download PDF

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KR101911196B1
KR101911196B1 KR1020177023140A KR20177023140A KR101911196B1 KR 101911196 B1 KR101911196 B1 KR 101911196B1 KR 1020177023140 A KR1020177023140 A KR 1020177023140A KR 20177023140 A KR20177023140 A KR 20177023140A KR 101911196 B1 KR101911196 B1 KR 101911196B1
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vapor deposition
layer
article
substrate
dimethylsilane
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KR20170100041A (ko
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데이비드 에이. 스미스
제임스 비. 마트젤라
폴 에이치. 실비스
게리 에이. 바로네
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실코텍 코포레이션
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • H01L21/205—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2202/00—Metallic substrate
    • B05D2202/10—Metallic substrate based on Fe
    • B05D2202/15—Stainless steel
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020177023140A 2009-10-27 2010-10-26 화학적 증기 증착 코팅, 물품, 및 방법 Active KR101911196B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US25523709P 2009-10-27 2009-10-27
US61/255,237 2009-10-27
US26722809P 2009-12-07 2009-12-07
US61/267,228 2009-12-07
PCT/US2010/054058 WO2011056550A1 (en) 2009-10-27 2010-10-26 Chemical vapor deposition coating, article, and method

Related Parent Applications (1)

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KR1020127010812A Division KR101773213B1 (ko) 2009-10-27 2010-10-26 화학적 증기 증착 코팅, 물품, 및 방법

Related Child Applications (1)

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KR1020187029570A Division KR101932899B1 (ko) 2009-10-27 2010-10-26 화학적 증기 증착 코팅, 물품, 및 방법

Publications (2)

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KR20170100041A KR20170100041A (ko) 2017-09-01
KR101911196B1 true KR101911196B1 (ko) 2018-10-24

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KR1020187029570A Active KR101932899B1 (ko) 2009-10-27 2010-10-26 화학적 증기 증착 코팅, 물품, 및 방법
KR1020127010812A Active KR101773213B1 (ko) 2009-10-27 2010-10-26 화학적 증기 증착 코팅, 물품, 및 방법

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KR1020127010812A Active KR101773213B1 (ko) 2009-10-27 2010-10-26 화학적 증기 증착 코팅, 물품, 및 방법

Country Status (7)

Country Link
US (2) US9777368B2 (enExample)
EP (1) EP2494087B1 (enExample)
JP (1) JP5735522B2 (enExample)
KR (3) KR101911196B1 (enExample)
CN (2) CN102741452A (enExample)
ES (1) ES2859458T3 (enExample)
WO (1) WO2011056550A1 (enExample)

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TW201319299A (zh) * 2011-09-13 2013-05-16 Applied Materials Inc 用於低溫電漿輔助沉積的活化矽前驅物
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Also Published As

Publication number Publication date
KR101773213B1 (ko) 2017-08-30
US20190032201A1 (en) 2019-01-31
US20120251797A1 (en) 2012-10-04
US9777368B2 (en) 2017-10-03
KR101932899B1 (ko) 2018-12-26
KR20170100041A (ko) 2017-09-01
ES2859458T3 (es) 2021-10-04
JP2013508563A (ja) 2013-03-07
KR20120120120A (ko) 2012-11-01
EP2494087A1 (en) 2012-09-05
WO2011056550A1 (en) 2011-05-12
CN106319477A (zh) 2017-01-11
JP5735522B2 (ja) 2015-06-17
EP2494087B1 (en) 2020-12-30
KR20180115356A (ko) 2018-10-22
US10731247B2 (en) 2020-08-04
CN102741452A (zh) 2012-10-17

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