CN102741452A - 化学气相沉积涂层、制品和方法 - Google Patents

化学气相沉积涂层、制品和方法 Download PDF

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Publication number
CN102741452A
CN102741452A CN2010800498267A CN201080049826A CN102741452A CN 102741452 A CN102741452 A CN 102741452A CN 2010800498267 A CN2010800498267 A CN 2010800498267A CN 201080049826 A CN201080049826 A CN 201080049826A CN 102741452 A CN102741452 A CN 102741452A
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CN
China
Prior art keywords
layer
coating
chemical vapor
vapor deposition
dimethylsilane
Prior art date
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Pending
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CN2010800498267A
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English (en)
Chinese (zh)
Inventor
D·A·史密斯
J·B·马特泽拉
P·H·西尔维斯
G·A·贝伦
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Silcotek Corp
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Silcotek Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Silcotek Corp filed Critical Silcotek Corp
Priority to CN201610697860.4A priority Critical patent/CN106319477A/zh
Publication of CN102741452A publication Critical patent/CN102741452A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2202/00—Metallic substrate
    • B05D2202/10—Metallic substrate based on Fe
    • B05D2202/15—Stainless steel
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Vapour Deposition (AREA)
CN2010800498267A 2009-10-27 2010-10-26 化学气相沉积涂层、制品和方法 Pending CN102741452A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610697860.4A CN106319477A (zh) 2009-10-27 2010-10-26 化学气相沉积涂层、制品和方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US25523709P 2009-10-27 2009-10-27
US61/255,237 2009-10-27
US26722809P 2009-12-07 2009-12-07
US61/267,228 2009-12-07
PCT/US2010/054058 WO2011056550A1 (en) 2009-10-27 2010-10-26 Chemical vapor deposition coating, article, and method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201610697860.4A Division CN106319477A (zh) 2009-10-27 2010-10-26 化学气相沉积涂层、制品和方法

Publications (1)

Publication Number Publication Date
CN102741452A true CN102741452A (zh) 2012-10-17

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CN201610697860.4A Pending CN106319477A (zh) 2009-10-27 2010-10-26 化学气相沉积涂层、制品和方法
CN2010800498267A Pending CN102741452A (zh) 2009-10-27 2010-10-26 化学气相沉积涂层、制品和方法

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US (2) US9777368B2 (enExample)
EP (1) EP2494087B1 (enExample)
JP (1) JP5735522B2 (enExample)
KR (3) KR101932899B1 (enExample)
CN (2) CN106319477A (enExample)
ES (1) ES2859458T3 (enExample)
WO (1) WO2011056550A1 (enExample)

Cited By (4)

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CN105112886A (zh) * 2015-09-18 2015-12-02 杭州天净检测技术有限公司 一种惰性表面处理技术
CN107267955A (zh) * 2016-01-22 2017-10-20 西尔科特克公司 扩散速率受限的热化学气相沉积涂层
CN113707526A (zh) * 2020-05-20 2021-11-26 中微半导体设备(上海)股份有限公司 零部件、形成耐等离子体涂层的方法和等离子体反应装置
CN115125512A (zh) * 2022-07-11 2022-09-30 杭州师范大学 利用四甲基二硅氧烷热分解沉积技术的基材表面惰性处理方法

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TW201319299A (zh) * 2011-09-13 2013-05-16 Applied Materials Inc 用於低溫電漿輔助沉積的活化矽前驅物
JP6256953B2 (ja) * 2012-03-26 2018-01-10 シルコテック コーポレーション コーティングされた物品及び化学蒸着方法
EP2996819A1 (en) 2013-05-14 2016-03-23 Silcotek Corp. Vapor phase treatment of amorphous carbon films with (perfluoro 1,1,2,2 tetrahydroalkyl)trialkoxysilane
US20150030885A1 (en) * 2013-07-29 2015-01-29 Silcotek Corp. Coated article and chemical vapor deposition process
US11292924B2 (en) 2014-04-08 2022-04-05 Silcotek Corp. Thermal chemical vapor deposition coated article and process
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US9915001B2 (en) * 2014-09-03 2018-03-13 Silcotek Corp. Chemical vapor deposition process and coated article
US10316408B2 (en) * 2014-12-12 2019-06-11 Silcotek Corp. Delivery device, manufacturing system and process of manufacturing
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US9995864B2 (en) 2015-04-03 2018-06-12 Moxtek, Inc. Wire grid polarizer with silane protective coating
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US10487403B2 (en) * 2016-12-13 2019-11-26 Silcotek Corp Fluoro-containing thermal chemical vapor deposition process and article
US11161324B2 (en) 2017-09-13 2021-11-02 Silcotek Corp. Corrosion-resistant coated article and thermal chemical vapor deposition coating process
US12181452B2 (en) 2017-09-18 2024-12-31 Waters Technologies Corporation Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes
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JP2019108569A (ja) * 2017-12-15 2019-07-04 シルコテック コーポレーション フッ素含有熱化学気相堆積方法および物品
CN109957788A (zh) * 2017-12-22 2019-07-02 西尔科特克公司 含氟热化学气相沉积方法和制品
KR102207529B1 (ko) 2018-03-14 2021-01-26 주식회사 엘지화학 비정질 실리콘-탄소 복합체, 이의 제조방법 및 이를 포함하는 리튬 이차전지
JP7138192B2 (ja) * 2018-06-22 2022-09-15 リンデ ゲゼルシャフト ミット ベシュレンクテル ハフツング シリンダ弁並びにシリンダ及びシリンダ弁内の汚染物質の形成を抑制する方法
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105112886A (zh) * 2015-09-18 2015-12-02 杭州天净检测技术有限公司 一种惰性表面处理技术
CN107267955A (zh) * 2016-01-22 2017-10-20 西尔科特克公司 扩散速率受限的热化学气相沉积涂层
TWI772285B (zh) * 2016-01-22 2022-08-01 美商席爾科泰克公司 限制擴散速率之熱化學氣相沉積塗層
CN113707526A (zh) * 2020-05-20 2021-11-26 中微半导体设备(上海)股份有限公司 零部件、形成耐等离子体涂层的方法和等离子体反应装置
CN113707526B (zh) * 2020-05-20 2024-05-24 中微半导体设备(上海)股份有限公司 零部件、形成耐等离子体涂层的方法和等离子体反应装置
CN115125512A (zh) * 2022-07-11 2022-09-30 杭州师范大学 利用四甲基二硅氧烷热分解沉积技术的基材表面惰性处理方法

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Publication number Publication date
US9777368B2 (en) 2017-10-03
US10731247B2 (en) 2020-08-04
US20120251797A1 (en) 2012-10-04
CN106319477A (zh) 2017-01-11
WO2011056550A1 (en) 2011-05-12
KR20170100041A (ko) 2017-09-01
KR20120120120A (ko) 2012-11-01
KR20180115356A (ko) 2018-10-22
KR101911196B1 (ko) 2018-10-24
US20190032201A1 (en) 2019-01-31
KR101932899B1 (ko) 2018-12-26
EP2494087A1 (en) 2012-09-05
KR101773213B1 (ko) 2017-08-30
JP2013508563A (ja) 2013-03-07
ES2859458T3 (es) 2021-10-04
EP2494087B1 (en) 2020-12-30
JP5735522B2 (ja) 2015-06-17

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