KR101880212B1 - Block copolymer - Google Patents

Abstract

The present application may provide block copolymers and uses thereof. The block copolymer of the present application has excellent self-assembling property or phase-separating property, can freely impart various required functions, and particularly, has excellent etching selectivity and can be effectively applied to applications such as pattern formation.

Description

BLOCK COPOLYMER < RTI ID = 0.0 >

This application relates to block copolymers and uses thereof.

The block copolymer has a molecular structure in which polymer blocks having different chemical structures are linked via covalent bonds. The block copolymer can form a periodically arranged structure such as a sphere, a cylinder or a lamella by phase separation. The size of the domain of the structure formed by the self-assembling phenomenon of the block copolymer can be widely controlled, and various types of structures can be manufactured. Thus, various next-generation nano-structures such as high density magnetic storage media, nanowire fabrication, And can be applied to pattern formation by devices, magnetic recording media, lithography, or the like.

The physical properties required for the block copolymer to be applied to the pattern formation include self selectivity as well as etch selectivity. That is, a process of selectively removing one of the chemically different blocks of the self-assembled block copolymer may be required for the production of the mask for pattern formation. In this process, if the etching selectivity between the blocks is not ensured , Application to pattern formation is difficult.

The present application provides block copolymers and uses thereof.

As used herein, the term alkyl group may mean an alkyl group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms or 1 to 4 carbon atoms, unless otherwise specified. The alkyl group may be a straight chain, branched or cyclic alkyl group and may be optionally substituted by one or more substituents.

As used herein, unless otherwise specified, the term alkoxy group may mean an alkoxy group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms. The alkoxy groups may be straight, branched or cyclic alkoxy groups and may optionally be substituted by one or more substituents.

As used herein, the term alkenyl or alkynyl group means an alkenyl group or alkynyl group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms unless otherwise specified can do. The alkenyl or alkynyl group may be linear, branched or cyclic and may optionally be substituted by one or more substituents.

As used herein, unless otherwise specified, the alkylene group may mean an alkylene group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms. The alkylene group may be a straight, branched or cyclic alkylene group and may optionally be substituted by one or more substituents.

As used herein, the term alkenylene group or alkynylene group means an alkenylene group or an alkynylene group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms, It can mean a group. The alkenylene or alkynylene group may be linear, branched or cyclic and may optionally be substituted by one or more substituents.

As used herein, the term "aryl" group or "arylene group" means, unless otherwise specified, one benzene ring structure, two or more benzene rings connected together sharing one or two carbon atoms, Or a monovalent or di-valent residue derived from a compound or a derivative thereof. The aryl group or the arylene group may be, for example, an aryl group having 6 to 30 carbon atoms, 6 to 25 carbon atoms, 6 to 21 carbon atoms, 6 to 18 carbon atoms, or 6 to 13 carbon atoms unless otherwise specified.

The term aromatic structure in this application may mean the aryl group or the arylene group.

As used herein, the term alicyclic ring structure means a cyclic hydrocarbon structure other than an aromatic ring structure unless otherwise specified. The alicyclic ring structure may be, for example, an alicyclic ring structure having 3 to 30 carbon atoms, 3 to 25 carbon atoms, 3 to 21 carbon atoms, 3 to 18 carbon atoms, or 3 to 13 carbon atoms unless otherwise specified .

The term single bond in the present application may mean that no separate atom is present at the site. For example, in the structure represented by A-B-C, when B is a single bond, it may mean that no atom exists at a site represented by B and A and C are directly connected to form a structure represented by A-C.

Examples of the substituent which may optionally be substituted in the present application include an alkyl group, an alkenyl group, an alkynyl group, an alkylene group, an alkenylene group, an alkynylene group, an alkoxy group, an aryl group, an arylene group, A carboxyl group, a glycidyl group, an acryloyl group, a methacryloyl group, an acryloyloxy group, a methacryloyloxy group, a thiol group, an alkyl group, an alkenyl group, an alkynyl group, an alkylene group, an alkenylene group, , An alkoxy group or an aryl group, but are not limited thereto.

The block copolymer of the present application may include a block having a unit represented by the following formula (hereinafter referred to as a first block). The first block may be composed of a unit represented by the following general formula (1), or may further include another unit in addition to the unit of the general formula (1).

[Chemical Formula 1]

X is a single bond, an oxygen atom, a sulfur atom, -S (= O) _2- , a carbonyl group, an alkylene group, an alkenylene group, an alkynylene group, -C (= O) -X ₁ - or -X ₁ -C (= O) - and, in the X ₁ is an oxygen atom, sulfur _{atom, -S (= O) 2 -} , An alkylene group, an alkenylene group or an alkynylene group, and Y is a monovalent substituent group including a cyclic structure having a chain having 8 or more chain-forming atoms linked thereto.

X in the formula 1 may be a single bond, an oxygen atom, a carbonyl group, -C (= O) -O- or -OC (= O) - or -C (= O) -O- in another example, But is not limited to.

The monovalent substituent of Y in formula (1) includes a chain structure formed by at least eight chain-forming atoms.

The term chain forming atom in the present application means an atom forming a straight chain structure of a certain chain. The number of chain-forming atoms is calculated by the number of atoms forming the longest straight chain, and the number of the other atoms bonded to the chain-forming atoms (for example, the chain- A hydrogen atom bonded to the carbon atom in the case of a carbon atom, etc.) is not calculated. Also, in the case of a branched chain, the number of chain-forming atoms can be calculated as the number of chain-forming atoms forming the longest chain. For example, when the chain is an n-pentyl group, all of the chain-forming atoms are carbon, the number is 5, and even if the chain is a 2-methylpentyl group, all the chain-forming atoms are carbon, The chain-forming atom may be exemplified by carbon, oxygen, sulfur or nitrogen, and a suitable chain-forming atom may be carbon, oxygen or nitrogen, or carbon or oxygen. The number of chain-forming atoms may be 8 or more, 9 or more, 10 or more, 11 or more, or 12 or more. The number of the chain-forming atoms may be 30 or less, 25 or less, 20 or less, or 16 or less.

The unit of the formula (1) can make the block copolymer exhibit excellent self-assembling properties.

In one example, the chain may be a straight chain hydrocarbon chain such as a straight chain alkyl group. In this case, the alkyl group may be an alkyl group having 8 or more carbon atoms, 8 to 30 carbon atoms, 8 to 25 carbon atoms, 8 to 20 carbon atoms, or 8 to 16 carbon atoms. At least one of the carbon atoms of the alkyl group may optionally be substituted with an oxygen atom, and at least one hydrogen atom of the alkyl group may be optionally substituted by another substituent.

In Formula (1), Y may include a cyclic structure, and the chain may be connected to the cyclic structure. Such a ring structure can further improve the self-assembling property and the like of the block copolymer formed by the monomer. The ring structure may be an aromatic structure or an alicyclic structure.

The chain may be directly connected to the ring structure, or may be connected via a linker. The linker is an oxygen atom, a sulfur _{atom, -NR 1 -, S (=} O) 2 -, a carbonyl group, an alkylene group, alkenylene group, alkynylene _{group, -C (= O) -X 1} - or - X ₁ -C (= O) -, etc., wherein R ₁ may be hydrogen, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or an aryl group, X ₁ represents a single bond, , -NR ₂ -, -S (═O) ₂ -, an alkylene group, an alkenylene group or an alkynylene group, and R ₂ is hydrogen, an alkyl group, an alkenyl group, an alkynyl group, have. An appropriate linker may be an oxygen atom or a nitrogen atom. The chain may be connected to the aromatic structure via, for example, an oxygen atom or a nitrogen atom. In this case, the linker may be an oxygen atom, or -NR ₁ - (wherein R ₁ may be hydrogen, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or an aryl group).

Y in the formula (1) may be represented by the following formula (2) in one example.

(2)

In the formula 2 P is an arylene group, Q is a single bond, an oxygen atom or -NR ₃ - and, at the R ₃ is a hydrogen atom, alkyl group, alkenyl group, alkynyl group, alkoxy group or aryl group, Z is 8 Or more of the chain forming atoms. When Y in the general formula (1) is a substituent of the general formula (2), P in the general formula (2) may be directly connected to X in the general formula (1).

Suitable examples of P in formula (2) include, but are not limited to, an arylene group having 6 to 12 carbon atoms, such as a phenylene group.

In formula (2), Q is an oxygen atom or -NR ₁ - (where R ₁ is hydrogen, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or an aryl group) as a suitable example.

As a suitable example of the unit of the formula (1), R is hydrogen or an alkyl group such as hydrogen or an alkyl group having 1 to 4 carbon atoms, X is -C (= O) -O-, In Formula (2), P is an arylene group having 6 to 12 carbon atoms or phenylene, Q is an oxygen atom, and Z is the above-mentioned chain having 8 or more chain-forming atoms.

Accordingly, examples of suitable examples of the formula (1) include the following formula (3).

(3)

R is hydrogen or an alkyl group having 1 to 4 carbon atoms, X is -C (= O) -O-, P is an arylene group having 6 to 12 carbon atoms, Q is an oxygen atom, Z is a chain- Lt; RTI ID = 0.0 > 8 < / RTI >

In another example, the unit of Formula 1 in the first block may be represented by Formula 4 below.

[Chemical Formula 4]

In formula (4), R ₁ and R ₂ are each independently hydrogen or an alkyl group having 1 to 4 carbon atoms, and X is a single bond, an oxygen atom, a sulfur atom, -S (═O) ₂ -, a carbonyl group, group, an alkynylene _{group, -C (= O) -X 1} - or -X ₁ -C (= O) - a, -S (= O) in said X ₁ is a single bond, an oxygen atom, a sulfur atom, and ₂ -, an alkylene group, an alkenylene group or an alkynylene group, T is a single bond or an arylene group, Q is a single bond or a carbonyl group, and Y is a chain having 8 or more chain forming atoms.

In Formula 4, X may be a single bond, an oxygen atom, a carbonyl group, -C (= O) -O- or -O-C (= O) -.

As a specific example of the chain of Y in the formula (4), the description described in the formula (1) can be similarly applied.

In another example, at least one chain-forming atom of the chain having 8 or more chain-forming atoms in any one of the above-described formulas (1), (3) and (4) of the first block may have an electronegativity of 3 or more. The electronegativity of the atom may be 3.7 or less in another example. In the above, the reactor having the electronegativity of 3 or more may be exemplified by nitrogen atom or oxygen atom, but is not limited thereto.

The second block included in the block copolymer together with the first block including the unit as described above may include at least a unit represented by the following formula (5).

[Chemical Formula 5]

In formula 5 X ₂ is a single bond, an oxygen atom, sulfur _{atom, -S (= O) 2 -} , alkylene group, alkenylene group, alkynylene _{group, -C (= O) -X 3} - or -X ₃ -C (= O) - and, at the X ₃ is a single bond, oxygen atom, sulfur atom, -S (= O) ₂ -, and the alkylene, alkenylene or alkynylene group, R ₁ to R ₅ is An alkyl group, a haloalkyl group, a halogen atom or a photo-crosslinkable functional group, and the number of photo-crosslinking functional groups contained in R ₁ to R ₅ is one or more.

The second block may be composed of only the unit of the formula (5), or may further include another unit described later. If the second block includes other units together with the unit of the above formula (5), each unit may form a separate sub-block in the second block, or may be randomly included.

The unit of formula (5) includes at least one photo-crosslinkable functional group as described above. With such a photo-crosslinkable functional group, the block copolymer can be crosslinked before or after the formation of the self-assembled structure, and if the crosslinking reaction is induced only in the second block, the etch selectivity of the first block and the second block can be improved.

Examples of the photo-crosslinkable functional group that can be included in the unit of Formula 5 include a functional group capable of forming a radical by irradiation with light (hereinafter, referred to as a photo-radical generator) or a radical, And a functional group which can be crosslinked in the presence of the compound. In the latter case, the block copolymer can be applied to the process with an appropriate radical initiator. Examples of the photo-crosslinking functional group include benzoylphenoxy group, alkenyloxycarbonyl group, (meth) acryloyl group or alkenyloxyalkyl group, but are not limited thereto.

In the unit of the general formula (5), one or more photocrosslinking functional groups may be contained, for example, at least R ₃ may be the photopolymerizable functional group.

The unit of the formula (5) may contain one or more, two or more, three or more, four or five or more halogen atoms such as a fluorine atom together with the photo-crosslinking functional group. The halogen atom such as the fluorine atom contained in the unit may be 10 or less, 9 or less, 8 or less, 7 or less, or 6 or less.

At least one, one to three, or one to two of R ₁ to R ₅ in the unit of the formula (5) may be the above-described photo-crosslinking functional group.

In the formula (5), R ₁ to R ₅ may contain one or more halogen atoms, two or more, three or more, four or more, or five or more halogen atoms. The halogen atoms contained in R ₁ to R ₅ may be 10 or less, 9 or less, 8 or less, 7 or less, or 6 or less.

When the second block includes other units together with the unit of the formula (5), the ratio of the unit of the formula (5) can be adjusted to a range in which a proper crosslinking reaction can occur while maintaining the self-assembly property of the block copolymer . For example, the ratio of the unit of the formula (5) in the second block may be 0.1 mol% to 5 mol%, 0.5 mol% to 5 mol%, 1 mol% To 5 mol%, or 1.5 mol% to 5 mol%, 1.5 mol% to 4 mol%, and 1.5 mol% to 3 mol%. This ratio can be adjusted depending on the type of unit or block included in the block copolymer.

The second block of the block copolymer may further comprise other units in addition to the units of the above formula (5). In this case, the type of unit that can be included is not particularly limited.

For example, the second block may include a polystyrene unit such as a polyvinyl pyrrolidone unit, a polylactic acid unit, a polyvinyl pyridine unit, polystyrene or poly trimethylsilyl styrene, a polyalkylene oxide unit such as polyethylene oxide, a polybutadiene unit, a polyisoprene unit, or a polyolefin unit such as polyethylene.

In one example, the second block may further include a unit having an aromatic structure containing at least one halogen atom, together with the unit of the formula (5).

The unit may be, for example, a unit that does not include the photo-crosslinkable functional group as shown in Formula 5. [

Such a second unit may be, for example, a unit represented by the following formula (6).

[Chemical Formula 6]

In Formula (6), B is a monovalent substituent having an aromatic structure containing at least one halogen atom.

The block containing such a unit exhibits excellent interaction with other blocks such as the first block, so that the block copolymer can exhibit excellent self-assembling properties and the like.

In the formula (6), the aromatic structure may be, for example, an aromatic structure having 6 to 18 carbon atoms or 6 to 12 carbon atoms.

As the halogen atom contained in the formula (6), a fluorine atom or a chlorine atom may be exemplified, and a fluorine atom may be appropriately used, but the present invention is not limited thereto.

In one example, B in formula (6) may be a monovalent substituent having an aromatic structure of 6 to 12 carbon atoms substituted with at least 1, at least 2, at least 3, at least 4, or at least 5 halogen atoms. The upper limit of the number of halogen atoms is not particularly limited and may be, for example, 10 or less, 9 or less, 8 or less, 7 or less, or 6 or less.

The unit of the formula (6) may be represented by the following formula (7).

(7)

In formula 7 X ₂ is a single bond, an oxygen atom, sulfur _{atom, -S (= O) 2 -} , alkylene group, alkenylene group, alkynylene _{group, -C (= O) -X 4} - or -X ₄ -C (= O) - and, in the X ₄ represents a single bond, oxygen atom, sulfur _{atom, -S (= O) 2 -} , alkylene group, alkenyl group or alkynyl group, and W is at least one halogen Is an aryl group containing an atom. In the above, W may be an aryl group substituted with at least one halogen atom, for example, an aryl group having 6 to 12 carbon atoms substituted with at least 2, at least 3, at least 4, or at least 5 halolene atoms.

In another example, the unit of the formula (6) may be represented by the following formula (8).

[Chemical Formula 8]

In Formula 8 X ₃ is a single bond, an oxygen atom, sulfur _{atom, -S (= O) 2 -} , alkylene group, alkenylene group, alkynylene _{group, -C (= O) -X 5} - or -X ₅ -C (= O) - and, in the X ₅ is a single bond, oxygen atom, sulfur atom, -S (= O) ₂ -, and the alkylene, alkenylene or alkynylene group, R _a to R _e is Are each independently hydrogen, an alkyl group, a haloalkyl group or a halogen atom, and the number of halogen atoms contained in R _a to R _e is one or more.

X ₃ in Formula 8 may be a single bond, an oxygen atom, an alkylene group, -C (= O) -O- or -OC (= O) - in another example.

R _a to R _e each independently is hydrogen, are an alkyl group, a haloalkyl group or a halogen wonjayi, R _a to R _e is 1 or more, two or more, three or more, four or more or five or more halogen atoms in formula (8) , For example, a fluorine atom. The halogen atoms, for example, fluorine atoms, contained in R _a to R _e may be 10 or less, 9 or less, 8 or less, 7 or less, or 6 or less.

When the second block contains a unit having an aromatic structure containing the halogen atom, for example, a unit represented by any one of the above-mentioned formulas (6) to (8) together with the unit of the above formula (5) (DH / D5) of the number of moles (D5) and the number of moles (DH) of units having an aromatic structure containing the halogen atoms may be about 35 to 65, about 40 to 60, or about 40 to 50.

The block copolymer of the present application is a block copolymer containing at least one of the above-described first and second blocks, and may be a diblock copolymer containing only the two blocks, or may be a block copolymer containing at least one of the first block and the second block Or may be a block copolymer of a triblock or more including two or more, or including other blocks.

The above-mentioned block copolymer can exhibit excellent phase separation or self-assembling properties basically. Further, by satisfying at least one of the selection and combination of each block and the parameters described below, it is possible to further improve the phase separation or self-assembly characteristics.

Since the block copolymer contains two or more chains of chains linked by covalent bonds, phase separation occurs. The block copolymer of the present application exhibits excellent phase separation characteristics and can form a nanoscale structure by microphase seperation if necessary. The shape and size of the nanostructure can be controlled by the size (molecular weight, etc.) of the block copolymer, the relative ratio of the blocks, and the like. Examples of the structure formed by phase separation include a spherical shape, a cylinder, a gyroid, a lamellar structure and an inverted structure, and the ability of the block copolymer to form such a structure can be referred to as self-assembling property. The inventors of the present invention have found that a copolymer satisfying at least one of the various parameters described below among the above-described variously-structured block copolymers has a substantially improved self-assembly property possessed by each block copolymer . The block copolymer of the present application may satisfy either one of the following parameters or two or more parameters at the same time. In particular, it has been found that the block copolymer can be made to exhibit vertical orientation by satisfying appropriate parameters. In the present application, the term " vertical orientation " refers to the orientation of the block copolymer, and the orientation of the nanostructure formed by the block copolymer may mean an orientation perpendicular to the substrate direction. The technique of adjusting the self-assembled structure of the block copolymer horizontally or vertically on various substrates occupies a very large proportion in the practical application of the block copolymer. Usually, the orientation of the nanostructure in the film of the block copolymer is determined by which of the blocks forming the block copolymer is exposed to the surface or air. In general, since a plurality of substrates are polar and air is non-polar, a block having a larger polarity among the blocks of the block copolymer is wetted to the substrate, and a block having a smaller polarity is wetted at the interface with air ). Therefore, various techniques have been proposed to allow the blocks having different characteristics of the block copolymer to be wetted simultaneously on the substrate side, and the most representative technique is the adjustment of the orientation using neutral surface preparation. However, in one aspect of the present application, by properly adjusting the following parameters, it is possible to obtain a perpendicular orientation even for a substrate on which a known process is not performed, in which the block copolymer is known to achieve vertical alignment including neutral surface treatment and the like This is possible. Further, in a further aspect of the present application, such a vertical orientation may be induced in a short period of time by thermal annealing.

The block copolymer of one aspect of the present application may form a film exhibiting an in-plane diffraction pattern of Grazing Incidence Small Angle X-ray Scattering (GISAXS) on a hydrophobic surface. The block copolymer may form a film exhibiting an inflation impingement diffraction pattern on a hydrophilic surface by Grazing Incidence Small Angle X-ray Scattering (GISAXS).

Indicating the diffraction pattern of inflation in GISAXS in the present application may mean that it exhibits a peak perpendicular to the X coordinate in the GISAXS diffraction pattern in the GISAXS analysis. This peak is confirmed by the vertical orientation of the block copolymer. Therefore, the block copolymer exhibiting the inflation-induced diffraction pattern has vertical orientation. In a further example, the peak identified in the X coordinate of the GISAXS diffraction pattern may be at least two or more, and in the presence of a plurality of peaks, the scattering vectors (q values) of the peak may be identified with an integer ratio, In this case, the phase separation efficiency of the block copolymer can be further improved.

The term vertical in the present application is an expression in consideration of an error, and may mean an error including, for example, errors within ± 10 degrees, ± 8 degrees, ± 6 degrees, ± 4 degrees, or ± 2 degrees.

A block copolymer capable of forming a film exhibiting a diffraction pattern on inflation on both hydrophilic and hydrophobic surfaces can exhibit vertical orientation characteristics on various surfaces without performing any separate treatment to induce vertical orientation. The term hydrophobic surface in the present application means a surface having a wetting angle with respect to purified water in the range of 5 to 20 degrees. Examples of hydrophobic surfaces include, but are not limited to, surfaces of silicon treated with oxygen plasma, sulfuric acid or pyran solution. The term hydrophilic surface in the present application means a surface having a room temperature wetting angle with respect to purified water in the range of 50 to 70 degrees. Examples of the hydrophilic surface include a surface of PDMS (polydimethylsiloxane) treated with oxygen plasma, a surface of silicon treated with HMDS (hexamethyldisilazane), a surface of silicon treated with hydrofluoric acid (HF), etc. However, no.

Unless otherwise specified, physical properties that may vary with temperature, such as wetting angle in the present application, are values measured at room temperature. The term ambient temperature is a natural, non-warming or non-warming temperature and may refer to a temperature of about 10 ° C to 30 ° C, about 25 ° C, or about 23 ° C.

The film exhibiting the inflation impression diffraction pattern on the hydrophilic or hydrophobic surface and on the sagittal incident incidence scattering (GISAXS) may be a thermal annealed film. The film for measuring the fine angle incident incidence scattering (GISAXS) can be obtained, for example, by coating a coating solution prepared by diluting the above block copolymer with a solvent (for example, flourobenzene) at a concentration of about 0.7 wt% (thickness: 1.5 cm, length: 1.5 cm) and a thickness of 2.25 cm < ² >. The thermal aging can be performed by, for example, The film may be maintained at a temperature of about 160 DEG C for about 1 hour. The grinding angle incident incidence angle scattering (GISAXS) is measured by incidence of X-rays at an incident angle within the range of about 0.12 to 0.23 degrees A diffraction pattern emerging from the film can be obtained with a known measuring device (for example, 2D marCCD). A method of confirming the presence of a diffraction pattern of inflation impression through the diffraction pattern is as follows: Jiyida.

The block copolymer exhibiting the aforementioned peaks in the fine angle incident incidence scattering (GISAXS) can exhibit excellent self-assembling properties, and such properties can be effectively controlled according to the purpose.

The block copolymer of the present application can exhibit at least one peak within a predetermined range of the scattering vector (q) in XRD analysis (X-ray diffraction analysis, X-ray diffraction analysis).

For example, the block copolymer may exhibit at least one peak within the range of the scattering vector (q) of 0.5 nm ^-1 to 10 nm ^{-1 in} the X-ray diffraction analysis. The scattering vector q at which the peak appears may be 0.7 nm ^-1 or more, 0.9 nm ^-1 or more, 1.1 nm ^-1 or more, 1.3 nm ^-1 or 1.5 nm ^-1 or more in another example. In another example, the scattering vector q at which the peak appears may be 9 nm ^-1 or less, 8 nm ^-1 or less, 7 nm ^-1 or less, 6 nm ^-1 or less, 5 nm ^-1 or less, 4 nm ^-1 or less, 3.5 nm ^-1 or 3 nm ^-1 or less.

The full width at half maximum (FWHM) of the peak identified within the range of the scattering vector (q) may be in the range of 0.2 to 0.9 nm ^-1 . The half-height width may be at least 0.25 nm ^{-1, at} least 0.3 nm ^-1, or at least 0.4 nm ^-1 in other examples. The half-height width may be 0.85 nm ^-1 or less, 0.8 nm ^-1 or 0.75 nm ^-1 or less in other examples.

The term half-height width in the present application may mean the width of the peak (the difference in the scattering vector q) at a position showing the intensity of 1/2 of the intensity of the maximum peak.

The scattering vector (q) and the half-height width in the XRD analysis are numerical values obtained by a numerical analytical method using a minimum left-hand method, as a result of XRD analysis described later. In this method, a portion showing the smallest intensity in the XRD diffraction pattern is taken as a baseline, and the intensity of the XRD pattern peak is set to a Gaussian and the scattering vector and the half height width can be obtained from the fitted results. The R square at the time of Gaussian fitting is at least 0.9, at least 0.92, at least 0.94, or at least 0.96. The manner of obtaining the above information from the XRD analysis is known, and for example, a numerical analysis program such as an origin can be applied.

The block copolymer exhibiting the half height width peak within the range of the scattering vector (q) may include a crystalline portion suitable for self-assembly. The block copolymer identified within the scope of the above-described scattering vector (q) can exhibit excellent self-assembling properties.

XRD analysis can be performed by passing X-rays through a block copolymer sample and measuring the scattering intensity according to the scattering vector. XRD analysis can be performed on the block copolymer without any special pretreatment, for example, after the block copolymer is dried under suitable conditions and then transmitted through X-rays. An X-ray having a vertical size of 0.023 mm and a horizontal size of 0.3 mm can be applied. A 2D diffraction pattern that is scattered in the sample is obtained as an image by using a measuring device (for example, 2D marCCD), and the obtained diffraction pattern is fitted in the above-described manner to obtain a scattering vector, a half-height width, .

As will be described later, when at least one block of the block copolymer contains the chain, the number (n) of chain-forming atoms of the chain is determined by the scattering vector (q) obtained by the X- The following equation (1) can be satisfied.

[Equation 1]

3 nm ^-1 to 5 nm ^-1 = nq / (2 x π)

In the formula 1, n is the number of the chain-forming atoms and q is the smallest scattering vector (q) in which the peak is observed in the X-ray diffraction analysis of the block copolymer, or a peak of the largest peak area is observed Is a scattering vector (q). In Equation (1),? Represents the circularity.

The scattering vector and the like introduced into the formula (1) are values obtained by the method mentioned in the above-mentioned X-ray diffraction analysis method.

The scattering vector q introduced in Equation 1 may be, for example, a scattering vector q within a range of 0.5 nm ^-1 to 10 nm ^-1 . In another example, the scattering vector q introduced into Equation 1 may be 0.7 nm ^-1 or more, 0.9 nm ^-1 or more, 1.1 nm ^-1 or more, 1.3 nm ^-1 or 1.5 nm ^-1 or more. In another example, the scattering vector q introduced into the above formula 1 is 9 nm ^-1 or less, 8 nm ^-1 or less, 7 nm ^-1 or less, 6 nm ^-1 or less, 5 nm ^-1 or less, 4 nm ^-1 or less , 3.5 nm ^-1 or less, or 3 nm ^-1 or less.

(1) represents the relationship between the distance (D) between the blocks in which the chain is included and the number of chain forming atoms of the chain when the block copolymer is self-assembled to form a phase separation structure, When the number of chain-forming atoms of the chain in the block copolymer satisfies the above-mentioned formula 1, the crystallinity exhibited by the chain is increased, and thus the phase-separating property or the vertical orientation of the block copolymer can be greatly improved. The nq / (2 x pi) according to the above formula 1 may be 4.5 nm ^-1 or less in another example. (D, unit: nm) between the blocks including the chain can be calculated by the following equation: D = 2 x? / Q where D is the interval (D, unit: nm) between the blocks , < / RTI > and < RTI ID = 0.0 > q < / RTI >

In one aspect of the present application, the absolute value of the difference between the surface energy of the first block of the block copolymer and the surface energy of the second block is 10 mN / m or less, 9 mN / m or less, 8 mN / m or less, 7.5 mN / m or less or 7 mN / m or less. The absolute value of the difference in surface energy may be 1.5 mN / m, 2 mN / m or 2.5 mN / m or more. The structure in which the first block and the second block having the absolute value of the difference in surface energy in this range are connected by covalent bonding can induce effective microphase seperation by phase separation due to proper non-availability. In the above, the first block may be, for example, a block having the chain described above.

Surface energy can be measured using a Drop Shape Analyzer (DSA100, KRUSS). Specifically, the surface energy of a sample solution (block copolymer or homopolymer) to be measured is diluted with fluorobenzene to a solid concentration of about 2% by weight, and the coating solution is applied to the substrate with a thickness of about 50 nm and a coating area of 4 cm ² (2 cm in length, 2 cm in length) and dried at room temperature for about 1 hour and then thermally annealed at 160 ° C for about 1 hour. The process of dropping the deionized water whose surface tension is known in the film subjected to thermal aging and obtaining the contact angle is repeated 5 times to obtain an average value of the obtained five contact angle values and similarly, The process of dropping the known diiodomethane and determining the contact angle thereof is repeated five times, and an average value of the obtained five contact angle values is obtained. Thereafter, the surface energy can be obtained by substituting the value (Strom value) of the surface tension of the solvent by the Owens-Wendt-Rabel-Kaelble method using the average value of the contact angle with the deionized water and diiodo methane obtained. The numerical value of the surface energy for each block of the block copolymer can be obtained by the method described above for a homopolymer produced only of the monomers forming the block.

When the block copolymer includes the above-mentioned chain, the block including the chain may have a higher surface energy than other blocks. For example, if the first block of the block copolymer comprises the chain, the first block may have a higher surface energy than the second block. In this case, the surface energy of the first block may be in the range of about 20 mN / m to 40 mN / m. The surface energy of the first block may be greater than or equal to 22 mN / m, greater than or equal to 24 mN / m, greater than or equal to 26 mN / m, or greater than or equal to 28 mN / m. The surface energy of the first block may be 38 mN / m or less, 36 mN / m or less, 34 mN / m or less, or 32 mN / m or less. The first block is included, and the block copolymer showing the difference in surface energy as the second block and the like can exhibit excellent self-assembling properties.

The absolute value of the difference between the density of the first block and the second block in the block copolymer is 0.25 g / cm ³ or more, 0.3 g / cm ³ or more, 0.35 g / cm ³ or more, 0.4 g / cm ³ or more, or 0.45 g / cm < ³ >. The absolute value of the density difference may be 0.9 g / cm ³ or more, 0.8 g / cm ³ or less, 0.7 g / cm ³ or less, 0.65 g / cm ³ or less, or 0.6 g / cm ³ or less. The structure in which the first block having the absolute value of the density difference in this range and the second block are connected in the covalent bond can induce an effective microphase seperation by phase separation due to proper non-availability.

The density of each block of the block copolymer can be measured by a known buoyancy method. For example, the mass of the block copolymer in a solvent such as ethanol, which is known in mass and density in air, is analyzed The density can be measured.

When the block copolymer includes the above-mentioned chain, the block including the chain may have a lower density than other blocks. For example, if the first block of the block copolymer comprises the chain, the first block may have a lower density than the second block. In this case, the density of the first block may be in the range of about 0.9 g / cm ³ to about 1.5 g / cm ³ . The density of the first block may be 0.95 g / cm < ³ > or more. The density of the first block is 1.4 g / cm < ³ > 1.3 g / cm < ³ > 1.2 g / cm < ³ > 1.1 g / cm < ³ > Or 1.05 g / cm < ³ > ≪ / RTI > Such a first block is included, and a block copolymer exhibiting such a density difference with the second block can exhibit excellent self-assembling properties. The above-mentioned surface energy and density may be values measured at room temperature.

The block copolymer may include a block having a volume fraction falling within a range of 0.4 to 0.8 and a block having a volume fraction falling within a range of 0.2 to 0.6. When the block copolymer comprises the chain, the volume fraction of the block having the chain may be in the range of 0.4 to 0.8. For example, when the chain is included in the first block, the volume fraction of the first block may be in the range of 0.4 to 0.8, and the volume fraction of the second block may be in the range of 0.2 to 0.6. The sum of the volume fractions of the first block and the second block may be one. The block copolymer containing each block in the above volume fraction can exhibit excellent self-assembling properties. The volume fraction of each block of the block copolymer can be determined based on the density of each block and the molecular weight measured by GPC (Gel Permeation Chromatography).

The number average molecular weight (Mn) of the block copolymer may be in the range of, for example, 3,000 to 300,000. In the present specification, the term number average molecular weight refers to a value converted to standard polystyrene measured using GPC (Gel Permeation Chromatograph). In the present specification, the term molecular weight refers to a number average molecular weight unless otherwise specified. The molecular weight (Mn) may be, for example, 3000 or more, 5000 or more, 7000 or more, 9000 or more, 11000 or more, 13000 or more, or 15000 or more in other examples. In another example, the molecular weight (Mn) is not more than 250,000, less than 200,000, less than or equal to 180,000, less than or equal to 160,000, less than or equal to 140000, less than or equal to 120000, less than or equal to 100000, less than or equal to 90000, less than or equal to 80000, less than or equal to 70000, Or 25,000 or less. The block copolymer may have a polydispersity (Mw / Mn) in the range of 1.01 to 1.60. In another example, the degree of dispersion may be at least about 1.1, at least about 1.2, at least about 1.3, or at least about 1.4.

In this range, the block copolymer can exhibit proper self-assembling properties. The number average molecular weight of the block copolymer and the like can be adjusted in consideration of the desired self-assembling structure and the like.

When the block copolymer contains at least the first and second blocks, the ratio of the first block in the block copolymer, for example, the block including the chain described above, is from 10 mol% to 90 mol% Lt; / RTI >

A specific method for producing such a block copolymer in the present application is not particularly limited as long as it includes the step of forming at least one block of the block copolymer by using the monomer capable of forming each unit described above.

For example, the block copolymer can be prepared by the LRP (Living Radical Polymerization) method using the above monomers. For example, anionic polymerization in which an organic rare earth metal complex is used as a polymerization initiator, or an organic alkali metal compound is used as a polymerization initiator in the presence of an inorganic acid salt such as a salt of an alkali metal or an alkaline earth metal, An atomic transfer radical polymerization method (ATRP) using an atom transfer radical polymerization agent as a polymerization initiator, and an atom transfer radical polymerization agent as a polymerization initiator, (ATRP), Initiators for Continuous Activator Regeneration (ATR), Atomic Transfer Radical Polymerization (ATRP), Inorganic Reducing Agent Reversible Additive - Reversible addition-cleavage chain transfer using cleavage chain transfer agent And a method using the polymerization method of (RAFT) or an organic tellurium compound, etc. as an initiator, may be subject to a suitable method among these methods is selected.

For example, the block copolymer can be prepared in a manner that includes polymerizing a reactant containing monomers capable of forming the block in the presence of a radical initiator and a living radical polymerization reagent by living radical polymerization .

The method of forming the other block included in the copolymer together with the block formed by using the monomer in the production of the block copolymer is not particularly limited and may be appropriately selected in consideration of the kind of the desired block, Block can be formed.

The preparation of the block copolymer may further include, for example, a step of precipitating the polymerization product produced through the above process in the non-solvent.

The kind of the radical initiator is not particularly limited and may be appropriately selected in consideration of the polymerization efficiency. For example, AIBN (azobisisobutyronitrile) or 2,2'-azobis-2,4-dimethylvaleronitrile (2,2 ' -azobis- (2,4-dimethylvaleronitrile), and peroxides such as benzoyl peroxide (BPO) or di-t-butyl peroxide (DTBP).

The living radical polymerization process can be carried out in the presence of a base such as, for example, methylene chloride, 1,2-dichloroethane, chlorobenzene, dichlorobenzene, benzene, toluene, acetone, chloroform, tetrahydrofuran, dioxane, monoglyme, diglyme, Amide, dimethylsulfoxide or dimethylacetamide, and the like.

Examples of the non-solvent include ethers such as alcohols such as methanol, ethanol, n-propanol or isopropanol, glycols such as ethylene glycol, n-hexane, cyclohexane, n-heptane or petroleum ether, But is not limited thereto.

The present application is also directed to a polymer membrane comprising said block copolymer. The film can be used for various purposes, for example, various electronic or electronic devices, a process of forming the pattern, a recording medium such as a magnetic storage medium, a flash memory, or a biosensor.

In one example, the block copolymer in the polymer membrane may be self-assembled to implement a cyclic structure including a sphere, a cylinder, a gyroid or a lamellar, .

For example, within the block of the first or second block or another block covalently bonded thereto, the other segment in the block copolymer may form a regular structure such as a lamellar shape or a cylinder shape.

The polymer membrane of the present application can exhibit a peak perpendicular to the X coordinate in the above-described inflation impression diffraction pattern, that is, the GISAXS diffraction pattern in the GISAXS analysis. In a further example, the peak identified in the X coordinate of the GISAXS diffraction pattern may be at least two or more, and when there are a plurality of peaks, the scattering vector (q values) of the peak may be identified with an integer ratio.

In the polymer membrane, the second block may include a crosslinked structure. That is, for example, the crosslinked structure can be formed by a method of crosslinking the photo-crosslinkable functional group of the unit of the formula (5) in the second block in a state where the self-assembled structure is formed. In this case, the conditions for forming the crosslinked structure are not particularly limited, and can be adjusted in consideration of the kind and amount of the photo-crosslinkable functional group used. For example, when the photo-crosslinkable functional group is a benzoylphenoxy group, the cross-linking can be performed by irradiating light of a wavelength of about 254 nm to a self-assembled block copolymer at a light amount of about 2 J / cm ² have.

The present application also relates to a method for forming a polymer film using the block copolymer. The method may include forming a polymer membrane including the block copolymer on a substrate in a self-assembled state. For example, the method may include forming a layer of the block copolymer or a coating liquid in which the block copolymer is diluted with a suitable solvent on the substrate by applying or the like, and if necessary, aging or heat-treating the layer.

The aging or heat treatment may be performed based on, for example, the phase transition temperature or the glass transition temperature of the block copolymer, and may be performed at, for example, the glass transition temperature or a temperature higher than the phase transition temperature. The time at which this heat treatment is performed is not particularly limited, and can be performed within a range of, for example, about 1 minute to 72 hours, but this can be changed if necessary. The heat treatment temperature of the polymer thin film may be, for example, about 100 ° C to 250 ° C, but may be changed in consideration of the block copolymer to be used.

The formed layer may be solvent aged for about 1 minute to 72 hours in a non-polar solvent and / or a polar solvent at room temperature in another example.

The second block may be further crosslinked after the polymer film is formed as described above. The process of the crosslinking process is as described above.

The present application also relates to a method of pattern formation. The above method is a method for selectively removing the first or second block of the block copolymer in a laminate having a substrate and a polymer film formed on the surface of the substrate and self-assembled with the block copolymer . ≪ / RTI > The method may be a method of forming a pattern on the substrate. For example, the method may include forming a polymeric film comprising the block copolymer on a substrate, selectively removing one or more blocks of the block copolymer present in the film, and then etching the substrate . In this way, it is possible to form, for example, a nanoscale fine pattern. In addition, various patterns such as nano-rods, nano-holes, and the like can be formed through the above-described method depending on the type of the block copolymer in the polymer film. If necessary, the block copolymer may be mixed with another copolymer or homopolymer for pattern formation. The type of the substrate to be applied to this method is not particularly limited and may be selected as required. For example, silicon oxide or the like may be applied.

The second block may include a cross-linking structure in the polymer membrane applied to the first and / or second blocks, and the manner of implementing the cross-linking structure is as described above.

For example, the method can form a nanoscale pattern of silicon oxide that exhibits a high aspect ratio. For example, the polymer film is formed on silicon oxide, and one block of the block copolymer is selectively removed while the block copolymer in the polymer film forms a predetermined structure. Thereafter, the silicon oxide is removed in various ways, for example, , Reactive ion etching, or the like to form various patterns including patterns of nano-rods or nano holes. In addition, it is possible to realize a nano pattern having a large aspect ratio through such a method.

For example, the pattern can be implemented in a scale of several tens of nanometers, and such a pattern can be utilized for various purposes including, for example, a next-generation information electronic magnetic recording medium and the like.

For example, according to the above method, a pattern in which nanostructures having a width of about 3 nm to 40 nm, for example, nanowires are arranged at intervals of about 6 nm to 80 nm, can be formed. In another example, it is possible to implement a structure in which the width is about 3 nm to 40 nm, for example, nanoholes having a diameter of about 6 nm to 80 nm are formed.

Also, in the above structure, the nanowires and nano holes can have a large aspect ratio.

The method of selectively removing one block of the block copolymer in the above method is not particularly limited. For example, a method of removing a relatively soft block by irradiating an appropriate electromagnetic wave, for example, ultraviolet light, Can be used. In this case, the ultraviolet ray irradiation conditions are determined depending on the type of the block of the block copolymer, and can be performed, for example, by irradiating ultraviolet light having a wavelength of about 254 nm for 1 minute to 60 minutes.

In addition, the ultraviolet irradiation may be followed by a step of treating the polymer membrane with an acid or the like to further remove the segment decomposed by ultraviolet rays.

The step of selectively etching the substrate using the polymer film having the removed block as a mask is not particularly limited. For example, the step of etching the substrate may be performed by a reactive ion etching step using CF 4 / Ar ions or the like. A step of removing the polymer membrane from the substrate by an oxygen plasma treatment or the like can also be performed.

The present application may provide block copolymers and uses thereof. The block copolymer of the present application has excellent self-assembling property or phase-separating property, can freely impart various required functions, and particularly, has excellent etching selectivity and can be effectively applied to applications such as pattern formation.

1 is an SEM photograph of a polymer membrane before photo-crosslinking formed using the block copolymer of Example 1. Fig.
2 is an SEM photograph of the polymer membrane after photo-crosslinking formed using the block copolymer of Example 1. Fig.
3 is a view showing a result of solvent washing performed on a polymer membrane formed by using the block copolymer of Example 1 without a photo-crosslinking step.

Hereinafter, the present application will be described in detail by way of examples and comparative examples according to the present application, but the scope of the present application is not limited by the following examples.

One. NMR  Measure

NMR analysis was performed at room temperature using an NMR spectrometer including a Varian Unity Inova (500 MHz) spectrometer with a triple resonance 5 mm probe. NMR measurement solvent (CDCl₃) Was diluted to a concentration of about 10 mg / ml, and the chemical shift was expressed in ppm.

<Application Abbreviation>

br = broad signal, s = singlet, d = doublet, dd = doublet, t = triplet, dt = double triplet, q = quartet, p = octet, m = polyline.

2. GPC ( Come Permeation Chromatograph )

The number average molecular weight (Mn) and molecular weight distribution were measured using GPC (Gel Permeation Chromatography). Add a sample to be analyzed such as a block copolymer or a macroinitiator of the example or comparative example into a 5 mL vial and dilute with tetrahydrofuran (THF) to a concentration of about 1 mg / mL. After that, the calibration standard sample and the sample to be analyzed were filtered through a syringe filter (pore size: 0.45 μm) and then measured. The analytical program used was a ChemStation from Agilent Technologies. The elution time of the sample was compared with a calibration curve to determine the weight average molecular weight (Mw) and the number average molecular weight (Mn), and the molecular weight distribution (PDI ) Were calculated. The measurement conditions of GPC are as follows.

&Lt; GPC measurement condition >

Devices: 1200 series from Agilent Technologies

Column: Using PLgel mixed B from Polymer laboratories

Solvent: THF

Column temperature: 35 ° C

Sample concentration: 1 mg / mL, 200 L injection

Standard samples: Polystyrene (Mp: 3900000, 723000, 316500, 52200, 31400, 7200, 3940, 485)

Manufacturing example  One.

The compound (DPM-C12) shown below was synthesized in the following manner. Hydroquinone (10.0 g, 94.2 mmol) and 1-bromododecane (23.5 g, 94.2 mmol) were placed in a 250 mL flask and dissolved in 100 mL of acetonitrile. An excess of potassium Potassium carbonate was added and reacted at 75 ^° C for about 48 hours under nitrogen. After the reaction, the remaining potassium carbonate and acetonitrile used for the reaction were also removed. The mixture was worked up by adding a mixed solvent of DCM (dichloromethane) and water, and the separated organic layer was dehydrated with MgSO ₄ . Subsequently, the product was purified by DC (dichloromethane) in CC (Column Chromatography) to obtain a white solid intermediate with a yield of about 37%.

<For intermediate NMR  Analysis results>

_{^{1 H-NMR (CDCl 3)}} : d6.77 (dd, 4H); d4.45 (s, 1 H); d3.89 (t, 2H); d 1.75 (p, 2H); d1.43 (p, 2H); d 1.33-1.26 (m, 16H); d 0.88 (t, 3 H).

(9.8 g, 35.2 mmol), methacrylic acid (6.0 g, 69.7 mmol), DCC (dicyclohexylcarbodiimide) (10.8 g, 52.3 mmol) and p-dimethylaminopyridine (1.7 g, 13.9 mmol) 120 mL of methylene chloride was added, and the mixture was allowed to react for 24 hours in a nitrogen atmosphere at room temperature. After the reaction, the urea salt formed during the reaction was filtered off and the remaining methylene chloride was removed. The resulting product was recrystallized in a mixed solvent of methanol and water (mixed at a weight ratio of 1: 1) to obtain the title compound (DPM-C12) as a white solid, which was purified by CC (Column Chromatography) using hexane and dichloromethane as mobile phases, (7.7 g, 22.2 mmol) in 63% yield.

< DPM - C12 NMR  Analysis results>

_{^{1 H-NMR (CDCl 3)}} : d7.02 (dd, 2H); d 6.89 (dd, 2 H); d6.32 (dt, 1 H); d5.73 (dt, 1 H); d 3.94 (t, 2 H); d 2.05 (dd, 3H); d, 1.76 (p, 2H); d1.43 (p, 2H); 1.34-1.27 (m, 16H); d 0.88 (t, 3 H).

(A)

In formula (A), R is a straight chain alkyl group having 12 carbon atoms.

Manufacturing example  2.

3-hydroxy-1,2,4,5-tetrafluorostyrene was synthesized in the following manner. Pentafluorostyrene (25 g, 129 mmol) was added to a mixture of 400 mL of tert -butanol and potassium hydroxide (37.5 g, 161 mmol), and the reaction was allowed to proceed for 2 hours ). After cooling the reaction mixture to room temperature, 1200 mL of water was added, and remaining butanol used in the reaction was removed by volatilization. The resultant of the reaction was extracted three times with diethyl ether (300 mL), and the aqueous layer was acidified with a 10% by weight hydrochloric acid solution to a pH of about 3 to precipitate the desired product. To the residue was added again diethyl ether The organic layer was extracted three times. Dehydrated the organic layer with MgSO ₄ and the solvent removed to give the crude product (Crude product). The crude product was purified by column chromatography using hexane and DCM (dichloromethane) as mobile phase to give 3-hydroxy-1,2,4,5-tetrafluorostyrene (11.4 g) as a colorless liquid. NMR analysis results for the above are as follows.

<Intermediate NMR  Analysis results>

^{1 H-NMR (DMSO-d} ): δ11.7 (s, 1H); [delta] 6.60 (dd, 1H); [delta] 5.89 (d, IH); [delta] 5.62 (d, IH)

The following compound of formula (B) was synthesized in the following manner. (1.7 g, 7.8 mmol), 4-benzoylbenzoic acid (1.9 g, 8.6 mmol) synthesized in the above-mentioned intermediate (3-hydroxy-1,2,4,5-tetrafluorostyrene) , Dicyclohexylcarbodiimide (DCC) (1.8 g, 8.6 mmol) and DMAP (p-dimethylaminopyridine) (0.48 g, 3.1 mmol) were added to the reaction mixture. 30 mL of methylene chloride was added thereto and reacted at room temperature under nitrogen for 24 hours. The salt (urea salt) formed during the reaction and the remaining methylene chloride were also removed after the reaction was completed. The obtained product was recrystallized in a mixed solvent of methanol and water (methanol: water = 3: 1 (weight ratio)) to obtain a product represented by the following formula (B) Was obtained as a white solid at a yield of 70% by weight. NMR analysis results for the above compound are as follows.

< NMR  Analysis results>

_{^{1 H-NMR (CDCl 3)}} : δ8.3 (t, 2H); δ7.9 (q, 2H); [delta] 7.8 (d, 2H); [delta] 7.6 (t, IH); [delta] 7.5 (dd, 2H); [delta] 6.60 (dd, 1H); [delta] 5.89 (d, IH); [delta] 5.62 (d, IH)

[Chemical Formula B]

Example  One.

2.0 g of the compound of Preparation Example 1 (DPM-C12) and 64 mg of 2-cyano-2-propyl dodecyl trihydroxybenzoate (RAFT), 23 mg of AIBN (azobisisobutyronitrile) and 5.34 mL of anisole Was placed in a 10 mL flask (Schlenk flask), stirred for 30 minutes at room temperature under nitrogen atmosphere, and then subjected to Reversible Addition Ratio Transfer (RAFT) polymerization at 70 ° C for 4 hours. After the polymerization, the reaction solution was precipitated in 250 mL of methanol, which was an extraction solvent, and then filtered under reduced pressure and then dried to produce a pale yellow giant initiator. The yield of the macro initiator was about 80% by weight, the number average molecular weight (Mn) and the molecular weight distribution (Mw / Mn) were 6,100 and 1.25, respectively.

0.2 g of the synthesized macroinitiator, 3.589 g of pentafluorostyrene, 0.151 g of the photo-crosslinking monomer of the formula (B) in Production Example 2 and 1.697 mL of anisole were placed in a 10 mL flask (Schlenk flask) After stirring for 30 minutes, RAFT (Reversible Addition Ratio Chain Transfer) polymerization was carried out at 70 ° C for 3 hours. After the polymerization, the reaction solution was precipitated in 250 mL of methanol, which was an extraction solvent, and then dried under reduced pressure to obtain a pale yellow block copolymer. The yield of the block copolymer was about 14%, and the number average molecular weight (Mn) and the molecular weight distribution (Mw / Mn) were 14,400 and 1.21, respectively. The block copolymer includes a first block derived from the compound (DPM-C12) of Production Example 1, a compound represented by the general formula (B) of Production Example 2, and a second block derived from pentafluorostyrene.

Test Example  One.

The self-assembled polymer membrane was formed using the block copolymer synthesized in Example 1, and the results were confirmed. Specifically, a coating solution prepared by dissolving a copolymer in a solvent at a concentration of about 1.0 wt% was spin-coated on a silicon wafer at a speed of 3000 rpm for 60 seconds and thermally annealed to form a self-assembled block copolymer . &Lt; / RTI &gt; 1 is an SEM image of the polymer membrane formed as described above. The polymer membrane was then irradiated with ultraviolet light. Then, the polymer film was irradiated with light having a wavelength of about 254 nm at a light quantity of about 2 J / cm ² . FIG. 2 attached is an SEM photograph of the polymer membrane after photo-crosslinking as described above. Solvent cleaning of the polymer membrane resulted in selective etching.

3 shows the result of performing solvent washing on the polymer membrane not subjected to the photocrosslinking process while performing solvent cleaning in the same manner. As shown in FIG. 3, the etch selectivity between blocks is not ensured.

Claims (21)

1. A block copolymer comprising a first block having a unit represented by the following formula (1) and a second block having a unit represented by the following formula (3)
[Chemical Formula 1]

(3)

X is a single bond, an oxygen atom, a sulfur atom, -S (= O) _2- , a carbonyl group, an alkylene group, an alkenylene group, an alkynylene group, -C (= O) -X ₁ - or -X ₁ -C (= O) -, and wherein X ₁ is an oxygen atom, sulfur atom, -S (= O) ₂ - and the alkylene, alkenylene or alkynylene group, Y is 8 the monovalent substituent is a linear chain having one or more chains to form a cyclic structure comprising atoms linked, X ₂ in the formula (3) is a single bond, an oxygen atom, sulfur _{atom, -S (= O) 2 -} , an alkylene group, an Al alkenylene group, alkynylene _{group, -C (= O) -X 3} - or -X ₃ -C (= O) -, and wherein X ₃ is -S (= O) a single bond, an oxygen atom, a sulfur atom, and ₂ -, an alkylene group, an alkenylene group or an alkynylene group, R ₁ to R ₅ each independently represents a hydrogen, an alkyl group, a haloalkyl group, a halogen atom or a photopolymerizable functional group, and R ₁ to R ₅ The number of the light-permeable tubes Benzoyl group is a phenoxy group, alkenyloxy carbonyl group, a (meth) acryloyl group or an alkenyloxy group. 2. The block copolymer according to claim 1, wherein X in the formula (1) is a single bond, an oxygen atom, a carbonyl group, -C (= O) -O- or -C (= O) -O-. The block copolymer of claim 1, wherein the straight chain comprises from 8 to 20 chain forming atoms. The block copolymer of claim 1, wherein the chain-forming atoms are carbon, oxygen, nitrogen, or sulfur. The block copolymer according to claim 1, wherein the chain-forming atom is carbon or oxygen. The block copolymer according to claim 1, wherein the ring structure of Y in Formula (1) is an aromatic ring structure or an alicyclic ring structure. 2. The block copolymer according to claim 1, wherein Y in the formula (1) is a block copolymer represented by the following formula
(2)

In the formula 2 P is an arylene group, Q is a single bond, an oxygen atom or -NR ₃ - and, at the R ₃ is a hydrogen atom, alkyl group, alkenyl group, alkynyl group, alkoxy group or aryl group, Z is 8 Or more chain-forming atoms. delete The block copolymer according to claim 1, wherein R ₁ to R ₅ in the general formula (3) contain one or more halogen atoms. The block copolymer according to claim 1, wherein the ratio of the unit of the formula (3) in the second block is in the range of 0.1 to 5 mol%. The block copolymer according to claim 1, wherein the second block further comprises a unit represented by the following formula (4):
[Chemical Formula 4]

In formula 4 X ₂ is a single bond, an oxygen atom, sulfur _{atom, -S (= O) 2 -} , alkylene group, alkenylene group, alkynylene _{group, -C (= O) -X 4} - or -X ₄ -C (= O) - and, in the X ₄ represents a single bond, oxygen atom, sulfur _{atom, -S (= O) 2 -} , alkylene group, alkenyl group or alkynyl group, and W is at least one halogen Is an aryl group containing an atom. The block copolymer according to claim 1, wherein the second block further comprises a unit represented by the following formula (5):
[Chemical Formula 5]

In formula 5 X ₃ are a single bond, oxygen atom, sulfur _{atom, -S (= O) 2 -} , alkylene group, alkenylene group, alkynylene _{group, -C (= O) -X 5} - or -X ₅ -C (= O) - and, in the X ₅ is a single bond, oxygen atom, sulfur atom, -S (= O) ₂ -, and the alkylene, alkenylene or alkynylene group, R _a to R _e is Are each independently hydrogen, an alkyl group, a haloalkyl group or a halogen atom, and the number of halogen atoms contained in R _a to R _e is one or more. The block copolymer according to claim 12, wherein R _a to R _e in formula (5) contain at least 3 halogen atoms. The block copolymer according to claim 12, wherein R _a to R _e in formula (5) contain at least 5 or more halogen atoms. The block copolymer according to claim 12, wherein the halogen atom is a fluorine atom. A polymer membrane comprising the self-assembled block copolymer of claim 1. The polymer membrane according to claim 16, wherein the second block of the block copolymer includes a crosslinked structure. A method for forming a polymer membrane, which comprises forming on a substrate a self-assembled polymer membrane comprising the block copolymer of claim 1. 19. The method of claim 18, further comprising crosslinking a second block of the self-assembled block copolymer. And selectively removing one block of the block copolymer in a laminate having a substrate and a polymer membrane including the block copolymer of claim 1 which is formed on the substrate and is self-assembled. 21. The method of claim 20, wherein the second block of the block copolymer comprises a crosslinked structure.

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