KR101849508B1 - 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 - Google Patents
기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 Download PDFInfo
- Publication number
- KR101849508B1 KR101849508B1 KR1020177010558A KR20177010558A KR101849508B1 KR 101849508 B1 KR101849508 B1 KR 101849508B1 KR 1020177010558 A KR1020177010558 A KR 1020177010558A KR 20177010558 A KR20177010558 A KR 20177010558A KR 101849508 B1 KR101849508 B1 KR 101849508B1
- Authority
- KR
- South Korea
- Prior art keywords
- optical system
- illumination
- projection
- substrate
- plane
- Prior art date
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/008—Systems specially adapted to form image relays or chained systems
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
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JPJP-P-2011-278290 | 2011-12-20 | ||
JP2011278290 | 2011-12-20 | ||
JPJP-P-2012-024058 | 2012-02-07 | ||
JP2012024058 | 2012-02-07 | ||
PCT/JP2012/076326 WO2013094286A1 (ja) | 2011-12-20 | 2012-10-11 | 基板処理装置、デバイス製造システム、及びデバイス製造方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020147016863A Division KR101737680B1 (ko) | 2011-12-20 | 2012-10-11 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20170046189A KR20170046189A (ko) | 2017-04-28 |
KR101849508B1 true KR101849508B1 (ko) | 2018-05-28 |
Family
ID=48668190
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
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KR1020177010559A KR101848590B1 (ko) | 2011-12-20 | 2012-10-11 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
KR1020177010558A KR101849508B1 (ko) | 2011-12-20 | 2012-10-11 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
KR1020187034105A KR101961605B1 (ko) | 2011-12-20 | 2012-10-11 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
KR1020147016863A KR101737680B1 (ko) | 2011-12-20 | 2012-10-11 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
KR1020187009744A KR101924309B1 (ko) | 2011-12-20 | 2012-10-11 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020177010559A KR101848590B1 (ko) | 2011-12-20 | 2012-10-11 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
Family Applications After (3)
Application Number | Title | Priority Date | Filing Date |
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KR1020187034105A KR101961605B1 (ko) | 2011-12-20 | 2012-10-11 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
KR1020147016863A KR101737680B1 (ko) | 2011-12-20 | 2012-10-11 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
KR1020187009744A KR101924309B1 (ko) | 2011-12-20 | 2012-10-11 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
Country Status (5)
Country | Link |
---|---|
JP (6) | JP6056770B2 (zh) |
KR (5) | KR101848590B1 (zh) |
CN (3) | CN107255858B (zh) |
TW (5) | TWI709830B (zh) |
WO (1) | WO2013094286A1 (zh) |
Families Citing this family (15)
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CN107255858B (zh) * | 2011-12-20 | 2020-05-29 | 株式会社尼康 | 基底处理装置 |
CN105652609B (zh) * | 2012-07-13 | 2018-12-04 | 株式会社尼康 | 曝光装置及曝光方法 |
KR101949117B1 (ko) * | 2012-08-06 | 2019-02-15 | 가부시키가이샤 니콘 | 주사 노광 장치 및 디바이스 제조 방법 |
KR102045713B1 (ko) * | 2012-11-06 | 2019-11-15 | 가부시키가이샤 니콘 | 편광 빔 스플리터, 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
KR101988820B1 (ko) | 2012-12-18 | 2019-06-12 | 가부시키가이샤 니콘 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
WO2016035842A1 (ja) * | 2014-09-04 | 2016-03-10 | 株式会社ニコン | 処理システムおよびデバイス製造方法 |
TW201624142A (zh) * | 2014-09-26 | 2016-07-01 | Orc Mfg Co Ltd | 直接曝光裝置 |
CN106292187A (zh) * | 2015-05-13 | 2017-01-04 | 鸿富锦精密工业(深圳)有限公司 | 曝光方法 |
JP6882316B2 (ja) | 2016-03-04 | 2021-06-02 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | ワイヤグリッド偏光板製造方法 |
JP6700936B2 (ja) * | 2016-04-25 | 2020-05-27 | キヤノン株式会社 | インプリント装置、インプリント方法、および物品の製造方法 |
KR102574781B1 (ko) * | 2016-07-15 | 2023-09-06 | 라이트 필드 랩 인코포레이티드 | 2차원 라이트 필드 및 홀로그램 릴레이들을 이용한 에너지 전파와 횡방향 앤더슨 편재 |
KR101856500B1 (ko) * | 2016-07-26 | 2018-06-21 | 재단법인 대구경북첨단의료산업진흥재단 | 레이저 가공된 포토마스크를 이용한 미세유체칩 제조방법 |
DE102019128198B3 (de) * | 2019-10-18 | 2021-02-25 | Laser Imaging Systems Gmbh | Vorrichtung zur Mustereinbringung mittels Strahlung an einem aufgewickelten Endlossubstrat |
TWI730831B (zh) * | 2020-07-02 | 2021-06-11 | 光群雷射科技股份有限公司 | 增亮膜的轉印式製造方法及增亮膜 |
JP2022023357A (ja) | 2020-07-27 | 2022-02-08 | デンカ株式会社 | シグナルの低下を改善した検査試薬 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004062205A (ja) | 2002-07-24 | 2004-02-26 | Heidelberger Druckmas Ag | 版に画像付けするコンパクトな装置 |
JP2006098719A (ja) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 露光装置 |
JP2011203311A (ja) | 2010-03-24 | 2011-10-13 | Nikon Corp | マスクホルダ、円筒型マスク、露光装置、基板処理装置及びデバイス製造方法 |
Family Cites Families (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU669721B2 (en) * | 1992-06-11 | 1996-06-20 | Luscher Zed Flexo Limited | Engraving head |
JP3724517B2 (ja) * | 1995-01-18 | 2005-12-07 | 株式会社ニコン | 露光装置 |
JP3287698B2 (ja) * | 1994-06-23 | 2002-06-04 | キヤノン株式会社 | 走査映像装置 |
JP3359127B2 (ja) * | 1993-10-08 | 2002-12-24 | キヤノン株式会社 | 眼底カメラ |
JP3448663B2 (ja) * | 1994-05-13 | 2003-09-22 | 株式会社ニコン | 投影露光装置 |
JPH0864497A (ja) * | 1994-08-23 | 1996-03-08 | Nikon Corp | 投影露光装置 |
JPH11219892A (ja) * | 1998-02-04 | 1999-08-10 | Nikon Corp | 走査型露光装置及びその視野絞り位置の測定方法 |
US6274294B1 (en) | 1999-02-03 | 2001-08-14 | Electroformed Stents, Inc. | Cylindrical photolithography exposure process and apparatus |
JP3376961B2 (ja) | 1999-06-08 | 2003-02-17 | ウシオ電機株式会社 | マスクを移動させて位置合わせを行う露光装置 |
KR20030051421A (ko) * | 2000-03-31 | 2003-06-25 | 가부시키가이샤 니콘 | 광학 부재의 유지 방법 및 장치, 광학 장치, 노광 장치 및디바이스 제조 방법 |
TW556044B (en) | 2001-02-15 | 2003-10-01 | Sipix Imaging Inc | Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web |
JP4218418B2 (ja) * | 2003-05-23 | 2009-02-04 | ウシオ電機株式会社 | 帯状ワークの両面投影露光装置 |
KR101281357B1 (ko) * | 2003-06-06 | 2013-07-02 | 가부시키가이샤 니콘 | 광학 소자 유지 장치, 경통, 노광 장치, 및 디바이스의제조방법 |
US9307648B2 (en) * | 2004-01-21 | 2016-04-05 | Microcontinuum, Inc. | Roll-to-roll patterning of transparent and metallic layers |
EP1730596B1 (en) * | 2004-03-30 | 2011-02-16 | Carl Zeiss SMT AG | Projection objective and projection exposure apparatus |
CN101052916B (zh) * | 2004-09-30 | 2010-05-12 | 株式会社尼康 | 投影光学设备和曝光装置 |
US7375795B2 (en) * | 2004-12-22 | 2008-05-20 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
WO2007029852A1 (en) * | 2005-09-07 | 2007-03-15 | Fujifilm Corporation | Pattern exposure method and pattern exposure apparatus |
JP5025157B2 (ja) * | 2005-09-29 | 2012-09-12 | 大日本スクリーン製造株式会社 | 画像記録装置および画像記録方法 |
FR2893610B1 (fr) * | 2005-11-23 | 2008-07-18 | Saint Gobain | Procede de structuration de surface d'un produit verrier, produit verrier a surface structuree et utilisations |
JP2007227438A (ja) * | 2006-02-21 | 2007-09-06 | Nikon Corp | 露光装置及び方法並びに光露光用マスク |
JP4952182B2 (ja) * | 2006-03-20 | 2012-06-13 | 株式会社ニコン | 走査型露光装置、マイクロデバイスの製造方法、走査露光方法、及びマスク |
JP5114061B2 (ja) * | 2006-04-26 | 2013-01-09 | 株式会社オーク製作所 | 投影露光装置 |
CN100529970C (zh) * | 2006-04-26 | 2009-08-19 | 株式会社Orc制作所 | 投影曝光装置 |
JP4984631B2 (ja) | 2006-04-28 | 2012-07-25 | 株式会社ニコン | 露光装置及び方法、露光用マスク、並びにデバイス製造方法 |
TWI481968B (zh) * | 2006-09-08 | 2015-04-21 | 尼康股份有限公司 | A mask, an exposure device, and an element manufacturing method |
JP5059382B2 (ja) | 2006-11-20 | 2012-10-24 | ディップ株式会社 | 職務経歴書自動作成システム及び方法 |
EP1950594A1 (de) * | 2007-01-17 | 2008-07-30 | Carl Zeiss SMT AG | Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik |
DE102008002377A1 (de) * | 2007-07-17 | 2009-01-22 | Carl Zeiss Smt Ag | Beleuchtungssystem sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einem derartigen Beleuchtungssystem |
JP2009032749A (ja) * | 2007-07-24 | 2009-02-12 | Nikon Corp | 露光装置およびデバイス製造方法 |
DE102007035387A1 (de) * | 2007-07-26 | 2009-01-29 | Leibnitz-Institut für neue Materialien Gemeinnützige GmbH | Verfahren und Vorrichtung zur Herstellung von strukturierten optischen Materialien |
JP2009099939A (ja) * | 2007-09-25 | 2009-05-07 | Dainippon Screen Mfg Co Ltd | アライメントマーク形成装置 |
JP2009163133A (ja) * | 2008-01-09 | 2009-07-23 | Nikon Corp | 露光方法及び露光装置 |
US8192920B2 (en) * | 2008-04-26 | 2012-06-05 | Rolith Inc. | Lithography method |
US8034540B2 (en) * | 2008-07-31 | 2011-10-11 | Eastman Kodak Company | System and method employing secondary back exposure of flexographic plate |
EP2376983B1 (en) * | 2008-12-23 | 2020-01-22 | 3M Innovative Properties Company | Roll-to-roll digital photolithography |
US8339573B2 (en) * | 2009-05-27 | 2012-12-25 | 3M Innovative Properties Company | Method and apparatus for photoimaging a substrate |
CN102472987A (zh) * | 2009-08-26 | 2012-05-23 | 株式会社尼康 | 曝光装置、曝光方法以及元件制造方法 |
US20130027684A1 (en) * | 2010-04-13 | 2013-01-31 | Tohru Kiuchi | Exposure apparatus, substrate processing apparatus, and device manufacturing method |
JP2011221536A (ja) * | 2010-04-13 | 2011-11-04 | Nikon Corp | マスク移動装置、露光装置、基板処理装置及びデバイス製造方法 |
JP5724564B2 (ja) * | 2010-04-13 | 2015-05-27 | 株式会社ニコン | マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法 |
CN107255858B (zh) * | 2011-12-20 | 2020-05-29 | 株式会社尼康 | 基底处理装置 |
KR101988820B1 (ko) * | 2012-12-18 | 2019-06-12 | 가부시키가이샤 니콘 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
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2012
- 2012-10-11 CN CN201710321582.7A patent/CN107255858B/zh active Active
- 2012-10-11 WO PCT/JP2012/076326 patent/WO2013094286A1/ja active Application Filing
- 2012-10-11 KR KR1020177010559A patent/KR101848590B1/ko active IP Right Grant
- 2012-10-11 CN CN201280063563.4A patent/CN104011597B/zh active Active
- 2012-10-11 KR KR1020177010558A patent/KR101849508B1/ko active IP Right Grant
- 2012-10-11 KR KR1020187034105A patent/KR101961605B1/ko active IP Right Grant
- 2012-10-11 JP JP2013550164A patent/JP6056770B2/ja active Active
- 2012-10-11 KR KR1020147016863A patent/KR101737680B1/ko active Application Filing
- 2012-10-11 KR KR1020187009744A patent/KR101924309B1/ko active IP Right Grant
- 2012-10-11 CN CN201510964816.0A patent/CN105425553B/zh active Active
- 2012-11-29 TW TW109108967A patent/TWI709830B/zh active
- 2012-11-29 TW TW106109149A patent/TWI648601B/zh active
- 2012-11-29 TW TW107144810A patent/TWI668526B/zh active
- 2012-11-29 TW TW101144692A patent/TWI585541B/zh active
- 2012-11-29 TW TW107144809A patent/TWI691805B/zh active
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2016
- 2016-12-06 JP JP2016236579A patent/JP6323542B2/ja active Active
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2017
- 2017-11-17 JP JP2017221825A patent/JP6436216B2/ja active Active
- 2017-11-17 JP JP2017221826A patent/JP6512265B2/ja active Active
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2019
- 2019-04-03 JP JP2019071211A patent/JP6677333B2/ja active Active
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2020
- 2020-03-03 JP JP2020035758A patent/JP6927348B2/ja active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004062205A (ja) | 2002-07-24 | 2004-02-26 | Heidelberger Druckmas Ag | 版に画像付けするコンパクトな装置 |
JP2006098719A (ja) | 2004-09-29 | 2006-04-13 | Fuji Photo Film Co Ltd | 露光装置 |
JP2011203311A (ja) | 2010-03-24 | 2011-10-13 | Nikon Corp | マスクホルダ、円筒型マスク、露光装置、基板処理装置及びデバイス製造方法 |
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