KR101824234B1 - 고효율 고정확도 히터 드라이버 - Google Patents

고효율 고정확도 히터 드라이버 Download PDF

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Publication number
KR101824234B1
KR101824234B1 KR1020127024467A KR20127024467A KR101824234B1 KR 101824234 B1 KR101824234 B1 KR 101824234B1 KR 1020127024467 A KR1020127024467 A KR 1020127024467A KR 20127024467 A KR20127024467 A KR 20127024467A KR 101824234 B1 KR101824234 B1 KR 101824234B1
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South Korea
Prior art keywords
transistor
rapid thermal
temperature
power
processing chamber
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KR1020127024467A
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English (en)
Korean (ko)
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KR20120137367A (ko
Inventor
알렉산더 골딘
올레그 브이. 세레브리아노브
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
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Publication of KR20120137367A publication Critical patent/KR20120137367A/ko
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
    • F24C15/00—Details
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24C—DOMESTIC STOVES OR RANGES ; DETAILS OF DOMESTIC STOVES OR RANGES, OF GENERAL APPLICATION
    • F24C15/00—Details
    • F24C15/24—Radiant bodies or panels for radiation heaters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B1/00—Details of electric heating devices
    • H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227—Applications
    • H05B1/023—Industrial applications
    • H05B1/0233—Industrial applications for semiconductors manufacturing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H05B3/0047—Heating devices using lamps for industrial applications for semiconductor manufacture
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Control Of Resistance Heating (AREA)
  • Circuit Arrangement For Electric Light Sources In General (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Control Of Temperature (AREA)
  • Control Of Electrical Variables (AREA)
KR1020127024467A 2010-02-19 2011-02-18 고효율 고정확도 히터 드라이버 Active KR101824234B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/708,648 2010-02-19
US12/708,648 US8548312B2 (en) 2010-02-19 2010-02-19 High efficiency high accuracy heater driver
PCT/US2011/025391 WO2011103391A2 (en) 2010-02-19 2011-02-18 High efficiency high accuracy heater driver

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020187002546A Division KR101890155B1 (ko) 2010-02-19 2011-02-18 고효율 고정확도 히터 드라이버

Publications (2)

Publication Number Publication Date
KR20120137367A KR20120137367A (ko) 2012-12-20
KR101824234B1 true KR101824234B1 (ko) 2018-01-31

Family

ID=44476555

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020127024467A Active KR101824234B1 (ko) 2010-02-19 2011-02-18 고효율 고정확도 히터 드라이버
KR1020187002546A Active KR101890155B1 (ko) 2010-02-19 2011-02-18 고효율 고정확도 히터 드라이버

Family Applications After (1)

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KR1020187002546A Active KR101890155B1 (ko) 2010-02-19 2011-02-18 고효율 고정확도 히터 드라이버

Country Status (8)

Country Link
US (3) US8548312B2 (https=)
EP (1) EP2537178A4 (https=)
JP (3) JP5887282B2 (https=)
KR (2) KR101824234B1 (https=)
CN (2) CN104617013B (https=)
SG (1) SG183187A1 (https=)
TW (2) TWI474403B (https=)
WO (1) WO2011103391A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
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US10734257B2 (en) * 2012-04-25 2020-08-04 Applied Materials, Inc. Direct current lamp driver for substrate processing
US9734659B2 (en) * 2014-08-06 2017-08-15 Mido Play Inc. Single platform system for multiple jurisdiction lotteries and social media
TWI691233B (zh) * 2015-01-05 2020-04-11 美商應用材料股份有限公司 用於低壓環境的燈驅動器
TWI612259B (zh) * 2016-02-26 2018-01-21 財團法人工業技術研究院 加熱設備以及加熱方法
CN109863584B (zh) 2016-06-15 2023-05-26 沃特洛电气制造公司 用于热系统的功率转换器
US10908195B2 (en) 2016-06-15 2021-02-02 Watlow Electric Manufacturing Company System and method for controlling power to a heater
CN111226498B (zh) * 2017-08-10 2022-04-12 沃特洛电气制造公司 用于控制给加热器的功率的系统和方法
CN109429382A (zh) * 2017-08-24 2019-03-05 江苏威能电气有限公司 快速升降温加热器
DE102018203945B4 (de) 2018-03-15 2023-08-10 Siltronic Ag Verfahren zur Herstellung von Halbleiterscheiben
CN110554717B (zh) * 2019-08-15 2021-08-24 国电南瑞科技股份有限公司 适用于电力电子装置温度闭环调节的散热风扇设速方法
CN113405323A (zh) * 2021-07-21 2021-09-17 东方凯特瑞(成都)环保科技有限公司 一种用于蜂窝scr脱硝催化剂的微波干燥方法及装置
CN114060892B (zh) * 2021-11-29 2023-05-16 奥普家居股份有限公司 一种恒温浴霸及其控制方法、存储介质

Citations (2)

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US20030029859A1 (en) 2001-08-08 2003-02-13 Applied Materials, Inc. Lamphead for a rapid thermal processing chamber
WO2006107013A1 (ja) * 2005-04-04 2006-10-12 Kokusai Electric Semiconductor Service Inc. 供給電力調整器及び半導体製造装置

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US4438356A (en) * 1982-03-24 1984-03-20 International Rectifier Corporation Solid state relay circuit employing MOSFET power switching devices
JPH0327408A (ja) * 1989-06-24 1991-02-05 Matsushita Electric Works Ltd デユーテイ制御装置
JP3215613B2 (ja) * 1995-10-04 2001-10-09 古河電池株式会社 力率制御回路
US5751896A (en) * 1996-02-22 1998-05-12 Micron Technology, Inc. Method and apparatus to compensate for non-uniform film growth during chemical vapor deposition
US5841110A (en) 1997-08-27 1998-11-24 Steag-Ast Gmbh Method and apparatus for improved temperature control in rapid thermal processing (RTP) systems
JP3304894B2 (ja) * 1998-09-28 2002-07-22 ウシオ電機株式会社 フィラメントランプ点灯装置
JP2000235886A (ja) 1998-12-14 2000-08-29 Tokyo Electron Ltd 加熱手段の温度制御装置および温度制御方法
JP3988338B2 (ja) * 1999-10-07 2007-10-10 ウシオ電機株式会社 光照射式急速加熱処理装置の制御装置
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US20080090309A1 (en) 2003-10-27 2008-04-17 Ranish Joseph M Controlled annealing method
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US7283734B2 (en) * 2004-08-24 2007-10-16 Fujitsu Limited Rapid thermal processing apparatus and method of manufacture of semiconductor device
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JP5282409B2 (ja) 2008-02-25 2013-09-04 ウシオ電機株式会社 光照射式加熱方法及び光照射式加熱装置
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030029859A1 (en) 2001-08-08 2003-02-13 Applied Materials, Inc. Lamphead for a rapid thermal processing chamber
WO2006107013A1 (ja) * 2005-04-04 2006-10-12 Kokusai Electric Semiconductor Service Inc. 供給電力調整器及び半導体製造装置

Also Published As

Publication number Publication date
KR101890155B1 (ko) 2018-08-21
US20110206358A1 (en) 2011-08-25
JP5887282B2 (ja) 2016-03-16
WO2011103391A2 (en) 2011-08-25
TW201145395A (en) 2011-12-16
US8548312B2 (en) 2013-10-01
US20140027440A1 (en) 2014-01-30
CN102763201B (zh) 2015-07-15
EP2537178A4 (en) 2013-07-17
US20170162408A1 (en) 2017-06-08
KR20180014208A (ko) 2018-02-07
KR20120137367A (ko) 2012-12-20
CN102763201A (zh) 2012-10-31
CN104617013B (zh) 2017-11-14
JP6324938B2 (ja) 2018-05-16
TW201517176A (zh) 2015-05-01
SG183187A1 (en) 2012-09-27
TWI474403B (zh) 2015-02-21
JP2013520801A (ja) 2013-06-06
EP2537178A2 (en) 2012-12-26
TWI590333B (zh) 2017-07-01
JP2016076708A (ja) 2016-05-12
JP2018093210A (ja) 2018-06-14
CN104617013A (zh) 2015-05-13
WO2011103391A3 (en) 2012-02-09
US9612020B2 (en) 2017-04-04

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