KR101808860B1 - 조정 가능한 광학 소자를 구비한 광학 모듈 - Google Patents

조정 가능한 광학 소자를 구비한 광학 모듈 Download PDF

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KR101808860B1
KR101808860B1 KR1020110037620A KR20110037620A KR101808860B1 KR 101808860 B1 KR101808860 B1 KR 101808860B1 KR 1020110037620 A KR1020110037620 A KR 1020110037620A KR 20110037620 A KR20110037620 A KR 20110037620A KR 101808860 B1 KR101808860 B1 KR 101808860B1
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South Korea
Prior art keywords
support
joints
optical element
pivot
axis
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Korean (ko)
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KR20110118579A (ko
Inventor
이반 이바노프
타오우픽 음바렉
마티아스 휘싱
부르크하르트 코르페스
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칼 짜이스 에스엠테 게엠베하
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0808—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H10P76/2042—Photolithographic processes using lasers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
KR1020110037620A 2010-04-23 2011-04-22 조정 가능한 광학 소자를 구비한 광학 모듈 Active KR101808860B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010018224A DE102010018224A1 (de) 2010-04-23 2010-04-23 Optisches Modul mit einem verstellbaren optischen Element
DE102010018224.9 2010-04-23

Publications (2)

Publication Number Publication Date
KR20110118579A KR20110118579A (ko) 2011-10-31
KR101808860B1 true KR101808860B1 (ko) 2017-12-13

Family

ID=44815562

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110037620A Active KR101808860B1 (ko) 2010-04-23 2011-04-22 조정 가능한 광학 소자를 구비한 광학 모듈

Country Status (4)

Country Link
US (1) US10274845B2 (https=)
JP (1) JP6008468B2 (https=)
KR (1) KR101808860B1 (https=)
DE (1) DE102010018224A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9254538B2 (en) * 2013-04-16 2016-02-09 Corning Incorporated Method of minimizing stacking element distortions in optical assemblies
DE102019112224A1 (de) * 2019-05-10 2020-11-12 Carl Zeiss Smt Gmbh Abstützung eines optischen Elements
DE102019218609A1 (de) * 2019-11-29 2021-06-02 Carl Zeiss Smt Gmbh Abstützung einer optischen einheit

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000066075A (ja) * 1998-08-17 2000-03-03 Nikon Corp 光学系及びその製造方法、並びに前記光学系を備えた露光装置
US20020044260A1 (en) 2000-06-19 2002-04-18 Nikon Corporation Projection optical system, manufacturing method thereof, and projection exposure apparatus
JP2008111891A (ja) * 2006-10-30 2008-05-15 Canon Inc 光学要素の保持装置及びそれを備えた露光装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60126103T2 (de) 2000-08-18 2007-11-15 Nikon Corp. Haltevorrichtung für optisches Element
DE10115914A1 (de) * 2001-03-30 2002-10-02 Zeiss Carl Vorrichtung zur Lagerung eines optischen Elementes in einer Optik
DE10344178B4 (de) * 2003-09-24 2006-08-10 Carl Zeiss Smt Ag Halte- und Positioniervorrichtung für ein optisches Element
WO2005101131A1 (en) 2004-04-14 2005-10-27 Carl Zeiss Smt Ag Support device for positioning an optical element
KR20080038050A (ko) * 2006-10-27 2008-05-02 캐논 가부시끼가이샤 광학 요소 유지장치 및 노광 장치
EP1995534A1 (de) * 2007-05-19 2008-11-26 Fritz Brinkmann Steuerung und Antrieb eines kippbaren Solarreflektors zur Leistungssteigerung und zum Schutz von flächigen Sonnenkollektoren
DE102009044957A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Stützelemente für ein optisches Element
US9664982B2 (en) * 2015-03-12 2017-05-30 Panasonic Intellectual Property Management Co., Ltd. Optical system driving device, lens barrel, and optical device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000066075A (ja) * 1998-08-17 2000-03-03 Nikon Corp 光学系及びその製造方法、並びに前記光学系を備えた露光装置
US20020044260A1 (en) 2000-06-19 2002-04-18 Nikon Corporation Projection optical system, manufacturing method thereof, and projection exposure apparatus
JP2008111891A (ja) * 2006-10-30 2008-05-15 Canon Inc 光学要素の保持装置及びそれを備えた露光装置

Also Published As

Publication number Publication date
JP2011232751A (ja) 2011-11-17
US20110261341A1 (en) 2011-10-27
DE102010018224A1 (de) 2012-02-16
US10274845B2 (en) 2019-04-30
JP6008468B2 (ja) 2016-10-19
KR20110118579A (ko) 2011-10-31

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