DE102010018224A1 - Optisches Modul mit einem verstellbaren optischen Element - Google Patents

Optisches Modul mit einem verstellbaren optischen Element Download PDF

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Publication number
DE102010018224A1
DE102010018224A1 DE102010018224A DE102010018224A DE102010018224A1 DE 102010018224 A1 DE102010018224 A1 DE 102010018224A1 DE 102010018224 A DE102010018224 A DE 102010018224A DE 102010018224 A DE102010018224 A DE 102010018224A DE 102010018224 A1 DE102010018224 A1 DE 102010018224A1
Authority
DE
Germany
Prior art keywords
support
axis
module according
optical element
optical module
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102010018224A
Other languages
German (de)
English (en)
Inventor
Ivan Ivanov
Dipl.-Ing. Mbarek Taoufik
Dr.-Ing. Hüsing Mathias
Prof. Corves Burkhard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102010018224A priority Critical patent/DE102010018224A1/de
Priority to US13/091,457 priority patent/US10274845B2/en
Priority to KR1020110037620A priority patent/KR101808860B1/ko
Priority to JP2011096245A priority patent/JP6008468B2/ja
Publication of DE102010018224A1 publication Critical patent/DE102010018224A1/de
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0808—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • H10P76/2042—Photolithographic processes using lasers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
DE102010018224A 2010-04-23 2010-04-23 Optisches Modul mit einem verstellbaren optischen Element Ceased DE102010018224A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE102010018224A DE102010018224A1 (de) 2010-04-23 2010-04-23 Optisches Modul mit einem verstellbaren optischen Element
US13/091,457 US10274845B2 (en) 2010-04-23 2011-04-21 Optical module with an adjustable optical element
KR1020110037620A KR101808860B1 (ko) 2010-04-23 2011-04-22 조정 가능한 광학 소자를 구비한 광학 모듈
JP2011096245A JP6008468B2 (ja) 2010-04-23 2011-04-22 調整可能な光学素子を有する光学モジュール

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102010018224A DE102010018224A1 (de) 2010-04-23 2010-04-23 Optisches Modul mit einem verstellbaren optischen Element

Publications (1)

Publication Number Publication Date
DE102010018224A1 true DE102010018224A1 (de) 2012-02-16

Family

ID=44815562

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102010018224A Ceased DE102010018224A1 (de) 2010-04-23 2010-04-23 Optisches Modul mit einem verstellbaren optischen Element

Country Status (4)

Country Link
US (1) US10274845B2 (https=)
JP (1) JP6008468B2 (https=)
KR (1) KR101808860B1 (https=)
DE (1) DE102010018224A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019218609A1 (de) * 2019-11-29 2021-06-02 Carl Zeiss Smt Gmbh Abstützung einer optischen einheit

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9254538B2 (en) * 2013-04-16 2016-02-09 Corning Incorporated Method of minimizing stacking element distortions in optical assemblies
DE102019112224A1 (de) * 2019-05-10 2020-11-12 Carl Zeiss Smt Gmbh Abstützung eines optischen Elements

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10115914A1 (de) * 2001-03-30 2002-10-02 Zeiss Carl Vorrichtung zur Lagerung eines optischen Elementes in einer Optik
US20020163741A1 (en) 2000-08-18 2002-11-07 Yuichi Shibazaki Optical element holding device
DE10344178A1 (de) * 2003-09-24 2005-04-28 Zeiss Carl Smt Ag Halte- und Positioniervorrichtung für ein optisches Element
WO2005101131A1 (en) 2004-04-14 2005-10-27 Carl Zeiss Smt Ag Support device for positioning an optical element
EP1995534A1 (de) * 2007-05-19 2008-11-26 Fritz Brinkmann Steuerung und Antrieb eines kippbaren Solarreflektors zur Leistungssteigerung und zum Schutz von flächigen Sonnenkollektoren
DE102009044957A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Stützelemente für ein optisches Element

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000066075A (ja) 1998-08-17 2000-03-03 Nikon Corp 光学系及びその製造方法、並びに前記光学系を備えた露光装置
JP2002083766A (ja) 2000-06-19 2002-03-22 Nikon Corp 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
JP2008111891A (ja) 2006-10-30 2008-05-15 Canon Inc 光学要素の保持装置及びそれを備えた露光装置
KR20080038050A (ko) * 2006-10-27 2008-05-02 캐논 가부시끼가이샤 광학 요소 유지장치 및 노광 장치
US9664982B2 (en) * 2015-03-12 2017-05-30 Panasonic Intellectual Property Management Co., Ltd. Optical system driving device, lens barrel, and optical device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020163741A1 (en) 2000-08-18 2002-11-07 Yuichi Shibazaki Optical element holding device
DE10115914A1 (de) * 2001-03-30 2002-10-02 Zeiss Carl Vorrichtung zur Lagerung eines optischen Elementes in einer Optik
DE10344178A1 (de) * 2003-09-24 2005-04-28 Zeiss Carl Smt Ag Halte- und Positioniervorrichtung für ein optisches Element
WO2005101131A1 (en) 2004-04-14 2005-10-27 Carl Zeiss Smt Ag Support device for positioning an optical element
EP1995534A1 (de) * 2007-05-19 2008-11-26 Fritz Brinkmann Steuerung und Antrieb eines kippbaren Solarreflektors zur Leistungssteigerung und zum Schutz von flächigen Sonnenkollektoren
DE102009044957A1 (de) * 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Stützelemente für ein optisches Element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019218609A1 (de) * 2019-11-29 2021-06-02 Carl Zeiss Smt Gmbh Abstützung einer optischen einheit

Also Published As

Publication number Publication date
JP2011232751A (ja) 2011-11-17
US20110261341A1 (en) 2011-10-27
KR101808860B1 (ko) 2017-12-13
US10274845B2 (en) 2019-04-30
JP6008468B2 (ja) 2016-10-19
KR20110118579A (ko) 2011-10-31

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Date Code Title Description
R002 Refusal decision in examination/registration proceedings
R003 Refusal decision now final

Effective date: 20130817