KR101806329B1 - 모노머, 중합체, 유기막 조성물, 유기막, 및 패턴형성방법 - Google Patents

모노머, 중합체, 유기막 조성물, 유기막, 및 패턴형성방법 Download PDF

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Publication number
KR101806329B1
KR101806329B1 KR1020150109027A KR20150109027A KR101806329B1 KR 101806329 B1 KR101806329 B1 KR 101806329B1 KR 1020150109027 A KR1020150109027 A KR 1020150109027A KR 20150109027 A KR20150109027 A KR 20150109027A KR 101806329 B1 KR101806329 B1 KR 101806329B1
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KR
South Korea
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independently
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KR1020150109027A
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English (en)
Korean (ko)
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KR20160061865A (ko
Inventor
남연희
권효영
김성환
김승현
남궁란
도미니아 라뜨웰
문수현
정슬기
정현일
허유미
Original Assignee
삼성에스디아이 주식회사
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Application filed by 삼성에스디아이 주식회사 filed Critical 삼성에스디아이 주식회사
Priority to US14/886,121 priority Critical patent/US9862668B2/en
Priority to TW104135514A priority patent/TWI576335B/zh
Priority to CN201510725055.3A priority patent/CN105622364B/zh
Publication of KR20160061865A publication Critical patent/KR20160061865A/ko
Application granted granted Critical
Publication of KR101806329B1 publication Critical patent/KR101806329B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/782—Ketones containing a keto group bound to a six-membered aromatic ring polycyclic
    • C07C49/788—Ketones containing a keto group bound to a six-membered aromatic ring polycyclic with keto groups bound to a condensed ring system
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
KR1020150109027A 2014-11-24 2015-07-31 모노머, 중합체, 유기막 조성물, 유기막, 및 패턴형성방법 KR101806329B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US14/886,121 US9862668B2 (en) 2014-11-24 2015-10-19 Monomer, polymer, organic layer composition, organic layer, and method of forming patterns
TW104135514A TWI576335B (zh) 2014-11-24 2015-10-29 單體、聚合物、有機層組成物、有機層及形成圖案的方法
CN201510725055.3A CN105622364B (zh) 2014-11-24 2015-10-29 单体、聚合物、有机层组成物、有机层及形成图案的方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020140164607 2014-11-24
KR20140164607 2014-11-24

Publications (2)

Publication Number Publication Date
KR20160061865A KR20160061865A (ko) 2016-06-01
KR101806329B1 true KR101806329B1 (ko) 2017-12-07

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KR1020150109027A KR101806329B1 (ko) 2014-11-24 2015-07-31 모노머, 중합체, 유기막 조성물, 유기막, 및 패턴형성방법

Country Status (2)

Country Link
KR (1) KR101806329B1 (zh)
TW (1) TWI576335B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11480878B2 (en) * 2016-08-31 2022-10-25 Rohm And Haas Electronic Materials Korea Ltd. Monomers, polymers and photoresist compositions

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150338423A1 (en) 2014-05-21 2015-11-26 Sabic Global Technologies B.V. Methods for determining relative binding energy of monomers and methods of using the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101566533B1 (ko) * 2012-10-24 2015-11-05 제일모직 주식회사 하드마스크 조성물 및 이를 사용한 패턴형성방법
WO2014104496A1 (ko) * 2012-12-26 2014-07-03 제일모직 주식회사 모노머, 상기 모노머를 포함하는 하드마스크 조성물 및 상기 하드마스크 조성물을 사용하는 패턴형성방법
KR101599961B1 (ko) * 2012-12-26 2016-03-04 제일모직 주식회사 모노머, 상기 모노머를 포함하는 하드마스크 조성물 및 상기 하드마스크 조성물을 사용하는 패턴형성방법
KR101556276B1 (ko) * 2012-12-28 2015-09-30 제일모직 주식회사 하드마스크 조성물용 모노머, 상기 모노머를 포함하는 하드마스크 조성물 및 상기 하드마스크 조성물을 사용하는 패턴형성방법

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150338423A1 (en) 2014-05-21 2015-11-26 Sabic Global Technologies B.V. Methods for determining relative binding energy of monomers and methods of using the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Chem. Eur. J. 2003, 9, 3544-3554*

Also Published As

Publication number Publication date
TW201619108A (zh) 2016-06-01
TWI576335B (zh) 2017-04-01
KR20160061865A (ko) 2016-06-01

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