KR101763198B1 - 자기 재료들 사이의 갭 - Google Patents

자기 재료들 사이의 갭 Download PDF

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Publication number
KR101763198B1
KR101763198B1 KR1020140026632A KR20140026632A KR101763198B1 KR 101763198 B1 KR101763198 B1 KR 101763198B1 KR 1020140026632 A KR1020140026632 A KR 1020140026632A KR 20140026632 A KR20140026632 A KR 20140026632A KR 101763198 B1 KR101763198 B1 KR 101763198B1
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KR
South Korea
Prior art keywords
layer
magnetic
gap
sacrificial layer
sacrificial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020140026632A
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English (en)
Korean (ko)
Other versions
KR20140111962A (ko
Inventor
웨이 티엔
벤카테스와라 라오 인투리
더그 린
후하칭 인
지아오밍 치우
Original Assignee
시게이트 테크놀로지 엘엘씨
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Publication of KR20140111962A publication Critical patent/KR20140111962A/ko
Application granted granted Critical
Publication of KR101763198B1 publication Critical patent/KR101763198B1/ko
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3176—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/23—Gap features
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/23—Gap features
    • G11B5/235—Selection of material for gap filler
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
    • G11B5/23—Gap features
    • G11B5/232—Manufacture of gap
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109—Details
    • G11B5/313—Disposition of layers
    • G11B5/3143—Disposition of layers including additional layers for improving the electromagnetic transducing properties of the basic structure, e.g. for flux coupling, guiding or shielding
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00555—Achieving a desired geometry, i.e. controlling etch rates, anisotropy or selectivity
    • B81C1/00611—Processes for the planarisation of structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102—Surface micromachining
    • B81C2201/0105—Sacrificial layer
    • B81C2201/0109—Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0041—Photosensitive materials providing an etching agent upon exposure

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Magnetic Heads (AREA)
KR1020140026632A 2013-03-12 2014-03-06 자기 재료들 사이의 갭 Expired - Fee Related KR101763198B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/796,951 US9214167B2 (en) 2013-03-12 2013-03-12 Main pole layer with at least tow sacrificial layers and a gap layer
US13/796,951 2013-03-12

Publications (2)

Publication Number Publication Date
KR20140111962A KR20140111962A (ko) 2014-09-22
KR101763198B1 true KR101763198B1 (ko) 2017-07-31

Family

ID=50276974

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140026632A Expired - Fee Related KR101763198B1 (ko) 2013-03-12 2014-03-06 자기 재료들 사이의 갭

Country Status (5)

Country Link
US (2) US9214167B2 (enExample)
EP (1) EP2779165A3 (enExample)
JP (1) JP6066947B2 (enExample)
KR (1) KR101763198B1 (enExample)
CN (1) CN104050986B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9147407B2 (en) * 2013-03-12 2015-09-29 Seagate Technology Llc Write head having non-magnetic write gap seed layer, and method
US9214167B2 (en) 2013-03-12 2015-12-15 Seagate Technology Llc Main pole layer with at least tow sacrificial layers and a gap layer

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JP2007087551A (ja) * 2005-09-26 2007-04-05 Alps Electric Co Ltd 垂直磁気記録ヘッドの製造方法
JP2012133859A (ja) * 2010-12-22 2012-07-12 Hitachi Global Storage Technologies Netherlands Bv 主磁極または遮蔽層を分離するギャップ層の膜成長のためのシード積層としてのＮｉＣｒ
US8238059B1 (en) * 2011-04-06 2012-08-07 Headway Technologies, Inc. PMR write head with narrow gap for minimal internal flux loss
US20120304454A1 (en) * 2011-06-06 2012-12-06 Western Digital (Fremont), Llc Process for fabricating a magnetic pole and shields
US20130020204A1 (en) * 2011-07-20 2013-01-24 Hitachi Global Storage Technologies Netherlands B. V. Magnetic write head having an electroplated write pole with a leading edge taper

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US5729413A (en) 1995-12-20 1998-03-17 Ampex Corporation Two-gap magnetic read/write head
JP3305244B2 (ja) 1997-12-10 2002-07-22 アルプス電気株式会社 薄膜磁気ヘッドおよびその製造方法
JPH11195206A (ja) * 1997-12-26 1999-07-21 Hitachi Metals Ltd 磁気抵抗効果型薄膜磁気ヘッドおよびその製造方法
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JP2007087551A (ja) * 2005-09-26 2007-04-05 Alps Electric Co Ltd 垂直磁気記録ヘッドの製造方法
JP2012133859A (ja) * 2010-12-22 2012-07-12 Hitachi Global Storage Technologies Netherlands Bv 主磁極または遮蔽層を分離するギャップ層の膜成長のためのシード積層としてのＮｉＣｒ
US8238059B1 (en) * 2011-04-06 2012-08-07 Headway Technologies, Inc. PMR write head with narrow gap for minimal internal flux loss
US20120304454A1 (en) * 2011-06-06 2012-12-06 Western Digital (Fremont), Llc Process for fabricating a magnetic pole and shields
US20130020204A1 (en) * 2011-07-20 2013-01-24 Hitachi Global Storage Technologies Netherlands B. V. Magnetic write head having an electroplated write pole with a leading edge taper

Also Published As

Publication number Publication date
US9214167B2 (en) 2015-12-15
EP2779165A2 (en) 2014-09-17
CN104050986B (zh) 2018-06-19
US20160078887A1 (en) 2016-03-17
CN104050986A (zh) 2014-09-17
JP2014175048A (ja) 2014-09-22
JP6066947B2 (ja) 2017-01-25
US20140268415A1 (en) 2014-09-18
KR20140111962A (ko) 2014-09-22
US9922671B2 (en) 2018-03-20
EP2779165A3 (en) 2015-03-25

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