KR101698236B1 - 노광 장치 및 디바이스의 제조 방법 - Google Patents

노광 장치 및 디바이스의 제조 방법 Download PDF

Info

Publication number
KR101698236B1
KR101698236B1 KR1020130164484A KR20130164484A KR101698236B1 KR 101698236 B1 KR101698236 B1 KR 101698236B1 KR 1020130164484 A KR1020130164484 A KR 1020130164484A KR 20130164484 A KR20130164484 A KR 20130164484A KR 101698236 B1 KR101698236 B1 KR 101698236B1
Authority
KR
South Korea
Prior art keywords
substrate
illuminance
oxygen concentration
optical system
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020130164484A
Other languages
English (en)
Korean (ko)
Other versions
KR20140085355A (ko
Inventor
료 사사키
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20140085355A publication Critical patent/KR20140085355A/ko
Application granted granted Critical
Publication of KR101698236B1 publication Critical patent/KR101698236B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020130164484A 2012-12-27 2013-12-26 노광 장치 및 디바이스의 제조 방법 Active KR101698236B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012284352A JP6099970B2 (ja) 2012-12-27 2012-12-27 露光装置及びデバイスの製造方法
JPJP-P-2012-284352 2012-12-27

Publications (2)

Publication Number Publication Date
KR20140085355A KR20140085355A (ko) 2014-07-07
KR101698236B1 true KR101698236B1 (ko) 2017-01-19

Family

ID=51017561

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130164484A Active KR101698236B1 (ko) 2012-12-27 2013-12-26 노광 장치 및 디바이스의 제조 방법

Country Status (3)

Country Link
US (1) US9280050B2 (https=)
JP (1) JP6099970B2 (https=)
KR (1) KR101698236B1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180100495A (ko) * 2017-03-01 2018-09-11 가부시키가이샤 스크린 홀딩스 노광 장치, 기판 처리 장치, 기판의 노광 방법 및 기판 처리 방법

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6343326B2 (ja) * 2016-11-18 2018-06-13 キヤノン株式会社 露光装置、および物品の製造方法
JP7152876B2 (ja) * 2018-05-17 2022-10-13 キヤノン株式会社 露光装置及び物品の製造方法
JP7278836B2 (ja) * 2019-03-29 2023-05-22 キヤノン株式会社 露光装置、露光方法、および物品の製造方法
KR102829107B1 (ko) 2019-05-02 2025-07-07 삼성전자주식회사 Euv 노광 장치 및 그를 이용한 반도체 소자의 제조 방법
US11860555B2 (en) * 2021-03-30 2024-01-02 Changxin Memory Technologies, Inc. Alignment mark count acquiring method and device
KR102666441B1 (ko) * 2021-05-27 2024-05-20 세메스 주식회사 에지 노광 장치 및 광원 출력 제어 방법

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4273421B2 (ja) 2002-08-29 2009-06-03 株式会社ニコン 温度制御方法及び装置、並びに露光方法及び装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0719058B2 (ja) 1984-08-21 1995-03-06 ソニー株式会社 パタ−ン形成方法及び露光装置
JPS61213814A (ja) * 1985-03-20 1986-09-22 Hitachi Ltd 投影露光装置
JPH01195445A (ja) 1988-01-29 1989-08-07 Matsushita Electric Ind Co Ltd レジストの露光方法
JP4011643B2 (ja) * 1996-01-05 2007-11-21 キヤノン株式会社 半導体製造装置
KR20010006467A (ko) * 1997-04-18 2001-01-26 오노 시게오 노광 장치, 해당 장치를 이용한 노광 방법 및 회로 장치 제조 방법
JPH1187230A (ja) * 1997-09-01 1999-03-30 Canon Inc 露光装置およびデバイス製造方法
JPH11354409A (ja) * 1998-06-09 1999-12-24 Canon Inc 照明装置、これを備えた投影露光装置、及び半導体装置の製造方法
US6690450B2 (en) * 2000-01-31 2004-02-10 Nikon Corporation Exposure method, exposure apparatus, method for producing exposure apparatus, and method for producing device
JP2003257822A (ja) * 2002-02-28 2003-09-12 Nikon Corp 光学装置及び露光装置
US20050175497A1 (en) * 2002-08-29 2005-08-11 Nikon Corporation Temperature control method and apparatus and exposure method and apparatus
JP2004281854A (ja) * 2003-03-18 2004-10-07 Canon Inc 露光装置
JP2005142185A (ja) * 2003-11-04 2005-06-02 Canon Inc 露光装置及びその環境制御方法
JP5448724B2 (ja) * 2009-10-29 2014-03-19 キヤノン株式会社 露光装置及びデバイスの製造方法
JP5936328B2 (ja) * 2010-10-22 2016-06-22 キヤノン株式会社 露光装置およびデバイス製造方法
JP6099969B2 (ja) 2012-12-27 2017-03-22 キヤノン株式会社 露光装置及びデバイスの製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4273421B2 (ja) 2002-08-29 2009-06-03 株式会社ニコン 温度制御方法及び装置、並びに露光方法及び装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180100495A (ko) * 2017-03-01 2018-09-11 가부시키가이샤 스크린 홀딩스 노광 장치, 기판 처리 장치, 기판의 노광 방법 및 기판 처리 방법
KR102103632B1 (ko) 2017-03-01 2020-04-22 가부시키가이샤 스크린 홀딩스 노광 장치, 기판 처리 장치, 기판의 노광 방법 및 기판 처리 방법

Also Published As

Publication number Publication date
JP6099970B2 (ja) 2017-03-22
US20140186755A1 (en) 2014-07-03
KR20140085355A (ko) 2014-07-07
JP2014127620A (ja) 2014-07-07
US9280050B2 (en) 2016-03-08

Similar Documents

Publication Publication Date Title
KR101698236B1 (ko) 노광 장치 및 디바이스의 제조 방법
US9250541B2 (en) Exposure apparatus and device fabrication method
KR20090029686A (ko) 가변슬릿장치, 조명장치, 노광장치, 노광방법 및 디바이스 제조방법
US9465303B2 (en) Exposure apparatus and device manufacturing method
US8269945B2 (en) Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method
US7510341B2 (en) Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus
US20040156026A1 (en) Exposure apparatus and exposure method
TW201335719A (zh) 曝光裝置及曝光方法
KR101267144B1 (ko) 센서의 교정 방법, 노광 방법, 노광 장치, 디바이스 제조방법, 및 반사형 마스크
JP3200244B2 (ja) 走査型露光装置
KR100846337B1 (ko) 노광방법 및 노광장치
US10534278B2 (en) Exposure apparatus and method of manufacturing article
JP2008171974A (ja) 光量調整装置、露光装置およびデバイス製造方法
JP2011009411A (ja) 光学特性計測方法、露光方法、及びデバイス製造方法
JP2000114164A (ja) 走査型投影露光装置及びそれを用いたデバイスの製造方法
JP2001196293A (ja) 露光装置及びそれを用いたデバイスの製造方法
KR100865554B1 (ko) 노광 장치
TW201936355A (zh) 曝光裝置、壓印裝置及物品之製造方法
JP3884968B2 (ja) 露光装置、露光方法、デバイス製造方法及びデバイス
JP2009266904A (ja) 位置検出装置、露光装置及びデバイス製造方法
JP2023049841A (ja) 露光装置、露光方法、及び物品の製造方法
JP2006019561A (ja) 露光方法
JP2003162044A (ja) レチクル、露光方法及び装置
JP2000150334A (ja) 露光装置及びそれを用いたデバイスの製造方法
JP2005197445A (ja) 検出装置、露光装置及び露光方法

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20131226

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20150109

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 20131226

Comment text: Patent Application

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20160311

Patent event code: PE09021S01D

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20160331

Patent event code: PE09021S01D

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 20161020

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 20170113

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 20170113

End annual number: 3

Start annual number: 1

PG1601 Publication of registration
FPAY Annual fee payment

Payment date: 20200103

Year of fee payment: 4

PR1001 Payment of annual fee

Payment date: 20200103

Start annual number: 4

End annual number: 4

FPAY Annual fee payment

Payment date: 20210108

Year of fee payment: 5

PR1001 Payment of annual fee

Payment date: 20210108

Start annual number: 5

End annual number: 5

FPAY Annual fee payment

Payment date: 20211221

Year of fee payment: 6

PR1001 Payment of annual fee

Payment date: 20211221

Start annual number: 6

End annual number: 6

PR1001 Payment of annual fee

Payment date: 20231227

Start annual number: 8

End annual number: 8

PR1001 Payment of annual fee

Payment date: 20241224

Start annual number: 9

End annual number: 9