KR101692083B1 - 바이트 휠 - Google Patents
바이트 휠 Download PDFInfo
- Publication number
- KR101692083B1 KR101692083B1 KR1020110076704A KR20110076704A KR101692083B1 KR 101692083 B1 KR101692083 B1 KR 101692083B1 KR 1020110076704 A KR1020110076704 A KR 1020110076704A KR 20110076704 A KR20110076704 A KR 20110076704A KR 101692083 B1 KR101692083 B1 KR 101692083B1
- Authority
- KR
- South Korea
- Prior art keywords
- bite
- wheel
- mounting portion
- cutting
- mounting
- Prior art date
Links
- 238000005520 cutting process Methods 0.000 claims abstract description 47
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000003754 machining Methods 0.000 abstract description 9
- 238000004904 shortening Methods 0.000 abstract description 2
- 230000010485 coping Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 35
- 239000004065 semiconductor Substances 0.000 description 14
- 238000000034 method Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 238000004140 cleaning Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a cutting blade mounted on a carriage
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/741—Apparatus for manufacturing means for bonding, e.g. connectors
- H01L24/742—Apparatus for manufacturing bump connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/75—Apparatus for connecting with bump connectors or layer connectors
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Milling Processes (AREA)
- Turning (AREA)
- Dicing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2010-175340 | 2010-08-04 | ||
JP2010175340A JP5729937B2 (ja) | 2010-08-04 | 2010-08-04 | バイトホイール |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20120022594A KR20120022594A (ko) | 2012-03-12 |
KR101692083B1 true KR101692083B1 (ko) | 2017-01-02 |
Family
ID=45790917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020110076704A KR101692083B1 (ko) | 2010-08-04 | 2011-08-01 | 바이트 휠 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5729937B2 (ja) |
KR (1) | KR101692083B1 (ja) |
CN (1) | CN102371372B (ja) |
TW (1) | TWI531456B (ja) |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BR8707610A (pt) * | 1986-02-24 | 1989-03-14 | James Wilson | Ferramenta de corte |
JPS63131312U (ja) * | 1987-02-18 | 1988-08-26 | ||
JPH0417014U (ja) * | 1990-05-31 | 1992-02-12 | ||
JP4249827B2 (ja) | 1998-12-04 | 2009-04-08 | 株式会社ディスコ | 半導体ウェーハの製造方法 |
JP3835052B2 (ja) * | 1999-04-06 | 2006-10-18 | 三菱マテリアル株式会社 | 転削工具 |
JP2004174691A (ja) * | 2002-11-29 | 2004-06-24 | Sanyo Kogyo:Kk | 樹脂材端面の鏡面仕上げ用カッターおよびそのカッターを具備した樹脂材端面の鏡面仕上げ装置 |
JP2006116627A (ja) * | 2004-10-20 | 2006-05-11 | Sanyo Kogyo:Kk | 樹脂材の鏡面仕上げ用カッタ |
US7390150B2 (en) * | 2006-05-03 | 2008-06-24 | Valenite Llc | Cutting tool with adjustable indexable cutting insert |
JP4875532B2 (ja) * | 2007-04-03 | 2012-02-15 | 株式会社ディスコ | 切削加工装置 |
-
2010
- 2010-08-04 JP JP2010175340A patent/JP5729937B2/ja active Active
-
2011
- 2011-07-19 TW TW100125471A patent/TWI531456B/zh active
- 2011-08-01 KR KR1020110076704A patent/KR101692083B1/ko active IP Right Grant
- 2011-08-02 CN CN201110220277.1A patent/CN102371372B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
KR20120022594A (ko) | 2012-03-12 |
CN102371372A (zh) | 2012-03-14 |
TW201210775A (en) | 2012-03-16 |
JP5729937B2 (ja) | 2015-06-03 |
TWI531456B (zh) | 2016-05-01 |
JP2012035344A (ja) | 2012-02-23 |
CN102371372B (zh) | 2015-07-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20191217 Year of fee payment: 4 |