KR101674484B1 - 위치설정 시스템, 리소그래피 장치, 및 디바이스 제조 방법 - Google Patents

위치설정 시스템, 리소그래피 장치, 및 디바이스 제조 방법 Download PDF

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KR101674484B1
KR101674484B1 KR1020157000726A KR20157000726A KR101674484B1 KR 101674484 B1 KR101674484 B1 KR 101674484B1 KR 1020157000726 A KR1020157000726 A KR 1020157000726A KR 20157000726 A KR20157000726 A KR 20157000726A KR 101674484 B1 KR101674484 B1 KR 101674484B1
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South Korea
Prior art keywords
support
sensor
substrate
deformation
substrate table
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KR1020157000726A
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English (en)
Korean (ko)
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KR20150030714A (ko
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루드 안토니우스 카타리나 마리아 비렌스
안드레 베르나르더스 제우닌크
데 발 마리너스 마리아 요하네스 반
윌헬무스 헨리쿠스 데오도러스 마리아 안게넨트
리에샤우트 리차드 헨리쿠스 아드리아누스 반
데 그로스 헨리쿠스 마르티너스 요한 반
데르 호벤 사르츠 윌렘 반
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에이에스엠엘 네델란즈 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020157000726A 2012-06-15 2013-06-13 위치설정 시스템, 리소그래피 장치, 및 디바이스 제조 방법 KR101674484B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261660471P 2012-06-15 2012-06-15
US61/660,471 2012-06-15
PCT/EP2013/062263 WO2013186307A1 (en) 2012-06-15 2013-06-13 Positioning system, lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
KR20150030714A KR20150030714A (ko) 2015-03-20
KR101674484B1 true KR101674484B1 (ko) 2016-11-09

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KR1020157000726A KR101674484B1 (ko) 2012-06-15 2013-06-13 위치설정 시스템, 리소그래피 장치, 및 디바이스 제조 방법

Country Status (7)

Country Link
US (1) US9383659B2 (ja)
JP (1) JP6101348B2 (ja)
KR (1) KR101674484B1 (ja)
CN (1) CN104350427B (ja)
NL (1) NL2010967A (ja)
TW (1) TWI468880B (ja)
WO (1) WO2013186307A1 (ja)

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WO2014053296A1 (en) * 2012-10-01 2014-04-10 Asml Netherlands B.V. A method for calibration of an encoder scale and a lithographic apparatus
US10607334B2 (en) * 2014-12-09 2020-03-31 Asml Netherlands B.V. Method and apparatus for image analysis
US10437157B2 (en) 2014-12-09 2019-10-08 Asml Netherlands B.V. Method and apparatus for image analysis
WO2016150631A1 (en) * 2015-03-23 2016-09-29 Asml Netherlands B.V. Lithographic apparatus, and device manufacturing method
CN106154752A (zh) * 2015-03-26 2016-11-23 上海微电子装备有限公司 一种测量装置
JP6700680B2 (ja) * 2015-06-16 2020-05-27 キヤノン株式会社 支持装置、リソグラフィ装置、および物品の製造方法
WO2017057589A1 (ja) 2015-09-30 2017-04-06 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法、並びに物体の移動方法
JP6489999B2 (ja) 2015-11-19 2019-03-27 東芝メモリ株式会社 位置合わせ方法およびパターン形成システム
CN109690418B (zh) 2016-09-08 2021-10-01 Asml控股股份有限公司 包括对装置标记的原位印刷的测量方法以及对应装置
NL2019477A (en) * 2016-10-04 2018-04-10 Asml Netherlands Bv Athermalization of an alignment system
CN109891325B (zh) * 2016-10-28 2021-11-16 Asml荷兰有限公司 测量衬底、测量方法及测量系统
DE102020210024B4 (de) 2020-08-07 2024-02-08 Carl Zeiss Smt Gmbh Optische Baugruppe und Projektionsbelichtungsanlage

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JP2009135490A (ja) * 2007-11-20 2009-06-18 Asml Netherlands Bv ステージシステム、このようなステージシステムを含むリソグラフィ装置、及び補正方法

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JP2002365016A (ja) 2001-06-07 2002-12-18 Nikon Corp 干渉計を用いた位置測定方法、干渉式位置測定装置、露光装置及び露光方法
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JP2009135490A (ja) * 2007-11-20 2009-06-18 Asml Netherlands Bv ステージシステム、このようなステージシステムを含むリソグラフィ装置、及び補正方法

Also Published As

Publication number Publication date
US20150168852A1 (en) 2015-06-18
NL2010967A (en) 2013-12-17
KR20150030714A (ko) 2015-03-20
TW201403267A (zh) 2014-01-16
US9383659B2 (en) 2016-07-05
CN104350427A (zh) 2015-02-11
TWI468880B (zh) 2015-01-11
JP6101348B2 (ja) 2017-03-22
CN104350427B (zh) 2017-03-29
JP2015527600A (ja) 2015-09-17
WO2013186307A1 (en) 2013-12-19

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