KR101614339B1 - 합성 석영 유리의 제조 방법 - Google Patents
합성 석영 유리의 제조 방법 Download PDFInfo
- Publication number
- KR101614339B1 KR101614339B1 KR1020147016084A KR20147016084A KR101614339B1 KR 101614339 B1 KR101614339 B1 KR 101614339B1 KR 1020147016084 A KR1020147016084 A KR 1020147016084A KR 20147016084 A KR20147016084 A KR 20147016084A KR 101614339 B1 KR101614339 B1 KR 101614339B1
- Authority
- KR
- South Korea
- Prior art keywords
- sio
- feedstock
- liquid
- carrier gas
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 117
- 239000007788 liquid Substances 0.000 claims abstract description 64
- 239000012159 carrier gas Substances 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 31
- 230000008016 vaporization Effects 0.000 claims abstract description 28
- 238000009834 vaporization Methods 0.000 claims abstract description 25
- 239000004071 soot Substances 0.000 claims abstract description 20
- 239000002245 particle Substances 0.000 claims abstract description 19
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000002347 injection Methods 0.000 claims abstract description 8
- 239000007924 injection Substances 0.000 claims abstract description 8
- 238000000151 deposition Methods 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 12
- 238000005507 spraying Methods 0.000 claims description 10
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims description 5
- 239000002994 raw material Substances 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 9
- 238000010438 heat treatment Methods 0.000 abstract description 6
- 238000000889 atomisation Methods 0.000 abstract description 2
- 239000006200 vaporizer Substances 0.000 description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 238000006116 polymerization reaction Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 8
- 230000007062 hydrolysis Effects 0.000 description 8
- 238000006460 hydrolysis reaction Methods 0.000 description 8
- 239000007791 liquid phase Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000000567 combustion gas Substances 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000000197 pyrolysis Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- -1 siloxanes Chemical class 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical class [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011121190.3 | 2011-12-16 | ||
| DE102011121190A DE102011121190A1 (de) | 2011-12-16 | 2011-12-16 | OMCTS-Verdampfungsverfahren |
| PCT/EP2012/075346 WO2013087751A1 (de) | 2011-12-16 | 2012-12-13 | Verfahren zur herstellung von synthetischem quarzglas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20140098786A KR20140098786A (ko) | 2014-08-08 |
| KR101614339B1 true KR101614339B1 (ko) | 2016-04-21 |
Family
ID=47435939
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020147016084A Active KR101614339B1 (ko) | 2011-12-16 | 2012-12-13 | 합성 석영 유리의 제조 방법 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9481597B2 (enExample) |
| EP (1) | EP2791069B1 (enExample) |
| JP (1) | JP6138145B2 (enExample) |
| KR (1) | KR101614339B1 (enExample) |
| CN (1) | CN103987667B (enExample) |
| DE (1) | DE102011121190A1 (enExample) |
| IN (1) | IN2014CN04381A (enExample) |
| WO (1) | WO2013087751A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220085008A (ko) * | 2020-12-14 | 2022-06-21 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 다공질 유리 모재의 제조 방법 및 제조 장치 |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6236866B2 (ja) * | 2013-05-15 | 2017-11-29 | 住友電気工業株式会社 | ガラス微粒子堆積体の製造方法およびガラス微粒子堆積体製造用バーナー |
| DE102013209673B3 (de) | 2013-05-24 | 2014-05-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren und Verdampfer zur Herstellung von synthetischem Quarzglas |
| EP3034476A1 (de) | 2014-12-16 | 2016-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung |
| EP3059212A1 (de) | 2015-02-18 | 2016-08-24 | Heraeus Quarzglas GmbH & Co. KG | Verfahren und vorrichtung zur herstellung von quarzglas aus einer polymerisierbaren polyalkylsiloxanverbindung mit membranfilter als reinigungsvorrichtung |
| EP3434653A1 (de) | 2017-07-24 | 2019-01-30 | Heraeus Quarzglas GmbH & Co. KG | Einsatz von einer polyalkylsiloxanverbindung mit geringem siloxanolgehalt für die herstellung von synthetischem quarzglas |
| JP6978991B2 (ja) | 2018-08-23 | 2021-12-08 | 信越化学工業株式会社 | 光ファイバ用多孔質ガラス母材の製造方法および製造装置 |
| JP7463967B2 (ja) * | 2018-12-04 | 2024-04-09 | 住友電気工業株式会社 | ガラス微粒子堆積体の製造装置及び製造方法 |
| CN109373196A (zh) * | 2018-12-05 | 2019-02-22 | 上海正帆科技股份有限公司 | 一种八甲基环四硅氧烷的输送及汽化系统和方法 |
| JP7058627B2 (ja) * | 2019-06-11 | 2022-04-22 | 信越化学工業株式会社 | 光ファイバ用多孔質ガラス母材の製造装置および製造方法 |
| EP4144705A4 (en) * | 2020-05-01 | 2024-05-01 | Shin-Etsu Chemical Co., Ltd. | Manufacturing device for porous glass preform, manufacturing method for porous glass preform, and manufacturing method for optical fiber glass preform |
| EP3950610A1 (de) | 2020-08-06 | 2022-02-09 | Heraeus Quarzglas GmbH & Co. KG | Alternative fluorierungsmittel ii: fluosil und sootaufbau |
| EP3950611A1 (de) | 2020-08-06 | 2022-02-09 | Heraeus Quarzglas GmbH & Co. KG | Alternative fluorierungsmittel zur herstellung von fluoriertem quarzglas |
| EP4015468A1 (de) | 2020-12-16 | 2022-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas |
| EP4015467A1 (de) | 2020-12-16 | 2022-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas |
| EP4015466A1 (de) | 2020-12-16 | 2022-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas |
| USD982401S1 (en) * | 2021-05-09 | 2023-04-04 | Weber Product Development, Llc | Cap designed to reseal a partially used tube of caulk for later reuse |
| EP4428106A1 (de) | 2023-03-07 | 2024-09-11 | Heraeus Quarzglas GmbH & Co. KG | Antriebssynchronisation für soot-abscheidemaschine zur vermeidung von strukturbildungen in abscheideprozessen |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8905966D0 (en) | 1989-03-15 | 1989-04-26 | Tsl Group Plc | Improved vitreous silica products |
| US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| US5152819A (en) * | 1990-08-16 | 1992-10-06 | Corning Incorporated | Method of making fused silica |
| US5558687A (en) * | 1994-12-30 | 1996-09-24 | Corning Incorporated | Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds |
| US5632797A (en) * | 1994-12-30 | 1997-05-27 | Corning Incorporated | Method of providing vaporized halide-free, silicon-containing compounds |
| US5703191A (en) * | 1995-09-01 | 1997-12-30 | Corning Incorporated | Method for purifying polyalkylsiloxanes and the resulting products |
| US6312656B1 (en) * | 1995-12-19 | 2001-11-06 | Corning Incorporated | Method for forming silica by combustion of liquid reactants using oxygen |
| US6244575B1 (en) * | 1996-10-02 | 2001-06-12 | Micron Technology, Inc. | Method and apparatus for vaporizing liquid precursors and system for using same |
| EP1044172A4 (en) * | 1997-12-19 | 2005-01-19 | Corning Inc | BURNER AND PROCESS FOR PRODUCING METAL OXIDE SUES |
| JP2000017438A (ja) | 1998-06-30 | 2000-01-18 | Japan Pionics Co Ltd | 気化器及び気化供給方法 |
| US6546757B1 (en) * | 1998-07-28 | 2003-04-15 | Brown University Research Foundation | Liquid spray pyrolysis method for the fabrication of optical fiber preforms, with reactant mixing |
| US6672106B1 (en) * | 1998-08-07 | 2004-01-06 | Corning Incorporated | Method and apparatus for forming soot for the manufacture of glass |
| US6260385B1 (en) * | 1998-08-07 | 2001-07-17 | Corning Incorporated | Method and burner for forming silica-containing soot |
| US6705127B1 (en) * | 1998-10-30 | 2004-03-16 | Corning Incorporated | Methods of manufacturing soot for optical fiber preforms and preforms made by the methods |
| JP3685251B2 (ja) * | 2000-08-31 | 2005-08-17 | 信越化学工業株式会社 | 球状シリカ粉末の製造方法 |
| US6766702B2 (en) * | 2001-07-16 | 2004-07-27 | Institute For Tropospheric Research, A German Non-Profit Organization | Method and apparatus for investigating temporal development of particles or droplets in gas-vapor mixture |
| KR20040078643A (ko) * | 2001-12-04 | 2004-09-10 | 프라이맥스 인코포레이티드 | 증기를 증착실에 공급하는 방법 및 화학 증착 기화기 |
| DE10302914B4 (de) * | 2003-01-24 | 2005-12-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
| GB2478307A (en) * | 2010-03-02 | 2011-09-07 | Heraeus Quartz Uk Ltd | Manufacture of silica glass |
| DE102011119341A1 (de) * | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode |
| DE102011119339A1 (de) * | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas |
| DE102011119373A1 (de) * | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
| DE102011119374A1 (de) * | 2011-11-25 | 2013-05-29 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas |
| DE102011121153B3 (de) * | 2011-12-15 | 2013-03-21 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas sowie Quarzglas für den Einsatz als Mantelmaterial einer optischen Faser |
-
2011
- 2011-12-16 DE DE102011121190A patent/DE102011121190A1/de not_active Withdrawn
-
2012
- 2012-12-13 EP EP12806426.8A patent/EP2791069B1/de active Active
- 2012-12-13 IN IN4381CHN2014 patent/IN2014CN04381A/en unknown
- 2012-12-13 WO PCT/EP2012/075346 patent/WO2013087751A1/de not_active Ceased
- 2012-12-13 KR KR1020147016084A patent/KR101614339B1/ko active Active
- 2012-12-13 CN CN201280062054.XA patent/CN103987667B/zh active Active
- 2012-12-13 US US14/365,944 patent/US9481597B2/en active Active
- 2012-12-13 JP JP2014546502A patent/JP6138145B2/ja active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220085008A (ko) * | 2020-12-14 | 2022-06-21 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 다공질 유리 모재의 제조 방법 및 제조 장치 |
| KR102475516B1 (ko) * | 2020-12-14 | 2022-12-07 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 다공질 유리 모재의 제조 방법 및 제조 장치 |
| US11667557B2 (en) * | 2020-12-14 | 2023-06-06 | Shin-Etsu Chemical Co., Ltd. | Apparatus and method for producing porous glass preform |
Also Published As
| Publication number | Publication date |
|---|---|
| DE102011121190A1 (de) | 2013-06-20 |
| US20150007611A1 (en) | 2015-01-08 |
| KR20140098786A (ko) | 2014-08-08 |
| JP2015505291A (ja) | 2015-02-19 |
| EP2791069A1 (de) | 2014-10-22 |
| EP2791069B1 (de) | 2017-08-02 |
| JP6138145B2 (ja) | 2017-05-31 |
| IN2014CN04381A (enExample) | 2015-09-04 |
| CN103987667B (zh) | 2016-10-19 |
| WO2013087751A1 (de) | 2013-06-20 |
| CN103987667A (zh) | 2014-08-13 |
| US9481597B2 (en) | 2016-11-01 |
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