KR101589400B1 - 시료 관찰 방법 - Google Patents

시료 관찰 방법 Download PDF

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Publication number
KR101589400B1
KR101589400B1 KR1020147034116A KR20147034116A KR101589400B1 KR 101589400 B1 KR101589400 B1 KR 101589400B1 KR 1020147034116 A KR1020147034116 A KR 1020147034116A KR 20147034116 A KR20147034116 A KR 20147034116A KR 101589400 B1 KR101589400 B1 KR 101589400B1
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KR
South Korea
Prior art keywords
sample
charged particle
housing
optical
microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020147034116A
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English (en)
Korean (ko)
Other versions
KR20140146233A (ko
Inventor
유스께 오미나미
마미 고노미
스께히로 이또
도모히사 오따끼
신스께 가와니시
Original Assignee
가부시키가이샤 히다치 하이테크놀로지즈
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 가부시키가이샤 히다치 하이테크놀로지즈 filed Critical 가부시키가이샤 히다치 하이테크놀로지즈
Publication of KR20140146233A publication Critical patent/KR20140146233A/ko
Application granted granted Critical
Publication of KR101589400B1 publication Critical patent/KR101589400B1/ko
Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/204—Means for introducing and/or outputting objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020147034116A 2011-10-05 2012-09-03 시료 관찰 방법 Expired - Fee Related KR101589400B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2011-220606 2011-10-05
JP2011220606A JP5825964B2 (ja) 2011-10-05 2011-10-05 検査又は観察装置及び試料の検査又は観察方法
PCT/JP2012/072290 WO2013051357A1 (ja) 2011-10-05 2012-09-03 検査又は観察装置及び試料の検査又は観察方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020147008793A Division KR101566646B1 (ko) 2011-10-05 2012-09-03 검사 또는 관찰 장치 및 시료의 검사 또는 관찰 방법

Publications (2)

Publication Number Publication Date
KR20140146233A KR20140146233A (ko) 2014-12-24
KR101589400B1 true KR101589400B1 (ko) 2016-01-29

Family

ID=48043525

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020147034116A Expired - Fee Related KR101589400B1 (ko) 2011-10-05 2012-09-03 시료 관찰 방법
KR1020147008793A Expired - Fee Related KR101566646B1 (ko) 2011-10-05 2012-09-03 검사 또는 관찰 장치 및 시료의 검사 또는 관찰 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020147008793A Expired - Fee Related KR101566646B1 (ko) 2011-10-05 2012-09-03 검사 또는 관찰 장치 및 시료의 검사 또는 관찰 방법

Country Status (6)

Country Link
US (2) US8933400B2 (https=)
JP (1) JP5825964B2 (https=)
KR (2) KR101589400B1 (https=)
CN (1) CN103858204B (https=)
DE (1) DE112012003809B4 (https=)
WO (1) WO2013051357A1 (https=)

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* Cited by examiner, † Cited by third party
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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法
CN105103262B (zh) * 2013-04-12 2017-10-10 株式会社日立高新技术 带电粒子束装置以及过滤部件
WO2014192361A1 (ja) * 2013-05-30 2014-12-04 株式会社 日立ハイテクノロジーズ 荷電粒子線装置、試料観察方法
JP6302702B2 (ja) * 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
DE102014103360A1 (de) 2014-03-12 2015-09-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Vorrichtung für die korrelative Raster-Transmissionselektronenmikroskopie (STEM) und Lichtmikroskopie
JP6255305B2 (ja) * 2014-05-19 2017-12-27 株式会社レナ・システムズ 光学顕微装置
DE102014108331A1 (de) 2014-06-13 2015-12-17 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Spezifische Proteinmarkierung sowie Verfahren zur Identifizierung der statistischen Verteilung der Proteinstöchiometrie
DE102014108825A1 (de) * 2014-06-24 2015-12-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gesellschaft Mit Beschränkter Haftung Vorrichtung und Verfahren für die stöchiometrische Analyse von Proben
CN105651696B (zh) * 2014-11-28 2019-05-14 财团法人工业技术研究院 检测仪器及其检测方法
US10177048B2 (en) * 2015-03-04 2019-01-08 Applied Materials Israel Ltd. System for inspecting and reviewing a sample
DE112016000047B4 (de) * 2015-04-28 2021-01-28 Hitachi High-Tech Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Installationsverfahren
US10141157B2 (en) * 2015-06-29 2018-11-27 Hitachi High-Technologies Corporation Method for adjusting height of sample and observation system
CN107664834A (zh) * 2017-11-07 2018-02-06 西北农林科技大学 一种超声电机驱动的光学显微镜及其操作方法
US11294164B2 (en) 2019-07-26 2022-04-05 Applied Materials Israel Ltd. Integrated system and method
EP4141906A4 (en) * 2020-06-09 2024-09-25 National Institute for Materials Science DEVICE FOR OBSERVING GAS UNDER OBSERVATION, METHOD FOR OBSERVING IONS UNDER OBSERVATION AND SAMPLE HOLDER
WO2022219699A1 (ja) * 2021-04-13 2022-10-20 株式会社日立ハイテク 透過型電子顕微鏡

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JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
JP2010509709A (ja) * 2006-10-24 2010-03-25 ビー・ナノ・リミテッド インターフェース、非真空環境内で物体を観察する方法、および走査型電子顕微鏡
JP2010080144A (ja) * 2008-09-25 2010-04-08 Lasertec Corp 複合型顕微鏡装置及び試料観察方法

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US6172363B1 (en) * 1996-03-05 2001-01-09 Hitachi, Ltd. Method and apparatus for inspecting integrated circuit pattern
JP2000228166A (ja) * 1999-02-05 2000-08-15 Horon:Kk 試料観察装置
US6563570B1 (en) * 1999-05-17 2003-05-13 Nikon Corporation Apparatus for evaluating a sample including a self-supporting thin film
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EP1116932A3 (de) 2000-01-14 2003-04-16 Leica Microsystems Wetzlar GmbH Messgerät und Verfahren zun Vermessen von Strukturen auf einem Substrat
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JP5707286B2 (ja) * 2011-09-21 2015-04-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法。
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
JP2010509709A (ja) * 2006-10-24 2010-03-25 ビー・ナノ・リミテッド インターフェース、非真空環境内で物体を観察する方法、および走査型電子顕微鏡
JP2010080144A (ja) * 2008-09-25 2010-04-08 Lasertec Corp 複合型顕微鏡装置及び試料観察方法

Also Published As

Publication number Publication date
KR20140071407A (ko) 2014-06-11
CN103858204B (zh) 2016-06-08
KR101566646B1 (ko) 2015-11-05
KR20140146233A (ko) 2014-12-24
US9236217B2 (en) 2016-01-12
US20140246583A1 (en) 2014-09-04
US20150083908A1 (en) 2015-03-26
DE112012003809B4 (de) 2017-04-13
WO2013051357A1 (ja) 2013-04-11
US8933400B2 (en) 2015-01-13
JP2013080642A (ja) 2013-05-02
CN103858204A (zh) 2014-06-11
DE112012003809T5 (de) 2014-06-05
JP5825964B2 (ja) 2015-12-02

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