KR101559602B1 - 마이크로리소그래피 투영 노광 장치용 조명 시스템 - Google Patents

마이크로리소그래피 투영 노광 장치용 조명 시스템 Download PDF

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Publication number
KR101559602B1
KR101559602B1 KR1020107016157A KR20107016157A KR101559602B1 KR 101559602 B1 KR101559602 B1 KR 101559602B1 KR 1020107016157 A KR1020107016157 A KR 1020107016157A KR 20107016157 A KR20107016157 A KR 20107016157A KR 101559602 B1 KR101559602 B1 KR 101559602B1
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KR
South Korea
Prior art keywords
digital
mirror
analog converter
analog
lighting system
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KR1020107016157A
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English (en)
Korean (ko)
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KR20100107013A (ko
Inventor
얀 호른
크리스티안 켐프터
볼프강 팔롯-부르크하르트
Original Assignee
칼 짜이스 에스엠테 게엠베하
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Publication of KR20100107013A publication Critical patent/KR20100107013A/ko
Application granted granted Critical
Publication of KR101559602B1 publication Critical patent/KR101559602B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
KR1020107016157A 2007-12-21 2008-12-19 마이크로리소그래피 투영 노광 장치용 조명 시스템 KR101559602B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1610507P 2007-12-21 2007-12-21
US61/016,105 2007-12-21

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020157013505A Division KR101668573B1 (ko) 2007-12-21 2008-12-19 마이크로리소그래피 투영 노광 장치용 조명 시스템

Publications (2)

Publication Number Publication Date
KR20100107013A KR20100107013A (ko) 2010-10-04
KR101559602B1 true KR101559602B1 (ko) 2015-10-12

Family

ID=40475018

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020107016157A KR101559602B1 (ko) 2007-12-21 2008-12-19 마이크로리소그래피 투영 노광 장치용 조명 시스템
KR1020157013505A KR101668573B1 (ko) 2007-12-21 2008-12-19 마이크로리소그래피 투영 노광 장치용 조명 시스템
KR1020167028633A KR101789961B1 (ko) 2007-12-21 2008-12-19 마이크로리소그래피 투영 노광 장치용 조명 시스템

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020157013505A KR101668573B1 (ko) 2007-12-21 2008-12-19 마이크로리소그래피 투영 노광 장치용 조명 시스템
KR1020167028633A KR101789961B1 (ko) 2007-12-21 2008-12-19 마이크로리소그래피 투영 노광 장치용 조명 시스템

Country Status (6)

Country Link
US (1) US9348232B2 (zh)
EP (1) EP2232334B1 (zh)
JP (1) JP5639894B2 (zh)
KR (3) KR101559602B1 (zh)
CN (3) CN103034075B (zh)
WO (1) WO2009080310A1 (zh)

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Publication number Priority date Publication date Assignee Title
DE102008050446B4 (de) 2008-10-08 2011-07-28 Carl Zeiss SMT GmbH, 73447 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln
EP2317386B1 (en) 2008-12-23 2012-07-11 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
CN102349026B (zh) 2009-03-13 2015-07-29 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备
JP5337304B2 (ja) 2009-07-17 2013-11-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置及びそこに収容される光学面に関連するパラメータを測定する方法
JP5532213B2 (ja) * 2009-12-07 2014-06-25 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
US20120008943A1 (en) * 2010-07-08 2012-01-12 Nec Laboratories America, Inc. Optical switching network
KR101714825B1 (ko) * 2010-08-06 2017-03-09 칼 짜이스 에스엠테 게엠베하 마이크로리소그래피 투영 노광 장치
CN103399463B (zh) * 2013-07-19 2015-07-29 中国科学院上海光学精密机械研究所 投影光刻机照明装置和使用方法
JP6854914B2 (ja) 2017-04-06 2021-04-07 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ方法及び装置
CN112947654B (zh) * 2019-12-10 2022-12-30 圣邦微电子（北京）股份有限公司 阈值电压产生电路、测试机及充电保护芯片测试装置
DE102020210829A1 (de) * 2020-08-27 2022-03-03 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage

Citations (2)

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JP2001090587A (ja) * 1999-09-24 2001-04-03 Isuzu Motors Ltd 流体圧力検出回路
US20040179257A1 (en) * 2001-10-24 2004-09-16 Decicon, Incorporated MEMS driver

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JPS51126194A (en) 1974-11-25 1976-11-04 Hitachi Ltd Signal processing unit for analyzers
DE3916202A1 (de) * 1989-05-18 1990-11-22 Thomson Brandt Gmbh D/a-wandler mit hoher linearitaet
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
DE19839348C1 (de) 1998-08-28 1999-10-07 Daimler Chrysler Ag Fahrzeugsicherungssystem
US6543286B2 (en) * 2001-01-26 2003-04-08 Movaz Networks, Inc. High frequency pulse width modulation driver, particularly useful for electrostatically actuated MEMS array
US6998219B2 (en) * 2001-06-27 2006-02-14 University Of South Florida Maskless photolithography for etching and deposition
US6549155B1 (en) * 2002-01-30 2003-04-15 Texas Instruments Incorporated Signal conversion using coarse and fine digital to analog converters
JP4219645B2 (ja) * 2002-09-12 2009-02-04 シャープ株式会社 マイクロレンズアレイの露光方法
JP2004212209A (ja) * 2002-12-27 2004-07-29 Olympus Corp 角度検出装置、光信号スイッチシステムおよび情報記録再生システム
JP2005311145A (ja) 2004-04-23 2005-11-04 Canon Inc 露光装置、露光方法、デバイス製造方法、パターン形成装置および位置合わせ方法
US7304718B2 (en) * 2004-08-17 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TW200628921A (en) * 2004-09-17 2006-08-16 Hitachi Maxell Microlens array, method of fabricating microlens array, and liquid crystal display apparatus with microlens array
CN1749829A (zh) * 2004-09-17 2006-03-22 日立麦克赛尔株式会社 微透镜阵列和该微透镜阵列的制造方法及搭载了该微透镜阵列的液晶显示装置
US7177012B2 (en) * 2004-10-18 2007-02-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7170584B2 (en) * 2004-11-17 2007-01-30 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN1963672A (zh) * 2005-11-07 2007-05-16 中芯国际集成电路制造(上海)有限公司 利用微机电系统制造集成电路的可重构掩模的方法和器件
US7936445B2 (en) * 2006-06-19 2011-05-03 Asml Netherlands B.V. Altering pattern data based on measured optical element characteristics
US7738077B2 (en) * 2006-07-31 2010-06-15 Asml Netherlands B.V. Patterning device utilizing sets of stepped mirrors and method of using same
US7804603B2 (en) * 2006-10-03 2010-09-28 Asml Netherlands B.V. Measurement apparatus and method
US8937706B2 (en) * 2007-03-30 2015-01-20 Asml Netherlands B.V. Lithographic apparatus and method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001090587A (ja) * 1999-09-24 2001-04-03 Isuzu Motors Ltd 流体圧力検出回路
US20040179257A1 (en) * 2001-10-24 2004-09-16 Decicon, Incorporated MEMS driver

Also Published As

Publication number Publication date
EP2232334A1 (en) 2010-09-29
KR101668573B1 (ko) 2016-10-21
US9348232B2 (en) 2016-05-24
CN105045045B (zh) 2018-10-19
KR20150064235A (ko) 2015-06-10
KR20100107013A (ko) 2010-10-04
JP5639894B2 (ja) 2014-12-10
CN105045045A (zh) 2015-11-11
CN101946211A (zh) 2011-01-12
US20100309449A1 (en) 2010-12-09
CN101946211B (zh) 2013-02-13
JP2011507294A (ja) 2011-03-03
KR101789961B1 (ko) 2017-10-25
WO2009080310A1 (en) 2009-07-02
CN103034075A (zh) 2013-04-10
EP2232334B1 (en) 2013-02-20
KR20160122281A (ko) 2016-10-21
CN103034075B (zh) 2015-07-08

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