KR101490722B1 - 장파장 천이된 벤조트리아졸 uv-흡수제 및 이의 용도 - Google Patents

장파장 천이된 벤조트리아졸 uv-흡수제 및 이의 용도 Download PDF

Info

Publication number
KR101490722B1
KR101490722B1 KR20097001702A KR20097001702A KR101490722B1 KR 101490722 B1 KR101490722 B1 KR 101490722B1 KR 20097001702 A KR20097001702 A KR 20097001702A KR 20097001702 A KR20097001702 A KR 20097001702A KR 101490722 B1 KR101490722 B1 KR 101490722B1
Authority
KR
South Korea
Prior art keywords
alkyl
branched
straight
carbon atoms
phenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR20097001702A
Other languages
English (en)
Korean (ko)
Other versions
KR20090031593A (ko
Inventor
카타리나 프리츠쉐
마르쿠스 그로브
아달베르트 브라이크
이로나 마리온 킨즐레
게라르트 다닐 게오르게스 빌라인
Original Assignee
시바 홀딩 인크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시바 홀딩 인크 filed Critical 시바 홀딩 인크
Publication of KR20090031593A publication Critical patent/KR20090031593A/ko
Application granted granted Critical
Publication of KR101490722B1 publication Critical patent/KR101490722B1/ko
Assigned to 바스프 에스이 reassignment 바스프 에스이 권리의 전부이전등록 Assignors: 시바 홀딩 인크
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D249/00Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D513/00Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
    • C07D513/02Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains two hetero rings
    • C07D513/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D471/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D498/00Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D498/02Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D498/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/48Stabilisers against degradation by oxygen, light or heat
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472Five-membered rings
    • C08K5/3475Five-membered rings condensed with carbocyclic rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Protection Of Plants (AREA)
  • Plural Heterocyclic Compounds (AREA)
KR20097001702A 2006-06-27 2007-06-18 장파장 천이된 벤조트리아졸 uv-흡수제 및 이의 용도 Expired - Fee Related KR101490722B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06116114.7 2006-06-27
EP06116114 2006-06-27
PCT/EP2007/056004 WO2008000646A1 (en) 2006-06-27 2007-06-18 Long wavelength shifted benzotriazole uv-absorbers and their use

Publications (2)

Publication Number Publication Date
KR20090031593A KR20090031593A (ko) 2009-03-26
KR101490722B1 true KR101490722B1 (ko) 2015-02-06

Family

ID=37074143

Family Applications (1)

Application Number Title Priority Date Filing Date
KR20097001702A Expired - Fee Related KR101490722B1 (ko) 2006-06-27 2007-06-18 장파장 천이된 벤조트리아졸 uv-흡수제 및 이의 용도

Country Status (10)

Country Link
US (1) US8262949B2 (https=)
EP (1) EP2032577B1 (https=)
JP (1) JP5301434B2 (https=)
KR (1) KR101490722B1 (https=)
CN (1) CN101479271B (https=)
AT (1) ATE497502T1 (https=)
BR (2) BRPI0713466A2 (https=)
DE (1) DE602007012346D1 (https=)
RU (1) RU2455305C2 (https=)
WO (1) WO2008000646A1 (https=)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9828597B2 (en) 2006-11-22 2017-11-28 Toyota Motor Engineering & Manufacturing North America, Inc. Biofunctional materials
KR20120053018A (ko) 2009-07-29 2012-05-24 바스프 에스이 캡슐화된 페놀계 항산화제
US8796009B2 (en) 2010-06-21 2014-08-05 Toyota Motor Engineering & Manufacturing North America, Inc. Clearcoat containing thermolysin-like protease from Bacillus stearothermophilus for cleaning of insect body stains
US9388370B2 (en) 2010-06-21 2016-07-12 Toyota Motor Engineering & Manufacturing North America, Inc. Thermolysin-like protease for cleaning insect body stains
US10988714B2 (en) 2010-06-21 2021-04-27 Regents Of The University Of Minnesota Methods of facilitating removal of a fingerprint from a substrate or a coating
US9121016B2 (en) 2011-09-09 2015-09-01 Toyota Motor Engineering & Manufacturing North America, Inc. Coatings containing polymer modified enzyme for stable self-cleaning of organic stains
US11015149B2 (en) 2010-06-21 2021-05-25 Toyota Motor Corporation Methods of facilitating removal of a fingerprint
ES2476367T3 (es) 2010-07-22 2014-07-14 Basf Se Combinación de aditivos para aplicaciones de estanqueidad
BR112015022854A2 (pt) 2013-03-14 2017-07-18 Alkermes Pharma Ireland Ltd pró-farmacos de fumaratos e uso do mesmo no tratamento de várias doenças
US8669281B1 (en) 2013-03-14 2014-03-11 Alkermes Pharma Ireland Limited Prodrugs of fumarates and their use in treating various diseases
CN105358528B (zh) 2013-07-08 2021-07-20 巴斯夫欧洲公司 新型光稳定剂
JP6337135B2 (ja) 2014-02-24 2018-06-06 アルカーメス ファーマ アイルランド リミテッド フマル酸エステルのスルホンアミドプロドラッグ及びスルフィンアミドプロドラッグ並びに種々の疾患の治療におけるその使用
TW201703879A (zh) 2015-06-02 2017-02-01 西克帕控股有限公司 用於生產光學效應層之製程
US9828467B2 (en) 2016-02-05 2017-11-28 International Business Machines Corporation Photoresponsive hexahydrotriazine polymers
CN115819359B (zh) * 2018-05-03 2025-04-18 江苏裕事达新材料科技有限责任公司 一种防蓝光化合物、制备方法及其组合物
CN111285853B (zh) * 2018-12-10 2023-07-28 江苏裕事达新材料科技有限责任公司 一种多环化合物
CN113646411B (zh) * 2019-03-18 2024-10-11 默克专利股份有限公司 可聚合液晶材料及经聚合的液晶膜
CN113573889B (zh) 2019-03-20 2023-05-26 积水化学工业株式会社 热塑性膜及夹层玻璃
JPWO2020189784A1 (https=) 2019-03-20 2020-09-24
KR20210145144A (ko) 2019-03-20 2021-12-01 세키스이가가쿠 고교가부시키가이샤 열가소성 필름, 및 접합 유리
CN113728070B (zh) * 2019-04-26 2024-03-08 三吉油脂株式会社 耐热性优异和长波长吸收优异的紫外线吸收剂
TWI723738B (zh) * 2020-01-13 2021-04-01 臺灣永光化學工業股份有限公司 新型反應型苯并三唑紫外線吸收劑及其用途
WO2026073795A1 (en) 2024-10-01 2026-04-09 Basf Se Mixtures of additives for the stabilization of adhesives, sealants and elastomers

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0717313A1 (en) * 1994-11-30 1996-06-19 Eastman Kodak Company Benzotriazole based UV absorbing compounds and photographic elements containing them
US6166218A (en) * 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
WO2002028854A1 (en) * 2000-10-03 2002-04-11 Ciba Specialty Chemicals Holding Inc. Heteroaryl substituted hydroxyphenyltriazine uv-absorbers

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4961071A (https=) * 1972-10-16 1974-06-13
US5280124A (en) * 1991-02-12 1994-01-18 Ciba-Geigy Corporation 5-sulfonyl-substituted benzotriazole UV-absorbers
RU2414471C2 (ru) * 2005-02-02 2011-03-20 Циба Спешиалти Кемикэлз Холдинг Инк. Бензотриазоловые поглотители уф-лучей со смещенным в длинноволновую область спектром поглощения и их применение

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0717313A1 (en) * 1994-11-30 1996-06-19 Eastman Kodak Company Benzotriazole based UV absorbing compounds and photographic elements containing them
US6166218A (en) * 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
WO2002028854A1 (en) * 2000-10-03 2002-04-11 Ciba Specialty Chemicals Holding Inc. Heteroaryl substituted hydroxyphenyltriazine uv-absorbers

Also Published As

Publication number Publication date
RU2009102272A (ru) 2010-08-10
RU2455305C2 (ru) 2012-07-10
BRPI0713466A2 (pt) 2012-01-24
EP2032577B1 (en) 2011-02-02
US8262949B2 (en) 2012-09-11
KR20090031593A (ko) 2009-03-26
ATE497502T1 (de) 2011-02-15
JP5301434B2 (ja) 2013-09-25
CN101479271B (zh) 2012-12-12
US20100163813A1 (en) 2010-07-01
BR122016009519B1 (pt) 2017-11-14
JP2009541416A (ja) 2009-11-26
WO2008000646A1 (en) 2008-01-03
CN101479271A (zh) 2009-07-08
DE602007012346D1 (de) 2011-03-17
EP2032577A1 (en) 2009-03-11

Similar Documents

Publication Publication Date Title
KR101490722B1 (ko) 장파장 천이된 벤조트리아졸 uv-흡수제 및 이의 용도
KR101322194B1 (ko) 장파장 천이된 벤조트리아졸 uv 흡수제 및 이의 용도
US8586735B2 (en) Hydroxyphenyl triazines with an aromatic carbocyclic fused ring system
US10047231B2 (en) Tris(hydroxyphenyl) triazines
JP2008545865A5 (https=)
CA2399183A1 (en) Thioimidazolidine derivatives
CA2290213A1 (en) Piperazinone derivatives
CA2443064C (en) Transition-metal-catalyzed process for the preparation of sterically hindered n-substituted alkoxyamines
BRPI0713466B1 (pt) Benzotriazol uv absorbing compositions displaced by long wave length, process for preparing, using, and stabilized composition against light-induced degradation
CA2396020A1 (en) Imidazolidinone derivatives
GB2377450A (en) 1,3,5-Triazine-Piperazinone derivatives

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R14-asn-PN2301

FPAY Annual fee payment

Payment date: 20180117

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20190122

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20200114

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20220203

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20220203